Patents Examined by Richard L. Schilling
  • Patent number: 7226709
    Abstract: A masking film has a unique polymeric binder in the imageable layer that enables the imaged film to be readily solubilized in non-chlorinated developers when it is used to form a relief image in a radiation-sensitive element, such as a UV-sensitive flexographic printing plate precursor. The polymeric binders in the imageable layer are resins that can be dissolved or dispersed in cyclohexane at 10% solids at 23° C. within 24 hours.
    Type: Grant
    Filed: June 20, 2006
    Date of Patent: June 5, 2007
    Assignee: Eastman Kodak Company
    Inventors: Kevin M. Kidnie, Pao Vang
  • Patent number: 7226716
    Abstract: A thermal transfer donor element is provided which comprises a support, a light-to-heat conversion layer, an interlayer, and a thermal transfer layer. When the above donor element is brought into contact with a receptor and imagewise irradiated, an image is obtained which is free from contamination by the light-to-heat conversion layer. The construction and process of this invention is useful in making colored images including applications such as color proofs and color filter elements.
    Type: Grant
    Filed: November 10, 2005
    Date of Patent: June 5, 2007
    Assignee: 3M Innovative Properties Company
    Inventors: Jeffrey C. Chang, John S. Staral, William A. Tolbert, Martin B. Wolk, Claire A. Jalbert, Hsin-hsin Chou
  • Patent number: 7223513
    Abstract: A thermal transfer image receiving sheet comprising a heat insulating layer and a layer adjacent to the heat insulating layer on a substrate, wherein the heat insulating layer is provided between the layer and the substrate, the heat insulating layer contains hollow particles in an amount of at least 65 percent by mass, and the heat insulating layer and the layer are formed by simultaneous multi-layer coating.
    Type: Grant
    Filed: August 12, 2005
    Date of Patent: May 29, 2007
    Assignee: Konica Minolta Photo Imaging, Inc.
    Inventors: Hiroki Nakane, Kenji Michiue, Tadanobu Sekiya
  • Patent number: 7223988
    Abstract: Embodiments of the present invention are directed toward a photoluminescent article comprising at least one host material and at least one color tunable photoluminescent dye. In certain embodiments, the emission spectrum of the at least one tunable photoluminescent dye may be dependent on the supramolecular architecture of the material. The photoluminescent emission spectrum of the dye is capable of being shifted by subjecting the article to an external stimuli such as, but not limited to, a mechanical deformation, a temperature change, aging of the article, a pressure change, exposure to a chemical compound. In specific embodiments, the color tunable photoluminescent dye is an oligo(phenylene vinylene) compound, such as, but not limited to, 1,4-Bis-(?-cyano-4-methoxystyryl)-benzene, 1,4-bis-(?-cyano-4-methoxystyryl)-2,5-dimethoxybenzene, and 1,4-bis-(?-cyano-4-(2-ethylhexyloxystyryl)-2,5-dimethoxybenzene and 2,5-bis-(?-cyano-4-methoxystyryl)-thiophene.
    Type: Grant
    Filed: June 20, 2003
    Date of Patent: May 29, 2007
    Assignee: Case Western Reserve University
    Inventors: Christiane Lowe, Christoph Weder
  • Patent number: 7223987
    Abstract: Fine particles of a phosphor are weighed, mixed, and filled. Provided after this step are at least one step of firing the particles in a reducing atmosphere, and a step of pulverizing, dispersing, rinsing, drying and then treating the particles in an ozone atmosphere after the last step of treatment in the reducing atmosphere. This method recovers oxygen vacancy in the host crystal of the phosphor.
