Abstract: A projection exposing apparatus has a second photo-mask disposed on a blind for determining a region to be exposed to deformed light beams, the circuit pattern of the second photo-mask being the same as or arranged to correspond to the circuit pattern of a first photo-mask to be projected onto a substrate The deformed irradiation light beams are applied to the second photo-mask circuit pattern to image diffracted light beams on the substrate and project the circuit pattern.
Abstract: A screen is constituted by one sheet of Fresnel lens and two sheets of lenticular lenses, and the following relationships are fulfilled: 0.9 To<vy.multidot.dy/n and 0.9 To<vx.multidot.dy<3 To where vx and vy denote respectively angles, which are obtained when viewing a projection lens from the side of the lenticular lenses through the Fresnel sheet, dx and dy denote respectively distances between a surface of the Fresnel lens and focal planes of the lenticular lenses, n denotes a refractive index of a medium, and To denotes a pitch of the Fresnel lens, whereby radial two dimensional moire disturbance appearing in a rear projection display can be reduced to one-fifth the amplitude of the prior art one.
Abstract: A exposure frame assembly for use with a contact and off contact photo exposure machine which includes a removable upper tray frame coupled to a lower tray frame. In use, a pair of pneumatically operated rams capture hinge pivot rollers mounted on the upper tray frame and actuate a pair of tray lift rollers which are also attached to the upper tray frame. In operation, the motion of the pneumatic ram act on the tray lift rollers to open the exposure frame assembly for access to the work-piece.
Abstract: A paper mask unit for setting a paper mask in an exposure station of a photographic printer. A mask frame of the paper mask unit has a paper guide member which is movable in a direction transverse to a paper transporting direction between a paper guide position for guiding photographic paper thereon and a rest position wherein the paper guide member is retracted from the exposure station. After the photographic paper is set in the exposure station, the mask frame is displaced apart from the photographic paper. When the paper mask is inserted into the mask frame through the mask guide path, the paper guide member is pushed by the paper mask inwards from the paper guide position into the rest position. Simultaneously, a letter printing aperture of the paper mask is automatically positioned on a lamp housing which is mounted on the paper guide member. Thereafter, the mask frame is moved into a masking position so as to bring the paper mask into contact with the photographic paper.
Abstract: An image projection apparatus switchable between a reader mode in which an image is projected on a screen for observation and a printer mode in which an exposure position is scan exposed to the image for obtaining a copied image comprises a support member for supporting two scanning mirrors in a mutually perpendicular manner, and a transport member for supporting and transporting the support member for scanning exposure. An arc-shaped guide portion is provided on the support member or on the transport member, whereby the support member can effect a rotating motion on the transport member, about the crossing point of the two scanning mirrors, and the scanning mirrors effect a rotating motion combined with a linear motion at the scanning exposure.
Abstract: An illumination device and a projection exposure apparatus using the same are disclosed, wherein an incoherency imparting optical system serves to amplitude-divide a coherent beam from a radiation source into plural beams and to impart an optical path length difference, not less than a coherent length of the coherent beam, to the divided beams, an optical integrator receives the divided beams to define a secondary light source, a condensing optical system directs a secondary beam from the secondary light source to a surface to be illuminated, an afocal system disposed on a path between the radiation source and the optical integrator has a variable angular magnification, and changing the angular magnification of the afocal system is contributable to changing the section of each of the beams impinging on the optical integrator to thereby adjust the intensity distribution of the secondary light source.
Abstract: An apparatus and method is provided for measuring photoresist parameters in situ is disclosed. Transmission and reflectivity detectors are used in a lithographic exposure tool to obtain in situ absorption parameters and reflectivity data. The absorption parameters and reflectivity data are used in a feedback control system that controls the exposure dose used in the lithographic tool.
July 29, 1993
Date of Patent:
November 8, 1994
The United States of America as represented by The Director, National Security Agency
Abstract: A camera includes a camera mechanism including a charging member which makes a reciprocating motion between a charging position and a charging-cancelling position; a motor for moving the charging member from the charging-cancelling position to the charging position; a first driving mechanism for driving the charging member from the charging position to the charging-cancelling position; and a second driving mechanism for driving the charging member only in the initial stage of the process of moving the charging member from the charging position to the charging-cancelling position.
Abstract: A reflection type projection screen is constituted as follows. Provided in order on a light absorbing layer 5, which is a dark plastic sheet or a solid print of a dark ink, are a fibrous sheet 4 of glass fibers, a white, opaque base material sheet 3made with a plastic sheet, and a light diffusing layer 2 of a translucent plastic into which a lustrous pigment or calcite powder is incorporated. An emboss 9 is formed on the outer surface of the light diffusing layer 1. It is preferable that a reflection layer 2 printed with an ink containing a lustrous pigment or calcite powder is provided below the light diffusing layer 1. Light absorbing stripes 11 are provided each at a position corresponding to a concave portion 9a of the emboss 9 on the surface of the base material sheet 3 adjoining the light diffusing layer 1. A production process and a production apparatus of a reflection type screen, which can efficiently produce reflection type screens with the emboss are also disclosed.
Abstract: A high quality projection screen which also is a dry erasable markerboard is disclosed, together with a method for making such a combination projection screen and dry erasable markerboard. The light reflecting writing surface of the combination projection screen and dry erasable markerboard preferably is white, off-white or light in color, and has a bi-directional lenticular embossed surface for increased and more accurate reflection of projected light, and a wider angle effective viewing area. The light reflecting writing surface preferably is made of a thin film of fluoropolymer, such as a modified copolymer of ethylene and tetrafluoroethylene.
