Abstract: A method of clearing residue from a fluid conduit includes commencing flush fluid flow through the fluid conduit and injecting a first fluid into the fluid conduit at a first point to induce turbulent flow of the flush fluid. The first fluid is preferably a gas. The method further includes sampling the flush fluid downstream of the first point to confirm the residue is adequately cleared from the fluid conduit.

Abstract: The method of the present invention cleans abrasive faces of an upper abrasive plate and a lower abrasive plate of an abrasive machine. The method is executed by a cleaning device including: a nozzle for jetting water; a brush for preventing the jetted water from scattering in the air, the brush enclosing the nozzle; and another brush for closing a gap between the preventing brush and an outer edge of the upper abrasive plate, the method is characterized by the steps of: jetting water from the nozzle toward the abrasive face of the upper abrasive plate; moving the nozzle toward the outer edge of the upper abrasive plate; and closing the gap by the closing brush when the gap is formed between the preventing brush and the outer edge of the upper abrasive plate.

Abstract: A method and system for cleaning collector optics in a light source chamber. In producing, for example, extreme ultraviolet light for lithography, debris such as tungsten can accumulate on optical components near a light source in the light source chamber. An etchant, such as a fluorine-containing gas, can be introduced into the light source chamber. The etchant is ionized via electrodes to generate free fluorine. The electrodes can be, for example, existing light source chamber components including the optical components. The fluorine can then react with the debris, forming gaseous compounds, which are pumped out of the light source chamber.

Abstract: A process for removing an aqueous slurry suspension comprising a blast medium and coating substance residues which produced when cleaning surfaces which have a corrosion protection coating. The process, which is particularly applicable to ships and industrial facilities, involves the steps of a) suctioning the aqueous slurry suspension by means of an air feed into a receiving tank which has an outside pressure to tank vacuum ratio of more than 1:0.52; b) diluting the suspension with water; c) continuous feeding of the diluted suspension by means of a pump overcoming a height differential>5 meters; d) separating the solids from the water by means of sedimentation in a settling tank; and e) recycling the separated water. Suctioning of the aqueous slurry suspension is by means of air into receiving a tank which has a vacuum of at least 0.5 bar with respect to atmospheric pressure, in combination with a pump which continuously feeds the water-diluted suspension over a height differential>5 meters.

Abstract: An apparatus and method for automatically collecting metallic impurities of a semiconductor wafer. In one aspect, an apparatus includes an air tight process chamber including a loading unit for loading the semiconductor wafer and unloading unit for unloading the semiconductor wafer; a vapor phase decomposition unit disposed in the process chamber for decomposing a silicon oxide layer on the semiconductor wafer; and a scanning unit disposed in the process chamber for scanning the semiconductor wafer to collect the metallic impurities. The scanning unit includes a scanning solution bottle for obtaining scanning solution that is used for absorbing metallic impurities on the semiconductor wafer; a scanning arm capable of downward, upward, and rotational movement; and a nozzle coupled to the scanning arm for drawing in scanning solution from the scanning solution bottle, and for forming a droplet of scanning solution that cohers to the nozzle when scanning a semiconductor wafer to collect metallic impurities.

Abstract: Analysis equipment for determining a concentration of an organic component and a caustic component of a reusable organic caustic solution that has been utilized for removing a ceramic coating from a metallic component at elevated temperatures and pressures, such as in an autoclave. Sensors are positioned between a filter for removing particles of the ceramic coating dispersed in the reusable organic caustic solution from the reusable organic caustic solution and a storage tank storing the reusable organic caustic solution after removal from the autoclave. The sensors measure physical properties of the reusable organic caustic solution after removal of the particles from the reusable organic caustic solution, such as electrical conductivity, opacity, refractive index, density, fluidity and the speed of sound in the solution.

Abstract: An apparatus for collecting impurities on a semiconductor wafer includes an airtight process chamber, a rotary chuck disposed in the process chamber for rotating and horizontally supporting the semiconductor wafer, a first scanning unit for forming a droplet of a first scanning solution and for scanning an upper surface of the semiconductor wafer rotated by the rotary chuck with the droplet to collect first impurities, a driving unit for tilting the rotary chuck and the semiconductor wafer supported on the rotary chuck, and a second scanning unit for receiving a second scanning solution for collecting second impurities from an edge portion of the semiconductor wafer, the second scanning solution being in contact with the edge portion of the semiconductor wafer tilted by the driving unit and rotated by the rotary chuck so that the second scanning solution scans the edge portion of the semiconductor wafer.

Abstract: A method for preparing a workpiece surface utilizing two more fluids of differing density and miscibility which create one or more fluid interfaces wherein the fluids are chosen such that the solubility or affinity of one of the fluids is high for a material to be removed from the workpiece surface while the other fluid has a low solubility or affinity for the material to be removed. The workpiece surface is treated by passing the workpiece through the fluid interface. The two or more fluids are preferably dispensed into an apparatus and allowed to settle into two or more predominant layers separated by an interface. Surface preparation techniques which may benefit from the present invention include etching, cleaning or drying processes and the like.

Abstract: A produce washing method, which permits the washing of produce from both above and below in the field. The produce washing takes produce along a conveyor belt, from a loading section, to a washing section on which is located a washing unit, upward along an ascending section, and from there the produce travels along a dumping section and into a receptacle. The washing unit features spray nozzles located above and below the washing section, so as to direct spray from above and below the produce so as to more effectively wash it.