    Type: Grant
    Filed: February 19, 2004
    Date of Patent: May 29, 2007
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Kazuhiko Sugimoto, Junichi Hibino, Masaki Aoki, Yoshinori Tanaka, Hiroshi Setoguchi
  • Patent number: 7223514
    Abstract: A method of fabricating a donor substrate and a method of fabricating an organic light emitting display (OLED) using the donor substrate. The method of fabricating the donor substrate includes preparing a base substrate that includes at least one transfer region and at least one non-transfer region, forming a light-to-heat conversion layer on the base substrate and depositing a transfer layer selectively on the light-to-heat conversion layer and in the at least one transfer region of the base substrate using a shadow mask. To then make the OLED, laser induced thermal imaging is used to transfer the patterned transfer layer from the donor substrate to display regions in an acceptor substrate.
    Type: Grant
    Filed: September 28, 2005
    Date of Patent: May 29, 2007
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Tae-Min Kang, Jae-Ho Lee, Seong-Taek Lee, Jin-Soo Kim
  • Patent number: 7223527
    Abstract: An immersion lithography process is described. First, a photoresist layer on a material layer is formed. Then, an acid compensation layer is formed on the photoresist layer. An immersion exposure step is performed on the acid compensation layer and the photoresist layer. The acid compensation layer contains a photo-acid generator with a concentration of the photo-acid higher than that produced by a photo-acid generator in the photoresist layer after the immersion exposure step. Then, a development step is performed to pattern the acid compensation layer and the photoresist layer.
    Type: Grant
    Filed: April 21, 2005
    Date of Patent: May 29, 2007
    Assignee: Winbond Electronics Corp.
    Inventors: Kao-Tsair Tsai, Jan-Nan Oue
  • Patent number: 7223515
    Abstract: Substrate films, thermal mass transfer donor elements, and methods of making and using the same are provided. In some embodiments, such substrate films and donor elements include at least two dyads, wherein each dyad includes an absorbing first layer and an essentially non-absorbing second layer. Also provided are methods of making a donor element that includes an essentially non-absorbing substrate, an absorbing first layer, and a non-absorbing second layer, wherein the composition of the essentially non-absorbing substrate is essentially the same as the composition of the essentially non-absorbing second layer.
    Type: Grant
    Filed: May 30, 2006
    Date of Patent: May 29, 2007
    Assignee: 3M Innovative Properties Company
    Inventors: Martin B. Wolk, Thomas R. Hoffend, Jr., Stephen A. Johnson, John P. Baetzold, Richard J. Thompson, Terence D. Neavin, Michael A. Haase, Sergey A. Lamansky
  • Patent number: 7220532
    Abstract: The present invention provides a chemical amplification type positive resist composition comprising a nitrogen containing compound of the formula (VIa) or (VIb); resin which contains a structural unit having an acid labile group and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid; and an acid generator of the formula (I)
    Type: Grant
    Filed: September 9, 2003
    Date of Patent: May 22, 2007
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Yoshiyuki Takata, Isao Yoshida, Hirotoshi Nakanishi
  • Patent number: 7217493
    Abstract: A positive resist composition comprising (A) polysiloxane or polysilsesquioxane that has a property of increasing solubility in an alkali developing solution by the action of an acid and contains a group capable of being decomposed with an acid, (B) a compound that generates a sulfonic acid upon irradiation of an actinic ray or radiation and (C) an organic basic compound, wherein an amount of the compound that generates a sulfonic acid upon irradiation of an actinic ray or radiation is from 6 to 20% by weight based on the total solid content of the positive resist composition.
