Patents Examined by Zeinab EL-Arini
  • Patent number: 7201805
    Abstract: This invention relates to a degreasing process and device. It is particularly useful for degreasing surfaces coated with lanoline. The process according to this invention comprises a step to clean the surface to be degreased with a cleaning solvent and a step to rinse the cleaned surface with a rinsing solvent, said cleaning solvent including a solvent A comprising dipropylene glycol monomethyl ether with a boiling point of more than 100° and without a flash point or with a flash point of more than 70°, and said rinsing solvent comprising a solvent B comprising 1,1,1,2,3,4,4,5,5,5-decafluoropentane with a boiling point less than 70° and a surface tension less than 30 mN/m.
    Type: Grant
    Filed: September 28, 2001
    Date of Patent: April 10, 2007
    Assignee: Commissariat a l'Energie Atomique
    Inventors: Pascal Thouvenot, Pierre Plume
  • Patent number: 7198054
    Abstract: A dishwasher includes a cabinet having arranged therein a central cavity. Slidably supported within the second cavity are first and second dish support rack systems. The first dish support rack system is defined by first and second upper dish support racks with the first upper dish support rack having a first width and the second dish support rack having a second width, substantially smaller than the first width. The second dish support rack system includes first and second lower dish support racks, each being substantially similar in construction to the first and second upper dish support racks. The dishwasher includes a first wash zone defined by the first upper and lower racks and a second wash zone defined by the second upper and lower racks. A control can selectively direct pressurized wash water through an associated spray arm member to the first and second wash zones either singly or collectively.
    Type: Grant
    Filed: December 17, 2003
    Date of Patent: April 3, 2007
    Assignee: Maytag Corporation
    Inventor: Rodney M. Welch
  • Patent number: 7195021
    Abstract: A method for cleaning optics in a chamber. The method can include introducing a first etchant into a chamber that encloses an optical component and a source of electromagnetic radiation that is suitable for lithography, ionizing the first etchant, and removing debris from a surface of the optical component.
    Type: Grant
    Filed: August 30, 2005
    Date of Patent: March 27, 2007
    Assignee: Intel Corporation
    Inventors: Michael Chan, Robert Bristol, Mark Doczy
  • Patent number: 7195678
    Abstract: A method of installing an inspection port on a pipe having asbestos insulation extending therearound in which the method has the steps of positioning the inspection port within a glove bag, affixing an opening of the glove bag onto a surface of the pipe, removing a section of asbestos insulation from the pipe, installing the inspection port onto the pipe within an area of the removed section, and removing the glove bag from the surface of the pipe. An air flow through the bag removes heat from the interior of the glove bag. The interior of the glove bag is maintained at a pressure below ambient.
    Type: Grant
    Filed: May 11, 2005
    Date of Patent: March 27, 2007
    Inventor: Howard Wall
  • Patent number: 7185664
    Abstract: A dish-cleaning appliance comprising a sink having a bowl defining a wash chamber with an open top for providing access to the wash chamber. A liquid recirculation system is provided for spraying liquid throughout the wash chamber. A drain conduit can be provided, alone or in combination with the recirculation system, for draining liquid from the wash chamber when the drain is closed. A fill control system is provided to ensure that the dishwashing cycle is not started with liquid in the wash chamber and that the sink drain is properly closed. One or more sensors can be provided for enabling the fill control system. The sensors can be located within the drain above the location where the drain is plugged.
    Type: Grant
    Filed: February 15, 2006
    Date of Patent: March 6, 2007
    Assignee: Whirlpool Corporation
    Inventors: Ralph E. Christman, Ryan K. Roth
  • Patent number: 7186299
    Abstract: A method for cleaning and drying semiconductor wafers improves device yield by providing more advanced control of the ratio of drying fluid to cleaning fluid, for example the ratio of N2 vapor to IPA vapor. In addition, a quick drain process is employed to improve process throughput, and to further improve particle and watermark removal during the cleaning and drying steps.
    Type: Grant
    Filed: March 9, 2004
    Date of Patent: March 6, 2007
    Assignee: Samsung Electronics, Co., Ltd.
    Inventors: Ki Hwan Park, Jong Kook Song, Mo Hyun Cho, Sung-Ho Jo, Sun Jae Lee, Pyung Ho Lim, Dong Wook Cho
  • Patent number: 7182820
    Abstract: Methods and apparatus for cleaning hearing aid devices are disclosed. Drying is facilitated in hearing instruments through a novel combination of heater and desiccant in an essentially closed system. Greater efficiency is obtained by minimizing the volume of gas, e.g., air, requiring moisture extraction.
    Type: Grant
    Filed: April 17, 2003
    Date of Patent: February 27, 2007
    Assignee: Magnatone Hearing Aid Corporation
    Inventors: Don E. K. Campbell, Srinivas Chari
  • Patent number: 7172657
    Abstract: In a state of the inside of a treatment chamber of treatment equipment being evacuated, therein a cleaning gas containing trifluoroaceticacid (TFA) as a cleaning agent is supplied. Metal such as copper used in the formation of an interconnection or an electrode and stuck on an inner wall surface of the treatment chamber, when coming into contact with the cleaning agent (TFA) in the cleaning gas, without forming an oxide or a metallic salt, is directly complexed. The complex is sublimed due to the evacuation and is exhausted outside the treatment chamber. Accordingly, at less labor and low cost, the cleaning can be efficiently implemented.
