Abstract: A shadow mask that includes compensation layer operative for at least partially correcting gravity-induced sag of a shadow-mask membrane is disclosed. The compensation layer is formed on a surface of the shadow-mask membrane such that the compensation layer is characterized by a residual stress that gives rise to a first bending moment in the membrane, where the first bending moment is directed in the opposite direction to a second bending moment in the membrane that is induced by the effect of gravity.
Type:
Grant
Filed:
May 1, 2018
Date of Patent:
October 19, 2021
Assignee:
eMagin Corporation
Inventors:
Fridrich Vazan, Evan P. Donoghue, Ilyas I. Khayrullin, Tariq Ali, Kerry Tice, Amalkumar P. Ghosh
Abstract: A method of coating a component having a multiple of cooling holes includes removing at least a portion of a prior coating; directing a gas through at least one of the multiple of cooling holes; and applying a coat layer while directing the gas through at least one of the
Abstract: A method of forming a boron-based film includes forming the boron-based film mainly containing boron on a substrate by plasma CVD using plasma of a processing gas including a boron-containing gas; and controlling film stress of the formed boron-based film by adjusting a process parameter.
Abstract: Embodiments relate to forming a thin film of nanoscale thickness by depositing a mixture of a precursor and a supercritical fluid onto a surface of a substrate and removing the supercritical fluid from the surface of the substrate. The mixture is sprayed onto the surface by a spraying module. A layer of the precursor is formed on at least a portion of the surface. Molecules of the supercritical fluid is removed from the surface. The surface is exposed to plasma radical to transform the layer of the precursor into a solid thin film. In some embodiments, molecules of the precursor chemically bond with molecules of the supercritical fluid in the mixture. The molecules of the supercritical fluid can be decoupled from the molecules of the precursor before the layer of the precursor is formed.
Abstract: A plasma processing method is provided. In the plasma processing method, a plurality of types of mixed gases is supplied to a plurality of areas on a film deposited on a surface of a substrate. The plurality of types of mixed gases contains a plurality types of noble gases. The plurality of types of mixed gases has different mix proportions of the plurality types of noble gases from each other. The plurality of types of mixed gases is converted to plasma. A plasma process is performed by using the mixed gases converted to the plasma on the film.
Abstract: Methods for chucking and de-chucking a substrate from an electrostatic chucking (ESC) substrate support to reduce scratches of the non-active surface of a substrate include simultaneously increasing a voltage applied to a chucking electrode embedded in the ESC substrate support and a backside gas pressure in a backside volume disposed between the substrate and the substrate support to chuck the substrate and reversing the process to de-chuck the substrate.
Type:
Grant
Filed:
March 5, 2019
Date of Patent:
September 7, 2021
Assignee:
Applied Materials, Inc.
Inventors:
Wendell Glenn Boyd, Jr., Jim Zhongyi He, Ramesh Gopalan, Robert T. Hirahara, Govinda Raj
Abstract: A method of initiating and controlling electroless nickel plating on copper substrates carried into a plating bath on a continuous stainless steel web where the copper is electrically bussed or in physical contact with the steel is described. A bias current is applied to the plating bath and a feedback loop is established to determine initiation of plating as well as to ramp down the biasing current to prevent electro- or electroless plating of the web.
Abstract: Shadow masks comprising a multi-layer membrane having a mechanical pre-bias that compensates the effect of gravity on the membrane are disclosed. A shadow mask in accordance with the present disclosure includes a membrane that is patterned with a desired pattern of apertures. The layers of the membrane are selected such that their residual stresses collectively give rise to a stress gradient that is directed normal to the plane of the membrane such that the stress gradient mitigates gravity-induced sag. In some embodiments, the membrane includes a layer pair having internal stresses that are of opposite signs to effect a tendency to bulge outward from the plane of the membrane prior to its release from the substrate. An exemplary membrane includes a layer pair comprising a layer of stoichiometric silicon dioxide that is under residual compressive stress and a layer of stoichiometric silicon nitride that is under residual tensile stress.
Abstract: A machine for coating an optical article with an anti-soiling coating composition, includes a vacuum chamber (8) configured to receive the optical article, a vacuum pump (20) connected to the vacuum chamber (8), a plasma generator (11) configured to carry out a vacuum plasma treatment of the optical article, an evaporation device (10) configured to carry out a vacuum evaporation treatment of the composition for depositing it on the optical article, a control unit (2) controlling the plasma generator for removing an initial outermost anti-soiling coating of the article, controlling the evaporation device for recoating the article with the anti-soiling coating composition, being configured to causes the vacuum pump (20) to suck gases from the chamber (8) during vacuum plasma treatment and being further configured to causes the vacuum pump (20) not to suck gases from the chamber (8) during vacuum evaporation treatment.
Abstract: A graphene structure forming method for forming a graphene structure is provided. The method comprises preparing a target substrate, and forming the graphene structure on a surface of the target substrate by remote microwave plasma CVD using a carbon-containing gas as a film-forming raw material gas in a state in which the surface of the target substrate has no catalytic function.
Abstract: A method of applying a multi-color finish to a plumbing fixture includes depositing a first coating on the plumbing fixture; selectively applying a masking material in a graduated fashion over at least a portion of the first coating to define a gradient from a first portion of the plumbing fixture that is substantially completely covered by the masking material to a second portion of the plumbing fixture that has substantially no masking material; depositing a second coating over the masking material; and removing the masking material from the plumbing fixture such that the plumbing fixture has a surface finish including a transition region representing a gradual transition between the first coating and the second coating.
