Abstract: A microelectronic device (semiconductor substrate) cleaning composition is provided that comprises water; oxalic acid, and two or more corrosion inhibitors and methods of using the same.

Abstract: Method for increasing the ability of at least one droplet to slide over a medium. An ultrasonic surface wave is generated in the medium with a sufficient amplitude to cause the droplet to deform in an inertio-capillary eigen-vibration mode, thus decreasing the attachment of the droplet to the medium, so as to make it easier for the droplet to move under the effect of an external force, the amplitude of the ultrasonic surface wave being insufficient to cause the droplet to deform asymmetrically to the point that it moves in the absence of the external force in the direction of propagation of the ultrasonic surface wave.

Abstract: To provide a composition for removing photoresist residue and/or polymer residue formed in a process for producing a semiconductor circuit element, and a removal method employing same. A composition for removing photoresist residue and/or polymer residue, the composition containing saccharin and water, and the pH being no greater than 9.7.

Abstract: A substrate processing apparatus includes a substrate holder, and a discharge head for peripheral area from which a fluid is discharge toward a surface peripheral area of the substrate held on the substrate holder. The discharge head for peripheral area includes multiple nozzles, and a support part that supports the nozzles integrally. The nozzles include a processing liquid nozzle from which a processing liquid is discharged toward the surface peripheral area, and a gas nozzle from which gas is discharged toward the surface peripheral area. The gas nozzle is placed upstream of a rotative direction of the substrate relative to the processing liquid nozzle.

Abstract: A method includes introducing ozone toward a photoresist layer over a substrate. The ozone is decomposed into dioxygen and first atomic oxygen. The dioxygen is decomposed into second atomic oxygen. The first atomic oxygen and the second atomic oxygen are reacted with the photoresist layer. An apparatus that performs the method is also disclosed.

Abstract: Industrial vacuum cleaner configured for servicing at least one construction tool (2), said vacuum cleaner (1) comprising a vacuum inlet (3), wherein said vacuum cleaner (1) further comprises a controller (8) and connected to said controller (8) a wireless transceiver (10), a memory (12), and at least one location and/or orientation sensor (11) configured for detection of vacuum cleaner location and/or localization of other objects in relation to the vacuum cleaner (1) and wherein the vacuum cleaner (1) further comprises means for propulsion (13) controlled by said controller (8).

Abstract: A cleaning method for cleaning a frame unit including an affixed object, a tape affixed to an undersurface of the affixed object, and an annular frame to which an outer peripheral portion of the tape is affixed, the cleaning method including: an affixed object cleaning step of cleaning the affixed object by jetting a cleaning liquid from a cleaning nozzle while moving the cleaning nozzle in a reciprocating manner along a path extending from above one end of an outer peripheral edge of the affixed object to above another end of the outer peripheral edge of the affixed object; and a frame cleaning step of cleaning the frame by jetting the cleaning liquid from the cleaning nozzle to the frame.

Abstract: Provided is an acid-pickling additive for a surface oxide scale of a stainless steel material, a preparation method thereof and an acid-pickling method. The acid-pickling additive consists of 1 to 10 parts by weight of an alcohol amine compound, 0.1 to 5 parts by weight of a metal complex ligand, 0 to 10 parts by weight of a nitrogen-containing organic cyclic compound, 0 to 3 parts by weight of an alcohol compound, 0 to 3 parts by weight of a plant extract, and 1 to 2 parts by weight of water. This acid-pickling additive can solve the problems of high energy consumption, environmental pollution, and high cost in the existing method for removing an oxide scale of a stainless steel.

Abstract: A method for cleaning a semiconductor wafer, including: supplying a semiconductor wafer whose surface has an oxide film formed thereon with a cleaning solution capable of removing the oxide film; and cleaning, while rotating, the semiconductor wafer to remove the oxide film formed on the surface of the semiconductor wafer. The oxide film is removed such that a rotational speed of the semiconductor wafer is 300 rpm or more after the cleaning with the cleaning solution is started and before a water-repelling surface is attained, and then the rotational speed of the semiconductor wafer is changed to 100 rpm or less to completely remove the oxide film. A method for cleaning a semiconductor wafer by which both surface roughness improvement and surface defect suppression can be achieved.

Abstract: In one embodiment, after a new filter unit is installed in a treatment liquid supply apparatus, there is performed, before a solvent-containing treatment liquid is passed through the filter unit, a step of soaking the filter unit with a solvent for pretreatment and then discharging therefrom the solvent. The solubility of a material, constituting a filter part of the filter unit, to the solvent is greater than the solubility of the material to the treatment liquid. This step makes it possible to remove a component, which may elute from the filter part into the treatment liquid to produce foreign matters (particles), before treatment liquid is passed through the filter unit.

