Abstract: A method of bonding a wire between a semiconductor die pad and a lead finger of a lead frame which includes providing a capillary having a bore and a wire pigtail extending through the bore and externally of the capillary. A ball is formed with the pigtail, a semiconductor die pad is provided and a ball bond is formed on the die pad with the ball. A lead frame finger is provided and the capillary and the wire threaded through the bore are moved to the lead frame finger. A stitch bond is formed on the lead finger with the capillary. The capillary is moved from the stitch bond with a pigtail of the wire extending out of the bore of the capillary. A second ball is formed with the pigtail and the capillary is again moved toward the stitch bond until the second ball contacts the stitch bond. A ball bond is then formed over and secured to the stitch bond and to the lead frame finger.

Abstract: A method in the manufacture of ultra-large scale integrated circuit semiconductor devices suppresses boron loss due to segregation into the screen oxide during the boron activation rapid thermal anneal. A nitridation of the screen oxide is used to incorporate nitrogen into the screen oxide layer prior to boron implantation for ultra-shallow, source and drain extension junctions. A second nitridation of a second screen oxide is used prior to boron implantation for deeper, source and drain junctions. This method significantly suppresses boron diffusion and segregation away from the silicon substrate which reduces series resistance of the complete source and drain junctions.

Abstract: A leadframe includes a leadframe finger support for supporting elongate leadframe fingers. These elongate leadframe fingers are subject to damage prior to or during the assembly process. Through the provision of the leadframe finger support, the leadframe fingers may be supported at an intermediate position along their length as necessary to prevent bending. The support may be severed from the dam bar in the course of singulation.

Abstract: A method is described for filling narrow gaps in a surface that is being overcoated. This has been achieved by heating the overcoating layer to a sufficient extent so that it flows relatively easily. This, in combination with externally applied pressure, causes the overcoating layer to effectively fill any narrow gaps in the surface being coated. Temperature and pressure are applied for a time that is sufficient to allow small quantities of gas that may have become trapped in the gaps to bubble to the surface. In an alternative embodiment, the surface to be coated is subjected to negative pressure prior to application of the coating. This eliminates the possibility of trapping gas in the gaps so a waiting time is no longer necessary.