Abstract: The present invention provides a non-destructive method of characterizing CMAS infiltration and CMAS assisted damage in thermal barrier coatings (TBCs). Such approach is especially relevant for determining the lifetime of coatings on e.g. turbines or parts of the turbines such as blades or in-liners of the combustion chambers. The turbines can be gas turbines or high-pressure turbines or others and may be stationary or used for example in aviation.

Abstract: Spectrometer and Method for Measuring the Spectral Characteristics thereof. The present invention provides an improved spectrometer and method for measuring the spectral characteristics of an object using the spectrometer. The spectrometer uses single aberration-corrected lens or mirror system such that the light passes through or reflects off that component only once. The lens or mirror system includes a plurality of different lens or mirror that may or may not be made up of different materials which act as one single system and wherein the lens or mirror are aligned such that the different wavelengths contained in the input signal are focused on one plane.

Abstract: A multilayered film for performing spectroscopic measurements in a fluid are provided. The multilayered film includes a substrate; a porous layer adjacent to the substrate; and a reflective layer formed on the porous layer, wherein the porous layer selectively allows a component of a fluid to be optically measured when the multilayered film is immersed in the fluid. A sensor for spectroscopic measurements in crude oil samples including a multilayered film as above is also provided. A method of manufacturing a multilayered film for spectroscopic measurements in fluids as above is also provided.

Abstract: Systems and methods which provide a compact spectrometer using static Fourier transform interferometer (SFTI) cube configurations, such as are suitable for use with respect to mobile and portable electronic devices, are described. A SFTI cube of embodiments comprises a monolithic dual mirrored wedge beam splitter structure wherein mirrored wedge surfaces provide two reflective mirrors that are slightly tilted away from the orthogonal directions so that the resultant beams of light cross over one another and form an interference pattern. SFTI cube implementations of embodiments facilitate highly compact spectrometer configurations having a wide wavelength range, high resolution, high throughput, and low cost.

Abstract: A coordinate measuring apparatus, comprising a rotatably driveable receptacle for a gear workpiece and a measuring assembly, and configured to perform feed movements and measuring movements of the measuring assembly relative to the gear workpiece on a plurality of axes, the measuring assembly including an optical switch sensor which operates in a contactless manner, which is designed as a focus trigger sensor and is arranged on the measuring assembly in such a way that it is able to emit a light beam along an optical axis in the direction of the gear workpiece, wherein a scanning movement relative to the gear workpiece can be carried out with the focus trigger sensor by using one or more of the axes, and wherein a switching signal can be provided by the focus trigger sensor whenever the gear workpiece has reached a nominal distance relative to the focus trigger sensor.

Abstract: An apparatus is provided. The apparatus comprises a substrate; a low index of refraction region in or on the substrate; an optical waveguide; a cover; wherein at least a portion of the low index of refraction region and the optical waveguide are hermetically sealed under the cover; a chamber formed by the low index of refraction region and the cover; atoms; an environment, in the chamber, including the atoms and having a first index of refraction; a segment of the optical waveguide formed over the low index of refraction region and within the chamber; and wherein the segment has a second index of refraction which is substantially equal to the first index of refraction.

Abstract: A metrology apparatus for and a method of determining a characteristic of interest relating to at least one structure on a substrate. The metrology apparatus comprises a sensor and an optical system. The sensor is for detecting characteristics of radiation impinging on the sensor. The optical system comprises an illumination path and a detection path. The optical system is configured to illuminate the at least one structure with radiation received from a source via the illumination path. The optical system is configured to receive radiation scattered by the at least one structure and to transmit the received radiation to the sensor via the detection path.

Abstract: A detection apparatus, a detection method and a detection system are provided. The detection apparatus includes: a light source module used to provide illumination for color filters; an image obtaining module used to obtain image data of the color filters; a light adjusting module disposed at a light-emitting side of the light source module and used to adjust a light direction of the light source module to make the light direction coincide with an orientation of the pixel units on a first direction or a second direction perpendicular to the first direction; a data processing module connected to the image obtaining module and used to perform a processing on the image data and judge whether there is an unqualified pixel unit in the pixel units as per a result of the processing. The light direction is adjustable to coincide with the orientation of pixel units.

Abstract: A particle counting method comprises obtaining first particle information related to the gas to be measured by a first particle counter with a first particle size detection range, obtaining second particle information related to the gas to be measured by a second particle counter with a second particle size detection range, and generating particle size distribution information according to the first and second particle information. The first particle information includes a plurality of particle size ranges and a plurality of particle quantities wherein each of the plurality of particle size ranges corresponds to a respective one of the plurality of particle quantities, the second particle information includes the quantity of particles of which the size values are in the second particle size range, and the lower limit of the second particle size range is lower than that of the first particle size range.

Abstract: Spectroscopic apparatus and methods incorporating a gas sensor configured to detect low concentration gases, including gases that are hazardous volatiles are provided. Low concentration gases can comprise gases where detection of concentrations on the order of parts-per-million (ppm), and in many embodiments part-per-billion (ppb) is required. The gas may be a species, such as, for example hydrogen sulfide (H2S) that may be produced in drilling and/or volcanic eruptions. The spectroscopic apparatus and methods are configured to operate in particular atmospheres where gas detection can be challenging, such as in ambient air and/or in space where various contaminants may be present. The spectroscopic apparatus and methods may incorporate a long path length detector, such as, for example, a cavity-enhanced absorption spectrometer. The methods and apparatus further incorporate a wavelength modulation technique to improve the signal-to-noise ratio.

