Patents Examined by Richard L. Schilling
  • Patent number: 7399507
    Abstract: A method of preparation of a Lithographic Printing Plate comprising the steps of, selecting a substrate for making of the printing plate from a natural or synthetic polymeric sheet element material having a tensile strength in the range of 400 to 3000 Kgm/cm2 and thickness ranging from 75 microns to 250 microns; shrinking the said substrate to have shrinkage in the range of 0.2 to 2.0% by exposing the substrate to heat of temperatures ranging from 140 to 180 degrees Celsius for 8 to 12 minutes; subbing the substrate to alter the surface energy of the substrate; forming a hydrophilic lithographic coating by reacting a hydrophilic binder with a cross linking agent, an accelerator, at least one pigment, at least one cationic surfactant and particulate silica having micron size ranging between 1 to 5 microns and a pore volume ranging between 0.2 ml/gm to 1.
    Type: Grant
    Filed: January 30, 2004
    Date of Patent: July 15, 2008
    Inventors: Jivan Gulabrai Bhatt, Thyagarajan Anantharaman Iyer
  • Patent number: 7396632
    Abstract: Substrate films, thermal mass transfer donor elements, and methods of making and using the same are provided. In some embodiments, such substrate films and donor elements include at least two dyads, wherein each dyad includes an absorbing first layer and an essentially non-absorbing second layer. Also provided are methods of making a donor element that includes an essentially non-absorbing substrate, an absorbing first layer, and a non-absorbing second layer, wherein the composition of the essentially non-absorbing substrate is essentially the same as the composition of the essentially non-absorbing second layer.
    Type: Grant
    Filed: April 19, 2007
    Date of Patent: July 8, 2008
    Assignee: 3M Innovative Properties Company
    Inventors: Martin B. Wolk, Thomas R. Hoffend, Jr., Stephen A. Johnson, John P. Baetzold, Richard J. Thompson, Terence D. Neavin, Michael A. Haase, Sergey A. Lamansky
  • Patent number: 7381685
    Abstract: An image-forming method, containing the steps of: superposing a heat-sensitive transfer sheet on a heat-sensitive transfer image-receiving sheet so that the following at least one receptor layer of the heat-sensitive transfer image-receiving sheet can be contacted with the following thermal transfer layer of the heat-sensitive transfer sheet; and providing thermal energy given by a thermal head in accordance with image signals, thereby to form an image; wherein the heat-sensitive transfer image-receiving sheet is transported at a speed of 125 mm/s or more during the image formation, and wherein the heat-sensitive transfer image-receiving sheet contains, on a support, at least one receptor layer containing a polymer latex, and at least one heat insulation layer containing hollow polymer particles but free of any resins having poor resistance to an organic solvent except for the hollow polymer particles, and the heat-sensitive transfer sheet contains, on a support, a thermal transfer layer.
    Type: Grant
    Filed: February 28, 2007
    Date of Patent: June 3, 2008
    Assignee: FUJIFILM Corporation
    Inventors: Kazuaki Oguma, Yoshio Ishii, Kazuma Takeno, Hisashi Mikoshiba, Yoshihisa Tsukada
  • Patent number: 7371510
    Abstract: Provided are a material for forming a resist protecting film which is for use in a liquid immersion lithography process and which is formed on a resist film, wherein the material has the following properties of: being transparent with respect to exposure light; having substantially no compatibility with a liquid for liquid immersion lithography; and causing no mixing with the resist film, a composite film comprising a protective film formed from the material and a resist film, and a method for forming a resist pattern using them. These can prevent both the resist film and the liquid used from changing in properties during the liquid immersion lithography, so that a resist pattern with high resolution can be formed using the liquid immersion lithography.
    Type: Grant
    Filed: February 6, 2007
    Date of Patent: May 13, 2008
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Taku Hirayama, Ryoichi Takasu, Mitsuru Sato, Kazumasa Wakiya, Masaaki Yoshida, Koki Tamura
  • Patent number: 7364833
    Abstract: The invention relates to a photoresist composition for an organic layer for a liquid crystal display, which may be used for a large-scale substrate, a spin-less coating method using the composition, a method for fabricating an organic layer pattern, and a liquid crystal display having the organic layer pattern. In particular, the liquid crystal display photoresist composition comprises an organic polymer resin having an average molecular weight in the range of about 2,000 to about 20,000, a mixed solvent of ethylene diglycol methylethyl ether (EDM) and a solvent having a vapor pressure lower than the EDM, and a photosensitizer.
    Type: Grant
    Filed: May 24, 2005
    Date of Patent: April 29, 2008
    Assignee: Samsung Electronics Co., Ltd
    Inventors: Yeong-beom Lee, Seon-su Sin
  • Patent number: 7361437
    Abstract: The invention provides a thermal transfer donor element comprising a support layer and a transfer layer supported by the support layer and comprising a binder containing carboxylic acid groups. The transfer layer includes an organic compound containing a plurality of hydroxyl groups with a hydroxyl group concentration of less than 18 mM/g and at least one connecting group, wherein the organic compound is free of any N,N-bis-(2-hydroxyethyl)amide and any rosin ester. In another embodiment, a method of using the donor element is provided, particularly in the manufacture of a color filter.
