Patents Examined by Nga Leung V Law
  • Patent number: 11367611
    Abstract: There is provided a film forming method of embedding a film in a groove formed in a front surface of a substrate, which includes: depositing an in-conformal film in the groove formed in the front surface of the substrate while forming a V-like cross-sectional shape in the groove; and embedding a conformal film in the groove by depositing the conformal film.
    Type: Grant
    Filed: March 18, 2019
    Date of Patent: June 21, 2022
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Yuji Nishino, Jun Sato
  • Patent number: 11328905
    Abstract: There is provision of a thermal spraying method of a component for a plasma processing apparatus performed by a plasma spraying apparatus including a nozzle and a plasma generating unit having a common axis with the nozzle. The method includes a step of injecting, with a plasma generating gas, feedstock powder having a particle diameter of 15 ?m or less from a tip of the nozzle to the plasma generating unit, a step of generating a plasma from the plasma generating gas in the plasma generating unit, by using electric power not more than 50 kW, and a step of thermal spraying the feedstock powder liquefied by the plasma at the component through a mask, such that a surface of a resin layer of the component is covered with the feedstock powder.
    Type: Grant
    Filed: July 6, 2018
    Date of Patent: May 10, 2022
    Assignee: Tokyo Electron Limited
    Inventor: Yoshiyuki Kobayashi
  • Patent number: 11328831
    Abstract: Treating a reflective optical element (104) for the EUV wavelength range that has a reflective coating on a substrate. The reflective optical element in a holder (106) is irradiated with at least one radiation pulse of a radiation source (102) having a duration of between 1 ?s and 1 s. At least one radiation source (102) and the reflective optical element move relative to one another. Preferably, this is carried out directly after applying the reflective coating in a coating chamber (100). Reflective optical elements of this type are suitable in particular for use in EUV lithography or in EUV inspection of masks or wafers, for example.
    Type: Grant
    Filed: July 31, 2018
    Date of Patent: May 10, 2022
    Assignee: CARL ZEISS SMT GMBH
    Inventors: Christian Grasse, Martin Hermann, Stephan Six, Joern Weber, Ralf Winter, Oliver Dier, Vitaliy Shklover, Kerstin Hild, Sebastian Strobel
  • Patent number: 11310918
    Abstract: A method for producing a plated part, includes: forming, on a surface of a base member, a catalyst activity inhibiting layer containing a polymer which has at least one of an amide group and an amino group; irradiating with light or heating a part of the surface of the base member on which the catalyst activity inhibiting layer is formed; applying an electroless plating catalyst to the surface of the base member heated or irradiated with the light; and bringing an electroless plating solution into contact with the surface of the base member to which the electroless plating catalyst is applied, to form an electroless plating film at a light-irradiated portion or a heated portion of the surface.
    Type: Grant
    Filed: April 13, 2021
    Date of Patent: April 19, 2022
    Assignee: MAXELL, LTD.
    Inventors: Naoki Usuki, Akiko Kito, Atsushi Yusa
  • Patent number: 11302521
    Abstract: A plasma processing system includes processing modules, a transfer device connected to the processing modules, and a control unit for controlling an oxygen partial pressure and a water vapor partial pressure in the transfer device. The control unit controls the oxygen partial pressure and the water vapor partial pressure in the transfer device to 127 Pa or less and 24.1 Pa or less, respectively. The processing modules include a first processing module for performing etching on the target object, a second processing module for performing surface treatment on the target object, and a third processing module for performing a deposition process on the target object. The second processing module performs the surface treatment using hydrogen radicals generated by a high frequency antenna. The high frequency antenna resonates at one half of a wavelength of a signal supplied from a high frequency power supply used in the processing system.
    Type: Grant
    Filed: April 18, 2019
    Date of Patent: April 12, 2022
    Assignee: TOKYO ELECTRON LIMITED
    Inventor: Kenji Matsumoto
  • Patent number: 11268183
    Abstract: A novel method of depositing grit particles onto a fan blade tip coating is provided. The method enhances grit capture by presenting a softened coating surface for the impinging particles. The softened surface is achieved without high substrate temperatures that could degrade the base metal properties in the fan blade. An auxiliary heat source is used to establish a locally heated and softened surface where the grit deposition takes place. The softened surface greatly increases the probability of grit capture.
    Type: Grant
    Filed: May 6, 2015
    Date of Patent: March 8, 2022
    Assignee: RAYTHEON TECHNOLOGIES CORPORATION
    Inventors: Christopher W. Strock, Paul M. Lutjen
  • Patent number: 11261335
    Abstract: A method of making a thermal control coating is provided. A primer layer can be applied to a substrate to form an exposed surface. The primer layer can include an epoxy binder and a silica filler. The exposed surface can be treated with an oxygen plasma to form a treated surface. A silicate-based thermal control coating can be applied to the treated surface, for example, by spraying, to form a thermal control coating on the substrate. Spacecraft and spacecraft hardware components coated with the thermal control coating, are also provided.
