Patents by Inventor Alfons Dehe

Alfons Dehe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Acoustic wave detector
    Patent number: 10451589
    Abstract: An acoustic wave detector may include: an exterior housing with an exterior housing wall, a gas chamber located within the exterior housing and configured to receive a gas therein. The exterior housing wall may include an aperture providing a gas passage between the gas chamber and the exterior of the acoustic wave detector. The acoustic wave detector may further include an excitation element configured to selectively excite gas molecules of a specific type in the gas received in the gas chamber in a time-varying fashion, thereby generating acoustic waves in the gas, and an acoustic wave sensor configured to detect the acoustic waves generated in the gas and acoustic waves generated outside of the acoustic wave detector. The acoustic wave sensor may have an acoustic port overlapping with the aperture in the exterior housing wall.
    Type: Grant
    Filed: May 24, 2017
    Date of Patent: October 22, 2019
    Assignee: Infineon Technologies AG
    Inventors: David Tumpold, Alfons Dehe, Christoph Glacer
  • Sensitivity compensation for capacitive MEMS device
    Patent number: 10433070
    Abstract: A MEMS device includes a membrane and a counter electrode structure spaced apart from the membrane. The counter electrode structure includes a non-planar conductive layer. The MEMS device includes an air gap between the membrane and the counter electrode structure. The air gap has a non-uniform thickness.
    Type: Grant
    Filed: March 2, 2018
    Date of Patent: October 1, 2019
    Assignee: Infineon Technologies AG
    Inventors: Alfons Dehe, Abidin Güçlü Onaran
  • Semiconductor Devices Having a Membrane Layer with Smooth Stress-Relieving Corrugations and Methods of Fabrication Thereof
    Publication number: 20190297441
    Abstract: In one embodiment, a method of manufacturing a semiconductor device includes oxidizing a substrate to form local oxide regions that extend above a top surface of the substrate. A membrane layer is formed over the local oxide regions and the top surface of the substrate. A portion of the substrate under the membrane layer is removed. The local oxide regions under the membrane layer are removed.
    Type: Application
    Filed: June 12, 2019
    Publication date: September 26, 2019
    Inventors: Alfons Dehe, Stefan Barzen, Wolfgang Friza, Wolfgang Klein
  • Sensitivity Compensation for Capacitive MEMS Device
    Publication number: 20190273993
    Abstract: A MEMS device includes a membrane and a counter electrode structure spaced apart from the membrane. The counter electrode structure includes a non-planar conductive layer. The MEMS device includes an air gap between the membrane and the counter electrode structure. The air gap has a non-uniform thickness.
    Type: Application
    Filed: March 2, 2018
    Publication date: September 5, 2019
    Inventors: Alfons Dehe, Abidin Güçlü Onaran
  • MEMS-Sensor
    Publication number: 20190270639
    Abstract: A MEMS sensor includes a housing with an interior volume, wherein the housing has an access port to the interior volume, a MEMS component in the housing, and a protection structure, which reduces an introduction of electromagnetic disturbance radiation with a wavelength in the range between 10 nm and 20 ?m into the interior volume through the access port and reduces a propagation of the electromagnetic disturbance radiation in the interior volume.
    Type: Application
    Filed: February 7, 2019
    Publication date: September 5, 2019
    Inventors: Gunar Lorenz, Alfons Dehe, Marc Fueldner, Bernd Goller, Ulrich Krumbein, Andreas Wiesbauer
  • Semiconductor devices having a membrane layer with smooth stress-relieving corrugations and methods of fabrication thereof
    Patent number: 10405118
    Abstract: In one embodiment, a method of manufacturing a semiconductor device includes oxidizing a substrate to form local oxide regions that extend above a top surface of the substrate. A membrane layer is formed over the local oxide regions and the top surface of the substrate. A portion of the substrate under the membrane layer is removed. The local oxide regions under the membrane layer is removed.
    Type: Grant
    Filed: February 2, 2015
    Date of Patent: September 3, 2019
    Assignee: INFINEON TECHNOLOGIES AG
    Inventors: Alfons Dehe, Stefan Barzen, Wolfgang Friza, Wolfgang Klein
  • Dynamic pressure sensor
    Patent number: 10393606
    Abstract: According to various embodiments, a dynamic pressure sensor includes a substrate, a reference volume formed in the substrate, a deflectable membrane sealing the reference volume, a deflection sensing element coupled to the membrane and configured to measure a deflection of the membrane, and a ventilation hole configured to equalize an absolute pressure inside the reference volume with an absolute ambient pressure outside the reference volume.