    Type: Grant
    Filed: March 9, 2001
    Date of Patent: February 6, 2007
    Assignee: Tokyo Electron Limited
    Inventors: Yasuhiko Kojima, Yasuhiro Oshima
  • Patent number: 7163588
    Abstract: Contaminants such as photoresist are quickly removed from a wafer having metal features, using water, ozone and a base such as ammonium hydroxide. Processing is performed at room temperature to avoid metal corrosion. Ozone is delivered into a stream of process liquid or into the process environment or chamber. Steam may alternatively be used. A layer of liquid or vapor forms on the wafer surface. The ozone moves through the liquid layer via diffusion, entrainment, jetting/spraying or bulk transfer, and chemically reacts with the photoresist, to remove it.
    Type: Grant
    Filed: December 6, 2004
    Date of Patent: January 16, 2007
    Assignee: Semitool, Inc.
    Inventor: Eric J. Bergman
  • Patent number: 7159598
    Abstract: A method, system and apparatus for cleaning a tank through the use of a pair of spray heads arranged in operable communication with a pump via a pair of hose lines. One of the spray heads is operable to disperse a heated mist of cleaning solution, while the other spray head is operable to dispense a jet stream of the cleaning solution. The spray heads can be arranged in a closed loop, recirculating flow of the cleaning solution between the pump and the spray heads, or an open loop. Each hose line has a valve to control the flow of the cleaning solution therethrough so that the spray heads can operate independently from one another.
    Type: Grant
    Filed: November 22, 2004
    Date of Patent: January 9, 2007
    Assignee: ReNew Systems, Inc.
    Inventor: David B. Gregory
  • Patent number: 7156926
    Abstract: A method of removing iron oxide scale from processed sheet metal comprises the steps of: providing a surface conditioning apparatus; and conditioning a surface of the processed sheet metal with the surface conditioning apparatus. In general, the iron oxide scale generally comprises three layers prior to surface conditioning: a wustite layer, a magnetite layer, and a hematite layer. The wustite layer is bonded to a base metal substrate of the processed sheet metal. The magnetite layer is bonded to the wustite layer, and the hematite layer is bonded to the magnetite layer. The surface conditioning apparatus has at least one surface conditioning member. The step of conditioning the surface of the processed sheet metal includes bringing the at least one surface conditioning member into engagement with the surface of the sheet metal.
    Type: Grant
    Filed: August 11, 2004
    Date of Patent: January 2, 2007
    Assignee: The Material Works, Ltd.
    Inventor: Kevin Voges
  • Patent number: 7153370
    Abstract: The present application discloses a method of cleaning a semiconductor wafer by mounting a wafer to a chuck, positioning a gas guard, defining therein a chamber having an open bottom, immediately above the layer of water, spraying de-ionized water onto the wafer while rotating the chuck at a location outside the chamber when the wafer is mounted to the chuck, to thereby form a layer of water on the wafer, and spraying a cleaning gas from a gas spraying unit disposed above said chuck through the chamber and into the layer of water to thereby cause the cleaning gas to dissolve in the layer of water, and at the same time moving the chamber across a surface of the wafer, to thereby clean the wafer, wherein said gas spraying unit includes a gas injection tube oriented to inject the cleaning gas towards the wafer mounted to the chuck, and the gas guard connected to the gas injection tube.
    Type: Grant
    Filed: January 19, 2005
    Date of Patent: December 26, 2006
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Kun-tack Lee, Yong-pil Han, Sang-rok Hah
  • Patent number: 7153372
    Abstract: Gas is introduced prior to a flooding process of a vacuum chamber of a vacuum installation, into coverings of elements, which coverings can be ventilated such that solid bodies are blown out of said coverings thereby preventing a penetration of said solid bodies into the coverings.
    Type: Grant
    Filed: February 3, 2005
    Date of Patent: December 26, 2006
    Assignee: Applied Materials GmbH & Co. KG.
    Inventors: Stefan Hein, Günter Klemm
  • Patent number: 7147722
    Abstract: Activated gaseous species generated adjacent a carbon contaminated surface affords in-situ cleaning. A device for removing carbon contamination from a surface of the substrate includes (a) a housing defining a vacuum chamber in which the substrate is located; (b) a source of gaseous species; and (c) a source of electrons that are emitted to activate the gaseous species into activated gaseous species. The source of electrons preferably includes (i) a filament made of a material that generates thermionic electron emissions; (ii) a source of energy that is connected to the filament; and (iii) an electrode to which the emitted electrons are attracted. The device is particularly suited for photolithography systems with optic surfaces, e.g., mirrors, that are otherwise inaccessible unless the system is dismantled. A method of removing carbon contaminants from a substrate surface that is housed within a vacuum chamber is also disclosed.