    Type: Grant
    Filed: September 25, 2018
    Date of Patent: March 1, 2022
    Assignee: United States of America as represented by the Administrator of NASA
    Inventors: Mark M. Hasegawa, Kenneth O'Connor, Grace M. Miller, Alfred Wong, George M. Harris
  • Patent number: 11242610
    Abstract: A method that can plate a predetermined position on various plating targets without implementing a pretreatment thereon is provided. A plating method is performed on a plating target using a plating solution, and the plating method includes at least a bubble ejection step of ejecting a bubble generated by a bubble ejection member to a plating solution. The bubble ejection member includes an electrode formed of a conductive material and an insulating material covering at least a part of the electrode, at least a part of the insulating material forms a bubble ejection port, and an air gap surrounded by the insulating material is formed between at least a part of the electrode and the bubble ejection port.
    Type: Grant
    Filed: October 17, 2018
    Date of Patent: February 8, 2022
    Assignee: KYUSHU UNIVERSITY, NATIONAL UNIVERSITY CORPORATION
    Inventors: Yoko Yamanishi, Yudai Fukuyama, Keita Ichikawa
  • Patent number: 11230767
    Abstract: A substrate W having a non-plateable material portion 31 and a plateable material portion 32 formed on a surface thereof is prepared, and then, a catalyst is selectively imparted to the plateable material portion 32 by performing a catalyst imparting processing on the substrate W. Thereafter, a plating layer 35 is selectively formed on the plateable material portion 32 by supplying a plating liquid M1 onto the substrate W. The plating liquid M1 contains an inhibitor which suppresses the plating layer 35 from being precipitated on the non-plateable material portion 31.
    Type: Grant
    Filed: August 29, 2017
    Date of Patent: January 25, 2022
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Yuichiro Inatomi, Takashi Tanaka, Kazutoshi Iwai
  • Patent number: 11220455
    Abstract: Methods of processing coated articles, such as transparencies, are provided comprising flash annealing one or more layers of the coated article. The one or more layers may be reflective metallic layers, such as silver layers, or comprise a transparent conductive oxide, such as indium tin oxide, or a semiconductor.
    Type: Grant
    Filed: August 4, 2017
    Date of Patent: January 11, 2022
    Assignee: Vitro Flat Glass LLC
    Inventors: Patrick Fisher, James W. McCamy, Paul A. Medwick, Adam D. Polcyn, James P. Thiel, Andrew V. Wagner
  • Patent number: 11180411
    Abstract: Methods of processing coated articles, such as transparencies, are provided comprising flash annealing one or more layers of the coated article. The one or more layers may be reflective metallic layers, such as silver layers, or comprise a transparent conductive oxide, such as indium tin oxide, or a semiconductor.
    Type: Grant
    Filed: August 4, 2017
    Date of Patent: November 23, 2021
    Assignee: Vitro Flat Glass LLC
    Inventors: Patrick Fisher, James W. McCamy, Paul A. Medwick, Adam D. Polcyn, James P. Thiel, Andrew V. Wagner
  • Patent number: 11152573
    Abstract: A shadow mask that includes compensation layer operative for at least partially correcting gravity-induced sag of a shadow-mask membrane is disclosed. The compensation layer is formed on a surface of the shadow-mask membrane such that the compensation layer is characterized by a residual stress that gives rise to a first bending moment in the membrane, where the first bending moment is directed in the opposite direction to a second bending moment in the membrane that is induced by the effect of gravity.
    Type: Grant
    Filed: May 1, 2018
    Date of Patent: October 19, 2021
    Assignee: eMagin Corporation
    Inventors: Fridrich Vazan, Evan P. Donoghue, Ilyas I. Khayrullin, Tariq Ali, Kerry Tice, Amalkumar P. Ghosh
  • Patent number: 11148169
    Abstract: A method of forming a sprayed coating includes preparing a spray target member having a surface on which openings of first ends of holes are formed, preparing a plurality of masking pins each of which comprises metal, and inserting each of the masking pins into a corresponding one of the holes so that each of the masking pins partially protrudes from the surface. The method also includes applying an adhesive agent for fixing the masking pins to the respective holes, to at least one of the holes or the masking pins, forming a ceramic layer by spraying on the surface of the spraying target member, the ceramic layer comprising a ceramic material, while the masking pins are fixed to the respective holes via the adhesive agent, and removing the masking pins from the holes after the spraying step.
    Type: Grant
    Filed: December 3, 2015
    Date of Patent: October 19, 2021
    Assignee: MITSUBISHI POWER, LTD.