Abstract: Disclosed are methods and apparatus for cleaning a substrate, such as a fabric material, involving the application of optical energy to the substrate, typically in the form of a beam of light, where the energy of the beam causes removal of the contaminant from substrate, such as from the fibres of a fabric material. The cleaning may occur via any mechanism, including one or more of, alone or in any combination, ablation, melting, heating or reaction with the substrate or contaminant or agent introduced to aid in the cleaning. The optical energy is typically applied to a selected area of the substrate (e.g., as a beam), and the substrate and beam or optical energy source moved relative to one another so as to clean a larger area of the substrate, either by moving the substrate or the beam, or both. Movement of the beam with respect to the substrate can be attained through a beam scanning mechanism or through movement of the optical source itself.

Abstract: A self-cleaning, automated apparatus with a filter for fluids includes a nozzle unit assembly that has a first tube inside a second tube. Each of the tubes has a different pattern of one or more slots or holes. One tube rotates while the other is fixed, so that part of the pattern of one coincides with the other at times, resulting in a jet of cleaning fluid that removes debris from a filter. The filter is rotated so the jet can reach all parts to be cleaned. The pattern of the rotating tube may approximate a helix and the pattern of the fixed tube may approximate a line.

Abstract: A protective arrangement for an electric vehicle charging system includes a floor unit forming a recess and a linkage disposed in the recess. The linkage is extendable from the recess from a stowed position to an extended position. A cleaning device is disposed to discourage accumulation of debris into the recess and on the linkage when the linkage is in the stowed position.

Abstract: The present disclosure relates to a dishmachine that includes at least two tanks and methods of using the tanks to isolate, substantially isolate, or incrementally isolate different chemistries from each other during a cycle. The disclosed dishmachine design and method allows for the use of two different, and potentially incompatible, reactive, or offsetting chemistries to be used in the same dishmachine cycle.

Abstract: Embodiments of the present disclosure relate generally to systems and methods for combining ozone and water to deliver ozonated water in a rinse stream. The ozone rain pan finds particular use for rinsing food products traveling along a conveyor line with ozonated water.

Abstract: The invention relates to a container emptying device (1) for emptying at least one container (6) filled with a liquid, comprising a suction unit (2), a receiving unit (4) and a pipe unit (3) connecting the receiving unit (4) with the suction unit (2). The suction unit (2) comprises at least one suction lance (2a) adapted to be inserted and lowered into the container (6), at least one pump (2c), connecting the suction lance (2a) with the pipe unit (3), for pumping the liquid out of the container (6) and a control device for controlling a suction process. The pipe unit (3) comprises at least one flexible pipe for transporting the liquid out of the container (6).

Abstract: A system for the maintenance and operation of an air-cooled heat exchanger (ACHE) includes a plurality of spray tubes provided with spaced-apart nozzles permanently positioned between the finned heat exchange tubes and longitudinally aligned within the region of the finned-tube pitch. The system is operable in several modes, including cleaning where the flow of air is stopped and temperature-controlled pressurized water with an optional cleaning agent is discharged from the nozzles to dislodge dirt and debris from the finned surfaces while simultaneously cooling the hot process liquid. When extremes of ambient air temperatures preclude the forced air fans from achieving the target temperature range of the process liquid passing through the ACHE, refrigerated pressurized cooled water and compressed air in the form of a mist is discharged from the nozzles, or alternatively, pressurized heated air is discharged from the nozzles.

Abstract: A device for clearing obstructions from a medical tube, such as a chest tube, is disclosed in various embodiments. The device features a clearance member in the form of a loop. The loop desirably has a diameter that substantially corresponds to the inner diameter of the medical tube. Also desirably, the loop presents a substantially unobstructed pathway therethrough for the flow of material from a location in the medical tube distal to the loop to a location in the medical tube proximal to the loop regardless whether the clearance member is being translated or is at rest in the medical tube. Methods of utilizing such a device are also disclosed.

Abstract: In chemical processes for cracking hydrocarbons, reactors are subject to coking. This results in carburization of the metal substrate for the reactor leading to a reduced reactor life. If the reactor is subject to a decoke process, followed by a steam scour and nitriding there is a reduced tendency to carburization of the metal substrate improving the reactor life.

Abstract: The present invention relates to the acidic cleaning in the beer industry, and more particularly an improved process for acidic cleaning of the various elements and vessels that are used in the preparation of beer and other and other related fermented beverages, said cleaning being carried out by using a formulation comprising at least one alkane sulphonic acid.