Abstract: Disclosed herein are systems and methods for treating the surface of a microelectronic substrate, and in particular, relate to an apparatus and method for scanning the microelectronic substrate through a cryogenic fluid mixture used to treat an exposed surface of the microelectronic substrate. The fluid mixture may be expanded through a nozzle to form an aerosol spray or gas cluster jet (GCJ) spray may impinge the microelectronic substrate and remove particles from the microelectronic substrate's surface. In one embodiment, the fluid mixture may be maintained to prevent liquid formation within the fluid mixture prior to passing the fluid mixture through the nozzle. The fluid mixture may include nitrogen, argon, helium, neon, xenon, krypton, carbon dioxide, or any combination thereof.

Abstract: A cleaning method for a surveillance camera uses a capacitive sensor to determine whether rain, ice, dirt, debris or other foreign objects are present on the camera lens substrate. A determination is made whether the sensed capacitance is greater than a first threshold indicative of the presence of a foreign object on the lens. If a foreign object is indicated, the lens is sprayed with a sprayer and then a wiper is activated. If a foreign object is not indicated, a determination is made whether ice is present by comparing the sensed capacitance to a second threshold that is less than the first threshold. If ice is present, wiper and lens defrosters are activated, and a wiper is then turned on. The cleaning method may include a temperature sensor and power management for the defrosters.

Abstract: A method of washing dishes in an automated dishwasher utilizing a high velocity sprayer and high velocity spray phase for forcibly spraying water from concavities on washed dishes or utensils in which liquid can puddle in the cavities of the dishes or utensils during previous washing or rinsing cycles.

Abstract: The need for a liquid hard surface cleaning composition which provides improved shine, reduced slipperiness during drying, and also improved drying times is met formulating the composition using a ethoxylated alkoxylated nonionic surfactant, in combination with a detersive surfactant.

Abstract: The present invention discloses methods of neutralizing apatite surfaces, for example after a flow-through collection of a target and prior to cleaning the chromatography solid support.

Abstract: The use of an alcohol in a liquid cleaning composition including surfactant, for cleaning hydrophobic stains from surfaces and/or for providing suds longevity, wherein the alcohol is selected from the group consisting of: C4-C6 linear mono-alcohols, branched C4-C10 mono-alcohols having one or more C1-C4 branching groups, alkyl mono-glycerols, and mixtures thereof.

Abstract: An antibacterial cleaning composition for hard surfaces is made from a flexible superabsorbent material and an antibacterial agent. The composition can be applied to various liquid and solid surface contaminants, including blood, vomit, fecal matter, urine, glass, food, etc. The composition may be applied to the contaminated hard surface by several methods including pouring, rolling, spraying or foaming. Once cured, the antimicrobial cleaning composition is removed from the surface, taking the contaminant along with it and leaving behind a clean surface.

Abstract: The present disclosure provides methods and systems for in situ cleaning of hot gas flowpath components of a turbine engine that form portions of a hot gas flowpath extending through the turbine. The hot gas flowpath components may include a layer of accumulated contaminants on first portions thereof that form a respective portion of the hot gas flowpath. The first portions may include a thermal battier coating (TBC), and the layer of accumulated contaminants may overlie the TBC and at least partially infiltrate into the TBC. The accumulated contaminants may include CaO—MgO—Al2O3-SiO2 (CMAS) partial melt. The methods may include introducing an acid-including detergent into the hot gas flowpath of the turbine engine and onto the hot gas flowpath components to clean the accumulated contaminants from the first surfaces of the components.

Abstract: A solid pet waste vacuum and bagging device is described. The device is equipped with a canister, collection chute, vacuum motor, and a bag cartridge. The device eliminates the need for an individual to come into any contact with pet waste, including the temperature and the smell conventionally known to emanate from pet waste. The device employs the vacuum motor to collect pet waste within the bag via the collection chute. The collection chute is lined with a plastic bag, which is sealed and released from the collection chute within the canister upon activation of a dispose button by the user. The device is powered by rechargeable batteries, and may be equipped with a charging cradle to maintain a fully charged battery.

Abstract: A device (100) for cleaning and method of cleaning an endoscope distal end (128) is disclosed. The device (100) may include a sealed longitudinal chamber (110) that may contain a porous structure (132) with fluid, and a brush and a spring (121) loaded brush. A removable substantially airtight closure (146) may be removed to allow an endoscope distal end (128) to be placed into the longitudinal chamber (110) and contact the porous structure (132) and the brush prior to a full cleaning, thereby preventing contaminates from drying and hardening on the endoscope distal end (128) prior to a cleaning and sanitization process. The spring (121) loaded brush may be moved to clean portions of the endoscope distal end (128) including cavities such and tools including an elevator or lifter. A cap may be removed from a airtight connector (120) and a fluid source may be connected to the airtight connector (120) to assist in the endoscope (127) cleaning process.