    Inventors: Taiji Torigoe, Masahiko Mega, Yoshifumi Okajima, Shuji Tanigawa, Masamitsu Kuwabara, Naotoshi Okaya
  • Patent number: 11145522
    Abstract: A method of forming a boron-based film includes forming the boron-based film mainly containing boron on a substrate by plasma CVD using plasma of a processing gas including a boron-containing gas; and controlling film stress of the formed boron-based film by adjusting a process parameter.
    Type: Grant
    Filed: January 31, 2019
    Date of Patent: October 12, 2021
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Yoshimasa Watanabe, Masahiro Oka, Hirokazu Ueda, Yuuki Yamamoto
  • Patent number: 11143030
    Abstract: A method of coating a component having a multiple of cooling holes includes removing at least a portion of a prior coating; directing a gas through at least one of the multiple of cooling holes; and applying a coat layer while directing the gas through at least one of the
    Type: Grant
    Filed: December 21, 2012
    Date of Patent: October 12, 2021
    Assignee: Raytheon Technologies Corporation
    Inventors: Steven W. Burd, Alan C. Barron
  • Patent number: 11118264
    Abstract: A plasma processing method is provided. In the plasma processing method, a plurality of types of mixed gases is supplied to a plurality of areas on a film deposited on a surface of a substrate. The plurality of types of mixed gases contains a plurality types of noble gases. The plurality of types of mixed gases has different mix proportions of the plurality types of noble gases from each other. The plurality of types of mixed gases is converted to plasma. A plasma process is performed by using the mixed gases converted to the plasma on the film.
    Type: Grant
    Filed: November 7, 2016
    Date of Patent: September 14, 2021
    Assignee: Tokyo Electron Limited
    Inventor: Shigehiro Miura
  • Patent number: 11117161
    Abstract: Embodiments relate to forming a thin film of nanoscale thickness by depositing a mixture of a precursor and a supercritical fluid onto a surface of a substrate and removing the supercritical fluid from the surface of the substrate. The mixture is sprayed onto the surface by a spraying module. A layer of the precursor is formed on at least a portion of the surface. Molecules of the supercritical fluid is removed from the surface. The surface is exposed to plasma radical to transform the layer of the precursor into a solid thin film. In some embodiments, molecules of the precursor chemically bond with molecules of the supercritical fluid in the mixture. The molecules of the supercritical fluid can be decoupled from the molecules of the precursor before the layer of the precursor is formed.
    Type: Grant
    Filed: October 2, 2019
    Date of Patent: September 14, 2021
    Assignee: NOVA ENGINEERING FILMS, INC.
    Inventor: Sang In Lee
  • Patent number: 11114326
    Abstract: Methods for chucking and de-chucking a substrate from an electrostatic chucking (ESC) substrate support to reduce scratches of the non-active surface of a substrate include simultaneously increasing a voltage applied to a chucking electrode embedded in the ESC substrate support and a backside gas pressure in a backside volume disposed between the substrate and the substrate support to chuck the substrate and reversing the process to de-chuck the substrate.
    Type: Grant
    Filed: March 5, 2019
    Date of Patent: September 7, 2021
    Assignee: Applied Materials, Inc.
    Inventors: Wendell Glenn Boyd, Jr., Jim Zhongyi He, Ramesh Gopalan, Robert T. Hirahara, Govinda Raj
  • Patent number: 11109493
    Abstract: A method of initiating and controlling electroless nickel plating on copper substrates carried into a plating bath on a continuous stainless steel web where the copper is electrically bussed or in physical contact with the steel is described. A bias current is applied to the plating bath and a feedback loop is established to determine initiation of plating as well as to ramp down the biasing current to prevent electro- or electroless plating of the web.
    Type: Grant
    Filed: February 26, 2019
    Date of Patent: August 31, 2021
    Assignee: Hutchinson Technology Incorporated
    Inventors: Douglas P. Riemer, Kurt F. Fischer
  • Patent number: 11098400
    Abstract: A machine for coating an optical article with an anti-soiling coating composition, includes a vacuum chamber (8) configured to receive the optical article, a vacuum pump (20) connected to the vacuum chamber (8), a plasma generator (11) configured to carry out a vacuum plasma treatment of the optical article, an evaporation device (10) configured to carry out a vacuum evaporation treatment of the composition for depositing it on the optical article, a control unit (2) controlling the plasma generator for removing an initial outermost anti-soiling coating of the article, controlling the evaporation device for recoating the article with the anti-soiling coating composition, being configured to causes the vacuum pump (20) to suck gases from the chamber (8) during vacuum plasma treatment and being further configured to causes the vacuum pump (20) not to suck gases from the chamber (8) during vacuum evaporation treatment.
    Type: Grant
    Filed: October 6, 2016
    Date of Patent: August 24, 2021
    Assignees: Essilor International, Satisloh AG
    Inventors: Reto Strobel, Stephan Scholze, GĂ©rald Fournand, Narendra Borgharkar