Abstract: The present disclosure also relates to a method for cleaning and decontaminating the internal working components of a piece of electronic equipment along a predetermined media path which includes the steps of: 1) providing a base material having first and second surfaces, the base material having a cleaning substrate disposed on the first surface and an adhesive substrate disposed on the second surface; 2) inserting the base material into the electronic equipment along the predetermined media path; and 3) moving the base material through the predetermined media path such that the cleaning substrate cleans and polishes at least one internal working component of the electronic equipment and the adhesive substrate decontaminates at least one internal working component of the electronic equipment.

Abstract: A reprocessing unit for the reprocessing of a device having internal passageways by applying a fluid at a plurality of pressures to the internal passageways of the device to permit reuse of the device in a clean environment, the reprocessing unit including a pressure differentiation device for receiving a fluid having a single input pressure, the pressure differentiation device having first and second pressure control fittings for providing first and second differing pressure outputs in accordance with the single input pressure. Also included are tubing for transmitting the fluid at the first and second differing pressures from the pressure differentiation device to the internal passageways whereby the internal passageways are reprocessed with the transmitted fluid at the first and second differing pressures and the internal passageways are reprocessed at differing pressures in accordance with the single input pressure.

Abstract: A method for separating a substance such as a hydrocarbon from a particulate material such as soil is provided. An aqueous slurry is formed and a shear force is applied to the slurry, such as in a reversible helical screw conveyor, while the slurry is vibrated. The substance thus separated can then be removed from the particulate material.

Abstract: A cleaning sheet has a base sheet, a first polishing layer formed on the base sheet, a porous foamed layer having air bubbles inside formed on the base sheet, and a second polishing layer formed on the foamed layer. The surface of the foamed layer may be flat or preferably porous with the second polishing layer having openings corresponding to those on the porous surface of the foamed layer. For cleaning a probe by using such a cleaning sheet, the tip of the probe is caused to penetrate the surface of the second polishing layer, to pass through the foamed layer and to be pressed against the first polishing layer.

Abstract: Apparatus for washing eggs including a housing with a first feed conveyor for receiving them through the housing inlet for conveying same to a second conveyor which transports them through an intermediate egg washer with various brushes and including a dispenser to apply cleaning solution onto eggs therebelow. Eggs are then transferred from the second conveyor to a third conveyor and transported through a lower washing station for final cleaning. Eggs then exit through a housing outlet for sanitizing and/or drying as may be necessary. The three conveyors are vertically tiered with, optionally, the second conveyor moving oppositely relatively to the first and third conveyor. In this manner a three tiered arranging of conveyors is provided. A pre-washing station can also, optionally, be included.

Abstract: A parts washer including a receptacle positioned on a reservoir for cleaning liquid having a drain opening and a module which engages a portion of the reservoir in the cleaning liquid for adjusting the temperature of the cleaning liquid and circulating the cleaning liquid into the receptacle. The module includes a heating element, a sensor and pump. An enclosure houses a temperature controller which displays the temperature of the cleaning liquid and a low liquid level condition. A bridge thermally links the heating element to the sensor so that the sensor normally generates a signal representative of the temperature of the cleaning fluid unless the level of the cleaning fluid is disposed below the sensor.

Abstract: A method and apparatus are provided for removing solid and/or liquid residues from electronic components such as semiconductor wafers utilizing liquid or supercritical carbon dioxide which is solidified on the surface of the wafer and then vaporized and removed from the system. In a preferred embodiment the solidification and vaporizing steps are repeated (cycled) before removal of the CO2 from the vessel. The residues are carried away with the vaporized carbon dioxide.

Abstract: The present invention relates to a depollution treatment method for soil constituted by materials based mainly on sand and/or earth that have been contaminated with hydrocarbons, wherein said hydrocarbon-contaminated material is mixed at ambient temperature with a hydrogen peroxide solution until gas is given off and said hydrocarbons are separated by flotation.

Abstract: A method for cleaning a dish-cleaning appliance having a removable basket that carries a spray arm. The method comprises: uncoupling the liquid supply from the sprayer, spraying liquid against the peripheral side wall from the liquid supply, and draining the sprayed liquid from the wash chamber.

Abstract: In a method for cleaning for cleaning metallic ion contamination, and especially copper, from wafer containers, the containers are loaded into a cleaning apparatus. The containers are sprayed with a dilute chelating agent solution. The chelating agent solution removes metallic contamination from the containers. The containers are then rinsed with a rinsing liquid, such as deionized water and a surfactant. The containers are then dried, preferably by applying heat and/or hot air movement.

Abstract: A novel chemistry, system and application technique reduces contamination of semiconductor wafers and similar substrates and enhances and expedites processing. A stream of liquid chemical is applied to the workpiece surface. Ozone is delivered either into the liquid process stream or into the process environment. The ozone is preferably generated by a high capacity ozone generator. The chemical stream is provided in the form of a liquid or vapor. A boundary layer liquid or vapor forms on the workpiece surface. The thickness of the boundary layer is controlled. The chemical stream may include ammonium hydroxide for simultaneous particle and organic removal, another chemical to raise the pH of the solution, or other chemical additives designed to accomplish one or more specific cleaning steps.