Abstract: A mask-image-taking-time calculating section 36 (i) sets a first imaging-time, in a first mask image, in accordance with X-ray imaging-conditions, and (ii) calculates a second imaging-time, in mask images from the second, for a mask image to be taken next in accordance with the imaging-time and brightness of the mask image taken previously such that average brightness of the mask image taken previously and a mask image to be taken next is target brightness. A live-image-taking-time calculating section 38 calculates an imaging-time for a live image in accordance with an actual imaging-time for the mask image having X-rays applied thereto from an X-ray irradiating device in accordance with the first or second imaging-time. An image processor 6 calculates a subtraction image by difference between a reference mask image obtained through averaging two or more mask images taken in accordance with the first or second imaging-time and the live image.

Abstract: A charged particle beam device is described. In one aspect, the charged particle beam device includes a charged particle beam source, and a switchable multi-aperture for generating two or more beam bundles from a charged particle beam which includes: two or more aperture openings, wherein each of the two or more aperture openings is provided for generating a corresponding beam bundle of the two or more beam bundles; a beam blanker arrangement configured for individually blanking the two or more beam bundles; and a stopping aperture for blocking beam bundles. The device further includes a control unit configured to control the individual blanking of the two or more beam bundles for switching of the switchable multi-aperture and an objective lens configured for focusing the two or more beam bundles on a specimen or wafer.

Abstract: A multi charged particle beam writing apparatus according to one aspect of the present invention includes a plurality of first blankers to respectively perform blanking deflection of a corresponding beam in multiple beams having passed through the plurality of openings of the aperture member, a plurality of second blankers to deflect a defective beam in the multiple beams having passed through the plurality of openings of the aperture member to be in a direction orthogonal to a deflection direction of the plurality of first blankers, a blanking aperture member to block each of beams which were deflected to be in a beam off state by at least one of the plurality of first blankers and the plurality of second blankers, and a detection processing unit to detect a defective beam in the multiple beams having passed through the plurality of openings of the aperture member.

Abstract: An extreme ultraviolet (EUV) radiation source pellet includes at least one metal particle embedded within a heavy noble gas cluster contained within a noble gas shell cluster. The EUV radiation source assembly can be activated by a sequential irradiation of at least one first laser pulse and at least one second laser pulse. Each first laser pulse generates plasma by detaching outer orbital electrons from the at least one metal particle and releasing the electrons into the heavy noble gas cluster. Each second laser pulse amplifies the plasma embedded in the heavy noble gas cluster triggering a laser-driven self-amplifying process. The amplified plasma induces inter-orbital electron transitions in heavy noble gas and other constitute atoms leading to emission of EUV radiation. The laser pulsing units can be combined with a source pellet generation unit to form an integrated EUV source system.

Abstract: Provided is a spatial focusing ion mobility tube, including an ionzation source, an ion gate, a grid mesh and a faraday disc. A focusing grid mesh parallel to the ion gate is provided at one side of the ion gate away from the ionization source, and the ion gate and the focusing grid mesh combine into a spatial focusing ion gate assembly which controls the flight of the ions. The mobility tube employs a traditional design and changes the ion gate portion to one or more spatial focusing ion gate assemblies. The spatial focusing assembly can realize the injection function of the ion gate and produce the spatial compression focusing of ions.

Abstract: A dual/beam FIB/SEM system and method for operating such a system are provided. A micrograph of a throat height view of a magnetic writer is obtained through iterative milling and repeated evaluation of the leading bevel angle or pole length. In some cases, the milling depth for a next iteration may be modified based on evaluation of the leading bevel angles of the current iteration.

Abstract: The device is configured from: a reflective surface shape controllable mirror in which a band-shaped X-ray reflective surface 2 is formed on a central portion of a front surface of a substrate 1, reference planes 3 are formed along both sides of the X-ray reflective surface, and a plurality of piezoelectric elements 4 are attached to at least one of front and back surfaces of the substrate so as to be arranged in the longitudinal direction of the X-ray reflective surface on both side portions of the substrate, and a multichannel control system for applying a voltage to each of the piezoelectric elements.

