Abstract: A cleaning system and process for cleaning a medical system comprising at least one air source at least one cleaning solution source at least one rinsing solution source and at least one switch for switching between the at least one air source, the at least one cleaning solution source, and said at least one rinsing solution source. The process is configured to selectively provide the cleaning solution from the cleaning solution source, selectively provide the rinsing solution source, and selectively providing the air pressure to purge the lines of a medical/dental system.

Abstract: A method for cleaning a substrate includes supplying to a substrate on which a resist layer is not formed a film-forming processing liquid which includes a volatile component and forms a film on the substrate, forming a processing film on the substrate by solidifying or curing the film-forming processing liquid supplied on the substrate, and supplying to the substrate having the processing film a strip-processing liquid which strips the processing film from the substrate.

Abstract: A cleaning method by which a cleaning apparatus including a first cleaner and a second cleaner cleans a detection element including a detection surface includes cleaning by the first cleaner the detection surface of the detection element by wind pressure, and wiping the detection surface of the detection element with the second cleaner in a contacted manner, wherein the cleaning by the first cleaner and the wiping by the second cleaner are performed in this order.

Abstract: A substrate cleaning apparatus includes a support inside a chamber to hold a substrate, a first supply source inside the chamber that includes a first nozzle along a first direction and facing an upper surface of the support, the first nozzle to spray polymer and solvent onto the substrate to form a coating, and a second nozzle at an oblique angle to the first direction and facing an edge of the support to inject a hot gas toward the coating to volatilize the solvent, a second supply source inside the chamber and having a third nozzle facing the upper surface of the support to inject a peeling treatment to the coating to peel the coating from the substrate, and a third supply source inside the chamber and facing a lower surface of the support to inject the hot gas to heat a second surface of the substrate.

Abstract: A cleaning station for an optical element is providing, including: an optical element holder configured to hold the optical element; a first drive configured to rotate the optical element holder around a rotation axis coinciding with an optical axis of the optical element when held by the optical element holder; a cleaning nozzle configured to project a cleaning jet of a cleaning liquid towards the optical element; and a separate drying nozzle configured to project a drying jet towards the optical element, the cleaning nozzle and the drying nozzle being configured to move in order to direct the cleaning jet and the drying jet, respectively, successively to different locations on the optical element.

Abstract: The present invention is a washing apparatus for induction suitable cookware and also involves the method of washing. The apparatus can be incorporated in restaurants, operated manually or incorporated in automatic cooking systems. The apparatus comprises of an induction heating unit, a replaceable water nozzle, a sink, an induction element, a ceramic glass, a pump, an electric motor, a controller, a manual HMI and a vision system.

Abstract: A device for cleaning the inside of a monocrystalline pulling apparatus includes a main tube unit to be inserted into a pull chamber and an inner surface cleaning mechanism that is provided at an upper part of the main tube unit and cleans the inner surface of the pull chamber. The main tube unit includes a retreat/housing section into which a seed chuck provided at the lower end of a wire retreats and which houses the seed chuck therein, and a continuous extension mechanism that is provided at the lower part of the main tube unit and to which a plurality of extension rods are capable of being added and joined. Accordingly, the inner surface of the pull chamber is efficiently cleaned.

Abstract: A substrate processing method includes a processing liquid film forming step of supplying a processing liquid, containing a sublimable substance, to a pattern forming surface of a substrate, to form a processing liquid film on the pattern forming surface, a temperature maintaining step of maintaining a temperature of the processing liquid film, formed on the pattern forming surface, in a temperature range not lower than a melting point of the sublimable substance and lower than a boiling point of the sublimable substance, a film thinning step of thinning the processing liquid film while the temperature of the processing liquid film is in the temperature range, a freezing step of making the processing liquid film, thinned by the film thinning step, freeze on the pattern forming surface after the temperature maintaining step to form a frozen body of the sublimable substance, and a sublimating step of sublimating the frozen body to remove the frozen body from the pattern forming surface.

Abstract: A method includes forming a film of a compound on an inner wall of a gas supply line by polymerization of a first compound and a second compound by controlling a temperature of the gas supply line to a first temperature at which the first compound and the second compound are polymerized in a state where a first gas containing the first compound and a second gas containing the second compound are supplied to the gas supply line, and removing the film by controlling the temperature of the gas supply line to a second temperature at which the film is depolymerized after predetermined processing is performed on a target object in a processing chamber by a processing gas supplied into the processing chamber through the gas supply line having the film. The first compound is isocyanate. The second compound is amine or a compound having a hydroxyl group.

Abstract: Processes and apparatuses for the treatment of semiconductor workpieces are provided. In some embodiments, a method can include placing the workpiece into a process chamber; vaporizing a solvent to create a vaporized solvent; introducing the vaporized solvent into the process chamber; and exposing the workpiece to the vaporized solvent.

Abstract: A method of remediating a media asset comprising a magnetic tape includes preliminarily cleaning the media asset, treating the media asset, and finally cleaning the media asset. Treating the media asset includes baking the media asset, determining whether adjacent layers of the tape are stuck to each other, and re-baking the media asset. If adjacent layers of the tape are stuck to each other, the method includes submerging the magnetic tape in a cleaning bath for a predetermined period of time, unwinding the magnetic tape from a supply reel to a take-up reel at an unwind speed while drying the magnetic tape, and rewinding the magnetic tape onto the supply reel at a rewind speed before re-baking the media asset.