    Type: Grant
    Filed: May 7, 2004
    Date of Patent: May 15, 2007
    Assignee: Fujifilm Corporation
    Inventors: Shoichiro Yasunami, Kazuyoshi Mizutani
  • Patent number: 7217500
    Abstract: A color image-forming material capable of drawing an image by infrared laser exposure and excellent in image visibility, storage stability and white light stability, and an on-press development or non-processing (non-development) type lithographic printing plate precursor ensuring high sensitivity and high press life and being excellent in image visibility, on-press developability and the like, are provided, which are a color image-forming material comprising an image recording layer capable of drawing an image by infrared laser exposure, the color image-forming material forming a color image without passing through a development processing step after image recording, wherein the image recording layer comprises (A) an infrared absorbent, (B) a cyclic color-forming compound having a cyclic structure within the molecule and forming a dye by a ring opening, and (C) a dye stabilizer which is a compound interacting with the cyclic color-forming compound to stabilize the ring-opened dye body and cause color formati
    Type: Grant
    Filed: August 24, 2005
    Date of Patent: May 15, 2007
    Assignee: Fujifilm Corporation
    Inventors: Kazuto Kunita, Yasuhito Oshima, Hidekazu Oohashi
  • Patent number: 7217492
    Abstract: An onium salt compound having a cation moiety of the following formula (1) is disclosed. wherein A represents I or S, m is 1 or 2, n is 0 or 1, x is 1–10, and Ar1 and Ar2 are (substituted) aromatic hydrocarbon group, and P represents —O—SO2R, —O—S(O)R, or —SO2R, wherein R represents a hydrogen atom, a (substituted) alkyl group, or a (substituted) alicyclic hydrocarbon group. The onium salt compound is suitable as a photoacid generator for photoresists of a positive-tone radiation-sensitive resin composition. The positive-tone radiation-sensitive resin composition containing this compound is useful as a chemically-amplified photoresist exhibiting high resolution at high sensitivity, responsive to various radiations, and having outstanding storage stability.
    Type: Grant
    Filed: December 24, 2003
    Date of Patent: May 15, 2007
    Assignee: JSR Corporation
    Inventors: Eiji Yoneda, Yong Wang, Yukio Nishimura
  • Patent number: 7214466
    Abstract: The invention is directed to a photoimageable composition comprising: (I) finely divided particles of inorganic material comprising: (a) functional phase particles selected from electrically conductive, resistive, and dielectric particles; (b) inorganic binder having a glass transition temperature in the range of from 325 to 600° C., a surface area of no greater than 10 m2/g and at least 85 wt. % of the particles having a size of 0.1–10 ?m; dispersed in: (II) an organic medium comprising: (a) aqueous developable polymer which is a copolymer, interpolymer or mixture thereof, wherein each copolymer or interpolymer comprises (1) a nonacidic comonomer comprising a C1-10 alkyl acrylate, C1-10 alkyl methacrylate, styrenes, substituted styrenes or combinations thereof and (2) an acidic comonomer comprising ethylenically unsaturated carboxylic acid containing moiety; (g) cationically polymerizable monomer; (h) photoinitiation system; and (i) organic solvent.
    Type: Grant
    Filed: December 14, 2005
    Date of Patent: May 8, 2007
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: Haixin Yang, Mark R. McKeever
  • Patent number: 7211364
    Abstract: A thermally conductive material, a donor element including the material, a method of printing using the donor element, and a print assembly including the donor element are described, wherein the thermally conductive material includes at least two immiscible or incompatible organic polymers, or a block or graft copolymer, wherein the constituent homopolymer repeat units that form the copolymer are prepared from chemical species that would form mutually immiscible or incompatible polymers, and thermally conductive particles having a short axis of less than or equal to 0.2 microns.
    Type: Grant
    Filed: October 21, 2005
    Date of Patent: May 1, 2007
    Assignee: Eastman Kodak Company
    Inventors: Christine J. Landry-Coltrain, Linda M. Franklin
  • Patent number: 7211365
    Abstract: New negative-acting photoresist compositions are provided that are particularly useful for imaging at short wavelengths, particularly sub-200 nm wavelengths such as 193 nm. Resists of the invention provide contrast between exposed and unexposed coating layer regions through crosslinking or other solubility switching mechanism. Preferred resists of the invention include a resin component that contains repeat units that facilitate aqueous base solubility.
    Type: Grant
    Filed: March 4, 2003
    Date of Patent: May 1, 2007
    Assignee: Shipley Company, L.L.C.
