Abstract: Stitched dies having a cooling structure are described. For example, an integrated circuit structure includes a first die including a first device layer and a first plurality of metallization layers over the first device layer. The integrated circuit structure also includes a second die including a second device layer and a second plurality of metallization layers over the second device layer, the second die separated from the second die by a scribe region. A common conductive interconnection is coupling the first die and the second die at a first side of the first and second dies. A plurality of microfluidic channels is coupled to the first side of the first and second dies.

Abstract: Stitched dies having high bandwidth and capacity are described. For example, an integrated circuit structure includes a first die including a first device layer and a first plurality of metallization layers over the first device layer, wherein the first device layer is a logic device layer. The integrated circuit structure also includes a second die including a second device layer and a second plurality of metallization layers over the second device layer, the second die separated from the first die by a scribe region. The second device layer is a transistor device layer, and the second plurality of metallization layers includes a layer of capacitor structures between an upper metallization layer portion and a lower metallization layer portion. A common conductive interconnection is coupling the first die and the second die at a first side of the first and second dies.

Abstract: Stitched dies having backside power delivery are described are described. For example, an integrated circuit structure includes a first die including a first device layer and a first plurality of metallization layers over the first device layer. The integrated circuit structure also includes a second die including a second device layer and a second plurality of metallization layers over the second device layer, the second die separated from the second die by a scribe region. A signal line is coupling the first die and the second die at a first side of the first and second dies. A backside power rail is coupling the first die and the second die at a second side of the first and second dies, the second side opposite the first side.

Abstract: Integrated circuits with embedded memory that includes ferroelectric capacitors having first conductor structures coupled to an underlying array of access transistors, and second conductors coupled to independent plate lines that are shunted by a metal strap having a pitch similar to that of the capacitors. The independent plate lines may reduce bit-cell disturbs and/or simplify read/write process while the plate line straps reduce series resistance of the plate lines. The metal straps may be subtractively patterned lines in direct contact with the second capacitor conductors, or may be damascene structures coupled to the second capacitor conductors through vias that also have a pitch similar to that of the capacitors.

Abstract: Integrated circuits with embedded memory that includes ferroelectric capacitors having first conductor structures coupled to an underlying array of access transistors, and second conductors coupled to independent plate lines that are shunted by a metal strap having a pitch similar to that of the capacitors. The independent plate lines may reduce bit-cell disturbs and/or simplify read/write process while the plate line straps reduce series resistance of the plate lines. The metal straps may be subtractively patterned lines in direct contact with the second capacitor conductors, or may be damascene structures coupled to the second capacitor conductors through vias that also have a pitch similar to that of the capacitors.

Abstract: Integrated circuits with embedded memory having multiple levels. Each memory array level includes ferroelectric capacitors coupled to an array of thin film access transistors according to a 1T-1F or 1T-many F bit-cell architecture. The levels of embedded memory are monolithically fabricated, one over the other, or after monolithically fabricating one level of embedded memory in a host IC structure, a second IC structure with another level of memory array is directly bonded to a front or backside of the host IC structure in a face-to-face or face-to-back orientation. The second IC structure may include additional peripheral CMOS circuitry, such as sense amps or decoders, or not.

Abstract: Integrated circuits with embedded memory that includes double-walled ferroelectric capacitors over an array of access transistors. Capacitor access transistors may be recessed channel array transistors (RCATs) implemented in a monocrystalline material that has been transferred from a donor wafer, or implemented in an amorphous or polycrystalline semiconductor material that has been deposited, such as a metal oxide semiconductor.

Abstract: Techniques are provided for forming one or more thermoelectric devices integrated within a substrate of an integrated circuit. Backside substrate processing may be used to form adjacent portions of the substrate that are doped with alternating dopant types (e.g., n-type dopants alternating with p-type dopants). The substrate can then be etched to form pillars of the various n-type and p-type portions. Adjacent pillars of opposite dopant type can be electrically connected together via a conductive layer. Additionally, the top portions of adjacent pillars are connected together, and the bottom portions of a next pair of adjacent pillars being coupled together, in a repeating pattern to ensure that current flows through the length of each of the doped pillars. The flow of current through alternating n-type and p-type doped material creates a heat flux that transfers heat from one end of the integrated thermoelectric device to the other end.

Abstract: An aspect of the disclosure relates to an integrated circuit. The integrated circuit includes a first electrically conductive structure, a thin film crystal layer located on the first electrically conductive structure, and a second electrically conductive structure including metal e.g. copper. The second electrically conductive structure is located on the thin film crystal layer. The first electrically conductive structure is electrically connected to the second electrically conductive structure through the thin film crystal layer. The thin film crystal layer may be provided as a copper diffusion barrier.

Abstract: An example relates to an integrated circuit including a semiconductor substrate, and a wiring layer stack located on the semiconductor substrate. The integrated circuit further includes a transistor embedded in the wiring layer stack. The transistor includes an embedded layer. The embedded layer has a thickness of less than 10 nm. The embedded layer includes at least one two-dimensional crystalline layer including more than 10% metal atoms. Further examples relate to methods for forming integrated circuits.

Abstract: A charge storage memory is described based on a vertical shared gate thin-film transistor. In one example, a memory cell structure includes a capacitor to store a charge, the state of the charge representing a stored value, and an access transistor having a drain coupled to a bit line to read the capacitor state, a vertical gate coupled to a word line to write the capacitor state, and a drain coupled to the capacitor to charge the capacitor from the drain through the gate, wherein the gate extends from the word line through metal layers of an integrated circuit.

Abstract: A two transistor, one resistor gain cell and a suitable storage element are described. In some embodiments the gain cell has a resistive memory element coupled to a common node at one end to store a value and to a source line at another end, the value being read as conductivity between the common node and the source line of the resistive memory element, a write transistor having a source coupled to a bit line, a gate coupled to a write line, and a drain coupled to the common node to write a value at the bit line to the resistive memory element upon setting the write line high, and a read transistor having a source coupled to a bit line read line and a gate coupled to the common node to read the value written to the resistive memory element as a value at the second transistor gate.

Abstract: A charge storage memory is described based on a vertical shared gate thin-film transistor. In one example, a memory cell structure includes a capacitor to store a charge, the state of the charge representing a stored value, and an access transistor having a drain coupled to a bit line to read the capacitor state, a vertical gate coupled to a word line to write the capacitor state, and a drain coupled to the capacitor to charge the capacitor from the drain through the gate, wherein the gate extends from the word line through metal layers of an integrated circuit.

Abstract: A two transistor, one resistor gain cell and a suitable storage element are described. In some embodiments the gain cell has a resistive memory element coupled to a common node at one end to store a value and to a source line at another end, the value being read as conductivity between the common node and the source line of the resistive memory element, a write transistor having a source coupled to a bit line, a gate coupled to a write line, and a drain coupled to the common node to write a value at the bit line to the resistive memory element upon setting the write line high, and a read transistor having a source coupled to a bit line read line and a gate coupled to the common node to read the value written to the resistive memory element as a value at the second transistor gate.

Abstract: The disclosure describes the use of a neural network circuit, such as an oscillatory neural network or cellular neural network, to serve as a physically unclonable function on an integrated circuit or within an electronic system. The manufacturing process variations that impact the initial state of the neural network parameters are used to provide the unique identification for the physically unclonable function. A challenge signal to the neural network results in a response that is unique to the circuits process variations. The neural network is designed such that there are random variations among manufactured circuits, but that the specific instance variations are sufficiently deterministic with respect to circuit aging and environmental conditions such as temperature and supply voltage.