Abstract: This method forms a patterned film. The method prepares a transfer member having a transfer surface on which asperities are formed in accordance with a film pattern to be formed, performs stripping treatment on surfaces of at least ridges formed on the transfer surface of the transfer member, thereafter forms a thin film formed by a technology of vacuum film formation on the surfaces of the at least ridges formed on the transfer surface of the transfer member and transfers the thin film formed on the surfaces of at least ridges of the transfer member onto a substrate, thereby forming the patterned film on the substrate.

Abstract: A method for forming a resist pattern on a substrate (18) places a donor element (12) having a layer of thermoresist material proximate the substrate. A gap is maintained such that the surface of the layer of thermoresist material is spaced apart from the surface of the substrate by a number of spacing elements. Thermal energy is directed toward the donor element (12) according to the resist pattern, whereby a portion of thermoresist material is transferred from the donor element (12) across the gap by ablative transfer and is deposited onto the substrate (18) forming the resist pattern.

Abstract: There is provided a chemically-amplified resist composition having high transparency to light having a wavelength of 220 nanometers or smaller, excellent resistance to etching, and excellent adhesion to a substrate. The chemically-amplified resist composition is prepared through the use of at least one of a repeated structural unit having a bridged alicyclic ?-lactone structure defined in the general formula (III), a repeated structural unit having a bridged alicyclic ?-lactone structure defined in the general formula (IV), and a repeated structural unit having a bridged alicyclic ?-lactone structure defined in the general formula (V).

Abstract: A positive photosensitive composition comprising (A) an acid generator that generates an acid upon irradiation of an actinic ray or radiation, (B) a resin that has a monocyclic or polycyclic alicyclic hydrocarbon structure and is decomposed by the action of an acid to increase solubility in an alkali developing solution, and (C) a specific basic compound.

Abstract: A method of forming an image using a photothermographic material containing a support having thereon an image forming layer which contains an organic silver salt, silver halide grains, a binder and a reducing agent, the method including the steps of: imagewise exposing the photothermographic material to light to form a latent image; and simultaneously or sequentially heating the exposed photothermographic material to develop the latent image, wherein at least two matting agents are contained on one surface of the support, and an average particle size LA of Matting agent A and an average particle size LB of Matting agent B satisfy the following relationship: 1.5?LB/LA?6.0, provided that Matting agent A is the matting agent having a largest weight ratio; and Matting agent B is the matting agent having a second largest weight ratio.

Abstract: An image forming method comprising by imagewise exposing a photothermographic material comprising at least a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent, and a binder, on at least one surface of a support, and thermally developing the photothermographic material at a line speed of 20 mm/sec or higher using an image forming apparatus, wherein the reducing agent is a bisphenol compound which has at a meso-position a substituent with ring structure or a substituent having an unsaturated bond.

Abstract: In one aspect, the invention provides methods for forming a photopatterned hydrogel. In some embodiments, the methods comprise the step of exposing a solution comprising a monomer, a crosslinking agent, and a photoinitiator to a pattern of light comprising a first and a second light intensity for a period of time and under suitable conditions for the first light intensity to induce essentially complete conversion of polymerizable groups on the monomer and the crosslinking agent to form a patterned hydrogel, and for the second light intensity to induce partial conversion of the polymerizable groups on the monomer and the crosslinking agent to form partially polymerized polymers that remain soluble. In some embodiments, the first light intensity is lower than the second light intensity. In another aspect, the invention provides methods for forming porous, photopatterned hydrogels.

Abstract: A print medium includes a sheet. A plurality of parallel rib elements extend along the sheet and are configured to provide the sheet with anisotropic bending properties.

Abstract: Multilayer, positive working, thermally imageable, bakeable imageable elements have a substrate, an underlayer, and a top layer. The underlayer comprises a polymeric material that comprises, in polymerized form from about 5 mol % to about 30 mol % of recurring units derived from an ethylenically unsaturated polymerizable monomer having a carboxy group; from about 20 mol % to about 75 mol % of recurring units derived from N-phenylmaleimide, N-cyclohexylmaleimide, N-benzylmaleimide, or a mixture thereof; and from about 3 mol % to about 50 mol % of recurring units derived from a compound represented by the formula: CH2?C(R2)—C(O)—NH—CH2—OR1, in which R1 is C1 to C12 alkyl, phenyl, C1 to C12 substituted phenyl, C1 to C12 aralkyl, or Si(CH3)3; and R2 is hydrogen or methyl. Other materials, such as a resin or resins having activated methylol and/or activated alkylated methylol groups, such as a resole resin, may be present in the underlayer.

