Abstract: A sanitization system for an aircraft may comprise: a lighting system disposed in the aircraft cabin, the lighting system including a plurality of sanitization lights, the plurality of sanitization lights configured to emit UV-C radiation; an electrical port in electrical communication with the lighting system; an external power source disposed away from the aircraft; and an electrical cable coupled to the external power source, the electrical cable configured to removably couple to the electrical port to provide electrical power to the plurality of sanitization lights.

Abstract: Provided is a mass spectrometer including: an ion generation unit configured to provide an ion generation path; an ion selection unit configured to provide an ion selection path connected to the ion generation path; a reaction unit configured to provide a reaction path connected to the ion selection path; a second ion selection unit configured to provide a second ion selection path connected to the reaction path; and an ion detection unit coupled to the second ion selection unit. The ion selection path and the reaction path extend in a first direction, and the reaction unit includes: a reaction pipe extending in the first direction to define the reaction path; and a sample inflow pipe coupled to the reaction pipe. The sample inflow pipe provides a sample inflow path connected to the reaction path, and the sample inflow path includes an inclined path. The inclined path extends to form an acute angle (?) with respect to the first direction.

Abstract: A touchless skin sanitization system, device and method. The sanitizing device is configurable to sense an object and radiate the sensed object with UV light for a predetermined amount of time. A touchless switch activates the sanitizing device upon sensing the object, while a timer deactivates the sanitizing device after the predetermined amount of time. The sanitizing device provides an outer cover adapted to move between a closed condition and an open condition for maintenance. The outer cover is also adapted to mount the sanitizing device in a downward orientation relative to the UV radiating device.

Abstract: Disclosed herein is an apparatus comprising: a source of charged particles configured to emit a beam of charged particles along a primary beam axis of the apparatus; a condenser lens configured to cause the beam to concentrate around the primary beam axis; an aperture; a first multi-pole lens; a second multi-pole lens; wherein the first multi-pole lens is downstream with respect to the condenser lens and upstream with respect to the second multi-pole lens; wherein the second multi-pole lens is downstream with respect to the first multi-pole lens and upstream with respect to the aperture.

Abstract: A device for cleaning a target includes a housing including a base defining an inner circumference and a lid; a chamber within the housing having a top within the lid, a bottom within the base, and at least one UV reflective plate; at least one UV emitter attached to the housing and positioned to emit UV radiation into the chamber; and a support attached to the base and located in the chamber, the support configured for locating the target so that the UV radiation illuminates the target. The support may be formed of a plurality of ribs and/or a plurality of protrusions configured so that the target is supported thereon without falling onto the base. The at least one UV emitter may be upper and lower UV emitters, either or both of which may be one or more arrays.

Abstract: A system and method for defect inspection using voltage contrast in a charged particle system are provided. Some embodiments of the system and method include positioning the stage at a first position to enable a first beam of the plurality of beams to scan a first surface area of the wafer at a first time to generate a first image associated with the first surface area; positioning the stage at a second position to enable a second beam of the plurality of beams to scan the first surface area at a second time to generate a second image associated with the first surface area; and comparing the first image with the second image to enable detecting whether a defect is identified in the first surface area of the wafer.

Abstract: Apparatuses, systems, and methods for multi-modal operations of a multi-beam inspection system are disclosed. An apparatus for generating multi-modal beamlets may include an aperture array which includes a first group of apertures having a first size and a second group of apertures having a second size different from the first size, the second group of apertures adjoining the first group of apertures, in which the first group of apertures and the second group of apertures are in different pass-or-block statuses. A multi-beam apparatus of multi-modal inspection operations may include the aforementioned apparatus, a source configured to emit charged particles, a condenser system configured to set a projection area of the charged particles, and circuitry for controlling the first and second groups of apertures.

