Patents Examined by Richard L. Schilling
  • Patent number: 7332253
    Abstract: A radiation-sensitive composition and negative-working imageable element includes a polymeric binder comprising pendant allyl ester groups to provide solvent resistance, excellent digital speed (sensitivity) and can be imaged and developed without a preheat step to provide lithographic printing plates. The polymeric binder can be prepared with a precursor polymer having pendant carboxy groups that are converted to allyl ester groups using an allyl-containing halide in the presence of a base in order to avoid gelation.
    Type: Grant
    Filed: July 27, 2006
    Date of Patent: February 19, 2008
    Assignee: Eastman Kodak Company
    Inventors: Ting Tao, Scott A. Beckley
  • Patent number: 7329479
    Abstract: A process of producing an electroluminescent element is provided. The production process comprises repeating at least twice a step of forming an electroluminescent layer comprising a buffer layer and a luminescent layer by patterning using a photolithographic process, thereby producing an electroluminescent element comprising a patterned electroluminescent layer. The method includes the steps of forming a first pattern part comprising a first buffer layer as the lowermost layer, and coating a solution for forming a second buffer layer in a region including the first pattern part. The first buffer layer is immiscible with the solution for forming the second buffer layer.
    Type: Grant
    Filed: June 16, 2005
    Date of Patent: February 12, 2008
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Norihito Itoh, Tomoyuki Tachikawa, Kiyoshi Itoh
  • Patent number: 7326512
    Abstract: Provided are a polymer compound having high transparency for use in a photoresist composition for microfabrication of the next generation, a resist composition using the polymer compound as a base polymer, and a dissolution inhibitor agent composed of the polymer compound. To ensure etching resistance, an alicyclic group is introduced into a side chain portion. Hydrogen atoms on the ring of the alicyclic group are highly fluorinated to ensure transparency to light of 157 nanometer wavelength, represented by an adsorption coefficient equal to or less than 3.0 ?m?1. As the alicyclic group, a polycyclic group is preferably used. Hydrogen atoms are highly fluorinated by preferably substituting all hydrogen atoms on the ring by fluorine atoms, that is, forming a perfluoroalicyclic group. The resist composition is formed by using the polymer compound as a base polymer and further, the dissolution inhibitor agent is formed of the polymer compound.
    Type: Grant
    Filed: November 28, 2003
    Date of Patent: February 5, 2008
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Toshiyuki Ogata, Kotaro Endo, Hiromitsu Tsuji, Masaaki Yoshida, Hideo Hada, Ryoichi Takasu, Mitsuru Sato
  • Patent number: 7326526
    Abstract: In various aspects, the present invention provides substantially monolayer thick molecular films with photoresponsive wettability, the molecules of said films comprising a photochromic molecule coordinated to a metal atom, which is coordinated to an organic tethering molecule, surface coupling group, or both, having a group for attachment to a surface of a substrate. In various aspects, the present inventions also provide photochromic articles comprising said films, methods of forming said films, and methods of manufacturing photochromic articles using said films. In various embodiments, provided are molecular films where the photoconversion between configurations of the photochromic molecule is substantially reversible by irradiation with light. In various embodiments, provided are films where the photoconversion is substantially irreversible by irradiation with light.
    Type: Grant
    Filed: December 15, 2004
    Date of Patent: February 5, 2008
    Assignee: Worcester Polytechnic Institute
    Inventors: W. Grant McGimpsey, John C. MacDonald
  • Patent number: 7326504
    Abstract: An anti-copy film is disclosed. The film has a light transmissive imageable substrate having opposing first and second surfaces. Each surface has an image receptive coating. Complementary positive and negative images are disposed on the first and second surfaces such that an imaged area on the first surface is in registration with a non-imaged area on the second surface. The anti-copy film appears substantially opaque when viewed orthogonally to and appears partially transparent when viewed obliquely to either the first or second surfaces.
    Type: Grant
    Filed: October 14, 2005
    Date of Patent: February 5, 2008
    Assignee: 3M Innovative Properties Company
    Inventors: Paul D. Graham, Jonathan P. Kitchin
  • Patent number: 7326521
    Abstract: Negative-working imageable elements can be imaged and then developed using a lower pH organic-based single-phase developer that is less toxic and corrosive and that can be more readily disposed of after use. This developer has a pH less than 12 and comprises a) an amphoteric surfactant comprising a nitrogen-containing heterocycle, b) an amphoteric surfactant having two or more nitrogen atoms, or c) an amphoteric surfactant of a) and an amphoteric surfactant of b).