Abstract: Disclosed is a chemical-amplification negative-working photoresist composition used for photolithographic patterning in the manufacture of semiconductor devices suitable for patterning light-exposure to ArF excimer laser beams and capable of giving a high-resolution patterned resist layer free from swelling and having an orthogonal cross sectional profile by alkali-development. The characteristic ingredient of the composition is the resinous compound which has two types of functional groups, e.g., hydroxyalkyl groups and carboxyl or carboxylate ester groups, capable of reacting each with the other to form intramolecular and/or intermolecular ester linkages in the presence of an acid released from the radiation-sensitive acid generating agent to cause insolubilization of the resinous ingredient in an aqueous alkaline developer solution.

Abstract: Initiator system comprising: (a) at least one substance capable of absorbing IR radiation, (b) at least one compound capable of forming free radicals, and (c) at least one 1,4-dihydropyridine derivative of the formula (I)

Abstract: A method of preparing negative-working, single-layer imageable elements improves their storage stability in a humid environment. The method includes enclosing the coated imageable elements in a water-impermeable sheet material that substantially inhibits the transfer of moisture to and from the imageable element. Such imageable elements include a radiation-sensitive composition that includes a radically polymerizable component, an initiator composition to provide radicals upon exposure to imaging radiation, a radiation absorbing compound, and a polymeric binder having poly(alkylene glycol) side chains.

Abstract: The present disclosure relates to an organic anti-reflective coating composition and a method for forming photoresist patterns using the same. The anti-reflective coating compositions are useful for preventing reflection of a lower film layer or a substrate of a photoresist film, reducing standing waves caused by light and variations in the thickness of the photoresist itself, and increasing the uniformity of the photoresist patterns. More particularly, the present invention relates to an organic anti-reflective coating composition comprising particular organo-silicon based polymers and a method for forming photoresist patterns using the same. The organic anti-reflective coating composition can prevent excessive absorbency of an anti-reflective film formed therefrom and, thus, minimize the reflectivity of the film so that it can efficiently remove standing waves and increase the uniformity of the photoresist pattern.

Abstract: A substrate is provided with a coating of material which is substantially transparent to the wavelength of the projection beam. The coating may be thicker than the wavelength of the projection beam and have a refractive index of the coating such that the wavelength of the projection beam is shortened as it passes through it. This allows the imaging of smaller features on the substrate. Alternatively, the coating may be used with a liquid supply system and act to keep bubbles away from a radiation sensitive layer of the substrate.

Abstract: Positive-working imageable elements are prepared by providing a first layer and second layers onto a substrate. Both layers include the same or different radiation absorbing compounds dispersed within different polymeric binders. After both layers are dried, they are heat treated at from about 40 to about 90° C. for at least 4 hours under conditions that inhibit the removal of moisture from the dried first and second layers. This method of preparation provides elements with improved imaging speed and good shelf life.

Abstract: A negative-working radiation-sensitive composition includes a polymeric binder comprising a polymer backbone and having attached thereto a carbazole derivative represented by the following Structure (I): wherein Y is a direct bond or a linking group, and R1 to R8 are independently hydrogen, or an alkyl, alkenyl, aryl, halo, cyano, alkoxy, acyl, acyloxy, or carboxylate groups, or any adjacent R1 through R8 groups can together form a carbocyclic or heterocyclic group or a fused aromatic ring. The composition can be sensitive to radiation having a maximum wavelength of from about 150 to about 1500 nm, and can be used to prepare negative-working imageable elements that be imaged and developed as lithographic printing plates.

Abstract: Backside conductive layers with increased conductive efficiency can be provided for thermally developable materials by formulating hydrophilic metal oxide clusters in a hydrophobic environment using low shear mixing conditions. The dry thickness and coating weight of the conductive layer are thereby reduced.

Abstract: A positive-working imageable element comprises inner and outer layers and an infrared radiation absorbing compound such as an IR absorbing dye. The inner layer includes a first polymeric material. The ink receptive outer layer includes a second polymeric binder comprising pendant carboxy groups that provides improved chemical resistance to the imageable element and reduced residue from development.

Abstract: A composition, method, and system for recording an image. The system includes a multiphase imaging material in which energy is absorbed by an antenna material. The absorbed energy causes the reaction of an activator and a color-forming material.

Abstract: Disclosed are a thermally transferable image protective sheet and a method for protective layer formation that can provide a protective layer which can protect an image of a record produced by a nonsilver photographic color hard copy recording method, can impart lightfastness and other properties to the record, and can realize a record having a glossy impression comparable to silver salt photographs. The thermally transferable image protective sheet comprises a support and a thermally transferable resin layer having a single-layer or multilayer structure stacked on the support so as to be separable from the support.