Abstract: An extreme ultraviolet (EUV) lithography system includes an extreme ultraviolet (EUV) radiation source to emit EUV radiation, a collector for collecting the EUV radiation and focusing the EUV radiation, a reticle stage for supporting a reticle including a pellicle for exposure to the EUV radiation, and at least one sensor configured to detect particles generated due to breakage of the pellicle.

Abstract: An overlay metrology tool and diffraction-based overlay measurements are described herein. The tool includes a light source for generating an incident light that illuminates stacked overlay targets formed within material layers of a wafer and a light sensing system for measuring characteristics of a diffracted light beam reflected from the surface of the wafer. During a single illumination of the wafer and without rotating a polarization of the incident light beam, the light sensing system generates three components of the diffracted light beam having one or more polarizations and intensities, according to an overlay recipe associated with the stacked overlay targets.

Abstract: Provided is an image exposure device capable of recording a favorable image and capable of decreasing the size of the device. An image exposure device (10) includes an image display device (12) having pixels (13), a photosensitive recording medium support portion (21) that supports a photosensitive recording medium (14) for recording an image of the image display device (12) in a state in which an exposure surface (14A) of the photosensitive recording medium (14) faces the image display device (12), and a transmitted light control portion (16) that is provided between the image display device (12) and the photosensitive recording medium support portion (21) and is formed by laminating three or more layers of transmission members (100) that have a plurality of openings (102) formed therein and transmit only light incident on the openings (102).

Abstract: A projection exposure apparatus for semiconductor lithography has a connecting element for connecting a component of the apparatus to a supporting cooling structure of the apparatus. The connecting element has a receiving region for receiving the component, and the connecting element has a foot region for connecting the connecting element to the supporting cooling structure. At least one joint is arranged between the receiving and foot regions, and at least one heat conducting element is arranged between the receiving and foot regions. The heat conducting element is soft in the actuation direction of the joint and has a stiffness perpendicularly to the actuation direction of the joint that is at least twice as large as in the actuation direction of the joint.

Abstract: Example embodiments relate to calibration systems usable for distortion characterization in cameras. An example embodiment includes a calibration system. The calibration system includes a first calibration target that includes a first mirror, a plurality of fiducials positioned on or adjacent to the first mirror, and an indexing fiducial positioned on or adjacent to the first mirror. The calibration system also includes a second calibration target that includes one or more second mirrors and has an aperture defined therein. The first mirror and the one or more second mirrors are separated by a distance. The first mirror faces the one or more second mirrors. The indexing fiducial is visible through the aperture in the second calibration target. Reflections of the plurality of fiducials are visible through the aperture defined in the second calibration target. The reflections of the plurality of fiducials are iterated reflections.

Abstract: An EUV light generating apparatus includes: a chamber device including an inner wall surrounding a space, and a plasma generating region in the space in which plasma is generated from a droplet irradiated with a laser beam; a heat shield including a through-hole and a channel portion, and disposed between the inner wall and the plasma generating region; a gas supply device that supplies gas; a gas introducing cylinder that is provided in the space on a side opposite to the plasma generating region, extends toward the through-hole, and introduces the gas supplied from the gas supply device through the through-hole toward the plasma generating region over the heat shield; and an optical unit optically coupled to the space through an internal space of the gas introducing cylinder and the through-hole. An entire front end surface of the gas introducing cylinder faces the heat shield.

Abstract: A lithography system and a cleaning method thereof are provided. The lithography system includes a light source generator. The light source generator includes a collector, a droplet generator and a droplet catcher. The droplet generator and the droplet catcher are facing each other, and disposed at a region surrounding the collector. The cleaning method includes: shifting the droplet generator out of the light source generator via a port of the light source generator; inserting a shove assembly into the light source generator via the port; using a borescope attached to the shovel assembly to identify a location of a deposit formed by droplets generated by the droplet generator; using the shovel assembly to remove and collect the deposit; and withdrawing the shovel assembly along with the borescope from the light source generator via the port.

Abstract: An inspection apparatus configured to provide assistance in the inspection of an object such as but not limited to a petrochemical vessel or pipeline. The inspection apparatus of the present invention includes a support pole wherein the support pole has an inspection assembly mounted to the second end thereof. The inspection assembly includes a base mount having an upper mounting plate and a lower mounting plate secured to the upper surface and lower surface respectively. A plurality of light mounts are secured to the upper mounting plate and the lower mounting plate each having a light secured thereto. The inspection assembly is moveably mounted to the support pole utilizing a first arm assembly and a second arm assembly. An additional pole member having a reel assembly with a steel cable is further included to provide control and manipulation of the inspection assembly.

Abstract: Devices, systems, and methods position a template for imprinting a formable material over one or more gas-flow channels on a stage, wherein the template includes a patterning surface, a mesa, and at least one mesa sidewall; and direct a gas flow through the one or more gas-flow channels toward a portion of the at least one mesa sidewall.

Abstract: A patterning device for use with a lithographic apparatus, the device comprising an absorber portion configured to absorb incident radiation and to reflect a portion of incident radiation, the absorber portion comprising a first layer and a second layer, the first layer of the absorber portion comprising a first material that is different from a second material of the second layer of the absorber portion; a reflector portion arranged beneath the absorber portion, the reflector portion being configured to reflect incident radiation; and a phase tune portion arranged between the reflector portion and the absorber portion, the phase tune portion being configured to induce a phase shift between the radiation reflected by the reflector portion and the portion of radiation reflected by the absorber portion such that the radiation reflected by the reflector portion destructively interferes with the portion of radiation reflected by the absorber portion.