    Type: Grant
    Filed: August 31, 2006
    Date of Patent: February 5, 2008
    Assignee: Eastman Kodak Company
    Inventors: Ting Tao, Kevin B. Ray, Scott A. Beckley, Paul R. West
  • Patent number: 7323289
    Abstract: Novel anti-reflective coatings comprising small molecules (e.g., less than about 5,000 g/mole) in lieu of high molecular weight polymers and methods of using those coatings are provided. In one embodiment, aromatic carboxylic acids are used as the chromophores, and the resulting compounds are blended with a crosslinking agent and an acid. Anti-reflective coating films prepared according to the invention exhibit improved properties compared to high molecular weight polymeric anti-reflective coating films. The small molecule anti-reflective coatings have high etch rates and good via fill properties. Photolithographic processes carried out with the inventive material result in freestanding, 110-nm profiles.
    Type: Grant
    Filed: October 6, 2003
    Date of Patent: January 29, 2008
    Assignee: Brewer Science Inc.
    Inventors: Charles J. Neef, Mandar Bhave, Michelle Fowler, Michelle Windsor
  • Patent number: 7323290
    Abstract: A dry film photoresist includes a functional polymer. The functional polymer has ?,?-unsaturated groups and groups that generate a free radical upon exposure to actinic radiation.
    Type: Grant
    Filed: March 18, 2003
    Date of Patent: January 29, 2008
    Assignee: Eternal Technology Corporation
    Inventors: Robert K. Barr, Edgardo Anzures, Daniel E. Lundy
  • Patent number: 7316883
    Abstract: A heat-sensitive lithographic printing plate of the present invention, which enables image recording by infrared-ray scanning exposure based on digital data and has excellent on-press developability, high resistance to scumming and a long press life, the heat-sensitive lithographic printing plate having on a support with a hydrophilic surface an image-forming layer made up of microcapsules in which a reactive group-containing hydrophobic compound is enclosed, a light-to-heat converting agent and a water-soluble compound which has a reactive group capable of reacting with the hydrophobic compound and is situated outside the microcapsules.
    Type: Grant
    Filed: May 11, 2006
    Date of Patent: January 8, 2008
    Assignee: Fujilfilm Corporation, Ltd.
    Inventor: Toshifumi Inno
  • Patent number: 7316875
    Abstract: An image forming medium including at least a polymer and a photochromic compound such as spiropyran embedded in the polymer, wherein spiropyran molecules of the spiropyran compound are chelated by a cation.
    Type: Grant
    Filed: May 6, 2005
    Date of Patent: January 8, 2008
    Assignee: Xerox Corporation
    Inventors: Gabriel Iftime, Peter M. Kazmaier
  • Patent number: 7314704
    Abstract: Imaging layers, image recording media, and methods of preparation of each, are disclosed.
    Type: Grant
    Filed: October 24, 2005
    Date of Patent: January 1, 2008
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventor: Makarand P. Gore
  • Patent number: 7312012
    Abstract: The present invention relates to a thermal donor comprising a dye mixture and a urea light-stabilizing compound, wherein the light-stabilizing compound is represented by structure I: wherein: R1, R2 and R3 represent a hydrogen atom, alkyl group, cycloalkyl group, alkenyl group, aralkyl group, aryl group or heterocyclic group, provided that at least one of R1, R2, and/or R3 is a hydrogen atom; R4-R8 represent a hydrogen atom, hydroxyl group, alkyl group, cycloalkyl group, alkenyl group, aralkyl group, aryl group, heterocyclic group, aryloxy group, or alkoxy group; and R3 forms a heterocyclic ring with either R4 or R8, and an imaging system comprising a donor sheet having a layer containing a dye and an image receiving sheet having a dye receiving layer, wherein either the donor sheet or the image receiving sheet comprises a dye mixture and a urea light-stabilizing compound of structure I.
    Type: Grant
    Filed: December 14, 2006
    Date of Patent: December 25, 2007
    Assignee: Eastman Kodak Company
    Inventors: Donald R. Diehl, Shari L. Eiff, Ramanuj Goswami, Christine J. Landry-Coltrain, Gary M. Russo
  • Patent number: 7306895
    Abstract: The invention provides a pattern forming method including providing a polymerization initiation layer which is obtained by fixing, by a cross-linking reaction, a polymer having functional groups having polymerization initiation ability and cross-linking groups at side chains, on a support, and forming a pattern including a preparation zone and a non-preparation zone of a graft polymer by preparing the graft polymer on the surface of the polymerization initiation layer using graft polymerization, by contacting a compound having a polymerizable group on the polymerization initiation layer and supplying energy imagewise; an image forming method which applies the pattern forming method; a pattern forming material; and a planographic printing plate. A fine particle adsorption pattern forming method and a conductive pattern forming method are also provided.
    Type: Grant
    Filed: April 21, 2004
    Date of Patent: December 11, 2007
    Assignee: FUJIFILM Corporation
    Inventors: Takeyoshi Kano, Koichi Kawamura
  • Patent number: 7306893
    Abstract: An image recording material of the present invention comprises an anodized aluminum support, an intermediate layer containing a polymer having a carboxylic acid group in a side chain thereof and formed on the aluminum support, and a photosensitive layer containing at least 50% by weight or more of novolak type phenol resin and a photothermal conversion agent and recordable by IR laser beam. A planographic printing plate excellent in printing durability can be obtained by subjecting the image recording material imagewise to IR laser exposure treatment and to development treatment, and then heating the image recording material at 150 to 300° C.
