Abstract: Disclosed are an apparatus and a method for treating a substrate. The substrate treating apparatus includes a flow rate measuring unit includes a container located outside the housing and having an accommodation space an upper side of which is opened and in which the treatment liquid discharged from the treatment liquid nozzle is accommodated, in the interior thereof, a measurement member configured to measure an amount of the treatment liquid accommodated in the accommodation space, and a drain line through which the treatment liquid in the container is discharged.

Abstract: Provided are methods and systems for cleaning various semiconductor substrate storage articles, in particular, FOUP doors. The FOUP doors and other similar articles often have openings that may get contaminated with cleaning liquids if not covered. The described cleaning system includes contact points for engaging the article and covering these openings. The contact points may be also used for supporting the article and for pressurizing the openings in the article with a gas. The gas may be supplied through one or more contact points. It prevents liquids from getting into the openings if even the openings are not completely sealed. The pressurization may be maintained through the entire wet portion of the cleaning process. The article may be rotated within the cleaning system while cleaning and/or other liquids or gases are dispensed through a set of spraying nozzles. Spraying nozzles may move to enhance cleaning of the article.

Abstract: A heatable element is configured to apply sufficient energy density to contaminants in an internal ambient atmosphere with in a sealable housing to drive a reaction that inactivates the contaminants.

Abstract: A portable cleaning device comprising a generally cylindrical container for receiving a fluid to a predetermined level and defining a container axis and having a bottom wall and a top opening at opposing axial ends along said container axis; a basket for supporting items to be cleaned and dimensioned to be removably receivable within said container, said basket defining a basket axis that is substantially coextensive with said container axis when said basket is received within said container and being configured to be rotatably supported for rotation on said bottom wall about said axes when received within said container; and spinning means for spinning said basket on said bottom wall about said axes when said basket is received within said container, whereby spinning said basket within said container on said bottom wall when immersed in fluid below said predetermined level creates turbulence and agitates the fluid in contact with the items to be cleaned to dislodge soil particles and contaminants from the it

Abstract: Some embodiments include methods of removing particles from over surfaces of semiconductor substrates. Liquid may be flowed across the surfaces and the particles. While the liquid is flowing, electrophoresis and/or electroosmosis may be utilized to enhance transport of the particles from the surfaces and into the liquid. In some embodiments, temperature, pH and/or ionic strength within the liquid may be altered to assist in the removal of the particles from over the surfaces of the substrates.

Abstract: A substrate treating method and a substrate treating apparatus which can reduce the collapse of a pattern on a substrate. The substrate treating method includes a supply step of supplying a process liquid including a sublimable substance in a molten state to a pattern-formed surface of a substrate; a solidification step of solidifying the process liquid on the pattern-formed surface so as to form a solidified body; a sublimation step of subliming the solidified body so as to remove the solidified body from the pattern-formed surface; and an organic substance removal step of removing, when the solidified body is sublimed, an organic substance precipitated on a sublimation interface, and the organic substance removal step is performed so as to overlap at least part of the sublimation step.

Abstract: An amine-free composition and process for cleaning post-chemical mechanical polishing (CMP) residue and contaminants from a microelectronic device having said residue and contaminants thereon. The compositions achieve highly efficacious cleaning of the post-CMP residue and contaminant material from the surface of the microelectronic device without compromising the low-k dielectric material, copper interconnect material, or cobalt-containing materials.

Abstract: A component for a vehicle wash system includes a rotatable stem portion and a backing member in communication with the rotatable stem portion. The backing member is configured to rotate with the stem portion about an axis of rotation defined by the centerline of the stem portion. A plurality of media elements are secured to the backing member with the plurality of media elements being constructed of a generally self-supporting, non-marring material and wherein the plurality of media elements are oriented generally perpendicular to the backing member. The plurality of media elements configured to rotate in a working plane defined by the backing member and the working plane is oriented generally perpendicularly to the axis of rotation. Additionally, the plurality of media elements are configured during a wash process to contact at least an exterior painted surface of a vehicle to effectuate cleaning thereof.

Abstract: A substrate cleaning method includes: sequentially loading each of a plurality of substrates, one substrate substantially immediately after a preceding substrate, into an input unit, in which adjacent substrates of the plurality of substrates are spaced apart from each other by a predetermined first interval; sequentially transferring each of the plurality of substrates in which adjacent substrates of the plurality of substrates are separated by a predetermined second interval that is greater than the predetermined first interval; cleaning each of the plurality of substrates in a cleaning unit; and aligning, in an output unit, adjacent substrates to be separated by the predetermined first interval.

Abstract: Methods and apparatus for removing a photoresist layer from a photomask substrate are provided. In one example, a method for removing a photoresist layer from a substrate in a chamber includes generating a first plasma including first radicals from a first gas mixture in a processing chamber, exposing a portion of a photoresist layer on a substrate to the first radicals to remove the portion of the photoresist layer from the substrate, generating a second plasma including second radicals from a second gas mixture, wherein the second radicals have a different composition than the first radicals, and exposing another portion of photoresist layer to the second radicals to remove the second portion of the photoresist layer.