Abstract: Provided are a display module and an electronic device. The display module includes a display panel and a backlight module stacked with the display panel. The backlight module includes a light-emitting member, a light-guide member, and a back plate. The light-emitting member is configured to emit visible light. The light-guide member is disposed adjacent to the light-emitting member and configured to guide the visible light to the display panel. The back plate is configured to accommodate the light-emitting member and the light-guide member and defines a through-hole. The display module further includes a disinfection assembly. The disinfection assembly is at least partially accommodated in the through-hole or disposed at one side of the back plate away from the display panel, the disinfection assembly is configured to emit UV rays, the UV rays irradiate the display panel via the through-hole, and the disinfection assembly is detachably connected to the back plate.

Abstract: Provided herein are systems, devices, articles of manufacture, and methods for generating neutrons employing a high energy ion beam target (HEIB target) and a target backing configured to be in contact with the bottom surface of the HEIR target (e.g., to generate an ion beam target assembly). In certain embodiments, the HEIB target has a thickness that is less than the penetration depth of protons or deuterons in the high energy ion beam that strikes the target. In certain embodiments, the target backing comprises a high hydrogen diffusion metal (e.g., palladium), has open spaces dispersed throughout for reduced proton diffusion distances, and has a shape and thickness such that all, or virtually all, of the protons or deuterons that pass through the HEIR target are stopped. Also provided herein are systems, devices, and methods for changing targets in an ion beam accelerator system.

Abstract: Described are various embodiments of an ion beam delayering system and method, topographically enhanced sample produced thereby, and imaging methods and systems related thereto. In one embodiment, a method comprises: identifying at least two materials in an exposed surface of the sample and predetermined operational characteristics of an ion beam mill that correspond with a substantially different ion beam mill removal rate for at least one of the materials; operating the ion beam mill in accordance with the predetermined operational characteristics to simultaneously remove the materials and introduce or enhance a topography associated with the materials and surface features defined thereby; acquiring surface data; and repeating the operating and acquiring steps for at least one more layer.

Abstract: A UV irradiation apparatus for coating systems that coat rigid or film-like workpieces, in particular furniture parts, having a transport apparatus for transporting workpieces provided with coating material from an inlet to an outlet through the UV irradiation apparatus, a UV light source arranged above the transport apparatus that irradiates the coated workpieces with UV light in an irradiation region between the inlet and the outlet, and a reflector or cover which shields the UV light source upward. A housing covers the irradiation region and the UV light source, which generally extends above the transport apparatus. A sensor of a measuring apparatus for direct or indirect automated measurement of radiant flux of the UV light source is arranged in the housing, and the sensor is in particular fitted fixed or movably on the housing or a holder. A method for quality assurance using this UV irradiation apparatus is also provided.

Abstract: A radiation shield assembly is described, configured to block radiation emanating from a radiation source from reaching a user. Two shields are supported by a support arm, and are configured to rotate and translate relative to one another about the support arm's longitudinal axis. This allows the shield to be easily configured and reconfigured as necessary to visualize various parts of a patient's body via radiography.

Abstract: Even a radiation thermometer using a quantum infrared sensor appropriately measures the temperature of a substrate irradiated with a flash of light. A heat treatment apparatus includes a quantum infrared sensor configured to measure a temperature of the first substrate and a temperature of the second substrate. The heat treatment apparatus further includes a temperature correction unit configured to correct, using a correction coefficient calculated based on the reference temperature and the shift temperature, a temperature of the second substrate on which second heat treatment having irradiation with the flash of light is performed, the temperature being measured by the quantum infrared sensor.

Abstract: A method and apparatus detect the presence of the feet of a user and emits ultraviolet light (and generate ozone) towards the feet of the user when the presence of the feet (e.g., feet or shoes) are detected. To increase the life of ultraviolet emitters within the device, the ultraviolet emitters are continuously powered (when a power source is connected). The method and apparatus include louvers or shutters that move by way of an electromechanical device from a closed position to an open position upon detecting force from the weight of the user and move from the open position to the closed position upon detecting when the weight of the user abates.

