Patents Examined by Sean M Luck
  • Patent number: 11749515
    Abstract: An apparatus for particle collection is provided. The apparatus includes a magnetic element configured to generate a tapered magnetic ion transport tunnel that collects particles from a local environment, a detector configured to perform one or more measurements of the collected particles, and ion optics configured to transport the collected particles to the detector.
    Type: Grant
    Filed: November 4, 2020
    Date of Patent: September 5, 2023
    Assignee: Northrop Grumman Systems Corporation
    Inventors: Vivian W. Ryan, Sameh S. Wanis, Carl B. Freidhoff, Clinton Ung
  • Patent number: 11749488
    Abstract: Aspects of the present disclosure describe an atomic oven including a cathode, an anode that comprises a source material, and a power supply that provides a voltage between the cathode and the anode, wherein applying the voltage causes multiple electrons from the cathode to ablate the source material from the anode or locally heat the anode to cause source material to evaporate from the anode and, in both case, to produce a stream of ablated or evaporated particles that passes through an opening in the cathode.
    Type: Grant
    Filed: February 5, 2021
    Date of Patent: September 5, 2023
    Assignee: IONQ, INC.
    Inventors: Kai Hudek, Jason Madjdi Amini
  • Patent number: 11744914
    Abstract: A novel purification device is provided which projects Ultra-Violet wavelength light to create curtain-like beams that impair germs and pathogens exposed thereto or passing through the beams. A preferred embodiment described herein is comprised of a powered Light Emitting Diode to produce light, mounted edgelight-fashion onto an optically clear substrate light guide that has clear remote outer edges for light projection. Substrate utilized herein is an optically clear sheet such as acrylic that guides the edge-mounted L.E.D. produced Ultra-Violet wavelength light to its remote edges, projecting it outwardly through surrounding air and onto surfaces in light beams emitting from edges of the substrate, projected in suitable strength and wavelength UV-C to create a curtain-like partition, a barrier deadly to airborne or surface germs, and renders germs exposed to the light dead, damaged or inert.
    Type: Grant
    Filed: June 30, 2021
    Date of Patent: September 5, 2023
    Inventor: John R. Wyss
  • Patent number: 11749500
    Abstract: A system and method for controlling an amount of outgassing caused by implanting ions into a photoresist disposed on a workpiece. The amount of outgassing is based on the species being implanted, the type of photoresist, the energy of the implant, and the amount of dose that has already been implanted, among other effects. By controlling the effective beam current, the amount of outgassing may be maintained below a predetermined threshold. By developing and utilizing the relationship between effective beam current, dose completed and rate of outgassing, the effective beam current may be controlled more precisely to implant the workpiece in the most efficient manner while remaining below the predetermined outgassing threshold.
    Type: Grant
    Filed: January 24, 2022
    Date of Patent: September 5, 2023
    Assignee: Applied Materials, Inc.
    Inventors: Nevin Clay, David Roger Timberlake, Christopher W. Campbell
  • Patent number: 11740546
    Abstract: In one embodiment, a multi charged particle beam writing apparatus includes an objective lens adjusting focus positions of multiple beams, an astigmatism correction element correcting astigmatism of the multiple beams, an inspection aperture allowing one of the multiple beams to pass therethrough, a deflector deflecting the multiple beams and causing the multiple beams to scan over the inspection aperture, a current detector detecting beam currents of the individual multiple beams after passing through the inspection aperture, a beam image formation unit forming a beam image based on the detected beam currents, a feature amount calculation unit generating a first waveform and a second waveform by adding brightnesses of the beam image in a first direction and in a second direction, and calculating a first and a second feature amounts from the first and the second waveforms, and a parameter calculation unit calculating an exciting parameter that is to be set for the astigmatism correction element based on the f
    Type: Grant
    Filed: March 7, 2022
    Date of Patent: August 29, 2023
    Assignee: NuFlare Technology, Inc.
    Inventors: Tsubasa Nanao, Hiroshi Matsumoto
  • Patent number: 11742178
    Abstract: The invention provides an ion milling device capable of cross-sectional milling on an all-solid-state battery while reducing an occurrence of a short circuit due to a redeposition film.