Abstract: A method of forming a transparent carbon layer on a substrate is provided. The method comprises generating an electron beam plasma above a surface of a substrate positioned over a first electrode and disposed in a processing chamber having a second electrode positioned above the first electrode. The method further comprises flowing a hydrocarbon-containing gas mixture into the processing chamber, wherein the second electrode has a surface containing a secondary electron emission material selected from a silicon-containing material and a carbon-containing material. The method further comprises applying a first RF power to at least one of the first electrode and the second electrode and forming a transparent carbon layer on the surface of the substrate.
Type:
Grant
Filed:
August 6, 2018
Date of Patent:
June 22, 2021
Assignee:
Applied Materials, Inc.
Inventors:
Yang Yang, Eswaranand Venkatasubramanian, Kartik Ramaswamy, Kenneth S. Collins, Steven Lane, Gonzalo Monroy, Lucy Zhiping Chen, Yue Guo
Abstract: A method of manufacturing a porous composite electrode including: preparing an ink including a carbon material and a binder; coating a substrate with the ink to manufacture a composite electrode; and irradiating the composite electrode with microwave to remove the binder and an organic material, and a method of removing an organic material of a porous composite electrode.
Type:
Grant
Filed:
November 9, 2018
Date of Patent:
June 22, 2021
Assignee:
KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY
Inventors:
Sun Sook Lee, Ki-Seok An, Jongsun Lim, Sung Myung, Wooseok Song, Jin Kyu Han, Ha Kyun Jung
Abstract: The present inventing relates to a method for marking at least one inner face of a container with at least one given pattern, in which method the inside of said inner face is at least partially coated with a pigmented sol-gel layer that reacts to laser radiation, by spraying or by means of a stamp applied to a precise zone of the layer provided for containing the pattern, and the pattern is developed by interaction between the sol-gel and UV laser radiation specifically programmed according to the pattern to be revealed, the UV laser radiation being emitted by a device comprising an optical system having a long optical length that allows a field depth of more than 1 mm to be obtained. The present invention also relates to a device suitable for implementing this method and to a container obtained by this method.
Abstract: A substrate W having a non-plateable material portion 31 and a plateable material portion 32 formed on a surface thereof is prepared, and then, a catalyst is selectively imparted to the plateable material portion 32 by performing a catalyst imparting processing on the substrate W. Thereafter, a plating layer 35 is selectively formed on the plateable material portion 32 by performing a plating processing on the substrate W. Before the imparting of the catalyst, an organic film 36 is formed on the substrate W by supplying an organic liquid L1 onto the substrate W.
Abstract: This disclosure relates to a composition for catalyst-free electroless plating and a method for catalyst-free electroless plating using the same. More particularly, this disclosure relates to a composition for catalyst-free electroless plating and a method for catalyst-free electroless plating using the same that does not require a catalyst such as an expensive noble metal catalyst and may simplify the process.
Type:
Grant
Filed:
December 27, 2018
Date of Patent:
May 18, 2021
Assignee:
Korea Institute of Materials Science
Inventors:
Taehoon Kim, Sang Bok Lee, Byung Mun Jung, Kyunbae Lee
Abstract: A method for producing a plated part, includes: forming, on a surface of a base member, a catalyst activity inhibiting layer containing a polymer which has at least one of an amide group and an amino group; irradiating with light or heating a part of the surface of the base member on which the catalyst activity inhibiting layer is formed; applying an electroless plating catalyst to the surface of the base member heated or irradiated with the light; and bringing an electroless plating solution into contact with the surface of the base member to which the electroless plating catalyst is applied, to form an electroless plating film at a light-irradiated portion or a heated portion of the surface.
Abstract: A method of electroless nickel plating on surface of silicon carbide powder with a uniform and stable coating. In this method, ultrasonic assist is introduced in the pre-treatment and during plating process, and the powder particles in the liquid are dispersed and deagglomerated by the mechanical action and cavitation of the ultrasonic waves, thereby achieving a uniform dispersion of the powder in the dispersant. Furthermore, a reducing agent is slowly added during plating so as to give a more uniform and stable deposition of the coating onto the surface of the powder particles, and thus a silicon carbide core-nickel shell structure with an excellent powder dispersibility and a uniform and stable coating is produced.
Abstract: A method of forming a self-cleaning film system includes ink jet printing a composition onto a substrate. The composition includes an oleophobic material and a photocatalytic material. The method further includes curing the composition to form a self-cleaning film disposed on the substrate and thereby form the self-cleaning film system. The self-cleaning film includes a first plurality of regions including the photocatalytic material and disposed within the oleophobic material such that each of the first plurality of regions abuts and is surrounded by the oleophobic material.
Type:
Grant
Filed:
May 7, 2018
Date of Patent:
April 20, 2021
Assignee:
GM GLOBAL TECHNOLOGY OPERATIONS LLC
Inventors:
Gayatri V. Dadheech, Thomas A. Seder, James A. Carpenter
Abstract: An on-chip magnetic structure includes a magnetic material comprising cobalt in a range from about 80 to about 90 atomic % (at. %) based on the total number of atoms of the magnetic material, tungsten in a range from about 4 to about 9 at. % based on the total number of atoms of the magnetic material, phosphorous in a range from about 7 to about 15 at. % based on the total number of atoms of the magnetic material, and palladium substantially dispersed throughout the magnetic material.
Type:
Grant
Filed:
November 20, 2017
Date of Patent:
April 6, 2021
Assignee:
INTERNATIONAL BUSINESS MACHINES CORPORATION
Inventors:
Hariklia Deligianni, William J. Gallagher, Andrew J. Kellock, Eugene J. O'Sullivan, Lubomyr T. Romankiw, Naigang Wang