Abstract: Embodiments of the invention generally relate to methods of dry stripping boron-carbon films. In one embodiment, alternating plasmas of hydrogen and oxygen are used to remove a boron-carbon film. In another embodiment, co-flowed oxygen and hydrogen plasma is used to remove a boron-carbon containing film. A nitrous oxide plasma may be used in addition to or as an alternative to either of the above oxygen plasmas. In another embodiment, a plasma generated from water vapor is used to remove a boron-carbon film. The boron-carbon removal processes may also include an optional polymer removal process prior to removal of the boron-carbon films. The polymer removal process includes exposing the boron-carbon film to NF3 to remove from the surface of the boron-carbon film any carbon-based polymers generated during a substrate etching process.

Abstract: A substrate processing method includes a replacement step of replacing a rinse liquid adhered to the front surface of a substrate with a low surface tension liquid whose surface tension is lower than that of the rinse liquid, where the replacement step includes a low surface tension liquid supply step of supplying the low surface tension liquid to the front surface while supplying a heating fluid to the rear surface on a side opposite to the front surface and a post-heating step of supplying the heating fluid to the rear surface on the side opposite to the front surface of the substrate, in a state in which the supply of the low surface tension liquid to the front surface is stopped, before the start of a spin dry step after the completion of the low surface tension liquid supply step.

Abstract: Disclosed herein are embodiments of a cleaning apparatus having an adjustable exposed surface area, the cleaning apparatus including: a flexible body with a predetermined flexible body area, the flexible body having a flexible body collapsible portion; and a panel with a predetermined panel area which is lesser than the predetermined flexible body area, the panel coupled to the flexible body to form a receptacle sized to receive the flexible body collapsible portion when the flexible body collapsible portion disposes in a collapsed condition; wherein the cleaning apparatus is adjustable between a first configuration, in which the cleaning apparatus has a lesser exposed surface area, and a second configuration, in which the cleaning apparatus has a greater exposed surface area; and wherein the first configuration is generated by removably inserting the flexible body collapsible portion disposed in the collapsed condition into the receptacle.

Abstract: Embodiments of the present disclosure generally relate to a methods and apparatuses for cleaning exhaust systems, such as exhaust systems used with process chambers for the formation of epitaxial silicon. The exhaust system includes a remote plasma source for supplying ionized gas through the exhaust system, and one or more temperature sensors positioned downstream of the remote plasma source.

Abstract: A method of controlling rotating side brushes of a robotic cleaning device and a robotic cleaning device performing the method. The robotic cleaning device has a main body, a propulsion system arranged to move the robotic cleaning device across a surface to be cleaned, and a controller arranged to control the propulsion system to move the robotic cleaning device across the surface to be cleaned in accordance with navigation information. The robotic cleaning device has an opening arranged in a bottom side of the main body via which debris is removed from the surface to be cleaned, and at least one rotating side brush adjacent to the opening. The controller registers a speed with which the robotic cleaning device moves across the surface to be cleaned, and controls a rotational speed of the rotating side brush on the basis of the registered speed of movement of the robotic cleaning device.

Abstract: The present invention relates to an apparatus designed to control the application of the previously uncontrollable reaction of a peroxide composition and an alkaline composition, and accurately maintain the desired composition ratios for removal of and destruction of microbiological and organic contamination on a surface safely and without waste of the materials. The apparatus may also be used to maintain the highest demulsifying and antimicrobial activity of an organic acid composition blended with a peroxide composition by limiting contact time and the level of degradation of the components of the organic acid composition. A method of using the apparatus is provided for removing biofilm, bacteria, fungal cells, spores, fragments, and hyphae, microbiological slime, and organic contaminants from porous and non-porous surfaces, maintaining the integrity and life expectancy of the substrates, and increasing their resistance to new biofilm formation and microbiological deposition.

Abstract: The substrate drying apparatus includes a rinse agent nozzle configured to eject a rinse agent to the substrate while moving away from a center of the substrate relative to the substrate, a drying gas nozzle configured to spout a drying gas to the substrate while moving away from the center of substrate relative to the substrate with movement of the rinse agent nozzle, a liquid area sensor and a dried area sensor configured to sense a surface of the substrate around an interface of the rinse agent by moving away from the center of the substrate with movement of the rinse agent nozzle and the drying gas nozzle, and a control unit configured to control a drying condition based on the sensing results of the liquid area sensor and the dried area sensor.

Abstract: The device is for cleaning the inner surface of a pipe. The device has a spindle arranged to be rotated and having a front end and a rear end between which a plurality of elastic metal blades are attached both in the rotation direction of the spindle and in the direction perpendicular to the rotation direction to clean the inner surface of the pipe. The blades has a shape that is curved at at least two points such that they curve at least once towards the circumferential direction of the spindle and at least once outwards from the circumferential direction of the spindle to prevent the device from getting stuck in uneven pipe systems.

Abstract: A method for cleaning a machine for liquid or semi-liquid products, the machine includes: a first container intended to contain a liquid or semi-liquid basic mixture or finished product and also provided with related means for thermal treatment of the liquid or semi-liquid basic mixture or finished product and a mixer. The method includes, in time sequence, the following steps: a) emptying the basic mixture contained in the first container; b) washing said first container with a washing fluid; c) at least partly filling the first container with a cleaning fluid and subjecting the cleaning fluid in the first container to a pasteurizing thermal treatment.

