Abstract: An electrodeposition process for producing gold masks for X-ray lithography of integrated circuits is disclosed. The process produces a gold layer of tightly controlled grain size and arsenic content which results in minimum stress in the gold film and therefore minimum distortion in the features produced from the mask. The process comprises (a) immersing a substrate in a solution containing from 6 to 9 grams of gold per liter and from 8 to 30 mg of arsenite per liter, and (b) passing an electric current having a current density of 1 to 5 mA per cm.sup.2 through the solution to cause electrodeposition of gold.

Abstract: A novel method of pattern formation and a projection exposure apparatus use the pupil of a projection lens of the projection exposure apparatus for forming an LSI pattern or the like, and mount at the pupil an optical filter having a complex amplitude transmittance distribution expressed substantially as T(r)=cos (2.pi..beta.r.sup.2 -.theta./2) as a function of a radial coordinate r normalized by the maximum radius of the pupil. Alternatively, the Fourier transform of a layout pattern drawn on the LSI is obtained, the obtained Fourier transform data are multiplied by cos (2.pi..beta.f.sup.2 -.theta./2) (where f is a spatial frequency, and .beta., .theta. appropriate real numbers), the inverse Fourier transform of the resulting product is taken to produce a pattern, and this pattern or an approximate solution thereof is used as a mask pattern thereby to produce an LSI by exposure.

Abstract: Fabrication of sub-micron design rule integrated circuits entails imposition of patterning information, consisting of degree of scattering, on a projected scanning beam of accelerated electrons by means of a mask, imaging being dependent upon passage through a back focal plane filter including a plurality of apertures for selectively passing relatively unscattered electrons.

Abstract: Photosensitive compositions containing a photoinitiator which generates an acid upon exposure to light and a polymer containing pendant alkoxy alkyl ester groups. Also disclosed are imageable articles containing the photosensitive compositions of the present invention coated on a substrate as well as processes for forming an imaged article.

Abstract: A thin film mask for use in an X-ray lithographic process is disclosed herein along with a method of making the mask which is comprised of a diamond thin film layer supported on one surface of an X-ray transparent non-diamond substrate, for example silicon. A predetermined pattern of ions of a substance opaque to X-rays, for example a heavy atomic number substance such as gold, tungsten or cesium, is introduced into the diamond thin film layer as opposed to being deposited thereon. In one embodiment disclosed herein, this is accomplished by means of ion implantation, and in a second embodiment by means of an ion beam direct write device.

Abstract: A process for the preparation of layered photoconductive imaging members which comprises forming layers comprised of a mixture of cyclic oligomers with degrees of polymerization of from about 2 to about 20 and a catalyst, wherein one layer contains a conductive filler, the second layer contains a photogenerating pigment and the third layer contains charge transporting molecules, and heating said layers to convert the cyclic oligomer mixture in each layer to a polycarbonate resin.

Abstract: A method for forming a patterned layer of material begins by providing a substrate (12). A device layer (14) is formed overlying the substrate (12). A layer (16) is formed over the device layer (14). Layer (16) is further characterized as being an inorganic dielectric material, such as a plasma enhanced silicon nitride (PEN) material. A mask (18) is positioned adjacent the layer (16). Ultra-violet (UV) light (20) is selectively exposed to the layer (16) through the mask (18). Exposure from the UV light (20) forms exposed regions (16b) and unexposed regions (16a) of the layer (16). The UV light (20) alters an atomic bonding energy of hydrogen atoms within the exposed regions (16b) while not altering unexposed regions (16a). The layer (16) is exposed to an etchant which etches the exposed regions (16b) and unexposed regions (16a) at different rates. The etching forms a patterned layer from the layer ( 16) which may be used as a masking layer.

Abstract: A method for monitoring the coating weight, uniformity, defects or markings present in a coating of a composition applied to a substrate comprises the steps:a) providing a substrate with a functional coating of a composition comprising an effective amount of uvescer that absorbs radiant energy, i.e., has an excitation energy, of wavelength .lambda..sub.1 and emits radiant energy of wavelength .lambda..sub.2 ;b) scanning the coating with radiant energy having a wavelength within wavelength .lambda..sub.1 ;c) detecting the radiant energy of wavelength .lambda..sub.2 emitted by the coating; andd) optionally, correlating the emitted radiant energy to independently measured standard coating weights or thicknesses, of the coating so as to measure coating weight, thickness, uniformity, defects, or markings.

Abstract: A phase-shifting lithographic mask having two or more self-aligned phase-shifting regions is fabricated by a sequence of etchings of the phase-shifting mask using a protective resist layer having three or more regions that have been subjected to mutually different doses (including possibly zero) of actinic radiation-such as electron beam, ion beam, or photon beam radiation. A self-aligned opaque region can be supplied by carbonization of remaining resist material.

