Patents Examined by Richard L. Schilling
  • Patent number: 7270945
    Abstract: A method of forming an image using a photothermographic material containing a support having thereon an image forming layer which contains an organic silver salt, silver halide grains, a binder and a reducing agent, the method including the steps of: imagewise exposing the photothermographic material to light to form a latent image; and simultaneously or sequentially heating the exposed photothermographic material to develop the latent image, wherein at least two matting agents are contained on one surface of the support, and an average particle size LA of Matting agent A and an average particle size LB of Matting agent B satisfy the following relationship: 1.5?LB/LA?6.0, provided that Matting agent A is the matting agent having a largest weight ratio; and Matting agent B is the matting agent having a second largest weight ratio.
    Type: Grant
    Filed: January 5, 2007
    Date of Patent: September 18, 2007
    Assignee: Konica Minolta Medical & Graphic, Inc.
    Inventor: Narito Goto
  • Patent number: 7270929
    Abstract: A method and a medium for laser imaging is herein disclosed. The medium incorporates one or more types of microstructures having a predetermined heat or radiation modifiable optical characteristic such as color, scattering, diffusion, diffraction, interference and iridescence. Associated intimately with the microstructures is a radiation antenna that acts to absorb radiation from a radiation source. The radiation antenna and source are attuned to one another to efficiently transfer energy therebetween and subsequently to the microstructures; this transfer of energy results in the modification of an optical characteristic of the microstructures to form an image on the medium. The medium has one or more layers that may include both the radiation antenna and the microstructures. Alternatively, the microstructures and radiation antenna may be included in separate layers. Coatings that incorporate one or more layers that include distinct microstructures and radiation antennae are also contemplated.
    Type: Grant
    Filed: February 24, 2005
    Date of Patent: September 18, 2007
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: David M Kwasny, Makarand P. Gore, Marshall Field
  • Patent number: 7270943
    Abstract: Imaging layers, image recording media, and methods of preparation of each, are disclosed. One exemplary embodiment of the imaging layer, among others, includes a matrix; a radiation absorbing compound dissolved in the matrix; an aromatic compound dissolved in the matrix; a color former; and an activator. One of the activator and the color former is dissolved in the matrix and the other of the activator and the color former is substantially insoluble in the matrix at ambient conditions and is substantially uniformly distributed in the matrix.
    Type: Grant
    Filed: July 8, 2004
    Date of Patent: September 18, 2007
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: Tetsuo Muryama, Makoto Ochi, Kanzi Shimizu, Cari L. Dorsh, Vladek Kasperchik, William E. Dorogy
  • Patent number: 7267936
    Abstract: The invention provides a photographic element, comprising a support, a photographic emulsion layer and, an antihalation underlayer and/or a pelloid layer, the antihalation underlayer and/or pelloid layer being present in an amount of 1 g/m2 or less and comprises a vehicle and a solid particle dye.
    Type: Grant
    Filed: April 30, 2004
    Date of Patent: September 11, 2007
    Assignee: Eastman Kodak Company
    Inventors: Colin J. Gray, Martin T. Day
  • Patent number: 7264915
    Abstract: A manufacturing method using an additional heat-treatment process for a donor film with improved surface roughness. The improved donor film, used in a laser induced thermal imaging method, is capable of enhancing the lifetime of products and reducing the defect rates thereof. A manufacturing method for a donor film according to the invention, includes: providing a donor film comprising a base film, a light-to-heat conversion layer and an organic film; heating the donor film to provide a heat-treated donor film; and cooling the heat-treated donor film. The surface roughness of a donor film can be improved, and the non-uniform distribution of a laser on a region subjected to the LITI process can be minimized to prevent the over- or under-transfer of an transferred organic film, etc., and the non-uniform adhesion of the transferred organic film with an acceptor substrate.
    Type: Grant
    Filed: September 12, 2006
    Date of Patent: September 4, 2007
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Myung Won Song, Tae Min Kang, Sam Il Kho, Young Gil Kwon, Mu Hyun Kim, Sun Hoe Kim, Sok Won Noh, Yeun Joo Sung, Jin Wook Seong, Nam Choul Yang, Byeong Wook Yoo, Seong Taek Lee, Jae Ho Lee
  • Patent number: 7264918
    Abstract: A resist composition for liquid immersion lithography process, which comprises: (A) a polymer comprising (a1) alkali-soluble constitutional units each comprising an alicyclic group having both (i) a fluorine atom or a fluoroalkyl group and (ii) an alcoholic hydroxyl group, wherein the polymer changes in alkali-solubility due to the action of acid; and (B) an acid generator which generates acid due to exposure to light, and a method for forming a resist pattern using the resist composition. By the resist composition or the method, an adverse effect of the immersion liquid can be avoided while achieving high resolution and high depth of focus.
