Abstract: Qubit devices require fast operation, long coherence, and large scalability to be viable for implementation in quantum computing systems. A qubit platform device having long coherence, scalability, and fast operation includes a substrate, or trap region, configured to structurally support solid neon thereon. A trap electrode is configured to provide a trap voltage to the trap region and which creates a confining electrical field to a confining region adjacent to the trap region. The confining region being a region of space to confine an electron therein, confining the electron against the solid neon. First and second sets of guard electrodes are configured to provide variable electric potentials to first and second guard regions to allow for trapping and manipulation of a single electron in the confining region.

Abstract: In one embodiment, a charged particle beam writing method includes transferring a substrate to a writing chamber of a charged particle beam writing apparatus by use of a transfer mechanism while maintaining each of the writing chamber and the transfer mechanism at a predetermined temperature, calculating correction amounts for charged particle beams based on correction data for charged particle beam irradiation positions each associated with a previously obtained elapsed time from a predetermined starting point in time of transfer of the substrate and the elapsed time at a point in time of irradiation with each of the charged particle beams, and applying the charged particle beams to positions corrected based on the calculated correction amounts for the charged particle beams to write a pattern on the substrate.

Abstract: A curing apparatus (100) includes a housing (102) having a loading portion (108) open to ambient atmosphere, a curing portion (110) having a curing chamber (124) with a controlled atmosphere, and a transition portion (112) extending between the loading portion (108) and the curing portion (110). A carrier (128) is movable between the loading portion (108) and the curing chamber (124) via the transition portion (112). The curing apparatus (100) further includes at least one ultraviolet radiation source (150) operative for transmitting ultraviolet radiation into the curing chamber (124). The transition portion (112) includes a plurality of baffles (158) protruding from a sidewall (120) of the transition portion (112) and configured for minimizing mixing between the ambient atmosphere and the controlled atmosphere during movement of the carrier (128) between the loading portion (108) and the curing chamber (124).

Abstract: The present invention relates to assemblies and method for obtaining a container comprising 212Pb on the walls obtained from a 212Pb precursor isotope source. The invention provides an improved system and method for producing 212Pb in high purity without the need for processing, with high yields, and which safely and efficiently can be transported to the locations where it is to be used.

Abstract: An example particle therapy system includes a gantry having a beamline structure configured to direct a particle beam that is monoenergetic from an output of a particle accelerator towards an irradiation target, where the beamline structure includes magnetic bending elements to bend the particle beam along a length of the beamline structure; and an energy degrader downstream of the beamline structure relative to the particle accelerator, where the energy degrader is configured and controllable to change an energy of the particle beam prior to at least part of the particle beam reaching the irradiation target.

Abstract: In an effective temperature calculation method for multi-charged particle beam writing region, at a plurality of observation times which are irradiation end times of a tracking cycle in a time domain in which a beam array region passes through a mesh region of interest, for each of the plurality of unit heat source regions around the mesh region of interest, a temperature rise amount given to the mesh region of interest is determined based on a total irradiation time of the unit heat source region, times since start of irradiation to the unit heat source region to the observation times, and a distance from the unit heat source region to the mesh region of interest, the temperature rise amount is accumulated, and accumulated values corresponding to the plurality of observation times are averaged to calculate an effective temperature of the mesh region of the interest.

Abstract: Light disinfecting systems are provided in which light emanating from an end or side of optical fibers is used to disinfect a target site. According to one implementation a light beam emanating from an end emitting optical fiber is directed into a body that includes a plurality of optical surfaces that are configured to direct at least a portion of the end emitted beam of bacterial disinfecting light to the target site. The assembly may further include a substrate coupled to the body, the substrate including one or more channels in which reside one or more radially emitting optical fibers that are configured to radially emit bacterial disinfecting light towards the target site, the substrate being at least partially transparent to the bacterial disinfecting light.

Abstract: In various embodiments, a system comprising an atomic object confinement apparatus and one or more signal manipulation elements is provided. Each signal manipulation element (a) is associated with a respective atomic object position of the atomic object confinement apparatus and (b) is one of a collection array or an action array. A collection array is configured to, responsive to an emitted signal emitted by an atomic object at the respective atomic object position being incident on the collection array, provide an induced collection signal to a respective collection position. An action array is configured to, responsive to an incoming signal being incident on the action array, provide an induced action signal to the respective atomic object position. The one or more signal manipulation elements comprise metamaterial arrays and/or diffractive optical elements.

Abstract: A method of reducing aberration comprises separating charged particles of a beam based on energy of the charged particles to form beamlets, each of the beamlets configured to include charged particles at a central energy level; and deflecting the beamlets so that beamlets having different central energy levels are deflected differently. An aberration corrector comprises a dispersive element configured to cause constituent parts of a beam (e.g. a charged particle beam) to spread apart based on energy; an aperture array configured to form beamlets from the spread apart beam; and a deflector array configured to deflect the beamlets differently based on central energy levels of particles that form the beamlets.

Abstract: A sanitization system for an aircraft may comprise: a lighting system disposed in the aircraft cabin, the lighting system including a plurality of sanitization lights, the plurality of sanitization lights configured to emit UV-C radiation; an electrical port in electrical communication with the lighting system; an external power source disposed away from the aircraft; and an electrical cable coupled to the external power source, the electrical cable configured to removably couple to the electrical port to provide electrical power to the plurality of sanitization lights.