Abstract: A tank apparatus and method for neutralizing or decontaminating valves which have been exposed to hydrofluoric acid or other contaminants wherein the valves are temporarily secured by valve holding structures provided on the interior walls of the tank so that the valves can be opened and at least partially disassembled while the valve holding structures retain the valves in the interior of the container below the fill level of a treatment fluid.

Abstract: An ultrasonic cleaning apparatus comprising: a tank for in use receiving a cleaning liquid and an item to be cleaned; a plurality of transducers arranged, when driven, to direct ultrasonic pressure waves into the tank; and a controller arranged in use to drive the transducers. First and second transducers from the plurality of transducers are arranged in use to direct ultrasonic pressure waves into an overlapping volume; and the controller is arranged in use to drive the first and second transducers to produce ultrasonic pressure waves at different frequencies from each other. The controller is arranged to in use produce first and second drive signals for the transducers using first and second frequency generators to each switch between primary and secondary operation, with the sequential switching taking place to cause different combinations of primary and secondary operation for the first and second frequency generators to occur over time.

Abstract: Provided are systems, methods, and apparatus for spraying water in a dishwasher. A dishwasher may include a wash chamber and at least one dish rack. The dishwasher may include a water inlet selectively connected to a dish spray device, which may connect a dish spray conduit with the wash chamber. The dish spray device may be oriented towards the at least one dish rack, such that the spray device may be configured to direct water onto the dishes for washing. The water inlet may be selectively connected to a fill device, which may connect the fill conduit with the wash chamber. The fill device may be configured to provide water to the circulation assembly without impinging the at least one dish rack. The one or more valves may selectively direct water from the water inlet to one or both of the dish spray device and the fill device.

Abstract: A process for the decoking of a hydrocarbon steam cracking furnace having a firebox, radiant coils, a transfer line exchanger, and an oil quench connection wherein liquid quench oil is injected to directly cool the steam-cracked effluent. Decoking feed comprising steam and air is supplied to the furnace under conditions sufficient to at least partially combust coke accumulated on the interior of the radiant coils, the transfer line exchanger, and the quench connection. Quench steam is supplied and injected into the decoking process effluent in an amount sufficient to cool the decoking process effluent below the metallurgical temperature limit of downstream piping. Also, a pyrolysis furnace for the production of ethylene is also provided.

Abstract: An apparatus for cleaning an instrument with a cleaning fluid includes a vessel defining a chamber and a port for at least partially filling the chamber with the fluid. The apparatus further includes an ultrasonic transducer for delivering ultrasonic energy to the fluid, and a vacuum pump for depressurizing the chamber. The apparatus further includes a rotatable device removably disposable in the chamber and having a rack defining a cavity for supporting the instrument. The rotatable device also has a fluid delivery member extending toward the cavity and having a fluid channel between an inlet and an outlet. The apparatus further includes a fluid transmission system in fluid communication with the chamber and the fluid channel of the fluid delivery member for circulating the fluid from the chamber through the fluid channel of the fluid delivery member. A method of cleaning an instrument is also provided.

Abstract: Provided among other things is a cleaning composition comprising: a carrier fluid; and Minute Fibrils suspended in the carrier fluid, wherein the composition is protein cleaning effective.

Abstract: A cup wash disk for cleaning a photoresist process tool is provided. An upper plate is arranged over a lower plate to define a cavity between the upper and lower plates. The lower plate comprises peripheral openings in fluid communication with the cavity and arranged along a periphery of the lower plate. A plurality of shims is arranged between the upper and lower plates to space the upper and lower plates and to define slits between the upper and lower plates. The slits are in fluid communication with the cavity. A method for cleaning the photoresist process tool using the cup wash disk is also provided.

Abstract: In some embodiments, an apparatus for cleaning a substrate is provided that includes (1) a substrate chuck configured to support a substrate with a front side of the substrate accessible; (2) a buff pad assembly configured to support a buff pad having a diameter smaller than a diameter of the substrate; and (3) a swing arm coupled to the buff pad and configured to position and rotate the buff pad along the front side of the substrate, and control an amount of force applied by the buff pad against the front side of the substrate during cleaning. The substrate chuck, buff pad assembly and swing arm are configured to buff clean the substrate. Numerous additional aspects are disclosed.

Abstract: A method of cleaning a clutch included in a drive train is disclosed in this paper. The method includes dispensing a cleaning agent, preferably a foamed cleaning agent, into the clutch. The clutch optionally includes clutch plates with evacuation channels formed in the clutch plates designed to carry cleaning agent and/or debris away from engagement surfaces of the clutch plates.

Abstract: A wash system for a gas turbine engine includes a foam generating device configured for receiving and aerating a flow of wash fluid to generate a flow of foamed wash fluid having particular foam characteristics. The flow of foamed wash fluid passes through a distribution manifold where it is selectively directed through a plurality of wash lines to desired portions of the gas turbine engine. The wash system further includes a controller configured for manipulating the foam characteristics of the flow of foamed wash fluid and using the distribution manifold to selectively direct the flow of foamed wash fluid to desired portions of the gas turbine engine for optimal cleaning and improved engine efficiency.

Abstract: At least one of COP and SOP treatments is performed by spraying a predetermined working fluid from spray nozzles (17a, 17b) within an aseptic chamber (9) accommodated with a filler (1) in a predetermined order, when such at least one of the COP and SOP treatments is performed, the predetermined working fluid is blasted toward externally of the filler (1) in the predetermined order while moving a movable spray nozzle (17b) opposing to the filler around the filler (1) from an outer periphery thereof, thus performing the filler cleaning operation. Accordingly, downtime at the drink filling working can be reduced.