Patents Examined by Steve Rosasco
  • Patent number: 5364722
    Abstract: A toner for developing electrostatic images is prepared from a binder resin and a hydrocarbon wax. The toner is provided with improved fixability and anti-offset characteristic by controlling the thermal characteristic of the hydrocarbon wax so as to provide a DSC (differential scanning calorimeter) curve, showing an onset temperature of heat absorption in the range of 50.degree.-110.degree. C. and at least one heat absorption peak P1 in the range of 70.degree.-130.degree. C. giving a peak temperature T.sub.P1 on temperature increase, and showing a maximum heat evolution peak temperature in the range of T.sub.P1 .+-.9.degree. C. on temperature decrease. Correspondingly, the toner provides a DSC curve showing a rising temperature of heat absorption of at least 80.degree. C., an onset temperature of heat absorption of at most 105.degree. C. and a heat absorption peak temperature in the range of 100.degree.-120.degree. C.
    Type: Grant
    Filed: September 10, 1992
    Date of Patent: November 15, 1994
    Assignee: Canon Kabushiki Kaisha
    Inventors: Hirohide Tanikawa, Hiroaki Kawakami, Masatsugu Fujiwara, Masashi Jinbo, Tsutomu Onuma
  • Patent number: 5364723
    Abstract: Disclosed is a toner composition comprised of pigment particles and monovinyl aromatic terpene copolymer resin particles, and more specifically styrene terpene copolymer resins.
    Type: Grant
    Filed: October 16, 1992
    Date of Patent: November 15, 1994
    Assignee: Xerox Corporation
    Inventors: Michael K. Georges, Nancy A. Listigovers, Stephan V. Drappel, Maria V. McDougall, Gerald R. Allison
  • Patent number: 5364717
    Abstract: The present invention relates to a method of manufacturing an exposure mask having an unprecedented supermicrostructure for an X-ray exposure method favorable for conventional supermicro exposure using lithography techniques. The method of manufacturing an X-ray exposure mask comprises the steps of alternately laminating two kinds of compound semiconductors as a thin film having a periodic structure with controllability of about one atomic layer on a substrate selectively etching only one material for forming the periodic structure, forming an uneven difference between adjacent layers of the laminate body, and manufacturing a mask for exposing streaks on a desired resist with the aid of a difference of X-rays absorption amounts between each layer by exposing X-ray in parallel to the direction of the laminate layer.
    Type: Grant
    Filed: October 1, 1992
    Date of Patent: November 15, 1994
    Assignee: Tokyo Institute of Technology
    Inventors: Kazuhito Furuya, Yasuyuki Miyamoto
  • Patent number: 5362591
    Abstract: There is disclosed a mask which includes a first phase shifter layer and a second phase shifter layer formed on the first phase shifter layer and has a structure capable of easily effecting highly precise control of the phase of exposure light and correction for a defect in the phase shifter layers. There are also disclosed a method of manufacturing the mask and a method of forming by use of the mask a pattern which has a smaller local error in pattern dimension and is free of a defect.
    Type: Grant
    Filed: October 5, 1990
    Date of Patent: November 8, 1994
    Assignee: Hitachi Ltd. et al.
    Inventors: Akira Imai, Norio Hasegawa, Hiroshi Fukuda, Toshihiko Tanaka
  • Patent number: 5362584
    Abstract: A plurality of noncontiguous polygonal regions of phase-shifting material have edges spaced apart less than the distance at which images of said edges would separate. The edges of the regions of phase-shifting material have differing arbitrarily selectable angular orientations (nonparallel as well as parallel) on a nonphase-shifting material. The noncontiguous phase-shifting regions may be arranged in a matrix of parallel columns and rows to facilitate fabrication and facilitate writing of the phase-shifting regions in any arbitrary pattern on an image plane. At least one of the phase-shifting regions constitutes a connective phase-shifting region with edges spaced from edges of adjacent ones of the phase-shifting regions to create a pattern with a continuous body of photoresist covering areas corresponding to the phase-shifting regions upon exposure of the mask.