    Type: Grant
    Filed: August 30, 2004
    Date of Patent: December 11, 2007
    Assignee: FUJIFILM Corporation
    Inventors: Ikuo Kawauchi, Miki Takahashi, Masako Imai
  • Patent number: 7306894
    Abstract: A polymerizable composition comprising an ethylenic monomer, a photopolymerization initiator and a specific benzotriazole compound or sulfone compound, and a method for producing a lithographic printing plate comprising a step of exposing a light-sensitive layer containing the above-described polymerizable composition on a support with laser light having a wavelength of 450 nm or shorter and a step of treating the exposed light-sensitive layer with a developing solution having a pH of 13.0 or less.
    Type: Grant
    Filed: February 28, 2005
    Date of Patent: December 11, 2007
    Assignee: Fujifilm Corporation
    Inventor: Tomotaka Tsuchimura
  • Patent number: 7306892
    Abstract: Multilayer photoresist systems are provided. In particular aspects, the invention relates to underlayer composition for an overcoated photoresist, particularly an overcoated silicon-containing photoresist that is imaged at short exposure wavelengths.
    Type: Grant
    Filed: November 20, 2003
    Date of Patent: December 11, 2007
    Assignee: Shipley Company, L.L.C.
    Inventors: George G. Barclay, James F. Cameron
  • Patent number: 7306900
    Abstract: A silver halide color photosensitive material comprising at least one layer containing at least one compound selected from a group consisting of the following type 1 and type 2, and at least one layer containing at least one fluorine compound represented by the following general formula (A): (Type 1) Compound which undergoes a one-electron oxidation so as to form a one-electron oxidation product capable of, through subsequent bond cleavage reaction, releasing one or more electrons; (Type 2) Compound which undergoes a one-electron oxidation so as to form a one-electron oxidation product capable of, after subsequent bond formation reaction, releasing one or more electrons; Rf?X-M:??General formula (A) wherein Rf represents an alkyl group having 1 to 6 carbons which is substituted with at least one fluorine atom, X represents a divalent coupling group or a single bond, and M represents an anionic group, a cationic group or a betaine group.
    Type: Grant
    Filed: September 29, 2006
    Date of Patent: December 11, 2007
    Assignee: FUJIFILM Corporation
    Inventor: Koichi Yokota
  • Patent number: 7303856
    Abstract: A light-sensitive sheet comprises a support, a first light-sensitive layer and a second light-sensitive layer in this order. Each of the first and second light sensitive layers independently contains a binder, a polymerizable compound and a photo-polymerization initiator. The second light-sensitive layer is more sensitive to light than the first light-sensitive layer. A light-sensitive laminate comprises a substrate, the second light-sensitive layer and the first light-sensitive layer in this order.
    Type: Grant
    Filed: June 21, 2004
    Date of Patent: December 4, 2007
    Assignee: FUJIFILM Corporation
    Inventors: Morimasa Sato, Yuichi Wakata, Masanobu Takashima, Tomoko Tashiro
  • Patent number: 7300726
    Abstract: Positive-working imageable elements comprise a radiation absorbing compound and inner and outer layers on a substrate having a hydrophilic surface. The inner layer comprises a combination of two different polymeric binders one of which has an acid number of at least 30, which combination of polymers provides improved post-development bakeability (more quickly baked or cured at lower temperatures) and desired digital speed with no loss in chemical resistance.
    Type: Grant
    Filed: October 20, 2006
    Date of Patent: November 27, 2007
    Assignee: Eastman Kodak Company
    Inventors: Jayanti Patel, Shashikant Saraiya, Ting Tao
  • Patent number: 7300744
    Abstract: Disclosed is a method of processing a light sensitive planographic printing plate material comprising an aluminum support, and provided thereon, a photopolymerizable light sensitive layer containing a polymerizable ethylenically unsaturated compound, a photopolymerization initiator, and a polymer binder, the method comprising the steps of imagewise exposing the light sensitive planographic printing plate material, developing the exposed light sensitive planographic printing plate material with a developer to obtain a planographic printing plate, the developer containing no silicate or containing a silicate in amount of not more than 0.1% by weight in terms of SiO2, and plate processing the resulting planographic printing plate with a plate protecting solution containing a phosphonic acid compound at a temperature of from 40 to 90° C.
    Type: Grant
    Filed: May 23, 2005
    Date of Patent: November 27, 2007
    Assignee: Konica Minolta Medical & Graphic, Inc.
    Inventors: Toshitsugu Suzuki, Taro Konuma