Abstract: Trapping ions in an ion trapping assembly is described. In one aspect, this is implemented by introducing ions into the ion trapping assembly, applying a first RF trapping amplitude to the ion trapping assembly so as to trap introduced ions which have m/z ratios within a first range of m/z ratios, and cooling the trapped ions. In some aspects, also performed is reducing the RF trapping amplitude from the first RF trapping amplitude to a second, lower, RF trapping amplitude so as to reduce the low mass cut-off of the ion trapping assembly and trapping, at the second, lower RF trapping amplitude, introduced ions having m/z ratios within a second range of m/z ratios. A lower mass limit of the second range of m/z ratios is below the low mass cut-off of the ion trapping assembly when the first RF trapping amplitude is applied.

Abstract: A pathogen containment shield comprises a plexiglass barrier to protect both employees on the one side of the barrier from infecting or being infected by customers on the other side of the barrier. The shield includes a vertical portion with an upper outwardly extending portion and side wings extending outwardly from the vertical portion in the direction of the customer. A hood mounted to the upper outwardly extending portion and including a tourmaline and antimicrobial infused filter, a fan designed to direct droplets into the filtration box at the base of the vertical barrier. The hood also includes an auto distance sensor and programmable auto timer to activate the fans and the filtration box when a customer approaches the shield and to turn off the operation a set time after the customer leaves. The filtration box includes a removable tourmaline and antimicrobial infused intake filter and pathogen killing UV-C light.

Abstract: A multi-leaf collimator is provided. The multi-leaf collimator may include a plurality of leaves configured to shield radiation beams. At least two leaves of the plurality of leaves may be movable in a direction parallel to each another. Each leaf of at least some of the plurality of leaves may be configured to be movable between at least two positions. At least one of the at least two positions may be adjustable.

Abstract: An ion beam processing system including a plasma chamber, a plasma plate, disposed alongside the plasma chamber, the plasma plate defining a first extraction aperture, a beam blocker, disposed within the plasma chamber and facing the extraction aperture, a blocker electrode, disposed on a surface of the beam blocker outside of the plasma chamber, and an extraction electrode disposed on a surface of the plasma plate outside of the plasma chamber.

Abstract: A stage apparatus for an e-beam inspection apparatus comprising: an object table (3) comprising an supporting surface, the object table configured to support a substrate (190) on the supporting surface; a positioning device (180) configured to a position the object table; a position measurement system (5) comprising a position sensor (8-10) configured to measure a height position of the object table parallel to a first axis, the first axis being substantially perpendicular to the supporting surface, the position sensor comprising an interferometer measurement system having an interferometer sensor (9, 10, 22), wherein a measurement beam (11, 15) of the interferometer sensor is configured to irradiate a reflective surface (13, 17) of the object table in a measurement direction, the measurement direction having a first component parallel to the first axis and a second component parallel to a second axis, the second axis being substantially perpendicular to the first axis.

Abstract: A multichannel inlet system for a mass spectrometer includes a plurality of valve assemblies coupled to a manifold, and a pulsed valve driver. The manifold is configured to be connected in fluid connection with an ion trap of the mass spectrometer. Each valve assembly includes a valve and an injection port operably coupled to receive the reagent. The valve has an actuated state in which the valve provides fluid communication between the injection port and the manifold, and an unactuated state in which the valve substantially prevents fluid communication between the injection port and the manifold. The pulsed valve driver is operably connected to receive a pulse signal sequence from a processor, and is configured to generate pulsed valve drive signals for one or more of the valves based on the pulse signal sequence to cause a corresponding one of the valves to be in the actuated state.

Abstract: Atmospheric pressure ion guides are provided. The atmospheric pressure ion guides can include a multi-ring electrode structure connecting a larger opening to a smaller opening and having a series of ring electrodes with decreasing diameter and voltage going from the larger opening to the smaller opening. The electrodes can be made from stainless steel or other suitable conductive material. The multi-ring electrode structure can be contained in a housing, such as a housing made from polyetheretherketone or other suitable thermosetting polymer. The atmospheric pressure ion guide can focus ions from an ion source for use with ion detection devices such as an ion mobility spectrometer or a mass spectrometer. Methods of using the atmospheric pressure ion guides are provided, for example to focus a plurality of ions to be injected into an ion detection device. The atmospheric pressure ion guides can increase the signal intensity of the ion detection device.

Abstract: Improved aberration correction in multipass electron microscopy is provided by having Fourier images of the sample (instead of real images) at the reflection planes of the resonator. The resulting ?1 magnification of the sample reimaging can be compensated by appropriate sample placement or by adding compensating elements to the resonator. This enables simultaneous correction of lowest order chromatic and spherical aberration from the electron objective lenses. If real images of the sample are at the reflection planes of the resonator instead, only the lowest order chromatic aberration can be corrected.

Abstract: To assist an operator in setting an observation conditions, so as to acquire an image with a desired image quality (such as contrast) in a charged particle beam device without falling into trial and error based on the experience of the operator. Therefore, the charged particle beam device includes a stage 115 on which a sample is placed, a charged particle optical system configured to irradiate the sample with a charged particle beam, detectors 121 and 122 configured to detect an electron generated by an interaction between the charged particle beam and the sample, a control unit 103 configured to control the stage and the charged particle optical system according to an observation condition set by the operator and configured to form an image based on a detection signal from the detectors, and a display 104 configured to display an observation assist screen for setting the observation condition.