    Type: Grant
    Filed: September 1, 2006
    Date of Patent: April 22, 2008
    Assignee: E.I. du Pont de Nemours and Company
    Inventors: Gregory Charles Weed, Casey K. Chandrasekaran, Thomas Kevin Foreman
  • Patent number: 7358026
    Abstract: This invention relates to a method for thermally developing a photosensitive element to form a relief pattern. The method includes heating a composition layer of the element to cause a portion of the layer to liquefy and providing a development medium under tension to the element to absorb the liquefied composition. The development medium includes an absorbent material and a support, the combination of which minimizes stretch and distortion of the absorbent material and can impede the migration of the liquefied composition through the absorbent material.
    Type: Grant
    Filed: September 15, 2005
    Date of Patent: April 15, 2008
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: Dietmar Dudek, Mark A. Hackler, Robert A. McMillen, Allan Banke
  • Patent number: 7358033
    Abstract: A dye-containing curable composition including a binder and a dye that is soluble in an organic solvent, in which the binder contains a structural unit represented by the following general formula (I) and has a glass transition temperature in a range of 0 to 250° C.
    Type: Grant
    Filed: June 6, 2003
    Date of Patent: April 15, 2008
    Assignee: FUJIFILM Corporation
    Inventor: Katsumi Araki
  • Patent number: 7358029
    Abstract: A photoresist composition including a polymer, a photoacid generator and a dissolution modification agent, a method of forming an image using the photoresist composition and the dissolution modification agent composition. The dissolution modification agent is insoluble in aqueous alkaline developer and inhibits dissolution of the polymer in the developer until acid is generated by the photoacid generator being exposed to actinic radiation, whereupon the dissolution modifying agent, at a suitable temperature, becomes soluble in the developer and allows the polymer to dissolve in the developer. The DMAs are glucosides, cholates, citrates and adamantanedicarboxylates protected with acid-labile ethoxyethyl, tetrahydrofuranyl, and angelicalactonyl groups.
    Type: Grant
    Filed: September 29, 2005
    Date of Patent: April 15, 2008
    Assignee: International Business Machines Corporation
    Inventors: Robert David Allen, Phillip Joe Brock, Richard Anthony DiPietro, Ratnam Sooriyakumaran, Hoa D. Truong
  • Patent number: 7354692
    Abstract: A class of lithographic photoresist combinations is disclosed which is suitable for use with visible light and does not require a post-exposure bake step. The disclosed photoresists are preferably chemical amplification photoresists and contain a photosensitizer having the structure of formula (I): where Ar1 and Ar2 are independently selected from monocyclic aryl and monocyclic heteroaryl, R1 and R2 may be the same or different, and have the structure —X—R3 where X is O or S and R3 is C1-C6 hydrocarbyl or heteroatom-containing C1-C6 hydrocarbyl, and R4 and R5 are independently selected from the group consisting of hydrogen and —X—R3, or, if ortho to each other, may be taken together to form a five- or six-membered aromatic ring, with the proviso that any heteroatom contained within Ar1, Ar2, or R3 is O or S. The use of the disclosed photoresists, particularly for the manufacture of holographic diffraction gratings, is also disclosed.
    Type: Grant
    Filed: May 9, 2005
    Date of Patent: April 8, 2008
    Assignee: International Business Machines Corporation
    Inventors: Gregory Breyta, Daniel Joseph Dawson, Carl E. Larson, Gregory Michael Wallraff
  • Patent number: 7351517
    Abstract: Printing members that include a plasma polymer layer exhibit enhanced tolerance for high imaging-power densities. The plasma polymer layer may contain or be adjacent to an oleophilic metal such as copper.
    Type: Grant
    Filed: April 11, 2006
    Date of Patent: April 1, 2008
    Assignee: Presstek, Inc.
    Inventor: Sonia Rondon
  • Patent number: 7351514
    Abstract: A method in which a resist layer is applied to a base layer is disclosed. The resist layer includes an adhesive material, and the adhesive force of the adhesive material decreases or increases during an irradiation process. Residues of the resist layer may be stripped using the disclosed method.
    Type: Grant
    Filed: June 20, 2005
    Date of Patent: April 1, 2008
    Assignee: Infineon Technologies, Inc.
    Inventors: Werner Kröninger, Manfred Schneegans
  • Patent number: 7348131
    Abstract: A laser sensitive lithographic printing plate comprises an electrochemically grained, anodized, hydrophilically treated aluminum substrate with a reflection optical density of 0.30 or higher; a free radical polymerizable photosensitive layer; and a water soluble or dispersible overcoat. The photosensitive layer comprises a polymeric binder, a free radical polymerizable monomer, a free radical initiator, and a sensitizing dye. Such dark aluminum substrate in combination with the hydrophilic treatment allows both clean background and good printing durability. Such plate can be exposed with a suitable laser at lower dosage to cause hardening in the exposed areas. The exposed plate can be developed with a regular liquid developer or with ink and/or fountain solution.