Abstract: A system for controlling dust during hydraulic fracturing operations includes a manifold having a plurality of ports for capturing dust when negative air pressure is applied to the manifold. A support frame positions the manifold above a piece of hydraulic fracturing equipment receiving sand from a sand source.

Abstract: A cup wash disk for cleaning a photoresist process tool is provided. An upper plate is arranged over a lower plate to define a cavity between the upper and lower plates. The lower plate comprises peripheral openings in fluid communication with the cavity and arranged along a periphery of the lower plate. A plurality of shims is arranged between the upper and lower plates to space the upper and lower plates and to define slits between the upper and lower plates. The slits are in fluid communication with the cavity. A method for cleaning the photoresist process tool using the cup wash disk is also provided.

Abstract: Provided are systems, methods, and apparatus for spraying water in a dishwasher. A dishwasher may include a wash chamber and at least one dish rack. The dishwasher may include a water inlet selectively connected to a dish spray device, which may connect a dish spray conduit with the wash chamber. The dish spray device may be oriented towards the at least one dish rack, such that the spray device may be configured to direct water onto the dishes for washing. The water inlet may be selectively connected to a fill device, which may connect the fill conduit with the wash chamber. The fill device may be configured to provide water to the circulation assembly without impinging the at least one dish rack. The one or more valves may selectively direct water from the water inlet to one or both of the dish spray device and the fill device.

Abstract: A dishwasher and method for operating the same utilize a rack-mounted rotatable conduit with a return mechanism that positions the rotatable conduit to a predetermined rotational position when the conduit is disconnected from a docking arrangement on a wall of a wash tub.

Abstract: A system for processing water washable flexo photopolymer printing plates, the system comprises a washing line including one or more brushes and a surface essentially facing said brushes, and a guiding means adapted to guide a water washable photopolymer printing plate through the washing line by pulling it from a vicinity of a downstream edge thereof and automatically dragging such water washable photopolymer printing plate on said surface. Said brushes are adapted to contact onto a side of such water washable photopolymer printing plate in a washing direction from the downstream edge towards an upstream edge thereof. The system further comprises one or more attachments adapted to be annexed to the vicinity of the upstream edge of a water washable photopolymer printing plate, the attachments being further adapted to exert friction onto the surface, said friction being greater than that between such water washable photopolymer printing plate and said surface.

Abstract: A way of using narrowband irradiation to de-ice or release ice from a surface is provided. The methodology can be applied to a range of different types of de-icing from windshield de-icing to aircraft wing de-icing to releasing ice from the ice tray of an ice making machine. While there are many different specific applications, the concept and methodologies taught remain similar across all of them.

Abstract: A substrate processing apparatus includes a processing liquid supply mechanism 70 configured to supply a SPM liquid to a substrate; a temperature adjusting unit (heater) 303 configured to adjust a temperature of the SPM liquid at a time when the SPM liquid is supplied to the substrate from the processing liquid supply mechanism 70; an acquisition unit (temperature sensor) 80 configured to acquire temperature information of the SPM liquid on a surface of the substrate; and a control unit 18 configured to set an adjustment amount of the temperature adjusting unit (heater) 303 based on the temperature information of the SPM liquid acquired by the acquisition unit (temperature sensor) 80. The temperature adjusting unit (heater) 303 adjusts, based on the adjustment amount set by the control unit 18, the temperature of the SPM liquid at the time when the SPM liquid is supplied to the substrate.

Abstract: An apparatus and method for pre-cleaning or cleaning of objects such as medical, surgical and endoscope devices especially having lumens or channels are described of a sink for holding cleaning liquid. The PLC and software controls operators, doctors, patients and instruments through every step during the procedure which includes integrated leak test automatically, integrated channel rinsing, integrated camera, automatic brush control and endoscope layers with lift system.

Abstract: A method and to a cleaning device for cleaning tubes of tube bundles, wherein at least one rotating cleaning lance is used. During the insertion of the cleaning lance, the insertion depth E of the cleaning lance is measured and is stored and documented in a storage and documentation device. The cleaning device has an XY displacement device, on which a support rail is arranged, which supports a cleaning apparatus.

Abstract: An automatically traveling floor cleaning appliance during travel is capable of traveling over low obstacles extending lengthwise, typically represented by a carpet border, having an upwardly inclined obstructing surface, with a direction of travel at a right or acute angle with respect to a longitudinal extent of the obstacle. The appliance also has an obstacle detector. The appliance is formed so that the obstacle or an area adjoining same may be cleaned using a procedure in which the appliance assumes a direction of travel based on the extent of the obstacle, and with regard to the obstructing surface includes traveling on a floor area in front of the obstacle, and at a lateral distance of an associated boundary edge of the appliance in the direction of travel from the obstructing surface which is smaller than that corresponding to a width of the appliance perpendicular to the direction of travel.