Abstract: Disclosed is a substrate processing method including a first surface cleaning step of supplying a first cleaning liquid containing water to a first surface of a substrate; a second surface cleaning step of supplying a second cleaning liquid containing water to a second surface that is opposite to the first surface; a water removal step of removing the water remaining on the second surface of the substrate in a state where the first surface is not exposed to outside air, after the second surface cleaning step; a water-repellency step of supplying a water-repellent agent to the first surface of the substrate after the water removal step; and a drying step of drying the substrate after the water-repellency step.
Abstract: A method of operating a dishwasher appliance includes initiating a wash cycle of the dishwasher appliance. The wash cycle includes operating the dishwasher appliance in a wash mode for a first predetermined amount of time by positioning a diverter in a first position to direct a fluid flow to a spray assembly of the dishwasher appliance. The method also includes positioning the diverter in a second position to direct the fluid flow to a filter cleaning manifold for a second predetermined amount of time. The method further includes sensing the second position of the diverter with a position sensor. The method further includes performing a predetermined action after the second predetermined amount of time when the second position of the diverter is sensed before the first predetermined amount of time has elapsed.
Abstract: Methods for processing a substrate are provided herein. In some embodiments, a method of processing a substrate includes: heating a substrate disposed within a processing volume of a substrate processing chamber to a temperature of up to about 400 degrees Celsius, wherein the substrate comprises a first surface, an opposing second surface, and an opening formed in the first surface and extending towards the opposing second surface, and wherein the second surface comprises a conductive material disposed in the second surface and aligned with the opening; and exposing the substrate to a process gas comprising about 80 to about 100 wt. % of an alcohol to reduce a contaminated surface of the conductive material.
Type:
Grant
Filed:
September 29, 2016
Date of Patent:
May 7, 2019
Assignee:
APPLIED MATERIALS, INC.
Inventors:
Xiangjin Xie, Feng Q. Liu, Daping Yao, Alexander Jansen, Joung Joo Lee, Adolph Miller Allen, Xianmin Tang, Mei Chang
Abstract: A device is provided for unclogging an enteral tube including a first length of tubing, the distal end of which is fitted with a connector for connecting to an enteral feeding tube and the proximal end of which is fitted with a connector that is not compatible with an enteral feeding tube. An anti-reflux valve is situated in the first length of tubing and allows fluid flow only towards the distal end thereof. A second length of tubing has a proximal end connected to the first length of tubing at a position between the proximal end of the first length of tubing and the directional valve. A pressure relief valve is situated in the second length of tubing. A method is provided for utilizing the device to clear a clogged enteral tube.
Abstract: A method for cleaning and blocking the bore of the firearm includes inserting the cleaning and blocking device into the bore where the cleaning and blocking device includes a cleaning body having a foam core enclosed in a tubular sheath. A first pull-cord is coupled to a first end of the cleaning body and a second pull-cord is coupled to a second end of the cleaning body. A locking mechanism is additionally coupled to the first and second pull-cords. The method further includes pulling the cleaning body back and forth at least once through the bore with at least one of the pull-cords. The method also includes locking the cleaning and blocking device by coupling a lock to the locking mechanism of the first and second pull-cords.
Abstract: A cleaning film designed to remove foreign matter and particulates from working surfaces of cleaning wafers used in semiconductor processes. These processes include wafer sort test for cleaning of probe card pins and FEOL tooling for cleaning during wafer handling equipment and wafer chucks. The debris collected on the cleaning wafer working surfaces is removed by the particle removal film allowing the debris and foreign matter to be discarded. The use of the cleaning film allows the operator to refresh the cleaning wafer without use of an outside vendor and eliminates wet washing and the use of solvents in the cleaning process.
Type:
Grant
Filed:
November 20, 2017
Date of Patent:
March 26, 2019
Assignee:
International Test Solutions, Inc.