Abstract: Provided is a mass spectrometer including: an ion generation unit configured to provide an ion generation path; an ion selection unit configured to provide an ion selection path connected to the ion generation path; a reaction unit configured to provide a reaction path connected to the ion selection path; a second ion selection unit configured to provide a second ion selection path connected to the reaction path; and an ion detection unit coupled to the second ion selection unit. The ion selection path and the reaction path extend in a first direction, and the reaction unit includes: a reaction pipe extending in the first direction to define the reaction path; and a sample inflow pipe coupled to the reaction pipe. The sample inflow pipe provides a sample inflow path connected to the reaction path, and the sample inflow path includes an inclined path. The inclined path extends to form an acute angle (?) with respect to the first direction.

Abstract: A touchless skin sanitization system, device and method. The sanitizing device is configurable to sense an object and radiate the sensed object with UV light for a predetermined amount of time. A touchless switch activates the sanitizing device upon sensing the object, while a timer deactivates the sanitizing device after the predetermined amount of time. The sanitizing device provides an outer cover adapted to move between a closed condition and an open condition for maintenance. The outer cover is also adapted to mount the sanitizing device in a downward orientation relative to the UV radiating device.

Abstract: A device for cleaning a target includes a housing including a base defining an inner circumference and a lid; a chamber within the housing having a top within the lid, a bottom within the base, and at least one UV reflective plate; at least one UV emitter attached to the housing and positioned to emit UV radiation into the chamber; and a support attached to the base and located in the chamber, the support configured for locating the target so that the UV radiation illuminates the target. The support may be formed of a plurality of ribs and/or a plurality of protrusions configured so that the target is supported thereon without falling onto the base. The at least one UV emitter may be upper and lower UV emitters, either or both of which may be one or more arrays.

Abstract: Disclosed herein is an apparatus comprising: a source of charged particles configured to emit a beam of charged particles along a primary beam axis of the apparatus; a condenser lens configured to cause the beam to concentrate around the primary beam axis; an aperture; a first multi-pole lens; a second multi-pole lens; wherein the first multi-pole lens is downstream with respect to the condenser lens and upstream with respect to the second multi-pole lens; wherein the second multi-pole lens is downstream with respect to the first multi-pole lens and upstream with respect to the aperture.

Abstract: A system and method for defect inspection using voltage contrast in a charged particle system are provided. Some embodiments of the system and method include positioning the stage at a first position to enable a first beam of the plurality of beams to scan a first surface area of the wafer at a first time to generate a first image associated with the first surface area; positioning the stage at a second position to enable a second beam of the plurality of beams to scan the first surface area at a second time to generate a second image associated with the first surface area; and comparing the first image with the second image to enable detecting whether a defect is identified in the first surface area of the wafer.

Abstract: Apparatuses, systems, and methods for multi-modal operations of a multi-beam inspection system are disclosed. An apparatus for generating multi-modal beamlets may include an aperture array which includes a first group of apertures having a first size and a second group of apertures having a second size different from the first size, the second group of apertures adjoining the first group of apertures, in which the first group of apertures and the second group of apertures are in different pass-or-block statuses. A multi-beam apparatus of multi-modal inspection operations may include the aforementioned apparatus, a source configured to emit charged particles, a condenser system configured to set a projection area of the charged particles, and circuitry for controlling the first and second groups of apertures.

Abstract: Provided are a display module and an electronic device. The display module includes a display panel and a backlight module stacked with the display panel. The backlight module includes a light-emitting member, a light-guide member, and a back plate. The light-emitting member is configured to emit visible light. The light-guide member is disposed adjacent to the light-emitting member and configured to guide the visible light to the display panel. The back plate is configured to accommodate the light-emitting member and the light-guide member and defines a through-hole. The display module further includes a disinfection assembly. The disinfection assembly is at least partially accommodated in the through-hole or disposed at one side of the back plate away from the display panel, the disinfection assembly is configured to emit UV rays, the UV rays irradiate the display panel via the through-hole, and the disinfection assembly is detachably connected to the back plate.

Abstract: Provided herein are systems, devices, articles of manufacture, and methods for generating neutrons employing a high energy ion beam target (HEIB target) and a target backing configured to be in contact with the bottom surface of the HEIR target (e.g., to generate an ion beam target assembly). In certain embodiments, the HEIB target has a thickness that is less than the penetration depth of protons or deuterons in the high energy ion beam that strikes the target. In certain embodiments, the target backing comprises a high hydrogen diffusion metal (e.g., palladium), has open spaces dispersed throughout for reduced proton diffusion distances, and has a shape and thickness such that all, or virtually all, of the protons or deuterons that pass through the HEIR target are stopped. Also provided herein are systems, devices, and methods for changing targets in an ion beam accelerator system.

Abstract: Described are various embodiments of an ion beam delayering system and method, topographically enhanced sample produced thereby, and imaging methods and systems related thereto. In one embodiment, a method comprises: identifying at least two materials in an exposed surface of the sample and predetermined operational characteristics of an ion beam mill that correspond with a substantially different ion beam mill removal rate for at least one of the materials; operating the ion beam mill in accordance with the predetermined operational characteristics to simultaneously remove the materials and introduce or enhance a topography associated with the materials and surface features defined thereby; acquiring surface data; and repeating the operating and acquiring steps for at least one more layer.

Abstract: A UV irradiation apparatus for coating systems that coat rigid or film-like workpieces, in particular furniture parts, having a transport apparatus for transporting workpieces provided with coating material from an inlet to an outlet through the UV irradiation apparatus, a UV light source arranged above the transport apparatus that irradiates the coated workpieces with UV light in an irradiation region between the inlet and the outlet, and a reflector or cover which shields the UV light source upward. A housing covers the irradiation region and the UV light source, which generally extends above the transport apparatus. A sensor of a measuring apparatus for direct or indirect automated measurement of radiant flux of the UV light source is arranged in the housing, and the sensor is in particular fitted fixed or movably on the housing or a holder. A method for quality assurance using this UV irradiation apparatus is also provided.