Patents Examined by Sharidan Carrillo
  • Troika acid semiconductor cleaning compositions and methods of use
    Patent number: 7947130
    Abstract: Semiconductor processing compositions for use with silicon wafers having an insulating layers and metallization layers on the wafers comprising water and one or more Troika acids which is also referred to as ?,?-disubstituted trifunctional oximes or ?-(Hydroxyimino) Phosphonoacetic acids, their salts, and their derivatives.
    Type: Grant
    Filed: September 24, 2010
    Date of Patent: May 24, 2011
    Inventor: Wai Mun Lee
  • Starch removal process
    Patent number: 7942980
    Abstract: Starch is removed from the surface of an article using a multi-step method that includes presoaking the article in an acidic solution to remove the starch from the surface of the article and washing the article in an alkaline solution to clean the article.
    Type: Grant
    Filed: February 9, 2006
    Date of Patent: May 17, 2011
    Assignee: Ecolab USA Inc.
    Inventors: Helmut Maier, Tomoaki Nakasone
  • Composition for removing cementitious material from a surface and associated methods
    Patent number: 7938912
    Abstract: A composition is provided for use in cleaning a surface of a cementitious material. The composition includes HCl, urea, complex substituted keto-amine-hydrochloride, an alcohol, an ethoxylate, and a ketone. A method of using the composition includes applying the composition to a surface from which it is desired to clean a cementitious material and removing the composition and released cementitious material from the surface.
    Type: Grant
    Filed: April 7, 2009
    Date of Patent: May 10, 2011
    Assignee: Green Products & Technologies, L.L.C.
    Inventor: John MacDonald
  • Method for removing deposits containing magnetite and copper from containers in industrial and power plants
    Patent number: 7931753
    Abstract: A method to remove deposits containing magnetite and copper from a container, particularly from a steam generator of a nuclear power plant. In a first step, the container is treated using an alkaline cleaning solution containing a complexing agent forming a soluble complex with iron ions, a reducing agent, and an alkalizing agent. In a second step a further complexing agent forming a more stable complex with iron III ions than the complexing agent used in the first step and an oxidant are added to the cleaning solution of the first step present in the container.
    Type: Grant
    Filed: September 8, 2009
    Date of Patent: April 26, 2011
    Assignee: Areva NP GmbH
    Inventors: Konrad Bitter, Ursula Hollwedel, Enkhtsetseg Batchuluun
  • Cleaning compositions containing water soluble magnesium compounds and methods of using them
    Patent number: 7922828
    Abstract: The present invention relates to cleaning compositions and methods employing a water soluble magnesium compound. Such compositions can be used for reducing scale, rinsing, hard surface cleaning, ware washing, and corrosion inhibition.
    Type: Grant
    Filed: September 30, 2010
    Date of Patent: April 12, 2011
    Assignee: Ecolab USA Inc.
    Inventors: Kim R. Smith, Brenda L. Tjelta, Lisa M. Sanders, Keith E. Olson
  • Method for cleaning a fluid delivery system
    Patent number: 7909935
    Abstract: The present invention is directed to a method of cleaning an interior surface of a fluid delivery system. The method comprises introducing a first liquid into the fluid delivery system and contacting the interior surface with the first liquid; forming a slurry by introducing a particulate into the first liquid and contacting the interior surface with the slurry; introducing a second liquid into the fluid delivery system and contacting the interior surface with the second liquid; and introducing a third liquid into the fluid delivery system and contacting the interior surface with the third liquid. The first liquid is substantially soluble or substantially insoluble in the second liquid, the second liquid is substantially insoluble in the third liquid, and the particulate is substantially insoluble in the first and second liquids and substantially soluble in the third liquid.
    Type: Grant
    Filed: October 10, 2008
    Date of Patent: March 22, 2011
    Assignee: PPG Industries Ohio, Inc.
    Inventors: Jonathan N. Warren, Phillip J. Beauchamp, Finn Bergishagen, Denise A. Palumbo
  • Apparatus and method for washing polycrystalline silicon
    Patent number: 7905963
    Abstract: Disclosed is a polycrystalline silicon washing apparatus that sequentially immerses polycrystalline silicon into a plurality of acid baths each of which is filled with an acid to wash the polycrystalline silicon. The temperatures of the acids in the acid baths are set such that the temperature of the acid in a later acid bath of adjacent acid baths is equal to or lower than that of a former acid bath and the temperature of the acid in the last acid bath is lower than that of the acid in the first acid bath. Each of the acid baths is provided with a temperature adjusting unit that controls the temperature of the acid at a constant value.