Inventors:
Alan Eugene Humphrey, Jerry J. Broz, James H. Duvall
Abstract: Disclosed is a substrate liquid processing method. The method includes producing a processing liquid including deionized water, carbon dioxide, and ammonia, which has a PH of a predetermined value in a range of pH 5 to 9; and processing a substrate having a metal exposed, using the processing liquid.
Abstract: Disclosed is a liquid chemical for forming a water-repellent protecting film on a wafer. The liquid chemical is a liquid chemical containing a water-repellent-protecting-film-forming agent for forming the water-repellent protecting film, at the time of cleaning the wafer which has a finely uneven pattern at its surface and contains at least at a part of a surface of a recessed portion of the uneven pattern at least one kind of matter selected from the group consisting of titanium, titanium nitride, tungsten, aluminum, copper, tin, tantalum nitride, ruthenium and silicon, at least on the surface of the recessed portion. The liquid chemical is characterized in that the water-repellent-protecting-film-forming agent is a water-insoluble surfactant. The water-repellent protecting film formed with the liquid chemical is capable of preventing a pattern collapse of the wafer, in a cleaning step.
Abstract: The present invention comprises a waterless mixture which includes a biuret and/or urea, silica, and melamine particles coated with a layer of magnetite iron oxide for cleaning furnaces, heaters or boilers. A typical cleaning mixture comprises 30-50 percent silica, 20-50 percent biuret and/or urea, 20-40 percent melamine and 1-5 percent iron oxide. The cleaning can be performed at any time. This may lead to a reduction in fuel consumption, less air pollution, increased throughputs, and avoidance of equipment damage.
Abstract: A substrate cleaning apparatus may include a substrate support having a support surface to support a substrate to be cleaned, wherein the substrate support is rotatable about a central axis normal to the support surface; a first nozzle to provide a first cleaning gas to a region of the inner volume corresponding to the position of an edge of the substrate when the substrate is supported by the support surface of the substrate support; a first annular body disposed opposite and spaced apart from the support surface of the substrate support by a gap, the first annular body having a central opening defined by an inner wall shaped to provide a reducing size of the gap between the first annular body and the support surface in a radially outward direction; and a first gas inlet to provide a first gas to the central opening of the first annular body.
Type:
Grant
Filed:
September 13, 2016
Date of Patent:
February 26, 2019
Assignee:
APPLIED MATERIALS, INC.
Inventors:
James Matthew Holden, Song-Moon Suh, Todd Egan, Kalyanjit Ghosh, Leon Volfovski, Michael R. Rice, Richard Giljum
Abstract: The invention relates to a method for controlling a wiper device (10) by means of a control and/or regulating unit (12). At least one operating parameter is set dependent on at least one parameter which differs from a vehicle window coverage parameter.
Abstract: The present invention relates to graffiti removal compositions and the use thereof for the removal of graffiti from surfaces. The compositions comprise (i) alkyl esters of one or more soybean oil fatty acids; (ii) one or more aliphatic diesters of dicarboxylic acids; (iii) one or more compounds of the formula R2C(0)OR3, wherein R2 is a C1-C20 alkyl and R3 is C1-C20 alkyl; and (iv) a surfactant.
Abstract: The disclosure relates to a continuous cleaning method for cleaning a moving fabric in a paper machine. The method uses one or more cleaning stages. In one embodiment, one cleaning stage applies steam to heat and soften contaminants on the fabric followed by the application of water, preferably superheated water, to remove the contaminants. Another cleaning stage may apply hot water, steam and/or superheated water via an encapsulated shower and evacuation chamber making it possible to clean the width of the fabric without substantial rewet.
Type:
Grant
Filed:
March 13, 2013
Date of Patent:
February 12, 2019
Assignee:
GPCP IP Holdings LLC
Inventors:
Mark S. Hunter, Dean J. Baumgartner, David Drew Raines, Theodore D. Kennedy, David S. Veldhuizen, Glenn W. Busch, Mitchell S. Edbauer
Abstract: In some embodiments, methods and systems are provided for improved handling of lithography masks including loading a mask via a first load port from a first carrier; inverting the mask using a first contact pad; cleaning the mask; inverting the mask using a second contact pad; and unloading the mask via a second load port into a second carrier. Numerous other aspects are provided.