    Type: Grant
    Filed: April 2, 1993
    Date of Patent: November 8, 1994
    Assignee: International Business Machines Corporation
    Inventors: Phillip J. Brock, Jacqlynn A. Franklin, Franklin M. Schellenberg, Jiunn Tsay
  • Patent number: 5362587
    Abstract: According to the The present invention, there are provided an electrophotographic photosensitive member, an electrophotographic apparatus comprising the electrophotosensitive member, and a facsimile system comprising the electrophotographic apparatus. The electrophotographic photosensitive member comprises a conductive support, a photosensitive layer and an intermediate layer interposed therebetween. The intermediate layer comprises a material derived from an isocyanate compound and a plurality of kinds of polyether polyol compounds, the polyether polyol compounds meeting at least one of the following requirements i) and ii):i) a ratio of a weight average molecular weight of at least one polyether polyol compound to a weight average molecular weight of at least one other polyether polyol compound is 1.3 or more; andii) at least one polyether polyol compound has different functionality from that in at least one other polyether polyol compound.
    Type: Grant
    Filed: August 27, 1993
    Date of Patent: November 8, 1994
    Assignee: Canon Kabushiki Kaisha
    Inventors: Yuichi Hashimoto, Takashi Koyama
  • Patent number: 5362583
    Abstract: A reticle mask comprising: an exposure pattern for forming a unit for integrated circuits; and a window serving as a blank pattern, said window serving as a blank pattern existing in a region except the exposure pattern; and a method for exposing a pattern for integrated circuits which comprises the steps of: shielding said reticle mask at the exposure pattern for forming the units for integrated circuits; positioning and exposing the blank pattern over an incomplete pattern existing at the periphery of the photoresist film; and removing the exposed incomplete pattern by development.
    Type: Grant
    Filed: January 26, 1993
    Date of Patent: November 8, 1994
    Assignee: Sharp Kabushiki Kaisha
    Inventor: Koji Nakagawa
  • Patent number: 5362586
    Abstract: A photoreceptor for use in a two color electrostatic imaging process is disclosed which comprises a conductive substrate layer; a first photogenerating layer overlaying the substrate layer which is sensitive to a first wavelength; a unipolar hole transporting layer overlaying the first photogenerating layer; and a second photogenerating layer overlaying the hole transporting layer which is sensitive to a second wavelength and at least partially transmits the first wavelength; wherein the transporting layer is substantially transparent to the first wavelength.An apparatus for forming multi-color images of an object employing the photoreceptor of the invention, wherein the color images are properly registered with respect to each other, is also disclosed.
    Type: Grant
    Filed: June 25, 1992
    Date of Patent: November 8, 1994
    Assignee: Xerox Corporation
    Inventor: Geoffrey M. T. Foley
  • Patent number: 5358821
    Abstract: Polymer encapsulated pigment particles, or electrically passivated pigments, are dispersed in a thermoplastic binder resin by flushing an aqueous slurry or water-wet presscake of the encapsulated pigment particles, using an organic liquid, into the binder resin to form a uniform dispersion of the pigment particles in the binder resin. Subsequently, the dispersion is cooled, solidified and pulverized to form an electrophotographic toner. The triboelectric properties of toners containing pigments having different electrical properties can be thereby controlled, so that the tribos of different colored toners are within a narrow range.
    Type: Grant
    Filed: December 28, 1990
    Date of Patent: October 25, 1994
    Assignee: Xerox Corporation
    Inventors: Jacques C. Bertrand, Roger N. Ciccarelli
  • Patent number: 5358809
    Abstract: A method of fabricating thin film structures on the surface of a transparent substrate (10) in which a light shielding pattern (20, 54) is provided adjacent the opposing substrate surface and in which deposited thin film layers are photolithographically patterned by directing radiation onto the light shielding pattern and by varying the angle of the exposing radiation for respective layers whereby the thin film layers are patterned differently while using the same light shielding pattern. Various thin film structures can be fabricated inexpensively and reliably using this approach together with standard processing techniques such as the use of temporary layers and lift-off procedures. In particular, by appropriate design of the light shielding pattern and selection of deposited materials, active matrix arrays, e.g. comprising MIMs or TFTs with associated conductors, for use in liquid crystal display devices can be produced.