    Type: Grant
    Filed: May 24, 2004
    Date of Patent: December 12, 2006
    Assignee: EUV LLC
    Inventors: Leonard E. Klebanoff, Philip Grunow, Samuel Graham, Jr.
  • Patent number: 7125456
    Abstract: The invention relates to a method for cleaning a washing device (5) of an offset printing machine, according to which at least one washing device of said offset machine, which comprises a spray bar (11), is removed prior to the cleaning process and placed in a cleaning bath (17). The aim of the invention is to achieve improved cleaning results in a shorter time, in particular using fewer personnel. To achieve this, ultrasonic waves are directed onto the washing device in the cleaning bath that is filled with a liquid medium and during the cleaning of the washing device using said ultrasonic waves, the liquid medium is conducted through each spray bar. The invention also relates to a cleaning device (16) for carrying out said method.
    Type: Grant
    Filed: March 24, 2003
    Date of Patent: October 24, 2006
    Inventor: Hermann Leufgens
  • Patent number: 7124767
    Abstract: A washout container to which are mounted inclined ramps that allow a transit mixer, concrete pumping truck or other concrete handling vehicle to drive up over a portion of the container for dumping excess concrete and washing out waste concrete. The container cross-section may be rectangular to semi-circular, and is preferably fabricated with a steel structure. A watertight latching door assembly is coupled to the container to prevent leakage of collected liquid concrete waste material while allowing solidified concrete materials to be unloaded at a disposal site. The interior of the container is preferably lined with a material to which concrete will not adhere. The liner may be applied as a coating to the interior of the container or as a solid material retained within the container. In this way, solidified waste concrete can be easily removed from the container at the disposal site and preferably crushed for recycling.
    Type: Grant
    Filed: March 14, 2005
    Date of Patent: October 24, 2006
    Assignee: Concrete Washout Systems, Inc.
    Inventor: Mark Jenkins
  • Patent number: 7121288
    Abstract: A washout container to which are mounted inclined ramps that allow a transit mixer, concrete pumping truck or other concrete handling vehicle to drive up over a portion of the container for dumping excess concrete and washing out waste concrete. The container cross-section may be rectangular to semi-circular, and is preferably fabricated with a steel structure. A watertight latching door assembly is coupled to the container to prevent leakage of collected liquid concrete waste material while allowing solidified concrete materials to be unloaded at a disposal site. The interior of the container is preferably lined with a material to which concrete will not adhere. The liner may be applied as a coating to the interior of the container or as a solid material retained within the container. In this way, solidified waste concrete can be easily removed from the container at the disposal site and preferably crushed for recycling.
    Type: Grant
    Filed: February 6, 2004
    Date of Patent: October 17, 2006
    Assignee: Concrete Washout Systems, Inc.
    Inventor: Mark Jenkins
  • Patent number: 7118633
    Abstract: A method for controlling concrete washout and related washout container to which are mounted inclined ramps that allow a transit mixer, concrete pumping truck or other concrete handling vehicle to drive up over a portion of the container for dumping excess concrete and washing out waste concrete. The container cross-section may be rectangular to semi-circular, and is preferably fabricated with a steel structure. A watertight latching door assembly is coupled to the container to prevent leakage of collected liquid concrete waste material while allowing solidified concrete materials to be unloaded at a disposal site. The interior of the container is preferably lined with a material to which concrete will not adhere. The liner may be applied as a coating to the interior of the container or as a solid material retained within the container. In this way, solidified waste concrete can be easily removed from the container at the disposal site and preferably crushed for recycling.
    Type: Grant
    Filed: September 12, 2005
    Date of Patent: October 10, 2006
    Assignee: Concrete Washout Systems, Inc.
    Inventor: Mark Jenkins
  • Patent number: 7118631
    Abstract: A method for separating a substance such as a hydrocarbon from a particulate material such as soil is provided. An aqueous slurry is formed and a shear force is applied to the slurry, such as in a reversible helical screw conveyor, while the slurry is vibrated. The substance thus separated can then be removed from the particulate material.
    Type: Grant
    Filed: December 11, 2003
    Date of Patent: October 10, 2006
    Assignee: Newtech Commercialization Ltd.
    Inventors: Graham Philips, legal representative, Russell M. Graham, Ernest J. Taylor-Smith, deceased
  • Patent number: 7117876
    Abstract: A method of processing thin flat articles, particularly semiconductor wafers, utilizing sonic energy. In one aspect, the invention is a method comprising: supporting a substrate in a generally horizontal orientation and transmitting sonic energy to the substrate while flowing liquid onto both sides of the substrate to loosen particles on both sides of the substrate while maintaining said orientation. In another aspect, the invention is a cleaning method comprising: applying cleaning fluid to one side of a thin flat article while supporting the article in a generally horizontal orientation; and applying energy to the other one of the sides with sufficient power to produce vibration on the one side in the area of the cleaning fluid to loosen particles on the one side, while maintaining said orientation.
    Type: Grant
    Filed: December 3, 2003
    Date of Patent: October 10, 2006
    Assignee: Akrion Technologies, Inc.
    Inventor: Mario E. Bran