Abstract: The present disclosure relates to through-via structures with dielectric shielding of interconnections for advanced wafer level semiconductor packaging. The methods described herein enable the formation of high thickness dielectric shielding layers within low aspect ratio through-via structures, thus facilitating thin and small-form-factor package structures having high I/O density with improved bandwidth and power.

Abstract: A manufacturing method of an embodiment of a semiconductor device, the manufacturing method includes: heating a second layer of a first member including a first layer, the second layer, and a third layer, in which the first layer includes a support layer, the second layer includes a compound containing carbon and at least one element selected from the group consisting of silicon and metals, the third layer includes a semiconductor layer and/or a wiring layer, and the second layer is located between the first layer and the third layer, and obtaining a second member in which a carbonaceous material layer is formed on a surface of the second layer and/or a carbonaceous material region is formed inside the second layer; and cleaving the second member from the carbonaceous material layer or the carbonaceous material region, and obtaining a third member including the third layer.

Abstract: A semiconductor device includes a semiconductor substrate and an interconnect structure over the semiconductor substrate. The interconnect structure includes a magnetic core and a conductive coil winding around the magnetic core and electrically insulated from the magnetic core. The conductive coil includes horizontally-extending conductive lines and vertically-extending conductive vias electrically connecting the conductive lines.

Abstract: A laser annealing device includes a stage, a laser generator, and a reflective member. The stage supports a substrate with a thin film formed thereon to be processed, and may be moved in a first direction at a set or predetermined speed. The laser generator irradiates a first area of the thin film with a laser beam while the stage is moved. The reflective member reflects a part of the laser beam, which is reflected from the first area of the thin film, to a second area of the thin film. The first area and the second area are spaced apart from each other.

Abstract: A semiconductor package includes a first package substrate, a first semiconductor chip on the first package substrate, a molding layer covering side walls of the first semiconductor chip and including through holes, an interposer on the first semiconductor chip and the molding layer, conductive connectors in the through holes of the molding layer and connected to the first package substrate and the interposer, and an insulating filler including a first portion that fills the through holes of the molding layer so as to surround side walls of the conductive connectors.

Abstract: Provided is a pressurized semiconductor package including a lead frame including a pad board and a first terminal, a semiconductor chip, pressurizing members stacked to pressurize the semiconductor chip, and a package housing. The semiconductor chip is physically pressurized by the pressurizing members and is electrically connected to improve durability of the semiconductor package and to simplify a manufacturing process.

Abstract: A semiconductor package includes an IC having circuitry configured for at least one function with some nodes connected to bond pads, with first metal posts on the bond pads, and dome support metal posts configured in a ring having a top rim defining an inner cavity with solder on the top rim and extending over an area of the inner cavity for providing a solder dome that covers the inner cavity to provide a covered air cavity over a portion of the circuitry. A leadframe includes a plurality of leads or lead terminals. The IC is flipchip attached with a solder connection to the leadframe so that the first metal posts are attached to the leads or the lead terminals. A mold compound provides encapsulation for the semiconductor package except on at least a bottom side of the leads or lead terminals.

Abstract: A field-effect transistor (FET) includes a fin, an insulator region, and at least one gate. The fin has a doped first region, a doped second region, and an interior region between the first region and the second region. The interior region is undoped or more lightly doped than the first and second regions. The interior region of the fin is formed as a superlattice of layers of first and second materials alternating vertically. The insulator layer extends around the interior region. The gate is formed on at least a portion of the insulator region. The insulator layer and the gate are configured to generate an inhomogeneous electrostatic potential within the interior region, the inhomogeneous electrostatic potential cooperating with physical properties of the superlattice to cause scattering of charge carriers sufficient to change a quantum property of such charge carriers to change the ability of the charge carriers to move between the first and second materials.

Abstract: An optoelectronic device comprises a substrate; a first and a second optoelectronic units formed on the substrate; a plurality of third optoelectronic units formed on the substrate, electrically connected to the first optoelectronic unit and the second optoelectronic unit; a plurality of first electrodes respectively formed on the first optoelectronic unit, the second optoelectronic unit and the plurality of third optoelectronic units; a plurality of second electrodes respectively formed on the first optoelectronic unit, the second optoelectronic unit and the plurality of third optoelectronic units; an optical layer surrounding the first optoelectronic unit, the second optoelectronic unit and the plurality of third optoelectronic units in a top view of the optoelectronic device; a third electrode formed on the first optoelectronic unit and one of the plurality of third optoelectronic units; and a fourth electrode formed on the second optoelectronic unit and another one of the plurality of third optoelectronic

Abstract: A semiconductor package includes an interconnect structure including a redistribution structure, an insulating layer over the redistribution structure, and conductive pillars on the insulating layer, wherein the conductive pillars are connected to the redistribution structure, wherein the interconnect structure is free of active devices, a routing substrate including a routing layer over a core substrate, wherein the interconnect structure is bonded to the routing substrate by solder joints, wherein each of the solder joints bonds a conductive pillar of the conductive pillars to the routing layer, an underfill surrounding the conductive pillars and the solder joints, and a semiconductor device including a semiconductor die connected to a routing structure, wherein the routing structure is bonded to an opposite side of the interconnect structure as the routing substrate.

