Patents Examined by Parviz Hassanzadeh
  • Patent number: 11955342
    Abstract: A method of an etching includes preparing a substrate having a first region formed of silicon oxide and a second region formed of silicon nitride; etching the first region by exposing the substrate to plasma of a first processing gas including a fluorocarbon gas, and forming a deposit including fluorocarbon on the first region and the second region; etching the first region and the second region by radicals of the fluorocarbon included in the deposit; and removing the deposit by plasma of a second processing gas which does not include oxygen.
    Type: Grant
    Filed: March 12, 2021
    Date of Patent: April 9, 2024
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Masanori Hosoya, Tangkuei Wang
  • Patent number: 11942341
    Abstract: A system and method for plating a workpiece are described. In one aspect, an apparatus includes a deposition chamber, a workpiece holder adapted for insertion into and removal from the deposition chamber, a shield with patterns of apertures corresponding to features on the workpiece, a shield holder also adapted for insertion into and removal from the deposition chamber and a positioning mechanism to position the workpiece in the workpiece holder such that the pattern of apertures on the shield will align with the corresponding features on the workpiece when the workpiece holder and shield holder are inserted into the deposition chamber.
    Type: Grant
    Filed: January 26, 2022
    Date of Patent: March 26, 2024
    Assignee: ASMPT NEXX, INC.
    Inventors: Arthur Keigler, David G. Guarnaccia, Freeman Fisher, Demetrius Papapanayiotou, Jonathan Haynes, Daniel L. Goodman
  • Patent number: 11891692
    Abstract: A film-forming device which includes a chamber having a horizontal central axis, capable of maintaining a vacuum, and movable along the horizontal central axis, the chamber including an inner chamber and an outer chamber that houses the inner chamber; a workpiece holder that aligns and holds workpieces to be processed in multiple stages in the inner chamber; and a heater that heats an inside of the chamber.
    Type: Grant
    Filed: June 15, 2020
    Date of Patent: February 6, 2024
    Assignee: MURATA MANUFACTURING CO., LTD.
    Inventors: Yasuhiro Chikaishi, Shigeki Yamane
  • Patent number: 11887874
    Abstract: A system and method for plating a workpiece are described. In one aspect, an apparatus includes a deposition chamber, a workpiece holder adapted for insertion into and removal from the deposition chamber, a shield with patterns of apertures corresponding to features on the workpiece, a shield holder also adapted for insertion into and removal from the deposition chamber and a positioning mechanism to position the workpiece in the workpiece holder such that the pattern of apertures on the shield will align with the corresponding features on the workpiece when the workpiece holder and shield holder are inserted into the deposition chamber.
    Type: Grant
    Filed: January 11, 2023
    Date of Patent: January 30, 2024
    Assignee: ASMPT NEXX, INC.
    Inventors: Arthur Keigler, David G. Guarnaccia, Freeman Fisher, Demetrius Papapanayiotou, Jonathan Haynes, Daniel L. Goodman
  • Patent number: 11862442
    Abstract: A plasma process monitoring device capable of monitoring plasma light distributed in a certain area in a chamber includes a selection area light transmitter and a monitor. The selection area light transmitter is disposed to face a viewport formed in a chamber and includes a plurality of selective light blockers for selectively blocking plasma light emitted through the viewport. The monitor receives plasma light transmitted through at least one of a plurality of selective light blockers to acquire information on the plasma light, and monitors the uniformity of plasma generated in the chamber based on the information on the plasma light.
    Type: Grant
    Filed: May 15, 2019
    Date of Patent: January 2, 2024
    Assignee: INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY
    Inventor: Il Gu Yun
  • Patent number: 11848202
    Abstract: The present disclosure generally relates to process chambers for semiconductor processing. In one embodiment, a growth monitor for substrate processing is provided. The growth monitor includes a sensor holder and a crystal disposed in the sensor holder having a front side and a back side. An opening is formed in the sensor holder exposing a front side of the crystal. A gas inlet is disposed through the sensor holder to a plenum formed by the back side of the crystal and the sensor holder. A gas outlet is fluidly coupled to the plenum.
    Type: Grant
    Filed: November 30, 2021
    Date of Patent: December 19, 2023
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Zhepeng Cong, Mostafa Baghbanzadeh, Tao Sheng, Enle Choo
  • Patent number: 11810766
    Abstract: Embodiments of the present disclosure are directed towards a protective multilayer coating for process chamber components exposed to temperatures from about 20° C. to about 300° C. during use of the process chamber. The protective multilayer coating comprises a bond layer and a top layer, the bond layer is formed on a chamber component to reduce the stress between the top layer and the chamber component. The reduced stress decreases or prevents particle shedding from the top layer of the multilayer coating during and after use of the process chamber. The bond layer comprises titanium, titanium nitride, aluminum, or combinations thereof, and the top layer comprises tungsten nitride.