Abstract: There is provided a control method for an electron microscope including a thermionic-emission gun of self-bias type using a fixed bias resistor, an accelerating voltage power supply supplying an accelerating voltage to the thermionic-emission gun, and an optical system for irradiating a specimen with an electron beam. The control method includes: obtaining a value of a load current which is a current passing through an accelerating voltage power supply; determining a filament height of the thermionic-emission gun based on the value of the load current; and setting a condition of the optical system based on the filament height.

Abstract: Methods for using a single electron microscope system for investigating a sample with TEM and STEM techniques include the steps of emitting electrons toward the sample, forming the electrons into a two beams, and then modifying the focal properties of at least one of the two beams such that they have different focal planes. Once the two beams have different focal planes, the first electron beam is focused such that it acts as a STEM beam that is focused at the sample, and the second electron beam is focused so that it acts as a TEM beam that is parallel beam when incident on the sample. Emissions resultant from the STEM beam and the TEM beam being incident on the sample can then be detected by a single detector or detector array and used to generate a TEM image and a STEM image.

Abstract: A method of mass spectrometry is disclosed comprising mass analysing an eluent from a chromatography device and obtaining parent ion data sets and corresponding product ion data sets, and determining whether, in a first product ion data set, one or more product ions are present that are related to one or more parent ions in a corresponding first parent ion data set, based on the mass or mass to charge ratio and/or intensity of the one or more product ions and the one or more parent ions. If it is determined that the one or more product ions are present, the method further comprises removing the one or more product ions from one or more second product ion data sets to produce one or more second modified product ion data sets and/or removing ions other than the one or more product ions from the first product ion data set to produce a first modified product ion data set.

Abstract: A tungsten sheet includes a tungsten layer. The tungsten layer includes a binder resin and a plurality of tungsten particles included in the binder resin. A tungsten composition amount of the tungsten layer is at least 70% by mass (wt %). An average particle diameter of the plurality of tungsten particles is more than 1 ?m and less than 15 ?m.

Abstract: The invention relates to time-of-flight mass spectrometers in which individual time-of-flight spectra are measured by detection systems with limited dynamic measurement range and are summed to sum spectra. The invention proposes a method to increase the dynamic range of measurement of the spectrum. To achieve this, those ion signals whose measured values display saturation of the analog-to-digital converter (ADC) are replaced by correction values, particularly if several successive measured values are in saturation. The correction values are obtained from the width of the signals, preferably simply from the number of measured values in saturation.

Abstract: Some embodiments of a shielding device can include a base and a shield coupled to the base. The shielding device can be used to provide protection for a healthcare worker (e.g., physician, nurse, technician) during a medical procedure.

Abstract: An x-ray breast imaging system comprising a compression paddle in which the compression paddle comprises a front wall and a bottom wall. The front wall is configured to be adjacent and face a chest wall of a patient during imaging and the bottom wall configured to be adjacent a length of a top of a compressed breast. The bottom wall extends away from the patient's chest wall, wherein the bottom wall comprises a first portion and a second portion such that the second portion is between the front wall and the first portion. The first portion is generally non-coplanar to the second portion, wherein the compression paddle is movable along a craniocaudal axis. The x-ray breast imaging system also comprises a non-rigid jacket releasably secured to the compression paddle, the non-rigid jacket positioned between the compression paddle and the patient.

Abstract: Correctors for correcting two-fold, fifth-order parasitic aberrations in charged particle systems according to the present disclosure include a first corrective component that generates a first quadrupole field when a first excitation is applied to the first corrective component, and a second corrective component that generates a second quadrupole field when a second excitation is applied to the second corrective component. Correctors according to the present disclosure also include a quadrupole positioned between the second corrective component and the sample when used in the charged particle microscope system that generates a third quadrupole field. The third quadrupole field, in combination with at least the first quadrupole field and the second quadrupole field, corrects the fifth-order, two-fold aberrations when the charged particle microscope is in use.

Abstract: The present disclosure aims at proposing a multi-beam irradiation device capable of correcting off-axis aberrations. In order to achieve the above object, a beam irradiation device is proposed, which includes a beam source which emits a plurality of beams; an objective lens (17) which focuses a beam on a sample; a first lens (16) which is arranged such that a lens main surface is positioned at an object point of the objective lens and deflects a plurality of incident beams toward an intersection point of a lens main surface of the objective lens and an optical axis; a second lens (15) which is arranged closer to a beam source side than the first lens and focuses the plurality of beams on a lens main surface of the first lens; and a third lens (14) which is arranged closer to the beam source side than the second lens and deflects the plurality of beams toward an intersection point of a lens main surface of the second lens and the optical axis.

Abstract: Provided is a multi charged particle beam writing apparatus including: an emission unit emitting a charged particle beam; a restriction aperture unit having a first opening having a variable opening area, the restriction aperture unit shielding a portion of the charged particle beam; a shaping aperture array substrate having a plurality of second openings, the shaping aperture array substrate forming multiple beams by allowing the shaping aperture array substrate to be irradiated with the charged particle beam passing through the first opening and allowing a portion of the charged particle beam to pass through the plurality of second openings; and a blanking aperture array substrate having a plurality of third openings, each beam of the multiple beams passing through the plurality of third openings, the blanking aperture array substrate being capable of independently deflecting each beam of the multiple beams.

Abstract: An apparatus may include a scanner, arranged to receive an ion beam, and arranged to deliver a scan signal, defined by a scan period, to scan the ion beam between a first beamline side and a second beamline side. The apparatus may include a corrector module, disposed downstream of the scanner, and defining a variable path length for the ion beam, between the first beamline side and the second beamline side, wherein a difference in propagation time between a first ion path along the first beamline side and a second ion path along the second beamline side is equal to the scan period.