    Type: Grant
    Filed: November 25, 2009
    Date of Patent: March 15, 2011
    Assignee: Mitsubishi Materials Corporation
    Inventors: Kazuhiro Sakai, Tetsuya Atsumi, Yukiyasu Miyata
  • Substrate cleaning method and developing apparatus
    Patent number: 7901514
    Abstract: A cleaning method of cleaning a surface of a substrate that is processed by a developing process. The method includes pouring a cleaning liquid onto a central part of the substrate. A dry area that is not wetted with the cleaning liquid is created in a central part of the substrate by stopping pouring the cleaning liquid or by shifting a cleaning liquid pouring position to which the cleaning liquid is poured from the central part while the substrate holding device is rotating. The dry area is expanded outward from the central part of the substrate by rotating the substrate holding device at a rotating speed not lower than 1500 rpm without pouring the cleaning liquid onto the dry area. The cleaning liquid is poured onto an outer area contiguously surrounding the dry area on the surface of the substrate.
    Type: Grant
    Filed: July 15, 2009
    Date of Patent: March 8, 2011
    Assignee: Tokyo Electron Limited
    Inventors: Junji Nakamura, Kousuke Yoshihara, Kentaro Yamamura, Fumiko Iwao, Hirofumi Takeguchi
  • Media path universal cleaning fluid composition
    Patent number: 7901515
    Abstract: Exemplary embodiments provide a cleaning composition that can include alkane components for cleaning printer members made of elastomeric materials.
    Type: Grant
    Filed: October 28, 2010
    Date of Patent: March 8, 2011
    Assignee: Xerox Corporation
    Inventors: Santokh Badesha, Barry P. Mandel, Matthew M. Kelly, David J. Gervasi
  • Dishwasher in the form of a programmable machine and its operating method
    Patent number: 7892359
    Abstract: A dishwasher in the form of a programmable machine, in particular a commercial dishwasher, having a pre-cleaning station, which is disposed outside a treatment chamber of the dishwasher, and having a waste water transfer system, by which washing liquid can be fed from a wash tank of the dishwasher as pre-cleaning liquid to the pre-cleaning station.
    Type: Grant
    Filed: December 15, 2008
    Date of Patent: February 22, 2011
    Assignee: Premark FEG L.L.C.
    Inventors: Dietrich Berner, Harald Disch, Markus Heidt
  • Removal of niobium second phase particle deposits from pickled zirconium-niobium alloys
    Patent number: 7887638
    Abstract: The present invention relates generally to a process and chemical composition for the removal of adherent niobium-rich second-phase particles (SPPs) from pickled niobium-containing zirconium alloys which includes applying to the alloy surface a chemical composition comprising alkaline hydrogen peroxide; an alkali metal meta-silicate; and a magnesium salt.
    Type: Grant
    Filed: October 3, 2008
    Date of Patent: February 15, 2011
    Assignee: Westinghouse Electric Co. LLC
    Inventors: David F. McLaughlin, Vanessa R. Youchum
  • Method for cleaning metal nanoparticles
    Patent number: 7879153
    Abstract: It relates to a method for removing a surfactant, organic materials and chlorine ions remained on the surface of metal nanoparticles, prepared on an organic solvent phase including a surfactant. The method for cleaning metal nanoparticles herein is efficient to remove organic materials or chlorine ions remained on the surface of the nanoparticles. Not less than 90% of impurities may be removed by this method. As a result, the thickness of a multi layer ceramic capacitor (MLCC) can be reduced and a packing factor can be improved so that it allows thinner multi layer ceramic capacitors and improved utilities of metal nanoparticles as fuel cell catalysts, hydrogenation reaction catalysts, alternative catalysts of platinum (Pt) in chemical reactions and the like.
    Type: Grant
    Filed: July 13, 2010
    Date of Patent: February 1, 2011
    Assignee: Samsung Electro-Mechanics Co., Ltd.
    Inventors: Jung-Wook Seo, Hyo-Seung Nam, Young-Ku Lyu, Kyung-Mi Kim, Jong-Sik Kim, Tae-Ho Kim
  • Process for removal of paint from plastic substrates
    Patent number: 7879155
    Abstract: A method of removing paint from a plastic substrate at least partially coated with a paint coating by: providing at least one plastic substrate at least partially coated with a paint coating; providing a kit for a user to utilize to remove paint from the plastic substrate, which is at least partially coated with a paint coating; immersing the at least partially coated plastic substrate into first mix of components by the end user wherein the first mix of components further comprises water when the at least partially coated plastic substrates are immersed into the first mix of components; and rinsing the plastic substrate with water. The immersing and rinsing steps remove the paint coating from the plastic substrate.
    Type: Grant
    Filed: June 29, 2010
    Date of Patent: February 1, 2011
    Assignee: Montie-Targosz Enterprises, LLC
    Inventor: Paul Montie
  • Cleaning wastewater holding tanks
    Patent number: 7867336
    Abstract: Vibrators, each comprising an electric motor having an eccentric weight on its rotating shaft, are adhesively secured to the bottoms of the wastewater holding tanks of a recreational vehicle, to aid in flushing the tanks by dislodging solid debris from the inside walls and bottoms of the tanks and from the electrodes of the liquid level sensors in the tanks.