Abstract: A semiconductor device includes a non-volatile memory (NVM) cell. The NVM cell includes a semiconductor wire disposed over an insulating layer disposed on a substrate. The NVM cell includes a select transistor and a control transistor. The select transistor includes a gate dielectric layer disposed around the semiconductor wire and a select gate electrode disposed on the gate dielectric layer. The control transistor includes a stacked dielectric layer disposed around the semiconductor wire and a control gate electrode disposed on the stacked dielectric layer. The stacked dielectric layer includes a charge trapping layer. The select gate electrode is disposed adjacent to the control gate electrode with the stacked dielectric layer interposed therebetween.

Abstract: The disclosure provides a display device, including a substrate, a plurality of power lines and a pixel define layer. The plurality of power lines disposed on the substrate. The pixel define layer is disposed on the substrate, wherein the pixel define layer includes a first opening region and a second opening region. In a top view, the first opening region is adjacent to the second opening region, the first opening region overlaps a first power line of the plurality of power lines to define a first overlapping area, the second opening region overlaps a second power line of the plurality of power lines to define a second overlapping area, and the first overlapping area is different from the second overlapping area.

Abstract: The present application discloses an organic light emitting diode array substrate having a subpixel region and an inter-subpixel region. The organic light emitting diode array substrate in the inter-subpixel region includes a first base substrate; a pixel definition layer on the first base substrate for defining a plurality of subpixels; a spacer layer on a side of the pixel definition layer distal to the first base substrate; an auxiliary electrode layer on a side of the spacer layer distal to the pixel definition layer; and a second electrode layer on a side of the auxiliary electrode layer distal to the spacer layer and is electrically connected to the auxiliary electrode layer.

Abstract: A display device includes a substrate, a pixel circuit unit which is disposed on the substrate and having a first hole, a light blocking layer which is disposed on the pixel circuit unit and having a second hole corresponding to the first hole, a light emitting layer disposed on the pixel circuit unit, and a sealing unit on the light blocking layer. The substrate includes a first layer having a depression corresponding to the first hole, and a second layer which is disposed between the first layer and the pixel circuit unit and having a third hole between the depression and the second hole. The sealing unit includes a cover portion on the light blocking layer, and an extension portion extending from the cover portion. The depression has a width larger than a width of the third hole.

Abstract: An organic light emitting diode panel and a fabrication method thereof are provided. The organic light emitting diode panel includes a substrate; a pixel defining layer disposed over a portion of the substrate; an organic light emitting diode device and an auxiliary cathode contacting device disposed over the substrate, wherein the organic light emitting diode device includes an anode layer, a hole injecting layer, a hole transporting layer, a light emitting layer, and an electron transporting layer sequentially formed over a portion of the substrate, and the auxiliary cathode contacting device includes an auxiliary cathode and a conductive contact sequentially formed over another portion of the substrate; a conductive contact, including a conductive mixture consisting of the electron transporting layer and a solvent material used to dissolve the electron transporting layer; and a transparent electrode layer, covering the electron transporting layer, the pixel defining layer, and the conductive contact.

Abstract: Interconnected substrate arrays, microelectronic packages, and methods for fabricating microelectronic packages for fabricating microelectronic packages utilizing interconnected substrate arrays containing integrated electrostatic discharge (ESD) protection grids are provided. In an embodiment, the method includes obtaining an interconnected substrate array having an integrated ESD protection grid. The ESD protection grid includes, in turn, ESD grid lines at least partially formed in singulation streets of an interconnected substrate array and electrically coupling die attachment regions of the substrate array to one or more peripheral machine ground contacts. Array-level fabrication steps are performed to produce an interconnected package array utilizing the interconnected substrate array, while electrically coupling the die attachment regions to electrical ground through the ESD protection grid during at least one of the array-level fabrication steps.

Abstract: A semiconductor package is fabricated by attaching a first component to a second component. The first component is assembled by forming a first redistribution structure over a substrate. A through via is then formed over the first redistribution structure, and a die is attached to the first redistribution structure active-side down. The second component includes a second redistribution structure, which is then attached to the through via. A molding compound is deposited between the first redistribution structure and the second redistribution structure and further around the sides of the second component.

Abstract: A semiconductor storage device according to an embodiment includes: an array chip having a memory cell array; a circuit chip having a circuit electrically connected to a memory cell; and a metal pad bonding the array chip and the circuit chip together. The metal pad includes an impurity. A concentration of the impurity is lowered as separating in a depth direction apart from a surface in a thickness direction of the metal pad.

Abstract: A packaging structure, a display component and a display device are provided by the present disclosure. The packaging structure includes: a substrate; a light-emitting unit arranged on the substrate; a packaging layer, by which the light-emitting unit is packaged on the substrate; and a water-absorbing layer which is arranged in the packaging layer and completely wrapped by the packaging layer.

Abstract: A component carrier with a first stack and a second stack. The first stack includes at least one first electrically insulating layer structure and at least one first electrically conductive layer structure having a first connection body with a first exposed planar electrically conductive surface. The second stack includes at least one second electrically insulating layer structure and at least one second electrically conductive layer structure having a second connection body with a second exposed planar electrically conductive surface. The first stack and the second stack are connected with each other so that the first exposed planar electrically conductive surface and the second exposed planar electrically conductive surface are connected to establish a vertical two-dimensional electrically conductive connection.