    Type: Grant
    Filed: July 5, 2005
    Date of Patent: March 25, 2008
    Inventor: Gary Ganghui Teng
  • Patent number: 7348123
    Abstract: A flexographic printing plate is prepared from a photosensitive element having a photopolymerizable elastomeric layer with specific rheological properties. The element is imagewise exposed and thermally treated to form a relief structure suitable for flexographic printing.
    Type: Grant
    Filed: October 13, 2006
    Date of Patent: March 25, 2008
    Assignee: E.I. du Pont de Nemours and Company
    Inventors: Christoph Mengel, Dietmar Dudek, Mark A Hackler, Anandkumar Ramakrishnan Kannurpatti
  • Patent number: 7348110
    Abstract: A photothermographic material having a Dmin and Dmax optical density. The material includes a support having hereon one or more thermally-developable imaging layers which are developable to produce an image when the photothermographic material is thermally processed; and an area disposed along a length of at least one edge of the photothermographic material, wherein the area has an optical density less than the Dmax and greater than the Dmin of the photothermographic material.
    Type: Grant
    Filed: December 11, 2006
    Date of Patent: March 25, 2008
    Assignee: Carestream Health, Inc.
    Inventors: James C. Vanous, Bryan V. Hunt, Robert R. Brearey, Steven H. Kong, Mark C. Skinner, Thomas C. Geisler
  • Patent number: 7341818
    Abstract: The disclosed invention relates to novel norborne-type monomers containing pendent lactone or sultone groups. The invention also relates to norborne-type polymers and copolymers containing pendent lactone or sultone groups. These polymers and copolymers are useful in making photoimagable materials. The photoimagable materials are particularly suitable for use in photoresist compositions useful in 193 and 157 nm photolithography.
    Type: Grant
    Filed: January 10, 2005
    Date of Patent: March 11, 2008
    Assignee: Promerus LLC
    Inventors: Xiaoming Wu, Larry F. Rhodes, Lawrence Seger
  • Patent number: 7338746
    Abstract: A lithographic printing plate precursor comprising: a support; an image recording layer comprising (A) an actinic ray absorber, (B) a polymerization initiator, and (C) a polymerizable compound, wherein the image recording layer is capable of being removed with at least one of a printing ink and a fountain solution; and an overcoat layer comprising an inorganic laminar compound. And a lithographic printing method comprising: mounting a lithographic printing plate precursor on a printing press; imagewise exposing the lithographic printing plate precursor with laser beams; and feeding at least one of a printing ink and a fountain solution to the lithographic printing plate precursor to remove a laser beams non-exposed area in an image recording layer; and performing printing.
    Type: Grant
    Filed: September 23, 2004
    Date of Patent: March 4, 2008
    Assignee: FUJIFILM Corporation
    Inventors: Tomoyoshi Mitsumoto, Satoshi Hoshi
  • Patent number: 7338750
    Abstract: A resist pattern thickness reducing material has at least one type selected from a water soluble resin and an alkali-soluble resin. A process for forming a resist pattern includes a step for coating the resist pattern thickness reducing material such that the surface of a first resist pattern formed is covered and forming a mixing layer of the resist pattern thickness reducing material and the material of the resist pattern, on the surface of the resist pattern.
    Type: Grant
    Filed: October 29, 2002
    Date of Patent: March 4, 2008
    Assignee: Fujitsu Limited
    Inventors: Miwa Kozawa, Koji Nozaki, Takahisa Namiki, Junichi Kon
  • Patent number: 7338745
    Abstract: Positive-working imageable elements comprise a radiation absorbing compound and inner and outer layers on a substrate having a hydrophilic surface. The inner layer comprises a polymeric material that is removable using an alkaline developer and comprises a backbone and attached groups represented by the following Structure Q: wherein L1, L2, and L3 independently represent linking groups, T1, T2, and T3 independently represent terminal groups, and a, b, and c are independently 0 or 1. The imageable elements have improved resistance to development and printing chemicals and solvents.
    Type: Grant
    Filed: January 23, 2006
    Date of Patent: March 4, 2008
    Assignee: Eastman Kodak Company
    Inventors: Kevin B. Ray, Ting Tao, Scott A. Beckley
  • Patent number: 7335464
    Abstract: A water-soluble resin composition of the present invention comprises at least a water-soluble resin, an acid generator capable of generating an acid by heating and a solvent containing water. The water-soluble resin composition is applied on a highly water-repellant resist pattern 3 formed by a resist such as an ArF-responsive radiation sensitive resin composition on a substrate 1 to form a coated layer 4 thereon. The resist pattern 3 and the coated layer 4 are heat-treated to form a developer-insoluble modified coated layer 5 in the vicinity of a surface of the resist pattern 3. The coated layer is developed and the resist pattern thickened by the modified layer 5 is formed. The modified layer is a layer with sufficient thickness and is able to be formed with a high dimensional controllability in a highly water-repellant resist pattern such as ArF-responsive radiation sensitive resin composition.
    Type: Grant
    Filed: February 16, 2004
    Date of Patent: February 26, 2008
    Assignee: AZ Electronic Materials USA Corp.
    Inventors: Yusuke Takano, Sung-Eun Hong