    Type: Grant
    Filed: July 24, 2007
    Date of Patent: January 11, 2011
    Inventor: George E. Zanolli
  • Cleaning compound for cleaning surfaces in a food processing environment
    Patent number: 7857913
    Abstract: A cleaning compound for cleaning surfaces in a food processing environment includes at least one container, with each container including a peroxide and/or an alkaline reactant therein. The alkaline reactant is selected to raise the pH of the cleaning compound into the alkaline range when the peroxide and the alkaline reactant are mixed together. The cleaning compound may be a liquid or dry compound, which is applied to the surface to be cleaned.
    Type: Grant
    Filed: June 26, 2003
    Date of Patent: December 28, 2010
    Inventor: William E. Spindler
  • Method for cleaning substrate processing apparatus, substrate processing apparatus, program and recording medium having program recorded therein
    Patent number: 7846257
    Abstract: The substrate processing apparatus includes a plurality of processing chambers. A given processing chamber is cleaned by first executing first processing during which voltage application control is executed to control a voltage applied to an electrostatic chuck based upon first processing voltage application information provided for the particular processing chamber while drawing an inert gas into the processing chamber and evacuating the processing chamber sustaining therein low pressure conditions therein and then executing second processing during which voltage application control is executed to control the voltage application to the electrostatic chuck based upon second processing voltage application information for the processing chamber while drawing in the inert gas and evacuating the processing chamber, the internal pressure of which is set to a high level.
    Type: Grant
    Filed: October 12, 2006
    Date of Patent: December 7, 2010
    Assignee: Tokyo Electron Limited
    Inventors: Hiroshi Nakamura, Kiyohito Iijima
  • Media path universal cleaning fluid composition
    Patent number: 7846265
    Abstract: Exemplary embodiments provide a cleaning composition that can include alkane components for cleaning printer members made of elastomeric materials.
    Type: Grant
    Filed: October 13, 2009
    Date of Patent: December 7, 2010
    Assignee: Xerox Corporation
    Inventors: Santokh Badesha, Barry P. Mandel, Matthew M. Kelly, David J. Gervasi
  • Methods of using halogen-containing organic compounds to remove deposits from internal surfaces of turbine engine components
    Patent number: 7846261
    Abstract: Methods for cleaning surface deposits, such as sulfidation deposits or dust particles, from a surface bounding an internal passage in a turbine engine component. The surface deposits are cleaned by placing a halogen-containing organic compound, such as a fluorine-containing organic compound, into the internal passage and heating the component and organic compound to chemically react the halogen-containing species in the liquefied and boiling organic compound with the deposits. The temperature is further elevated to vaporize the chemically-modified deposits, which are moved by mass transport through the internal passage and out of the turbine engine component. An optional protective coating, such as a chromium or aluminum coating, may be applied to the cleaned surface of the internal passage.
    Type: Grant
    Filed: February 14, 2006
    Date of Patent: December 7, 2010
    Assignee: Aeromet Technologies, Inc.
    Inventors: Richard Patrick Chesnes, David C Fairbourn
  • Substrate cleaning method, substrate cleaning equipment, computer program, and program recording medium
    Patent number: 7837804
    Abstract: In a dry process after a cleaning process using a cleaning-liquid nozzle and a rinse process using a side rinse nozzle are performed on a wafer W, the wafer W is turned, feeding of pure water to a center point of the wafer W from a pure-water nozzle is started, and substantially at the same, injection of a nitrogen gas from a gas nozzle to a center portion of the wafer W at a point at an adequate distance apart from the center of the wafer W is started. Next, while the pure-water nozzle is caused to scan toward the periphery of the wafer W, the gas nozzle is caused to scan toward the periphery of the wafer W in an area radially inward of the position of the pure-water nozzle after the gas nozzle passes the center of the wafer W.
    Type: Grant
    Filed: April 19, 2005
    Date of Patent: November 23, 2010
    Assignee: Tokyo Electron Limited
    Inventors: Hiroki Ohno, Kenji Sekiguchi
  • Cleaning method, cleaning apparatus and electro optical device
    Patent number: RE42248
    Abstract: A cleaning apparatus of organic substances attached to a vapor-deposition mask for low molecular weight organic EL devices comprises a first stage for treating a vapor-deposition mask with a derivative of pyrrolidone, a second stage for rinsing the vapor-deposition mask with water, and a third stage for rinsing the vapor-deposition mask with flowing water. The cleaning apparatus also comprises a fourth stage for treating the vapor-deposition mask with ethanol, a fifth stage for drying the vapor-deposition mask, and a carrying means that carries the vapor-deposition mask to each stage in sequence. It is desirable to adopt N-methyl-2-pyrrolidone as the derivative of pyrrolidone.
    Type: Grant
    Filed: March 26, 2009
    Date of Patent: March 29, 2011
    Assignee: Seiko Epson Corporation
    Inventors: Toshiko Hosoda, Shinichi Yotsuya