    Type: Grant
    Filed: August 23, 2019
    Date of Patent: August 29, 2023
    Assignee: Hitachi High-Tech Corporation
    Inventors: Hitoshi Kamoshida, Hisayuki Takasu, Atsushi Kamino, Shota Aida, Megumi Nakamura
  • Patent number: 11738979
    Abstract: An arrangement for disinfecting can lids (32) and for closing cans includes a feed device (12) which feeds a can closing unit (24). Receiving portions (30) for individual can lids (32) are arranged in the feed device (12). The feed device (12) is situated in the feed region of the can closing unit (24). At least one sterilization device (18, 20), for can lids (32) received individually in the feed device (12), is arranged in a conveying region of the feed device.
    Type: Grant
    Filed: September 13, 2021
    Date of Patent: August 29, 2023
    Assignees: KHS GmbH, Claranor SA
    Inventors: Christophe Riedel, Ludwig Cluesserath
  • Patent number: 11735404
    Abstract: The invention relates to a method, a device and a system for the treatment of biological frozen samples using plasma focused ion beams (FIB). The samples can then be used for mass spectrometry (MS), genomics, such as gene sequencing analysis or next generation sequencing (NGS) analysis, and proteomics. The present invention particularly relates to a method of treatment of at least one biological sample. This method is particularly used for high performance microscopy, proteomics analytics, sequencing, such as NGS etc. According to the present invention the method comprises the steps of providing at least one biological sample in frozen form. The milling treats at least one part of the sample by a plasma ion beam comprising at least one of an O+ and/or a Xe+ plasma.
    Type: Grant
    Filed: September 10, 2020
    Date of Patent: August 22, 2023
    Assignee: FEI Company
    Inventors: Alex De Marco, Sergey Gorelick, Chad Rue, Joseph Christian, Kenny Mani, Steven Randolph, Matthias Langhorst
  • Patent number: 11728132
    Abstract: An ion implanter includes a beam generation device that generates an ion beam with which a workpiece is irradiated, a control device that sets a plurality of operation parameters for controlling an operation of the beam generation device, a measurement device that measures at least one of beam characteristics of the ion beam, a storage device that accumulates data sets in each of which a set of set values of the plurality of operation parameters and a measurement value of the at least one of the beam characteristics of the ion beam are associated with each other, and an analysis device that generates a function for estimating the at least one of the beam characteristics from a set value of at least one of specific parameters included in the plurality of operation parameters, based on a plurality of the data sets accumulated in the storage device.
    Type: Grant
    Filed: February 8, 2022
    Date of Patent: August 15, 2023
    Assignee: SUMITOMO HEAVY INDUSTRIES ION TECHNOLOGY CO., LTD.
    Inventors: Mikio Yamaguchi, Kazuhisa Ishibashi, Tetsuya Kudo
  • Patent number: 11721520
    Abstract: A semiconductor device according to an embodiment includes: a substrate including a plurality of through holes provided at predetermined intervals along a first direction in a substrate surface and along a second direction intersecting the first direction in the substrate surface; an insulating layer provided on the substrate, the insulating layer being penetrated by the through holes; a plurality of first electrodes provided on the insulating layer, the first electrodes being adjacent to the respective through holes in the first direction; a plurality of second electrodes provided on the insulating layer, the second electrodes being adjacent to the respective through holes in the first direction, the second electrodes being provided to face the first electrodes, the second electrodes being held at a predetermined potential; and a wiring layer provided on the insulating layer, the wiring layer electrically connecting the adjacent second electrodes.
    Type: Grant
    Filed: January 21, 2022
    Date of Patent: August 8, 2023
    Assignee: NuFlare Technology, Inc.
    Inventors: Kei Obara, Kazuyuki Higashi, Miyoko Shimada, Yoshiaki Shimooka, Hitomi Yamaguchi, Yoshikuni Goshima, Hirofumi Morita, Hiroshi Matsumoto
  • Patent number: 11707544
    Abstract: A sanitizing device is disclosed that has a channel extending through the device. The sanitizing device has a coupler for attaching it to a sewer cleaning machine for running its cable and/or cover tube through the channel. A set of ultraviolet LEDs illuminate the channel and disinfect the cable or cover tube running through the sanitizing device. Also, a system including a power transmission device and the sanitizing device is disclosed.