Abstract: An in-line shell egg pasteurizer has a clean-in-place system. Empty shell egg carriers are placed in the water bath for multiple cleaning cycles. The cleaning solution level is lowered to expose the shell egg carriers and the top parts of the water bath walls. An air perturbation is used to agitate cleaning solution held in the bottom of the water bath and clean heating coils and other components located in the bottom of the water bath. Sprayers (e.g., nozzles, cleaning spray balls, etc. . . . ) mounted on a hood over the water bath clean the top parts of the water bath walls and the empty shell egg carriers placed in the water bath.

Abstract: The invention relates to a method of automatic dishwashing of dishware using wash water, in which, in a first step, a first composition, which comprises an oxygen bleach but substantially no enzyme, is supplied to the wash water, and the dishware is washed in a washing zone with the oxygen bleach-containing wash water; and, in a second step which occurs after the first step, a second composition, which comprises an enzyme but substantially no bleach, is supplied to the wash water, and the dishware is washed in said washing zone with the enzyme-containing wash water. The invention also relates to an automatic dishwasher and a cartridge suitable for use in this method.

Abstract: Methods for cleaning integrated circuit (IC) wafers after undergoing planarization processes (for example, chemical mechanical polishing processes) and associated cleaning units and/or planarization units are disclosed herein. An exemplary method includes configuring outlet areas of spray nozzles to deliver a cleaning solution to optimal locations of the IC wafer and delivering the cleaning solution via the spray nozzles having the configured outlet areas to the IC wafer. Each of the outlet areas is configured to achieve a particular velocity of the cleaning solution exiting the outlet area, such that the cleaning solution reaches a particular location of the IC wafer depending on the particular velocity. In some implementations, the cleaning solution enters inlet areas of the spray nozzles at the same flow rate and the cleaning solution exits the outlet areas of the spray nozzles at different velocities.

Abstract: A method for removing oxide materials from a crack of a metallic workpiece comprises: infiltrating an alkali solution into the crack in a pressurized atmosphere or an ultrasonic environment; applying an energy to the crack to react the oxide materials with the alkali solution and form a resultant material; and rinsing the resultant material with an acid solution to remove the resultant material from the crack. The method is easier to penetrate into the inside of the cracks, in particular suitable for cleaning narrow and deep cracks.

Abstract: A method for evaluating a silicon wafer, including: a pre surface defect measuring step for performing a surface defect measurement on the silicon wafer in advance, a cleaning step of alternately repeating on the silicon wafer an oxidation treatment by ozone water and an oxide film removal treatment by hydrofluoric acid under a condition of not completely removing an oxide film formed on a surface of the silicon wafer, and an incremental defect measuring step of performing a surface defect measurement on the silicon wafer after the cleaning step and measuring incremental defects that increased relative to defects measured in the pre surface defect measuring step, wherein the cleaning step and the incremental defect measuring step are alternately performed repeatedly multiple times and the silicon wafer is evaluated based on a measurement result of the incremental defects after each cleaning step.

Abstract: The invention relates to a cleaning apparatus (10) for functionally regenerating a brush (20) which can be used for washing a flexographic plate; in particular, the apparatus is configured to regenerate a brush (20) comprising a cylindrical core (5) about which a channel (4) supporting filaments (3) is fixed according to a spiral shape. The apparatus comprises a frame defining a rotation axis (100) for the brush and a motorized assembly, which can be operatively connected to an end of said cylindrical core (5) of the brush (20) to rotate it about the rotation axis (100). The apparatus (10) further comprises a cleaning unit (30) comprising a carriage (31), movable along a rectilinear guide (32) and a tool (33) provided with an end (33A) adapted to penetrate into the spaces defined between the turns of the spiral to detach the polymer and monomer residues hardened in said spaces as a result of the use of said brush for said washing.

Abstract: An apparatus for cleaning false lashes for includes a body having upper and lower supports, each including a plurality of apertures, that are movable relative to one another between open and closed positions, the open position providing access to an inner surface of the lower support, and the closed position substantially abuts the upper and lower supports against one other, and an arcuate locator on an inner surface of the lower support that positions a strip of a false lash such that strands of the false lash extend across at least one aperture. The false lash is secured between the upper and lower supports in the closed position. Running fluid through the apertures of the upper and lower supports allows the fluid to run through the strands of the false lash. A system and methods of cleaning false lashes is also disclosed.

Abstract: A system for controlling dust during hydraulic fracturing operations includes a manifold having a plurality of ports for capturing dust when negative air pressure is applied to the manifold. A support frame positions the manifold above a piece of hydraulic fracturing equipment receiving sand from a sand source.

Abstract: Vessels can be become fouled due to normal operation thereof, for example, during lignocellulosic biomass hydrolysis, and the vessel will become inoperable unless the fouling is removed from the vessel. Accordingly, methods are disclosed herein for removing fouling substances from the interior surfaces of fouled pressurized vessels. The methods utilize a brief rapid change of pressure in the vessel. In some embodiments, the rapid pressure change is a decrease, and the rapid pressure change causes, for example, increased velocity of the fluid flowing in the vessel, flashing of a portion of the fluid to vapor, and removal of the fouling substance adhered to the interior surface of the vessel.