Abstract: A multi charged particle beam writing apparatus includes a divided shot data generation unit to generate, for each shot of multi beams of charged particle beams, data for plural times of divided shots such that irradiation for one shot of each beam is divided into plural times of divided shots each having a different irradiation time, an individual blanking system to provide blanking control individually for each of multi beams, based on the data for plural times of divided shots, an elastic rate correction value acquisition unit to acquire, for each of plural times of divided shots, an elastic rate correction value for correcting an elastic rate of an image of the whole multi beams, depending upon the number of ON-beams of the multi beams, and a lens to correct, for each divided shot, the elastic rate of the image of the whole multi beams by using the correction value.

Abstract: Embodiments of an ultraviolet (UV) curing system for treating a semiconductor substrate such as a wafer are disclosed. The curing system generally includes a processing chamber, a wafer support for holding a wafer in the chamber, a UV radiation source disposed above the chamber, and a UV transparent window interspersed between the radiation source and wafer support. In one embodiment, the wafer support is provided by a belt conveyor operable to transport wafers through the chamber during UV curing. In another embodiment, the UV radiation source is a movable lamp unit that travels across the top of the chamber for irradiating the wafer. In another embodiment, the UV transparent window includes a UV radiation modifier that reduces the intensity of UV radiation on portions of the wafer positioned below the modifier. Various embodiments enhance wafer curing uniformity by normalizing UV intensity levels on the wafer.

Abstract: One embodiment relates to a method of automated inspection of scattered hot spot areas on a manufactured substrate using an electron beam apparatus. A stage holding the substrate is moved along a swath path so as to move a field of view of the electron beam apparatus such that the moving field of view covers a target area on the substrate. Off-axis imaging of the hot spot areas within the moving field of view is performed. A number of hot spot areas within the moving field of view may be determined, and the speed of the stage movement may be adjusted based on the number of hot spot areas within the moving field of view. Another embodiment relates to an electron beam apparatus for inspecting scattered areas on a manufactured substrate. Other embodiments, aspects and features are also disclosed.

Abstract: A method of analyzing a biological sample, for example serum or other blood-based samples, using a MALDI-TOF mass spectrometer instrument is described. The method includes the steps of applying the sample to a sample spot on a MALDI-TOF sample plate and directing more than 20,000 laser shots to the sample at the sample spot and collecting mass-spectral data from the instrument. In some embodiments at least 100,000 laser shots and even 500,000 shots are directed onto the sample. It has been discovered that this approach, referred to as “deep-MALDI”, leads to a reduction in the noise level in the mass spectra and that a significant amount of additional spectral information can be obtained from the sample. Moreover, peaks visible at lower number of shots become better defined and allow for more reliable comparisons between samples.

Abstract: Electron microscope support structures and methods of making and using same. The support structures are generally constructed using semiconductor materials and semiconductor manufacturing processes. The temperature of the support structure may be controlled and/or gases or liquids may be confined in the observation region for reactions and/or imaging.

Abstract: Systems and methods are used to band-pass filter ions from a mass range. A full spectrum is received for a full scan of a mass range using a tandem mass spectrometer. A mass selection window of the full spectrum is selected and a set of tuning parameter values is selected. The tandem mass spectrometer is instructed to perform a scan of the mass selection window using the set of tuning parameter values. A spectrum is received for the scan from the tandem mass spectrometer. A band-pass filtered spectrum is created for the mass range that includes values from the spectrum for the mass selection window of the mass range. Systems and methods are also used to band-pass filter ions from two or more mass selection windows across the mass range and to filter out ions from a mass selection window between two band-pass mass selection windows.