    Type: Grant
    Filed: March 24, 2004
    Date of Patent: September 4, 2007
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Kotaro Endo, Masaaki Yoshida, Taku Hirayama, Hiromitsu Tsuji, Toshiyuki Ogata, Mitsuru Sato
  • Patent number: 7262001
    Abstract: A heat-developable photosensitive material comprising a support, providing thereon, an organic silver salt, silver halide, a binder and a reducing agent, wherein a value of Rz(E)/Rz(B) is from 0.1 to 0.7 in which Rz(E) is the ten-point average roughness of the outermost surface of the image forming layer side and Rz(B) is the ten-point average roughness of the outermost surface of the side of the support opposite to the side of the image forming layer.
    Type: Grant
    Filed: January 28, 2005
    Date of Patent: August 28, 2007
    Assignee: Konica Minolta Medical & Graphic, Inc.
    Inventor: Narito Goto
  • Patent number: 7258963
    Abstract: In a photosensitive resin, a photoresist composition having the photosensitive resin, and a method of forming a photoresist pattern by using the photoresist, the photosensitive resin includes a blocking group substituted for an acid. The photosensitive resin has a weight-average molecular weight of from about 6,000 up to about 8,000. The photosensitive resin has a blocking ratio of from about 5% up to about 40%.
    Type: Grant
    Filed: January 17, 2006
    Date of Patent: August 21, 2007
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Youn-Kyung Wang, Kyoung-Mi Kim, Young-Ho Kim, Jae-Hyun Kim
  • Patent number: 7252912
    Abstract: A polymer composite comprises a base material, and a polymer membrane provided on at least a part of the base material, the polymer membrane having at least hydrophilicity, and the polymer composite is used in a state exposed to water or a water-based solvent. The polymer membrane is a resin film formed by photo-crosslinking a photosensitive resin composition consisting essentially of a water-soluble polymer, and during crosslinking of the photosensitive resin composition, some of photosensitive groups of the photosensitive resin composition are bound to amino groups fixed to the surface of the base material, whereby the resin film is fixed to the base material.
    Type: Grant
    Filed: March 29, 2005
    Date of Patent: August 7, 2007
    Assignees: Toyo Gosei Co., Ltd.
    Inventors: Kazunori Kataoka, Akihiro Hirano, Takeshi Ikeya, Toru Shibuya
  • Patent number: 7247418
    Abstract: Both single-layer and multilayer imageable elements have a substrate and at least one imageable layer. The elements can be used to prepare either negative- or positive-working imaged elements, for example as lithographic printing plates. The imageable elements also include a radiation absorbing compound and a solvent-resistant polymer comprising pendant phosphoric acid groups, pendant adamantyl groups, or both. When this polymer comprises pendant adamantyl groups, they are connected to the polymer backbone through a urea or urethane group. The imageable elements have improved chemical resistance and thermal bakeability from the presence of the unique solvent-resistant polymer.
    Type: Grant
    Filed: December 1, 2005
    Date of Patent: July 24, 2007
    Assignee: Eastman Kodak Company
    Inventors: Shashikant Saraiya, Jayanti Patel, Ting Tao, Kevin B Ray, Frederic E. Mikell, James L. Mulligan, John Kalamen, Scott A. Beckley, Eric Clark
  • Patent number: 7241537
    Abstract: Method for producing an exposed substrate, which has at least two different image areas. The substrate is provided with at least two photoresist layers, which are adjusted to the type of image areas to be produced.
    Type: Grant
    Filed: February 24, 2004
    Date of Patent: July 10, 2007
    Assignee: Giesecke & Devrient GmbH
    Inventor: Wittich Kaule
  • Patent number: 7241553
    Abstract: A chemically amplified resist composition using an alternating copolymer of ?-trifluoroacrylic acid with norbornene as a base polymer lends itself to ArF laser lithographic micropatterning and is improved in transparency, plasma etching resistance, and line edge roughness.
    Type: Grant
    Filed: January 27, 2005
    Date of Patent: July 10, 2007
    Assignees: Shin-Etsu Chemical Co., Ltd., Matsushita Electric Industrial Co., Ltd., Central Glass Co., Ltd.
    Inventors: Jun Hatakeyama, Yuji Harada, Yoshio Kawai, Masaru Sasago, Masayuki Endo, Shinji Kishimura, Kazuhiko Maeda, Haruhiko Komoriya, Kazuhiro Yamanaka
  • Patent number: 7235351
    Abstract: A thermally developable photographic material containing a support, provided thereon: (i) a photosensitive layer containing photosensitive silver halide particles, and (ii) a layer containing at least one represented by formula below on one or both surfaces of the support
    Type: Grant
    Filed: April 3, 2006
    Date of Patent: June 26, 2007
    Inventors: Kiyoshi Fukusaka, Osamu Ishige, Rie Sakuragi
  • Patent number: 7235342
    Abstract: A negative photoresist composition and a method of patterning a substrate through use of the negative photoresist composition. The composition includes: a radiation sensitive acid generator; a hydroxy-containing additive; and a resist polymer derived from at least one first monomer. The resist polymer may be further derived from a second monomer having an aqueous base soluble moiety. The hydroxy-containing additive has the structure of Q—OH, where Q may include one or more cyclic structures. Q—OH may have a primary alcohol structure. The acid generator is adapted to generate an acid upon exposure to radiation. The resist polymer is adapted to chemically react with the additive in the presence of the acid to generate a non-crosslinking reaction product that is insoluble in an aqueous alkaline developer solution.