    Type: Grant
    Filed: May 2, 2019
    Date of Patent: November 7, 2023
    Assignee: Applied Materials, Inc.
    Inventors: Karthikeyan Balaraman, Sathyanarayana Bindiganavale, Rajasekhar Patibandla, Balamurugan Ramasamy, Kartik Shah, Umesh M. Kelkar, Mats Larsson, Kevin A. Papke, William M. Lu
  • Patent number: 11810797
    Abstract: A wet processing apparatus and an operation method thereof are provided. The wet processing apparatus includes: a tank body including at least one side wall, the at least one side wall being provided with an opening extending from the inside to the outside of the tank body, and the tank body being configured to accommodate a wet processing solution; and a fixing device configured to fix the substrate at the opening of the side wall. The operation method of the wet processing apparatus includes: placing the substrate on an outer side of the side wall and at the position of the opening, and operating the fixing device to fix the substrate; and performing wet processing treatment on the substrate.
    Type: Grant
    Filed: December 20, 2019
    Date of Patent: November 7, 2023
    Assignee: PYXIS CF PTE. LTD.
    Inventors: Amlan Sen, Navaneetha Kumaran Baheerathan
  • Patent number: 11798784
    Abstract: Methods and apparatus for processing a substrate in a multi-frequency plasma processing chamber are disclosed. The base RF signal pulses between a high power level and a low power level. Each of the non-base RF generators, responsive to a control signal, proactively switches between a first predefined power level and a second predefined power level as the base RF signal pulses. Alternatively or additionally, each of the non-base RF generators, responsive to a control signal, proactively switches between a first predefined RF frequency and a second predefined RF frequency as the base RF signal pulses. Techniques are disclosed for ascertaining in advance of production time the first and second predefined power levels and/or the first and second predefined RF frequencies for the non-base RF signals.
    Type: Grant
    Filed: June 29, 2018
    Date of Patent: October 24, 2023
    Assignee: Lam Research Corporation
    Inventors: John C. Valcore, Jr., Bradford J. Lyndaker
  • Patent number: 11798825
    Abstract: Apparatus and methods of processing a substrate in a carousel processing chamber are described. A wafer pedestal has a support surface with a support shaft extending below the wafer pedestal. A roller pinion wheel is below the wafer support around the support shaft. The roller pinion wheel has a plurality of spokes in contact with the support shaft and a wheel with a plurality of roller pinions spaced around the outer periphery of the wheel. Processing chambers incorporating the wafer pedestal and processing methods using the wafer pedestal for in-situ rotation are also described.
    Type: Grant
    Filed: April 27, 2019
    Date of Patent: October 24, 2023
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Joseph Yudovsky, Alexander S. Polyak
  • Patent number: 11776828
    Abstract: In a vacuum processing device, a loading/unloading port, a normal pressure transfer chamber and a vacuum transfer chamber are arranged in that order from a front side toward a rear side, and load-lock chambers are connected to the normal pressure transfer chamber. The position in the front-rear direction in a movement range of a wafer W in the normal pressure transfer chamber overlaps with the positions in the front-rear direction of the load-lock chambers. Three vacuum processing modules are connected to each of the left and right sides of the vacuum transfer chamber. Vacuum processing units are arranged in each of the vacuum processing modules in a front-rear direction when viewed from the vacuum transfer chamber side. Wafer mounting shelves for holding wafers W in the load-lock chambers are arranged in the front-rear direction when viewed from the vacuum transfer chamber side.
    Type: Grant
    Filed: April 24, 2018
    Date of Patent: October 3, 2023
    Assignee: Tokyo Electron Limited
    Inventor: Hiromitsu Sakaue
  • Patent number: 11776826
    Abstract: An apparatus for treating a substrate includes a process chamber having a process space therein, a support unit that supports the substrate in the process space, a heating member that heats the substrate supported on the support unit, and an exhaust unit that evacuates the process space. The exhaust unit includes an exhaust duct and a heat retention unit having a retention space that retains heat released from the process space. The retention space surrounds an adjacent area located adjacent to the process chamber in the exhaust duct.
    Type: Grant
    Filed: August 21, 2020
    Date of Patent: October 3, 2023
    Assignee: SEMES CO., LTD.
    Inventors: Junho Kim, Kyungsik Shin, Youngseo An, Jinki Shin, Man Kyu Kang, Yoonki Sa
  • Patent number: 11764082
    Abstract: A control method of a plasma processing apparatus including a first electrode and a second electrode includes supplying a bias power to the first electrode, and supplying a negative DC voltage to the second electrode. The negative DC voltage periodically repeats a first state that takes a first voltage value and a second state that takes a second voltage value having an absolute value smaller than the first voltage value. The control method further includes a first control process of applying the first state of the negative DC voltage in a partial time period within each cycle of a signal synchronized with a cycle of a radio frequency of the bias power, or in a partial time period within each cycle of a periodically varying parameter measured in a transmission path of the bias power, and applying the second state continuously with the first state.