    Type: Grant
    Filed: February 19, 1993
    Date of Patent: October 25, 1994
    Assignee: U.S. Philips Corporation
    Inventor: Cornelis Van Berkel
  • Patent number: 5356738
    Abstract: The edge of a 180.degree. phase shifter on a glass substrate of a reticle has a tapered structure, and a reduction of the intensity of transmitted light by an interference in the boundary area between the phase shifter and the glass substrate is moderated.
    Type: Grant
    Filed: December 24, 1991
    Date of Patent: October 18, 1994
    Assignee: Nippon Steel Corporation
    Inventors: Hiroyuki Inoue, Kenji Anzai, Kimiaki Tanaka
  • Patent number: 5354633
    Abstract: Novel photomask blanks and methods for producing photomasks using laser-imaging apparatus. The photomask blanks include at least one layer that absorbs laser energy and ablates in response thereto, and, where unremoved as a result of the imaging process, perform the masking function by blocking the passage of actinic radiation; and a a mechanically strong, durable and flexible substrate that is substantially transparent to actinic radiation.
    Type: Grant
    Filed: September 22, 1993
    Date of Patent: October 11, 1994
    Assignee: Presstek, Inc.
    Inventors: Thomas E. Lewis, Michael T. Nowak
  • Patent number: 5354639
    Abstract: A color toner for developing electrostatic images is formed of color toner particles each including a binder resin, a polyalkylene, and a colorant. The color toner particles are formed by suspension polymerization. The polyalkylene is characterized by having a crystallinity of 10-50% and a melting enthalpy (as measured by a differential scanning calorimeter) of at most 35 cal/g. The color toner is characterized by an improved fixability without causing offset especially at a relatively low temperature and suitable for providing a transparency film for an overhead projection.
    Type: Grant
    Filed: August 28, 1992
    Date of Patent: October 11, 1994
    Assignee: Canon Kabushiki Kaisha
    Inventors: Takashige Kasuya, Takayuki Nagatsuka, Tatsuya Nakamura, Makoto Kanbayashi, Tatsuhiko Chiba
  • Patent number: 5354640
    Abstract: A toner for developing an electrostatic image has toner particles. The toner particles are prepared by suspension polymerization and contain at least two components comprised of a high softening point resin-A and a low softening point material-B. The toner particles each have a structure separated into a phase-A mainly composed of the resin-A and a phase-B mainly composed of the material-B. The phase-B is absent in the vicinity of the toner particle surface, ranging from its surface to a depth 0.15 time a toner particle diameter. The toner particles contain an organic solvent, a polymerizable monomer or a mixture thereof in a quantity of not more than 1,000 ppm.
    Type: Grant
    Filed: September 21, 1992
    Date of Patent: October 11, 1994
    Assignee: Canon Kabushiki Kaisha
    Inventors: Makoto Kanbayashi, Takayuki Nagatsuka, Takashige Kasuya, Tatsuya Nakamura, Tatsuhiko Chiba
  • Patent number: 5350658
    Abstract: A method of forming fixed images including uniformly charging a photoconductor selectively exposing the photoconductor to light, developing an electrostatic latent image whereby a toner is applied to the electrostatic latent image formed on the photoconductor to form a visible image, transferring the formed visible image to a recording medium, and fixing the transferred visible image onto the recording medium, in which the toner is a thermally dissociating encapsulated toner, the photoconductor is a heat-resistant photoconductive film belt, and the transferring process and the fixing process are simultaneously carried out on the heat-resistant photoconductive film belt at a temperature of from 40.degree. to 120.degree. C.
    Type: Grant
    Filed: September 4, 1992
    Date of Patent: September 27, 1994
    Assignee: KAO Corporation
    Inventors: Shin-ichiro Yasuda, Kuniyasu Kawabe, Mitsuhiro Sasaki
  • Patent number: 5348837
    Abstract: A projection exposure apparatus has an effective source, a mask, a projection lens and an optical filter. The mask is illuminated with the light from the effective source having a substantially annular illumination distribution. The optical filter is disposed in the approximate position of the pupil plane of the projection lens. On the pupil plane, the transmittance of a first region is made lower than that of a second region, the first region being inside of the periphery of an annular region substantially conjugate with the effective source having the annular illumination distribution, the second region being outside of the periphery. Built in this manner, the apparatus forms fine patterns whose unit size is at least as small as the wavelength of the light used while maintaining high values of contrast and deep levels of focal length.