Abstract: An observation method using a scanning transmission electron microscope for scanning an electron beam over a specimen and detecting electrons transmitted through the specimen includes: acquiring results of detecting the electrons transmitted through the specimen using a segmented detector having detection regions disposed in a bright-field area; and generating segmented images based on the results of detecting the electrons in the detection regions, and applying filters determined based on a signal-to-noise ratio to the segmented images to generate a reconstructed image. The signal-to-noise ratio is proportional to an absolute value of a total phase contrast transfer function normalized by a noise level, the total phase contrast transfer function being defined by product-sum operation of phase contrast transfer functions expressed by complex numbers and weight coefficients for the detection regions.

Abstract: A method of manufacturing a nozzle for a droplet generator for a laser-produced plasma radiation source is disclosed. The method comprises disposing a glass capillary in a throughbore of a metal fitting, heating the metal fitting; and applying a pressure to the glass capillary such that the glass capillary conforms to the shape of, and forms a direct glass-to-metal seal with, the throughbore. Also disclosed is a nozzle for a droplet generator for a laser-produced plasma radiation source, and the radiation source itself, wherein the nozzle comprises the glass capillary for emitting fuel as droplets and the metal fitting for coupling the glass capillary to a body of the droplet generator, the glass capillary being conformed to a shape of a throughbore of the metal fitting, and wherein the glass capillary forms a direct glass-to-metal seal with the throughbore.

Abstract: The invention generally relates to electrophoretic mass spectrometry probes and systems and methods of uses thereof. In certain aspects, the invention provides a mass spectrometry probe having a hollow body with a distal tip, an electrically conductive hollow conduit, and an electrode. The electrically conductive hollow conduit may be operably coupled to a reservoir and a power source, and the electrically conductive hollow conduit may be configured to transport a liquid sample into the hollow body and polarize the liquid sample as it flows through the electrically conductive hollow conduit and into in the hollow body. The electrode and the electrically conductive hollow conduit are disposed within the hollow body (e.g., at different heights within the hollow body).

Abstract: Provided is a compact ultraviolet irradiation device in which a degree of an adverse effect on the human body is suppressed. The ultraviolet irradiation device includes: a lamp house on the surface of which a light extraction surface is formed; an excimer lamp accommodated in the lamp house, a main emission wavelength of which belongs to a first wavelength band of 190-225 nm; an optical filter that is arranged on the light extraction surface and substantially transmits the ultraviolet light in the first wavelength band and substantially reflect the ultraviolet light of a wavelength of 240-300 nm; and a reflecting surface that is a surface located outside the luminous tube of the excimer lamp and inclined with respect to the light extraction surface, the reflecting surface exhibiting reflectivity with respect to the ultraviolet light in the first wavelength band.

Abstract: A UV irradiation apparatus for coating systems that coat rigid or film-like workpieces, in particular furniture parts, having a transport apparatus for transporting workpieces provided with coating material from an inlet to an outlet through the UV irradiation apparatus, a UV light source arranged above the transport apparatus that irradiates the coated workpieces with UV light in an irradiation region between the inlet and the outlet, and a reflector or cover which shields the UV light source upward. A housing covers the irradiation region and the UV light source, which generally extends above the transport apparatus. A sensor of a measuring apparatus for direct or indirect automated measurement of radiant flux of the UV light source is arranged in the housing, and the sensor is in particular fitted fixed or movably on the housing or a holder. A method for quality assurance using this UV irradiation apparatus is also provided.

Abstract: A charged particle beam device includes a plurality of detectors configured to detect one or more signal charged particle beams caused by irradiation on a sample with one or more primary charged particle beams, and a control system. The control system is configured to measure an intensity distribution of the one or more signal charged particle beams detected by the plurality of detectors, and correct the intensity distribution by using a correction function. The control system is configured to generate an image based on the corrected intensity distribution.