    Type: Grant
    Filed: November 14, 2016
    Date of Patent: August 27, 2019
    Assignee: INFINEON TECHNOLOGIES AG
    Inventors: Andreas Wiesbauer, Alfons Dehe
  • Gas analysis apparatus
    Patent number: 10393658
    Abstract: An analysis apparatus includes a gas chamber for receiving a gas to be analyzed, a source to emit radiation into the chamber. The radiation is to selectively excite molecules of the gas. The apparatus further includes a sensor to detect a physical variable which contains information about a degree of interaction between the radiation and the gas. The source includes a heatable planar radiation element to emit radiation and a housing with a first wall and a second wall which, therebetween, define and immediately delimit a radiation element receptacle chamber that is separated in a fluid-tight manner from the surroundings of the source. At least one of the first or second housing wall is transparent to the electromagnetic radiation that is emittable by the radiation element.
    Type: Grant
    Filed: December 27, 2017
    Date of Patent: August 27, 2019
    Assignee: Infineon Technologies AG
    Inventors: Alfons Dehe, Christoph Glacer, David Tumpold
  • Microelectromechanical microphone
    Patent number: 10397709
    Abstract: A microelectromechanical microphone includes a planar first electrode that is formed, at least in portions, from an electrically conductive material, a planar second electrode that is formed, at least in portions, from an electrically conductive material and that is arranged at a distance from the first electrode, a spacer that is arranged between the first electrode and the second electrode, and a membrane that is arranged in a space defined between the first electrode and the second electrode and that is displaceable in the direction of at least one of the first electrode or the second electrode. The membrane has a membrane passage opening through which the spacer extends. The space defined between the first and the second electrode, in which the membrane is arranged, has a gas exchange connection with the surroundings of the microphone.
    Type: Grant
    Filed: January 22, 2018
    Date of Patent: August 27, 2019
    Assignee: Infineon Technologies AG
    Inventor: Alfons Dehe
  • SUPPORT STRUCTURE AND METHOD OF FORMING A SUPPORT STRUCTURE
    Publication number: 20190255669
    Abstract: A structure for fixing a membrane to a carrier including a carrier; a suspended structure; and a holding structure with a rounded concave shape which is configured to fix the suspended structure to the carrier and where a tapered side of the holding structure physically connects to the suspended structure is disclosed. A method of forming the holding structure on a carrier to support a suspended structure is further disclosed. The method may include: forming a holding structure on a carrier; forming a suspended structure on the holding structure; shaping the holding structure such that it has a concave shape; and arranging the holding structure such that a tapered side of the holding structure physically connects to the suspended structure.
    Type: Application
    Filed: May 3, 2019
    Publication date: August 22, 2019
    Inventors: Alfons Dehe, Reinhard Gabl, Ulrich Krumbein
  • Membrane Components and Method for Forming a Membrane Component
    Publication number: 20190256351
    Abstract: A membrane component comprises a membrane structure comprising an electrically conductive membrane layer. The electrically conductive membrane layer has a suspension region and a membrane region. In addition, the suspension region of the electrically conductive membrane layer is arranged on an insulation layer. Furthermore, the insulation layer is arranged on a carrier substrate. Moreover, the membrane component comprises a counterelectrode structure. A cavity is arranged vertically between the counterelectrode structure and the membrane region of the electrically conductive membrane layer. In addition, an edge of the electrically conductive membrane layer projects laterally beyond an edge of the insulation layer by more than half of a vertical distance between the electrically conductive membrane layer and the counterelectrode structure.
    Type: Application
    Filed: May 3, 2019
    Publication date: August 22, 2019
    Inventor: Alfons Dehe
  • MEMS device and method of manufacturing a MEMS device
    Patent number: 10384934
    Abstract: A method for manufacturing a MEMS device is disclosed. Moreover a MEMS device and a module including a MEMS device are disclosed. An embodiment includes a method for manufacturing MEMS devices includes forming a MEMS stack over a first main surface of a substrate, forming a polymer layer over a second main surface of the substrate and forming a first opening in the polymer layer and the substrate such that the first opening abuts the MEMS stack.