    Type: Grant
    Filed: February 2, 1993
    Date of Patent: September 20, 1994
    Assignee: Hitachi, Ltd.
    Inventors: Hiroshi Fukuda, Ryoko Yamanaka, Tsutomu Tawa, Tsuneo Terasawa, Seiji Yonezawa
  • Patent number: 5348826
    Abstract: A phase-shifted reticle with patterns proximate each other having inverted phases for the features and phase-shifting elements, and methods of fabricating the reticle. Each of the patterns and inverted patterns are structurally identical with regard to the direction of phase shift, so that any focal shift due to phase error is in the same direction for all patterns. In a preferred embodiment, the structurally identical inverted reticle is used to form an array of closely spaced contact or via openings. For a first pattern on the reticle, the feature will be the 0.degree. phase and the phase-shifting rim surrounding that feature will be the 180.degree. phase. All patterns surrounding the first pattern have phase-shifting rims of the 0.degree. phase and features of the 180.degree. phase. In this way, each pattern can form below conventional resolution features in the resist.
    Type: Grant
    Filed: February 2, 1993
    Date of Patent: September 20, 1994
    Assignee: Intel Corporation
    Inventors: Giang T. Dao, Qi De Qian, Nelson N. Tam, Eng T. Gaw, Harry H. Fujimoto
  • Patent number: 5348827
    Abstract: A plate material for a shadow mask, consisting essentially of iron or of iron and nickel and having a surface configuration which stabilizes the adhesion between the plate material and a photoresist and improves the adhesion between the plate material and a negative pattern in the process of producing a shadow mask, thereby enabling improvements in the quality and the productivity, and which causes no annealing adhesion in the shadow mask softening annealing step in the process of producing a color picture tube. The plate material has a surface roughness Ra and a surface roughness projection condition Rsk, which are defined as follows:Ra: from 0.3 to 0.8.mu.mRsk: +0.1 or morewhere Ra is the surface roughness specified in JIS B 0601, and Rsk is a value representative of the relativity of an amplitude distribution curve to a mean line, i.e.
    Type: Grant
    Filed: April 25, 1991
    Date of Patent: September 20, 1994
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventor: Tsutomu Hatano
  • Patent number: 5346790
    Abstract: A process for the preparation of a toner comprising: preparing an organic phase comprised of a first nonpolar olefinic monomer, a second nonpolar diolefinic monomer, a pigment, a free radical initiator, and optionally a charge control agent; adding the organic phase to an aqueous phase comprised of at least one surfactant; shearing the organic phase into the aqueous phase to form a microdroplet suspension of the organic phase dispersed in the aqueous phase; heating and polymerizing the microdroplets in the suspension to form nonpolar olefinic resin particles; halogenating the nonpolar olefinic resin particle mixture to form a nonpolar toner having a halopolymer resin outer surface or encapsulating shell; and optionally isolating the surface halogenated nonpolar toner.
    Type: Grant
    Filed: December 14, 1992
    Date of Patent: September 13, 1994
    Assignee: Xerox Corporation
    Inventors: Guerino G. Sacripante, Michael K. Georges, Grazyna Kmiecik-Lawrynowicz, Timothy J. Fuller
  • Patent number: 5344729
    Abstract: In a method for fabricating a reusable conformal photomask for a doubly contoured hemispherical substrate such as a radome or a three-dimensional printed circuit board, a light blocking material is deposited on a shell or tool corresponding to the shape of the radome or printed circuit board. A pattern is then formed in the light blocking material, and portions of the light blocking material corresponding to the pattern are removed. The resulting pattern corresponds to the pattern to be formed on the three-dimensional printed circuit board or radome. A light transmissive layer is then deposited over the light blocking layer for support. The light blocking material and the light transmissive material comprise the reusable conformal photomask which is then removed from the shell. The reusable conformal photomask can be used to form an image of the desired pattern on the three-dimensional printed circuit board or radome.
    Type: Grant
    Filed: June 26, 1992
    Date of Patent: September 6, 1994
    Assignee: Martin Marietta Corporation
    Inventors: Rickey D. Akins, John Walvoord, James E. Foreman