    Type: Grant
    Filed: March 30, 2021
    Date of Patent: July 25, 2023
    Assignee: Picote Solutions Oy Ltd.
    Inventors: Keijo Fyrstén, Ville Hukkanen
  • Patent number: 11705317
    Abstract: A method of mass spectrometry is disclosed comprising: a) providing temporally separated precursor ions; b) mass analyzing separated precursor ions, and/or product ions derived therefrom, during a plurality of sequential acquisition periods, wherein the value of an operational parameter of the spectrometer is varied during the different acquisition periods; c) storing the spectral data obtained in each acquisition period along with its respective value of the operational parameter; d) interrogating the stored spectral data and determining which of the spectral data for a precursor ion or product ions meets a predetermined criterion, and determining the value of the operational parameter that provides this mass spectral data as a target operational parameter value; and e) mass analyzing again the precursor or product ions whilst the operational parameter is set to the target operational parameter value.
    Type: Grant
    Filed: November 5, 2021
    Date of Patent: July 18, 2023
    Assignee: Micromass UK Limited
    Inventors: Martin Raymond Green, Jason Lee Wildgoose, Keith Richardson
  • Patent number: 11699570
    Abstract: A method of performing an ion implantation process using a beam-line ion implanter, including disposing a substrate on a platen, analyzing the substrate using metrology components, communicating data relating to the analysis of the substrate to a feedforward controller, processing the data using a predictive model executed by the feedforward controller to compensate for variations in the substrate and to compensate for variations in components of the beam-line ion implanter based on historical data collected from previous implantation operations, and using output from the predictive model to adjust operational parameters of the beam-line ion implanter.
    Type: Grant
    Filed: February 7, 2022
    Date of Patent: July 11, 2023
    Assignee: Applied Materials, Inc.
    Inventors: Supakit Charnvanichborikarn, Wei Zou, Hans-Joachim L. Gossmann, Qintao Zhang, Aseem Kumar Srivastava, William Robert Bogiages, Jr., Wei Zhao
  • Patent number: 11694868
    Abstract: According to one aspect of the present invention, a multi-beam image acquisition apparatus, includes: an objective lens configured to image multiple primary electron beams on a substrate by using the multiple primary electron beams; a separator configured to have two or more electrodes for forming an electric field and two or more magnetic poles for forming a magnetic field and configured to separate multiple secondary electron beams emitted due to the substrate being irradiated with the multiple primary electron beams from trajectories of the multiple primary electron beams by the electric field and the magnetic field formed; a deflector configured to deflect the multiple secondary electron beams separated; a lens arranged between the objective lens and the deflector and configured to image the multiple secondary electron beams at a deflection point of the deflector; and a detector configured to detect the deflected multiple secondary electron beams.
    Type: Grant
    Filed: January 4, 2022
    Date of Patent: July 4, 2023
    Assignee: NuFlare Technology, Inc.
    Inventors: Kazuhiko Inoue, Munehiro Ogasawara, Atsushi Ando
  • Patent number: 11684691
    Abstract: A personal sanitizing device includes an eyewear frame and one or more UV-C sources attached to a lower edge of the eyewear frame for directing UV-C energy in a downward direction from the eyewear frame. The one or more UV-C sources are configured for sanitizing air in proximity of a mouth and/or a nose of a wearer of the personal sanitizing device. The personal sanitizing device also includes a battery configured for powering the one or more UV-C sources.
    Type: Grant
    Filed: April 14, 2021
    Date of Patent: June 27, 2023
    Inventors: Todd D. Tillmanns, Matthew M. Glanzer
  • Patent number: 11679170
    Abstract: A sanitizer is described which frames a payment media, such as a bill, a coin and a credit card, in an irradiation zone between narrowly spaced support walls having associated ultraviolet lamps arranged to irradiate the payment media for at least a predetermined minimum time period. In one approach a motorized transport transports the payment media to an entry point from which it falls into the irradiation zone. In another aspect, a gravity feed approach is employed to return the irradiated media item to a dispense zone. One application is to alleviate concern at a point of sale where customers and merchants are concerned about whether payment media may be carrying a dangerous virus.