Abstract: A method for increasing the rate of debris collection of a robotic vacuum through increasing the number of times a robotic vacuum's cleaning apparatus passes over a work surface during each pass of the device. The device's main cleaning apparatus is installed on a plate that rotates within the housing of the device. The drive unit is housed separately from the rotating plate so that the device's normal movement patterns will be uninterrupted by the rotation of the cleaning apparatus. Ideally, the cleaning apparatus will be caused to rotate two or more times over an area before the robotic vacuum has driven completely through the area.

Abstract: A method for cleaning a food waste recycling bin of a food waste recycling appliance includes maintaining between a lower portion and an upper portion of the food waste recycling bin a temperature differential sufficient such that water vapor is emitted from waste located in the lower portion of the food waste recycling bin.

Abstract: The present invention comprises a waterless mixture which includes a biuret and/or urea, silica, and melamine particles coated with a layer of magnetite iron oxide for cleaning furnaces, heaters or boilers. A typical cleaning mixture comprises 30-50 percent silica, 20-50 percent biuret and/or urea, 20-40 percent melamine and 1-5 percent iron oxide. The cleaning can be performed at any time. This may lead to a reduction in fuel consumption, less air pollution, increased throughputs, and avoidance of equipment damage.

Abstract: A method of washing dishes in an automated dishwasher utilizing a high velocity sprayer and high velocity spray phase for forcibly spraying water from concavities on washed dishes or utensils in which liquid can puddle in the cavities of the dishes or utensils during previous washing or rinsing cycles.

Abstract: A method of controlling adherence of microparticles to a substrate to be processed includes applying voltage to an electrostatic chuck configured to electrostatically attract the substrate to be processed in a processing container before the substrate to be processed is carried into the processing container; and, after the applying of voltage to the electrostatic chuck, carrying the substrate to be processed into the processing container. Further, in the applying of voltage to the electrostatic chuck, the voltage is applied to the electrostatic chuck to reduce a potential difference between a focus ring and the substrate to be processed, the focus ring being provided to surround the electrostatic chuck.

Abstract: A substrate cleaning method for removing particles adhered to a substrate includes: acquiring particle information including diameters of the particles adhered to the substrate; controlling, based on the acquired particle information, a factor related to sizes of gas clusters having aggregates of atoms or molecules of a cleaning gas; ejecting the cleaning gas, at a higher pressure than a processing atmosphere where the substrate is provided, to the processing atmosphere and generating the gas clusters by adiabatic expansion; and removing the particles by irradiating the gas clusters in a perpendicular direction to a surface of the substrate. As a result, even if recesses for a circuit pattern are formed on the surface of the substrate, the particles in the recesses can be removed at a high removal rate.

Abstract: A process removes metal impurities from an untreated chemical liquid, which includes a silylating agent. The process includes providing a strongly acidic cation-exchange resin in which a cation-exchange group is immobilized to a resin membrane or an integral structure of a particle-removing membrane and an ion exchange resin membrane in which a strongly acidic cation-exchange resin has been chemically introduced onto surfaces of pores in a porous resin. The wettability of the ion exchange resin membrane is thereafter improved by contacting the ion-exchange resin membrane with an organic solvent. The metal impurities are then removed from the untreated chemical liquid by passing the untreated chemical liquid through the ion-exchange resin membrane.

Abstract: Deposits such as particles deposited on a surface of a target object can be easily removed while suppressing damage to the target object such as destruction of pattern formed on the surface of the target object or film roughness on the surface of the target object. In a pre-treatment, vapor of a hydrogen fluoride is supplied to a wafer W to dissolve a natural oxide film 11, so that a deposit 10 attached to a surface of the natural oxide film 11 is slightly separated from a surface of the wafer W. A carbon dioxide gas that does not react with an underlying film 12 is supplied to a processing gas atmosphere where the wafer W is placed, so that a gas cluster of the carbon dioxide gas is generated. Then, the gas cluster in a non-ionized state is irradiated toward the wafer W to remove the deposit 10.

Abstract: A method for removing oxide from a metallic substrate is described. The method includes providing a stream of boron trifluoride; heating the metallic substrate at a first temperature; and heating the metallic substrate at a second temperature different from the first temperature. An associated apparatus is also described.

Abstract: A method of flushing a hydraulic system including a fluid circuit and an in-service fluid flowing therein includes fluidly coupling a kidney loop to the fluid circuit such that at least a portion of the in-service fluid may flow therethrough, the kidney loop including a depth media filter and a micro-glass filter arranged in a parallel flow pattern and introducing a solvent cleaner into the in-service fluid at a concentration level between approximately 2.5% and approximately 6%, the solvent cleaner including at least one hydrocarbon group V fluid. The method further includes maintaining a temperature of the in-service fluid between approximately 100 degrees Fahrenheit and approximately 155 degrees Fahrenheit and controlling the flow of the in-service fluid at a flow rate between approximately 3 gallons per minute and approximately 6.8 gallons per minute.