Type:
Grant
Filed:
September 27, 2014
Date of Patent:
February 5, 2019
Assignee:
Applied Materials, Inc.
Inventors:
Edward Ng, Jeffrey C. Hudgens, Ayan Majumdar, Sushant S. Koshti
Abstract: A method of removing a liquid from a container (1) for accommodating an ophthalmic contact lens, in particular a soft contact lens, during transporting the container (1) from a liquid bath (13) to a subsequent processing station (14), the method including the steps of: transporting the container (1) from the liquid bath to the subsequent processing station, generating suction (20), and applying the suction (20) to a bottom (11) of the container (1) during the step of transporting the container (1) from the liquid bath to the subsequent processing station, thereby removing the liquid from the container (1).
Type:
Grant
Filed:
November 14, 2016
Date of Patent:
February 5, 2019
Assignee:
Novartis AG
Inventors:
Roger Biel, Andrea Kopp, Katrin Sylke Struckmeier, Michael Stutz
Abstract: A method is provided involving a gas turbine engine system. The method includes configuring a plug within a fluid passage in the gas turbine engine system, where the plug is between first and second portions of the fluid passage. Material is removed from an interior surface of the fluid passage in the first portion of the fluid passage to provide removed material, where the plug substantially prevents the removed material from entering the second portion of the fluid passage. The removed material is directed out of the fluid passage. The plug is removed from the fluid passage.
Abstract: A method for preventing the fogging of glass shower doors and bathroom mirrors and for cleaning said surfaces comprising dispensing an aqueous liquid formulation free of volatile organic compounds (VOC), comprising at least 96% USDA-certified biobased, non-toxic, biodegradable ingredients, said formulation being dispensed from a non-aerosol bottle with a sprayer, immediately followed by wiping excess composition, wherein the method critically requires avoiding rinsing and drying, thereby producing an adherent thin film without leaving visible residue, spots or streaks.
Type:
Grant
Filed:
September 24, 2017
Date of Patent:
December 18, 2018
Inventors:
Magdi Mossoba, Nevin Fahmy, David Mossoba
Abstract: Method of cleansing human skin employing an aqueous soap composition comprising of fatty acid soap, at least one silver (I) compound having a silver ion solubility (in water at 25° C.) of at least 1×10?4 mol/L, and water, which composition provides biocidal activity against Gram positive bacteria in particular S. aureus, in relatively short contact periods.
Abstract: A method of treating a sensor array including a plurality of sensors and an isolation structure, where a sensor of the plurality of sensors has a sensor pad exposed at a surface of the sensor array and the isolation structure is disposed between the sensor pad and sensor pads of other sensors of the plurality of sensors, comprises exposing the sensor pad and the isolation structure to a non-aqueous organo-silicon solution including an organo-silicon compound and a first non-aqueous carrier; applying an acid solution including an organic acid and a second non-aqueous carrier to the sensor pad; and rinsing the acid solution from the sensor pad and the isolation structure.
Type:
Grant
Filed:
December 21, 2016
Date of Patent:
November 27, 2018
Assignee:
LIFE TECHNOLOGIES CORPORATION
Inventors:
James A. Ball, Phil Waggoner, Scott Parker
Abstract: A process and apparatus for cleaning a wafer, the wafer having a front side and a back side, are provided. The process begins with placing the wafer on a platform, and a first gas stream delivering in a direction from a center to an edge of the front side of the wafer. The first gas stream prevents liquid drops entering a work piece region on the front side of the wafer and protects the integrity of the integrated circuits. A cleaning brush is rinsed by a first liquid stream and contacting the edge of the wafer for cleaning the wafer. The cleaning brush scrubs unwanted residual materials from the edge of the wafer, and the first liquid stream flushes the cleaning brush to recover the cleaning ability.