    Type: Grant
    Filed: January 28, 2004
    Date of Patent: June 26, 2007
    Assignee: International Business Machines Corporation
    Inventors: Wenjie Li, Pushkara R. Varanasi
  • Patent number: 7232644
    Abstract: The invention provides a polymerizable composition comprising: a binder polymer containing at least an acid group having an acid dissociation constant (pKa) of 5.5 or more and a radical addition polymerizable group, and a radical-generating compound capable of generating a radical with light or heat. Further, the invention provides a negative-working planographic printing plate precursor which has a recording layer containing the polymerizable composition. Use of the polymerizable composition of the invention provides a planographic printing plate precursor that is capable of forming high-quality images free from stains in non-image portions, and further has high strength in formed image portions and excellent printing endurance.
    Type: Grant
    Filed: August 22, 2003
    Date of Patent: June 19, 2007
    Assignee: Fujifilm Corporation
    Inventors: Akinori Shibuya, Kazuto Kunita
  • Patent number: 7229738
    Abstract: Disclosed is a silver halide photographic light-sensitive material comprising at least one silver halide emulsion layer on a support, which contains a fluorine compound having two or more fluorinated alkyl groups having two or more carbon atoms and 11 or less fluorine atoms and having at least one of an anionic hydrophilic group and a nonionic hydrophilic group, and has a characteristic curve drawn in orthogonal coordinates of logarithm of light exposure (x-axis) and optical density (y-axis) using equal unit lengths for the both axes, on which gamma is 5.0 or more for the optical density range of 0.3-3.0. There is provided a silver halide photographic light-sensitive material that provides high sensitivity, high contrast, favorable half tone dot quality and superior storage stability.
    Type: Grant
    Filed: January 30, 2003
    Date of Patent: June 12, 2007
    Assignee: Fujifilm Corporation
    Inventors: Shoji Yasuda, Terukazu Yanagi
  • Patent number: 7229739
    Abstract: The invention generally relates to positive-working coating compositions and to a substrate formed with a coating of that composition. Advantageous versions of the invention provide an infrared imageable, positive lithographic printing plate having a coating comprising a hydroxy substituted polymer, a diphenylcarbinol solubility suppressing compound and an infrared radiation absorbing compound.
    Type: Grant
    Filed: May 25, 2005
    Date of Patent: June 12, 2007
    Assignee: Anocoil Corporation
    Inventors: Paul A. Perron, Brian L. Anderson, William J. Ryan
  • Patent number: 7229726
    Abstract: The invention relates to a method for thermally transferring an imaging material from an imaging donor to a receiver to form a pattern of the imaging material on the receiver in which a transparent texturing material is thermally transferred, preferably by laser exposure, from a texturing donor to the receiver prior to thermally transferring the imaging material to the receiver.
    Type: Grant
    Filed: November 19, 2004
    Date of Patent: June 12, 2007
    Assignee: E. I. du Pont de Nemours and Company
    Inventor: Jonathan V. Caspar
  • Patent number: 7226722
    Abstract: A negative-working, imageable element comprises a substrate and an IR-sensitive imageable layer comprising a dispersion of nanofibers of a preformed IR-sensitive polymer. The nanofibers can be composed of polyaniline, polypyrrole, or polythiophene. The IR-sensitive imageable layer containing the nanofibers can be imaged using infrared radiation and used for printing without further processing. Thus, both imaging and printing can be carried out on-press.
    Type: Grant
    Filed: January 17, 2006
    Date of Patent: June 5, 2007
    Assignee: Eastman Kodak Company
    Inventor: Elizabeth Knight
  • Patent number: 7226718
    Abstract: Numerous embodiments of a method to prevent outgassing from a low activation energy photoresist are described. In one embodiment of the present invention, a photoresist material is dispensed over a substrate to form a photoresist layer. The photoresist layer includes branched polymers coupled with acetal or ketal linkages. An exposed portion of the photoresist layer is exposed to a radiation treatment to cleave the acetal or ketal linkages and separate the branched polymers. The photoresist layer is baked at a temperature below about 100° C., and the separated branched polymers are too large to outgass from the photoresist layer.
    Type: Grant
    Filed: September 15, 2005
    Date of Patent: June 5, 2007
    Assignee: Intel Corporation
    Inventors: Heidi B. Cao, Wang Yueh, Jeanette M. Roberts