Abstract: The metallic sheet for shadow mask comprises a Fe-Ni alloy sheet having mainly of Fe and Ni; degrees of planes on a surface of the alloy sheet, the degree of {331} plane being 14% or less, the degree of {210} plane 10% or less and the degree of {211} plane 10% or less; and a ratio of degrees of planes which is {210}/[{331}+{211}] being 0.2 to 1.Another thin metallic sheet for shadow mask comprises a Fe-Ni alloy sheet having mainly of Fe and Ni; degrees of planes on a surface of the alloy sheet, that of {111} plane being 5% or less, that of {100} plane 50 to 93%, that of {110} 24% or less, that of {311} plane 1 to 10%, that of {331} 1 to 14%, that of {210} plane 1 to 10% and that of {211} plane 1 to 10%; a ratio of degrees of planes which is [{100}+{311}+{210}]/[{110}+{111}+{331}+{211}] being 0.8 to 20.

Abstract: There is provided a photosensitive medium for recording a charge latent image, composed of a photo-conductive layer having an electrode and a protective layer at each surface thereof. There is further provided a charge latent image recording method. A photo-conductive layer and a charge holding layer, each having an electrode at a surface thereof, are arranged to face each other through a gap. A predetermined voltage is applied across the photo-conductive layer and the charge holding layer through the electrodes to cause discharge thereacross. At the time, an electro-magnetic wave corresponding to the charge latent image intended to be recorded is emitted to the photo-conductive layer. The impedance of the photo-conductive layer is thus varied to record the charge latent image on the charge holding layer.

Abstract: A process for the preparation of an encapsulated toner composition comprised of a core and a shell thereover, which process comprises mixing an organic phase comprised of an olefinic monomer, pigment, and a first resin A soluble in the organic phase; dispersing the organic phase into microdroplets in an aqueous solution comprised of a surfactant; subjecting the resulting mixture to free radical polymerization by heating wherein the olefinic monomer is converted to a second resin B; and wherein said resin B is incompatible with said resin A and phase separates whereby a core and shell results.

Abstract: A process for the preparation of supporting substrates which comprises heating a mixture of cyclic oligomers with degrees of polymerization of from about 2 to about 20 and a catalyst.

Abstract: Ionographic imaging members include an electrically conductive layer and a dielectric layer which contains boron nitride. The dielectric layer may contain boron nitride alone or boron nitride dispersed in a binder. Methods are provided for preparing and using such imaging members.

Abstract: A phase-shifted reticle with patterns proximate each other having inverted phases for the features and phase-shifting elements, and methods of fabricating the reticle, are disclosed. In a preferred embodiment, the inverted reticle is used to form an array of closely spaced contact or via openings. For a first pattern on the reticle, the feature will be the 0.degree. phase and the phase-shifting rim surrounding that feature will be the 180.degree. phase. All patterns surrounding the first pattern have phase-shifting rims of the 0.degree. phase and features of the 180.degree. phase. In this way, each pattern can form below conventional resolution features in the resist. Additionally, there will not be exposure of the regions between the closely spaced features since radiation transmitted through the closely spaced phase-shifting rims of the two patterns is 180.degree. out of phase.

Abstract: A phase-shifted reticle with patterns proximate each other having inverted phases for the features and phase-shifting elements, and methods of fabricating the reticle, are disclosed. In a preferred embodiment, the inverted reticle is used to form an array of closely spaced contact or via openings. For a first pattern on the reticle, the feature will be the 0.degree. phase and the phase-shifting rim surrounding that feature will be the 180.degree. phase. All patterns surrounding the first pattern have phase-shifting rims of the 0.degree. phase and features of the 180.degree. phase. In this way, each pattern can form below conventional resolution features in the resist. Additionally, there will not be exposure of the regions between the closely spaced features since radiation transmitted through the closely spaced phase-shifting rims of the two patterns is 180.degree. out of phase.

Abstract: A process for the preparation of photoconductive imaging members which comprises coating a supporting substrate with a photogenerator layer comprised of photogenerating pigments and a mixture of cyclic oligomers wherein said mixture is heated to obtain a polycarbonate resin binder, and subsequently applying to the photogenerating layer a layer of charge transport molecules.

Abstract: A process which comprises adding a pigment to a solution of trihaloacetic acid and toluene; adding the solution to a nonsolvent for the pigment; and separating the product from the solution.

Abstract: An electrophotographic photoconductor is disclosed, which comprises an electroconductive substrate, an undercoat layer formed on the electroconductive substrate, and a photoconductive layer comprising a charge generation layer and a charge transport layer formed on the undercoat layer, wherein the undercoat layer comprises a binder resin and a modified indium oxide having exothermic peaks in the range of 200.degree. to 600.degree. C. detected by the differential thermal analysis, which modified indium oxide is prepared by pretreatment with a hydroxyl-group-containing compound, an amino-group-containing compound, or an ether-group-containing compound.