    Type: Grant
    Filed: April 13, 2021
    Date of Patent: June 20, 2023
    Assignee: Ellenby Technologies, Inc.
    Inventors: Aaron H. Dobbins, Bob M. Dobbins, Thomas Carullo
  • Patent number: 11680961
    Abstract: A probe-based bidirectional electrophoretic force optical trap loading method includes steps of (1) detaching target particles from an upper electrode plate and capturing the target particles by a micro-scale probe based on a bidirectional electrophoretic force; (2) moving the probe with the target particles over an optical trap, applying a reverse electric field between the probe and the upper substrate electrode plate which is applied during a polar relaxation time of the target particles, and desorbing the target particles from the probe; and (3) turning on the optical trap, applying an electric field between the lower electrode plate and the upper electrode plate, adjusting the speed of the desorbed target particles through the electric field at which the optical trap is able to capture the desorbed target particles and the desorbed target particles moving to the effective capture range of the optical trap.
    Type: Grant
    Filed: August 16, 2022
    Date of Patent: June 20, 2023
    Assignees: Zhejiang Lab, Zhejiang University
    Inventors: Yuanyuan Ma, Cuihong Li, Zhiming Chen, Yingying Wang, Xunmin Zhu, Huizhu Hu
  • Patent number: 11676793
    Abstract: An electromagnetic compound lens may be configured to focus a charged particle beam. The compound lens may include an electrostatic lens provided on a secondary optical axis and a magnetic lens also provided on the secondary optical axis. The magnetic lens may include a permanent magnet. A charged particle optical system may include a beam separator configured to separate a plurality of beamlets of a primary charged particle beam generated by a source along a primary optical axis from secondary beams of secondary charged particles. The system may include a secondary imaging system configured to focus the secondary beams onto a detector along the secondary optical axis. The secondary imaging system may include the compound lens.
    Type: Grant
    Filed: November 8, 2019
    Date of Patent: June 13, 2023
    Assignee: ASML Netherlands B.V.
    Inventors: Weiming Ren, Xuedong Liu, Xuerang Hu, Zhong-wei Chen
  • Patent number: 11676792
    Abstract: Disclosed herein is an apparatus comprising: a source of charged particles configured to emit a beam of charged particles along a primary beam axis of the apparatus; a condenser lens configured to cause the beam to concentrate around the primary beam axis; an aperture; a first multi-pole lens; a second multi-pole lens; wherein the first multi-pole lens is downstream with respect to the condenser lens and upstream with respect to the second multi-pole lens; wherein the second multi-pole lens is downstream with respect to the first multi-pole lens and upstream with respect to the aperture.
    Type: Grant
    Filed: September 25, 2018
    Date of Patent: June 13, 2023
    Assignee: ASML Netherlands, B.V
    Inventors: Xuedong Liu, Qingpo Xi, Youfei Jiang, Weiming Ren, Xuerang Hu, Zhongwei Chen
  • Patent number: 11670477
    Abstract: A multi-beam apparatus for multi-beam inspection with an improved source conversion unit providing more beamlets with high electric safety, mechanical availability and mechanical stabilization has been disclosed. The source-conversion unit comprises an image-forming element array having a plurality of image-forming elements, an aberration compensator array having a plurality of micro-compensators, and a pre-bending element array with a plurality of pre-bending micro-deflectors. In each of the arrays, adjacent elements are placed in different layers, and one element may comprise two or more sub-elements placed in different layers. The sub-elements of a micro-compensator may have different functions such as micro-lens and micro-stigmators.
    Type: Grant
    Filed: October 2, 2018
    Date of Patent: June 6, 2023
    Assignee: ASML Netherlands B.V.
    Inventors: Xuerang Hu, Xuedong Liu, Weiming Ren, Zhong-wei Chen