Abstract: In continuous radiography, while a patient stands in front of an imaging support, a total image capture field is determined. The total image capture field is divided into small image capture fields. A map scaling section scales up or down a full spine irradiation area map in accordance with the size of the total image capture field. A map dividing section divides the scaled map into small maps corresponding to the small image capture fields. In each division exposure, a detection pixel selector selects one or more detection pixels belonging to an irradiation area defined by the small map, out of all detection pixels distributed in an imaging surface of an electronic cassette. If an integration value of a detection signal from the selected detection pixel reaches a threshold value, X-ray emission is stopped. Division X-ray images obtained by the division exposures are merged into a single continuous X-ray image.

Abstract: A single-chip scanning probe microscope is disclosed, wherein the microscope includes an isothermal two-dimensional scanner and a cantilever that includes an integrated strain sensor and a probe tip. The scanner is operative for scanning a probe tip about a scanning region on a sample while the sensor measures tip-sample interaction forces. The scanner, cantilever, probe tip, and integrated sensor can be fabricated using the backend processes of a conventional CMOS fabrication process. In addition, the small size of the microscope system, as well as its isothermal operation, enable arrays of scanning probe microscopes to be integrated on a single substrate.

Abstract: The invention relates to a computed tomography apparatus designed for dental use, which includes a first arm part supporting imaging means and arranged turnable by means of an actuator, and a second arm part supporting the first arm part and arranged turnable by means of an actuator. The actuators are arranged controllable such that, during the imaging process, said first arm part does not rotate but remains in its place in relation to said second arm part and said second arm part rotates about its rotation axis.

Abstract: Provided is a Schottky emitter having the conical end with a radius of curvature of 2.0 ?m on the emission side of an electron beam. Since a radius of curvature is 1 ?m or more, a focal length of an electron gun can be longer than in a conventional practice wherein a radius of curvature is in the range of from 0.5 ?m to not more than 0.6 ?m. The focal length was found to be roughly proportional to the radius of the curvature. Since the angular current intensity (the beam current per unit solid angle) is proportional to square of the electron gun focal length, the former can be improved by an order of magnitude within a practicable increase in the emitter radius. A higher angular current intensity means a larger beam current available from the electron gun and the invention enables the Schottky emitters to be used in applications which require relatively high beam current of microampere regime such as microfocus X-ray tube, electron probe micro-analyzer, and electron beam lithography system.

Abstract: A charged particle beam writing apparatus includes a shot division unit configured to divide a figure defined in layout data into a plurality of shot figures each having a size which can be irradiated by one shot of a charged particle beam, a shot data generating unit configured to generate each shot data for each shot figure of the plurality of shot figures, where a number of times of generating the each shot data equals a number of times of multiple writing of the each shot figure of the plurality of shot figures, such that multiplicity of the multiple writing is variable per the each shot figure, and a writing unit configured to perform the multiple writing of the each shot figure onto a target workpiece, in accordance with the number of times of the each shot data generated for the each shot figure, using a charged particle beam.

Abstract: A Time of Flight mass spectrometer is disclosed wherein a fifth order spatial focusing device is provided. The device which may comprise an additional stage in the source region of the Time of Flight mass analyzer is arranged to introduce a non-zero fifth order spatial focusing term so that the combined effect of first, third and fifth order spatial focusing terms results in a reduction in the spread of ion arrival times ?T of ions arriving at the ion detector.

Abstract: Disclosed are systems, devices and methodologies relating to an ion induced impact ionization detector and uses thereof. In certain implementations, the detector can include a dielectric layer having one or more wells. An anode layer defining apertures to accommodate the openings of the wells can be disposed on one side of the dielectric layer, and a cathode such as a solid resistive cathode can be disposed on the other side so as to provide an electric field in each of the wells. Various design parameters such as well dimensions and operating parameters such as pressure and high voltage are disclosed. In certain implementations, such an ion detector can be coupled to a low pressure gas volume to detect ionization products such as positive ions. Such a system can be configured to provide single ion counting capability. Various example applications where the ion detector can be implemented are also disclosed.