Abstract: A focusing method is disclosed wherein a substrate is moved substantially along a focal plane of a projection optical system up to a predetermined station adjacent to the focal plane of the projection optical system and then, at the predetermined station, the surface of the substrate is brought into substantial coincidence with the focal plane of the projection optical system. The method includes the steps of detecting a deviation of the surface of the substrate with respect to the focal plane of the projection optical system, before the substrate, being moved substantially along the focal plane of the projection optical system, is moved up to the predetermined station; and substantially correcting the deviation on the basis of the detection.
Abstract: Disclosed are an exposure apparatus and process, including a holding unit for holding first and second objects such as a mask and a substrate, a first illumination system for illuminating the first object with an exposure light, a projection optical system for forming an image of a portion such as a pattern portion of the first object illuminated with the exposure light onto the second object and a second illumination system for illuminating a portion such as peripheral portion of the second object held by the holding unit outside of a portion of the second object illuminated with the exposure light from the first illumination system.
Abstract: The proposed apparatus for transmissive exposure of copy pairs has a pressure device 15, which presses the copy pairs being transmitted against the glass plate 11 and which comprises a plurality of pressure shoes 25 which are disposed side by side in the transverse direction, with a flat base surface 27 pressing the copy pairs against the glass plate, each pressure shoe being resiliently acted upon centrally from below and being not only height-adjustable but also tiltable about a longitudinal axis and a transverse axis.
Abstract: According to the invention, elapsed time data indicative of a lapse of time are converted to greater values for permitting automatic performance according to the converted time data. Thus, it is made necessary, during fast forward of an automatic performance, only to convert the elapsed time data or time information of automatic performance information. In addition, the elapsed time data are converted into data, the value of which is reduced progressively with the lapse of time at a rate greater than the rate of change in the elapsed time data, for permitting automatic performance according to this data. Thus, it is made necessary, during rewind of an automatic performance, only to convert the elapsed time data or the time information of automatic performance information.
Abstract: The invention relates to an illuminating system in an exposure apparatus used for the fabrication of semiconductor devices to transfer a pattern on a reticle to a substrate having a photosensitive surface. As is usual, the illuminating system has reflecting and collimating elements to form light rays emitted from a light source into a light beam circular in cross-sectional shape, an optical integrater to uniformalize the light beam and an aperture diaphragm to desirably shape the uniformalized light beam. A reducing or magnifying lens, which is interchangeable with another reducing or magnifying lens different in reducing or magnifying power, is added in oreder to vary the diameter of the light beam nearly in conformance with the aperture diameter before the beam arrives at the aperture diaphragm to thereby reduce a loss of illuminating light by blockage by the aperture diaphragm.
Abstract: Improved screen for the reproduction of three-dimensional images, static or moving, and a method for manufacturing it. The screen is characterized in that the frames of cylindrical lenses are optically convergent and/or divergent; both frames of cylindrical lenses are formed by cylinders of semi-circular cross-section, juxtaposed in their axial direction, and are arranged on one or both faces of the screen, with the possibility of checking A) that the angle alpha between the two frames is equal to 90.degree., the frame of vertical cylindrical lenses then being covered by a transparent substance with a refractive index n'; or b) that this angle is less than 90.degree.; or c) that this angle alpha is less than 90.degree., and that the frames of cylindrical lenses are covered with a substance with a refractive index n". The method involves: a) preparing a first mould; b) producing a counter-mould; c) producing a final mould; and d) moulding the frames by pressing with the final mould.
Abstract: A projection type light exposure apparatus comprises, a mask having a fine pattern and at least one auxiliary pattern spaced from the fine pattern by a predetermined distance along an edge of the fine pattern, a projection optical system for projecting the fine pattern on the mask onto a photosensitive substrate, an illumination optical system for supplying an illumination light to the mask, and the illumination light being irradiated from at least one local area centered at a position eccentric from an optical axis of the illumination optical system in or a vicinity of a Fourier transform plane of the mask in the illumination optical system.
Abstract: A copying machine including a lower body, an upper body, a damper contractively arranged between the upper body and the lower body, and an adjusting member provided in the upper body is disclosed. The lower body end the upper body are rotatably connected with each other at ends thereof and can be opened at the other ends thereof. An original cover and an ADF are selectably mounted on the upper body so as to be replaced with each other. The adjusting member contracts the damper when the ADF is mounted on the upper body.
April 5, 1993
Date of Patent:
October 11, 1994
Mita Industrial Co., Ltd.
Mitsugu Miyamoto, Koji Ujino, Hiroyuki Sakamoto
Abstract: An image frame to be printed is divided into a plurality of portions, and the portions are photometrically measured. Photometric data necessary to determine an exposure condition is selected. Weighting factors, which are to be applied respectively to selected photometric data, to data obtained from first data obtained by photometric measuring of a plurality of films in accordance with film type identifying codes, and to data determined from second data obtained by photometric measuring of image frames to be printed which are recorded on a single film, are set based on the first data. The exposure condition is determined based on a value obtained by addition of respective weighted data. Hence, influence of color failure can be eliminated, and variations in film characteristics due to deterioration over time and the like can be eliminated. Accordingly, high-quality prints are thereby consistently obtained.
Abstract: A screen projection apparatus includes a housing within which a pair of projection screens are stored in a rolled position on motor driven rollers. A pair of access doors are mounted on the housing and support an idler roller over which a screen passes. The access doors open, one at a time, and the idler roller ensures that each of the screens when unrolled hangs in a common plane thereby eliminating the need to refocus the optical projection equipment which is used with the apparatus.