Abstract: Front side, reverse side, and transmissive images for a media item are obtained during a transaction at a transaction terminal wherein the media item is being processed by or urged through the transaction terminal during the transaction. A substrate image is derived from the front side, reverse side, and transmissive images. Features are extracted from the substrate image and compared against model features for a given type and a given denomination associated with the media item. A decision is made as to whether the media item is genuine or counterfeit based on the comparison between the extracted features and the model features, and the indication is provided to the transaction terminal during the transaction.

Abstract: To inspect a separator roll for a defect inside the separator roll with use of only a small number of defect inspection devices, a defect inspection device (1) includes: a radiation source section (2) configured to emit an electromagnetic wave (4) to a separator roll (10); and a sensor section (3) configured to detect the electromagnetic wave (4) having passed through the separator roll (10).

Abstract: Disclosed is an electronic device and a method for sensing proximity in an electronic device, which reduces an error in sensing a proximity distance by considering a color of an object when sensing the proximity distance to the object based on an amount of light reflected from the object.

Abstract: An airborne or liquid particle sensor with a number of advanced features is disclosed. The sensor includes an output channel generating an electrical signal for a particle passing through the sensor, where the electrical signal includes information related to the pulse. The information is processed by the sensor to determine a value that indicates a more accurate particle mass for a sample period than the average mass.

Abstract: Embodiments include devices and methods for detecting particles in a wafer processing tool. In an embodiment, a particle monitoring device having a wafer form factor includes several micro sensors capable of operating in all pressure regimes, e.g., under vacuum conditions. The particle monitoring device may include a clock to output a time value when a parameter of a micro sensor changes in response to receiving a particle within a chamber of the wafer processing tool. A location of the micro sensor or the time value may be used to determine a source of the particle. Other embodiments are also described and claimed.

Abstract: Illustrative embodiments of determining geometric characteristics of reflective surfaces are disclosed. In at least one illustrative embodiment, a method of determining geometric characteristics of reflective surfaces includes sensing electromagnetic waves with a sensor, where the electromagnetic waves have been reflected off a reflective surface of a specimen from a target structure including a feature point. The method further includes determining a displacement of the feature point of the target structure indicated by the sensed electromagnetic waves relative to reference data indicating a reference location for the feature point and determining a surface slope of a point of the reflective surface based on the determined displacement of the feature point of the target structure.

Abstract: The present invention relates to a method for detecting steel sample components by using a multi-pulse laser induced plasma spectral analysis device, and in particular, to a method for detecting steel sample components by using a multi-pulse laser induced plasma spectral analysis device that includes picosecond and nanosecond laser pulse widths. A laser induced light source is a laser light source that includes nanosecond and picosecond ultrashort pulses, and one pulse laser device can be used to generate two pulse lasers, namely, a nanosecond and a picosecond laser; the two pulse lasers pass through a same output and focusing light path, so as to ensure that the two pulse lasers are focused on a same position of a sample to be detected; a surface of the sample is irradiated by using a first beam of nanosecond laser pulse to generate plasmas; subsequently, the plasmas are irradiated by using a second beam of picosecond laser pulse to enhance spectral line emission.

Abstract: A system includes a method and apparatus suitable for measuring planar drop sizes in a liquid spray. Measurement may involve illuminating the spray with multiple lasers and measuring the scattered intensities at several view angles using linear arrays. The system may use inverse calculation of the measured scattered intensity to estimate the local drop sizes across the entire plane in a spray. The system includes radiation detectors containing sensing elements, a lens systems, and analog to digital conversion board to convert scattered intensities to drop sizes. In addition, the system may include choppers including at least two unique filters. The filters may be selectively placed in a path between the spray and the sensing elements. By selectively placing a single array may measure both a scattered intensity and an extinction of laser light emitted from the spray.

Abstract: A measurement system for performing measurement by Brillouin scattering analysis, the system comprising a laser emitter device (10) configured to emit an incident wave (?0) and a reference wave (?0??B), the incident wave presenting an incident frequency (?0) and the reference wave presenting a reference frequency (?0??B), the reference frequency (?0??B) being shifted from the incident frequency (?0) by a predetermined value (?B). The system is configured to: project the incident wave (?0) into the optical fiber (25); receive in return a backscattered wave (?0??S); generate a composite wave (?0-S, 0-B) combining the backscattered wave (?0??S) and the reference wave (S0??B); and determine at least one property relating to the fiber by analyzing a Brillouin spectrum of the composite wave (?0-S, 0-B). Advantageously, the incident wave and the reference wave come from a dual-frequency vertical-cavity surface-emitting laser source (12) forming part of the laser emitter device.

Abstract: A device for positioning an integrated circuit wafer includes: a base, called upper, and a base, called lower, arranged at a distance from one another in a direction, called vertical, so as to leave a free space between the bases; a support, provided to be mobile between the upper and lower bases, and including a location for receiving the wafer to be inspected; at least one first means apparatus for positioning the support in the vertical direction against, or by cooperation with, the upper base; and at least one second means apparatus for positioning the support in the vertical direction against, or by cooperation with, the lower base. Also provided is an inspection equipment for an integrated circuit wafer implementing such a positioning device.