    Type: Grant
    Filed: July 17, 2019
    Date of Patent: September 19, 2023
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Chishio Koshimizu, Shinji Kubota, Koji Maruyama, Takashi Dokan, Koichi Nagami
  • Patent number: 11761084
    Abstract: A substrate processing apparatus includes a stage provided in a chamber, a shower head in which a plurality of slits are formed and which is opposed to the stage, a first gas supply part which supplies a first gas to a space between the stage and the shower head via the plurality of slits, and a second gas supply part which supplies a second gas which is not a noble gas to a region below the stage, wherein the second gas is the same gas as one of a plurality of kinds of gases constituting the first gas in a case where the first gas is a mixture gas constituted of the plurality of kinds of gases, and the second gas is the same gas as the first gas in a case where the first gas is a single kind of gas.
    Type: Grant
    Filed: December 2, 2016
    Date of Patent: September 19, 2023
    Assignee: ASM IP Holding B.V.
    Inventors: Hiroki Arai, Yukihiro Mori, Yuya Nonaka
  • Patent number: 11742189
    Abstract: Multi-zone reactors, systems including a multi-zone reactor, and methods of using the systems and reactors are disclosed. Exemplary multi-zone reactors include a movable susceptor assembly and a moveable plate. The movable susceptor assembly and movable plate can move vertically between reaction zones of a reactor to expose a substrate to multiple processes or reactants.
    Type: Grant
    Filed: January 18, 2019
    Date of Patent: August 29, 2023
    Assignee: ASM IP Holding B.V.
    Inventors: Carl Louis White, Mohith Verghese, Eric James Shero, Todd Robert Dunn
  • Patent number: 11728477
    Abstract: Manufacturing apparatus, systems and method of making silicon (Si) nanowires on carbon based powders, such as graphite, that may be used as anodes in lithium ion batteries are provided. In some embodiments, an inventive tumbler reactor and chemical vapor deposition (CVD) system and method for growing silicon nanowires on carbon based powders in scaled up quantities to provide production scale anodes for the battery industry are described.
    Type: Grant
    Filed: July 14, 2017
    Date of Patent: August 15, 2023
    Assignee: OneD Material, Inc.
    Inventors: Yimin Zhu, Vincent Pluvinage
  • Patent number: 11725279
    Abstract: A deposition or cleaning apparatus including an outer vacuum chamber and a reaction chamber inside the outer chamber forming a double chamber structure.
    Type: Grant
    Filed: February 8, 2017
    Date of Patent: August 15, 2023
    Assignee: Picosun Oy
    Inventor: Timo Malinen
  • Patent number: 11702740
    Abstract: A CVD reactor includes a gas-tight and evacuatable reactor housing and an inner housing arranged therein. The inner housing has means for the infeed of a process gas and means for holding a substrate for treatment in the inner housing by means of the process gases. The inner housing also has a loading opening which can be closed off by a sealing element of a closure element. In its closure position, the closure element bears with an encircling sealing zone against a counterpart sealing zone which encircles the loading opening on the outer side of the inner housing. The sealing element is fastened to a carrier as to be adjustable in terms of inclination and/or pivotally movable about at least one spatial axis (X, Y, Z) and/or so as to be elastically deflectable in the direction of one of the spatial axes (X, Y, Z).
    Type: Grant
    Filed: October 2, 2018
    Date of Patent: July 18, 2023
    Assignee: AIXTRON SE
    Inventors: Marcel Kollberg, Francisco Ruda Y Witt, Mike Pfisterer
  • Patent number: 11702746
    Abstract: There is provided a magnetic drive apparatus having a magnetic drive mechanism driven by a magnet. The magnetic drive apparatus includes a magnetizing yoke disposed in the magnetic drive apparatus at a standby position and configured to be moved to magnetize the magnet and a magnetizing yoke holder configured to hold the magnetizing yoke at a magnetizing position for magnetizing the magnet when the magnetic drive mechanism is stopped.
    Type: Grant
    Filed: May 15, 2020
    Date of Patent: July 18, 2023
    Assignee: TOKYO ELECTRON LIMITED
    Inventor: Takeshi Kobayashi
  • Patent number: 11527426
    Abstract: A substrate processing device includes a transfer chamber configured to transfer a substrate under an atmospheric atmosphere and a plurality of processing units each including at least one processing chamber for processing the substrate under a vacuum atmosphere and at least one load-lock chamber connected to the processing chamber to switch an inner atmosphere thereof between the atmospheric atmosphere and the vacuum atmosphere. The transfer chamber includes a connection unit configured to connect the transfer chamber and the load-lock chamber such that each of the processing units is detachably attached. The connection unit includes an opening that allows the transfer chamber to communicate with the load-lock chamber, and an opening/closing mechanism configured to open and close the opening portion.
    Type: Grant
    Filed: March 12, 2018
    Date of Patent: December 13, 2022
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Norihiko Tsuji, Atsushi Kawabe, Hiroki Oka