    Inventors: George G. Barclay, Nicola Pugliano
  • Patent number: 7205093
    Abstract: A method of forming a top coat layer and a topcoat material for use in immersion lithography. A topcoat layer is formed on a photoresist layer from an aqueous solution that is immiscible with the photoresist layer. The topcoat layer is then rendered insoluble in neutral water but remains soluble in aqueous-base developer solutions so the photoresist may be exposed in a immersion lithographic system using water as the immersion fluid, but is removed during photoresist development. The topcoat materials are suitable for use with positive, negative, dual tone and chemically amplified (CA) photoresist.
    Type: Grant
    Filed: June 3, 2005
    Date of Patent: April 17, 2007
    Assignee: International Business Machines Corporation
    Inventor: William Dinan Hinsberg, III
  • Patent number: 7205091
    Abstract: A primer layer that includes a surface-tension modifier dispersed within a polymer binder is disposed between the imaging layer and the substrate of a lithographic printing member to inhibit the production of thermal degradation products that disrupt the oleophilicity of the exposed imaged areas, thereby improving print-making performance and efficiency. In addition, embodiments of the primer layer inhibit static charge buildup during production and during the print-making process.
    Type: Grant
    Filed: April 29, 2005
    Date of Patent: April 17, 2007
    Assignee: Presstek, Inc.
    Inventor: Kenneth R. Cassidy
  • Patent number: 7202009
    Abstract: This invention relates to resins and photoresist compositions that comprise such resins. Preferred polymers of the invention comprise adjacent saturated carbon atoms, either integral or pendant to the polymer backbone, that have a substantially gauche conformation. Polymers of the invention are particularly useful as a resin binder component of chemically-amplified positive-acting resists that can be effectively imaged at short wavelengths such as sub-200 nm and preferably about 157 nm. In such short-wavelength imaging applications, polymers of the invention that have a population of dihedral angles of adjacent saturated carbon atoms that are enriched in substantially gauche conformations can provide reduced undesired absorbance of the high energy exposure radiation.
    Type: Grant
    Filed: September 8, 2001
    Date of Patent: April 10, 2007
    Assignee: Shipley Company, L.L.C.
    Inventors: Peter Trefonas, III, Gary N. Taylor, Charles R. Szmanda
  • Patent number: 7202007
    Abstract: This method forms a patterned film. The method prepares a transfer member having a transfer surface on which asperities are formed in accordance with a film pattern to be formed, performs stripping treatment on surfaces of at least ridges formed on the transfer surface of the transfer member, thereafter forms a thin film formed by a technology of vacuum film formation on the surfaces of the at least ridges formed on the transfer surface of the transfer member and transfers the thin film formed on the surfaces of at least ridges of the transfer member onto a substrate, thereby forming the patterned film on the substrate.
    Type: Grant
    Filed: June 9, 2003
    Date of Patent: April 10, 2007
    Assignee: Fujifilm Corporation
    Inventors: Norio Shibata, Junji Nakada, Jun Fujinawa
  • Patent number: 7202008
    Abstract: An improved apparatus and a method of using the apparatus to remove non-crosslinked photopolymer from an imaged and exposed surface of a relief image printing element. Included are means for supporting and rotating the printing element, means for softening and/or melting non-crosslinked photopolymer on the imaged and exposed surface of the printing element, and at least one thermal developing assembly. The thermal developing assembly includes means for supplying an absorbent material that is contactable with the printing element, and that is capable of removing at least a portion of the softened and/or melted non-crosslinked photopolymer, and means for causing the absorbent material to contact at least a portion of the printing element. The absorbent material is backed with an endless impression belt that is supported by a plurality of rollers.
    Type: Grant
    Filed: June 23, 2005
    Date of Patent: April 10, 2007
    Inventors: Albert Roshelli, Jr., Gary T. Markhart