Abstract: A method for a lithography exposure process is provided. The method includes irradiating a target droplet with a laser beam to create an extreme ultraviolet (EUV) light. The method further includes reflecting the EUV light with a collector. The method also includes discharging a cleaning gas over the collector through a gas distributor positioned next to the collector. A portion of the cleaning gas is converted to free radicals before the cleaning gas leaves the gas distributor, and the free radicals are discharged over the collector along with the cleaning gas.

Abstract: Embodiments of the present disclosure generally provide improved photolithography systems and methods using a digital micromirror device (DMD). The DMD comprises columns and rows of micromirrors disposed opposite a substrate. Light beams reflect off the micromirrors onto the substrate, resulting in a patterned substrate. Certain subsets of the columns and rows of micromirrors may be positioned to the “off” position, such that they dump light, in order to correct for uniformity errors, i.e., features larger than desired, in the patterned substrate. Similarly, certain subsets of the columns and rows of micromirrors may be defaulted to the “off” position and selectively allowed to return to their programmed position in order to correct for uniformity errors, i.e., features smaller than desired, in the patterned substrate.

Abstract: A system is provided with a measurement system having a light source, a plurality of light sensors, and a controller coupled to the light source and the plurality of light sensors. The controller is configured to monitor one or more parameters between a rotor and a casing at least partially based on an interruption or a transmission of light from the light source to the plurality of light sensors.

Abstract: Combination of a stage and a level sensor configured to sense a height level at a target location on an object is described, the stage comprising an object table configured to hold the object and a positioning device for displacing the object table relative to the level sensor in a first direction, the level sensor comprising a projection system configured to project a measurement beam onto a measurement area of the object, the measurement area having a measurement area length in the first direction, a detector system configured to receive different portions of the measurement beam after being reflected off different sub-areas within the measurement area, the different sub-areas being arranged in the first direction, and to supply output signals representative of the different portions received, a signal processing system configured to process the output signals from the detector system.

Abstract: A lithographic apparatus includes a projection system which includes a plurality of optical elements configured to project a beam of radiation onto a radiation sensitive substrate. The lithographic apparatus also includes a metrology frame structure which includes a part of one or more optical element measurement systems to measure the position and/or orientation of at least one of the optical elements. The plurality of optical elements, a patterning device stage, and a substrate stage are arranged such that, in a two dimensional view on the projection system, a rectangle is defined such that it envelops the plurality of optical elements, the patterning device stage, and the substrate stage. The rectangle is as small as possible. The metrology frame structure is positioned within the rectangle.

Abstract: A distance measuring device includes an imaging optical system having an optical filter and an imaging element in which a plurality of pixel portions is arranged. The optical filter is divided into three regions, the first region has a first spectral transmittance characteristic, and the second region and the third region a second spectral transmittance characteristic in which light having a longer wavelength compared to the first spectral transmittance characteristic is transmitted. The first pixel portion that configures the imaging element includes a first photoelectric conversion unit and receives light that has passing through the first region. The second pixel portion that configures the imaging element includes second and third photoelectric conversion units, and receives light that has passed through each of the second region and the third region.

Abstract: This invention discloses apparatus for generating an ophthalmic lens with at least a portion of one surface free-formed from a Reactive Mixture. In some embodiments, an ophthalmic lens is formed on a substrate with an arcuate optical quality surface via a source of actinic radiation controllable to cure a definable portion of a volume of Reactive Mixture.

Abstract: There are provided an optical sensing assembly, a method for manufacturing an optical sensing assembly, and an optical sensing system. In the optical sensing assembly, a light emitting surface of a light emitting element is arranged in nonparallel to a light receiving surface of a light sensing element. Further, the optical sensing system is formed by the optical sensing assembly and a light guide assembly. Therefore, a distance between light emitted by the light emitting element to a to-be-detected object and light received by the light sensing element is increased, so that optical crosstalk can be greatly suppressed even if the optical sensing assembly has a small size, thereby improving distance detection accuracy.

Abstract: A lithographic cluster includes a track unit and a lithographic apparatus. The lithographic apparatus includes an alignment sensor and at least one controller. The track unit is configured to process a first lot and a second lot. The lithographic apparatus is operatively coupled to the track unit. The alignment sensor is configured to measure an alignment of at least one alignment mark type of a calibration wafer. At least one controller is configured to determine a correction set for calibrating the lithographic apparatus based on the measured alignment of the at least one alignment mark type and apply first and second weight corrections to the correction set for processing the first and second lots, respectively, such that overlay drifts or jumps during processing the first and second lots are mitigated.

Abstract: A lithographic apparatus prints a focus metrology pattern (T) on a substrate, the printed pattern including at least a first array of features (800). Features at any location within the array define a pattern that repeats at in at least a first direction of periodicity (X), while geometric parameters of the repeating pattern (w1, w3) vary over the array. A focus measurement is derived from measurements of the array at a selected subset of locations (ROI). As a result, the geometric parameters upon which the measurement of focus performance is based can be optimized by selection of locations within the array. The need to optimize geometric parameters of a target design on a reticle (MA) is reduced or eliminated. The measured property may be asymmetry, for example, and/or diffraction efficiency. The measured property for all locations may be captured by dark-field imaging, and a subset of locations selected after capture.