Abstract: An automatically traveling floor cleaning appliance during travel is capable of traveling over low obstacles extending lengthwise, typically represented by a carpet border, having an upwardly inclined obstructing surface, with a direction of travel at a right or acute angle with respect to a longitudinal extent of the obstacle. The appliance also has an obstacle detector. The appliance is formed so that the obstacle or an area adjoining same may be cleaned using a procedure in which the appliance assumes a direction of travel based on the extent of the obstacle, and with regard to the obstructing surface includes traveling on a floor area in front of the obstacle, and at a lateral distance of an associated boundary edge of the appliance in the direction of travel from the obstructing surface which is smaller than that corresponding to a width of the appliance perpendicular to the direction of travel.

Abstract: An apparatus for hydrodemolishing the inside surfaces of an inclined pipe, particularly suited to contiguous pipe sections with access ports between the sections. The fluid supply hose is fed to the hydrodemolition rig inside the pipe from the same side as the winch that controls the movement of the rig. The rig is moved upstream in a scarifying pass, then downstream in a cleaning pass for each section and re-staged at each access port.

Abstract: Disclosed are a substrate treating apparatus and a method for inspecting a treatment liquid nozzle. The substrate treating apparatus includes a support member configured to support a substrate, a treatment liquid nozzle configured to discharge a treatment liquid to the substrate located on the support member, a light source configured to irradiate light to a point of the substrate, to which the treatment liquid is discharged, a camera configured to photograph the point of the substrate, to which the treatment liquid is discharged, and a controller configured to determine, through an image captured by the camera, whether a crown is generated when the treatment liquid collides with the substrate.

Abstract: Various embodiments comprise apparatuses for cleaning and drying a substrate and methods of operating the apparatuses. In one embodiment, an exemplary apparatus includes a vertical substrate holder to hold and rotate the substrate at various speeds. An inner shield and an outer shield, when in a closed position, surround the vertical substrate holder during operation of the apparatus. Each of the inner shield and the outer shield can operate independently in at least one of rotational speed and direction from the other shield. A front-side spray jet and a back-side spray jet are arranged to spray at least one fluid onto both sides of the substrate and edges of the substrate substantially concurrently. A gas flow, combined with a high rotational-speed of the shields and substrate, assist in drying the substrate. Additional apparatuses and methods of forming the apparatuses are disclosed.

Abstract: Embodiments relate to solid nano-particles applied to the surface of well equipment to treat bituminous material adhesion. An embodiment provides a method of treating the surface of well equipment. The method may comprise applying a solid nanoparticle film to the surface of the well equipment with a treatment fluid comprising solid nanoparticles. The method may further comprise allowing the solid nanoparticles to interact with the surface of the well equipment and/or bituminous materials adhered to the surface of the well equipment to remove at least a portion of the bituminous materials from the surface of the well equipment.

Abstract: The invention relates to a method of pre-cleaning a semiconductor structure and to associated modular semiconductor process tools. The method includes the steps of: (i) providing a semiconductor structure having an exposed dielectric layer of an organic dielectric material, wherein the dielectric layer has one or more features formed therein which expose one or more electrically conductive structures to be pre-cleaned, in which the electrically conductive structures each include a metal layer, optionally with a barrier layer formed thereon, and the surface area of the exposed dielectric layer is greater than the surface area of the electrically conductive structures exposed by the dielectric layer; and (ii) pre-cleaning the semiconductor structure by performing an Ar/H2 sputter etch to remove material from the exposed electrically conductive structures and to remove organic dielectric material from the exposed dielectric layer.

Abstract: A directed flow pressure washer system for precision cleaning of parts is disclosed. The system includes a plurality of inlets connected to an elongated pipe tubing at a proximal end thereof via an inlet tee fitting. The plurality of inlets are configured to receive at least a gas, a detergent or surfactant, and a solvent, intermittently or simultaneously therethrough. A gas source supplies gas connected to one of the plurality of inlets via a first tubing. A detergent or surfactant source supplies detergent or surfactant connected to one of the plurality of inlets via a second tubing. A solvent source supplies solvent connected to one of the plurality of inlets via a third tubing. A component retainer is removably attached to elongated pipe tubing at a distal end thereof. Elongated pipe tubing contains parts therein such that parts are exposed to a directed variable pressure and flow rate of gas, detergent or surfactant, and solvent.

Abstract: A method for cleaning a reticle includes rotating the reticle, providing a cleaning liquid to clean the reticle, detecting a static charge value on the reticle during rotating the reticle, and reducing static charges on the reticle in response to the detected static charge value. Hence, the electrostatic discharge (ESD) occurred to the reticle can be prevented.

Abstract: Methods of removing a film of a biological material from a surface are provided. In embodiments, such a method comprises applying magnetic particles to a surface contaminated with a film of a biological material; and exposing the magnetic particles to a changing magnetic field to move the magnetic particles relative to the contaminated surface, thereby removing the film from the surface.

Abstract: At least one of COP and SOP treatments is performed by spraying a predetermined working fluid from spray nozzles within an aseptic chamber accommodated with a filler in a predetermined order, when such at least one of the COP and SOP treatments is performed, the predetermined working fluid is blasted toward externally of the filler in the predetermined order while moving a movable spray nozzle opposing to the filler around the filler from an outer periphery thereof, thus performing the filler cleaning operation. Accordingly, downtime at the drink filling working can be reduced.

Abstract: A soil washing process includes mixing water and contaminated soil in a log washer, separating the soil and water mixture into a first stream of wet soil and a second stream of water and floating organic materials, dewatering the first stream of wet soil to form a cleaned soil stream, dewatering the second stream to separate out the organic materials and form a water stream, separating the water stream into a stream of non-colloidal particulates and a stream of colloid-containing water, dewatering the stream of non-colloidal particulates, and adding the stream of colloid-containing water to the soil and water mixture. The method may further include returning a first portion of the colloid-containing water to the log washer, and drawing off a second portion of the colloid-containing water to filter out the colloids before returning a clean water stream to the log washer.

Abstract: The present invention relates to an apparatus designed to control the application of the previously uncontrollable reaction of a peroxide composition and an alkaline composition, and accurately maintain the desired composition ratios for removal of and destruction of microbiological and organic contamination on a surface safely and without waste of the materials. The apparatus may also be used to maintain the highest demulsifying and antimicrobial activity of an organic acid composition blended with a peroxide composition by limiting contact time and the level of degradation of the components of the organic acid composition. A method of using the apparatus is provided for removing biofilm, bacteria, fungal cells, spores, fragments, and hyphae, microbiological slime, and organic contaminants from porous and non-porous surfaces, maintaining the integrity and life expectancy of the substrates, and increasing their resistance to new biofilm formation and microbiological deposition.

Abstract: In examples, systems and methods for using skewed waveforms to eject debris using electromagnetic propulsion are disclosed. The systems and methods include a first electronic device having a surface. The systems and methods also include a signal generator configured to generate a skewed signal configured to cause a movement of particles on the surface of the first electronic device. Additionally, the systems and methods include an antenna coupled to the signal generator, where the antenna is configured to receive the skewed signal from the signal generator and radiate the skewed signal as electromagnetic energy proximate to the surface of the first electronic device.

Abstract: Methods and apparatuses for the production of HF in an electron-beam generated plasma. A gas containing fluorine, hydrogen, and an inert gas such as argon, e.g., Ar/SF6/H2O or Ar/SF6/NH3 flows into a plasma treatment chamber to produce a low pressure gas in the chamber. An electron beam directed into the gas forms a plasma from the gas, with energy from the electron beam dissociating the F-containing molecules, which react with H-containing gas to produce HF in the plasma. Although the concentration of the gas phase HF in the plasma is a very small fraction of the total gas in the chamber, due to its highly reactive nature, the low concentration of HF produced by the method of the present invention is enough to modify the surfaces of materials, performing the same function as aqueous HF solutions to remove oxygen from an exposed material.

Abstract: A method of dust processing comprises measuring (PC1) a first amount of particles of a first size (e.g. PM10), and measuring (PC2) a second amount of particles of a second size (e.g. PM2.5) smaller than the first size. In accordance with the invention, it is determined (?) whether the first amount exceeds the second amount by a predefined threshold. If so, a robotic vacuum cleaner (RVC) may be prompted to start cleaning a room.

Abstract: A method and a cleaning device for cleaning tubes of tube bundles, wherein at least one rotating cleaning lance is used. During the insertion of the cleaning lance, the insertion depth E of the cleaning lance is measured and is stored and documented in a storage and documentation device. The cleaning device has an XY displacement device, on which a support rail is arranged, which supports a cleaning apparatus.

Abstract: A method for cleaning a substrate includes supplying to a substrate a film-forming processing liquid which includes a volatile component and forms a film on the substrate, vaporizing the volatile component in the film-forming processing liquid such that the film-forming processing liquid solidifies or cures on the substrate and forms a processing film on the substrate, supplying to the substrate having the processing film a strip-processing liquid which strips the processing film from the substrate, and supplying to the processing film formed on the substrate a dissolving-processing liquid which dissolves the processing film after the supplying of the strip-processing liquid.

Abstract: A method for cleaning and/or disinfecting a milk-carrying system of a coffee machine for producing coffee mix drinks, and a coffee machine for carrying out the method has the aim of allowing the entire milk-carrying system to be cleaned, completely and in a way that can be easily automated. The milk delivery line is separated from the milk container, for carrying out the cleaning Process, and is connected to a first container, and a second container is arranged under a milk outlet of a milk preparation device of the milk-carrying system. Fluid is then delivered to fluid inlet in order to convey the active cleaning and/or disinfecting substance through the milk delivery line and a milk outlet into the second container. Thereafter, water is conveyed to the air inlet and the fluid inlet is closed, in order thereby to flush the milk-carrying system.

Abstract: A substrate processing method includes a substrate holding step of holding a substrate by means of a substrate holder which holds the substrate horizontally with an interval upward from an upper surface of a base, a first processing liquid supplying step of supplying a first processing liquid to an upper surface of the substrate held by the substrate holder, a cleaning liquid supplying step of supplying a cleaning liquid so as to wash away the first processing liquid attached to the upper surface of the base, to the upper surface of the base such that the cleaning liquid on the base does not contact a lower surface of the substrate held by the substrate holder, and a removing step of removing the cleaning liquid from the upper surface of the base.

Abstract: Provided herein is a method performed by an appliance for washing and rinsing goods of detecting process water added to a sump of the appliance during interruption of operation of the appliance, upon recommence of appliance operation, and an appliance performing the method. The method may include detecting process water added to a sump of the appliance during interruption of operation of the appliance, upon recommence of appliance operation. The method may include increasing operating speed of a circulation pump of the appliance to a target speed, measuring an indication of circulation pump pressure or process water flow rate through the circulation pump, and determining that process water has been added to the sump of the appliance during the interruption in case the measured pressure or flow rate is maintained at a sufficient level after the speed of the circulation pump has reached the target speed.