    Type: Grant
    Filed: March 16, 2018
    Date of Patent: August 20, 2019
    Assignee: INFINEON TECHNOLOGIES AG
    Inventors: Alfons Dehe, Stephan Pindl, Bernhard Knott, Carsten Ahrens
  • Microelectromechanical device, a microelectromechanical system, and a method of manufacturing a microelectromechanical device
    Patent number: 10370242
    Abstract: A microelectromechanical device, a microelectromechanical system, and a method of manufacturing a microelectromechanical device, wherein the microelectromechanical device may include: a substrate; a diaphragm mounted to the substrate; a first electrode mounted to the diaphragm; a second electrode mounted to the substrate; wherein the first electrode is laterally adjacent to the second electrode; and wherein the diaphragm is arranged over a gap between the first electrode and the second electrode.
    Type: Grant
    Filed: July 28, 2017
    Date of Patent: August 6, 2019
    Assignee: INFINEON TECHNOLOGIES AG
    Inventors: Alfons Dehe, Matthias Friedrich Herrmann, Johannes Manz
  • System and method for a variable flow transducer
    Patent number: 10367430
    Abstract: According to an embodiment, a microelectromechanical systems MEMS transducer includes a deflectable membrane attached to a support structure, an acoustic valve structure configured to cause the deflectable membrane to be acoustically transparent in a first mode and acoustically visible in a second mode, and an actuating mechanism coupled to the deflectable membrane. Other embodiments include corresponding systems and apparatus, each configured to perform various embodiment methods.
    Type: Grant
    Filed: January 11, 2016
    Date of Patent: July 30, 2019
    Assignee: INFINEON TECHNOLOGIES AG
    Inventors: David Tumpold, Alfons Dehe, Christoph Glacer
  • Gas sensor
    Patent number: 10365208
    Abstract: Shown is a gas sensor including a sensor element, a measurement chamber and an emitter element. The sensor element has a MEMS membrane which is arranged in a first substrate region. Furthermore, the measurement chamber is embodied to receive a measurement gas.
    Type: Grant
    Filed: March 24, 2016
    Date of Patent: July 30, 2019
    Assignees: Infineon Technologies AG, Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.V.
    Inventors: Stefan Kolb, Alfons Dehe, Jochen Huber, Franz Jost, Horst Theuss, Wilhelm Wiedmeier, Juergen Woellenstein
  • Gas analyzer
    Patent number: 10352910
    Abstract: A gas analyzer is provided. The gas analyzer may include: a tubular housing having a housing wall extending along an axial direction of the tubular housing and surrounding a gas chamber configured to receive a gas to be analyzed therein, an excitation element positioned at a first axial end of the tubular housing and configured to selectively excite gas molecules of a specific type that is to be detected in the gas received in the gas chamber in a time-varying fashion, thereby generating acoustic waves, and a sensor positioned at a second axial end of the tubular housing and configured to detect acoustic waves generated by the excitation element.
    Type: Grant
    Filed: August 31, 2016
    Date of Patent: July 16, 2019
    Assignee: Infineon Technologies AG
    Inventors: Christoph Glacer, Alfons Dehe, David Tumpold
  • Membrane components and method for forming a membrane component
    Patent number: 10336607
    Abstract: A membrane component comprises a membrane structure comprising an electrically conductive membrane layer. The electrically conductive membrane layer has a suspension region and a membrane region. In addition, the suspension region of the electrically conductive membrane layer is arranged on an insulation layer. Furthermore, the insulation layer is arranged on a carrier substrate. Moreover, the membrane component comprises a counterelectrode structure. A cavity is arranged vertically between the counterelectrode structure and the membrane region of the electrically conductive membrane layer. In addition, an edge of the electrically conductive membrane layer projects laterally beyond an edge of the insulation layer by more than half of a vertical distance between the electrically conductive membrane layer and the counterelectrode structure.
    Type: Grant
    Filed: January 31, 2018
    Date of Patent: July 2, 2019
    Assignee: INFINEON TECHNOLOGIES AG
    Inventor: Alfons Dehe
  • Comb MEMS Device and Method of Making a Comb MEMS Device
    Publication number: 20190185315
    Abstract: A MEMS device and a method to manufacture a MEMS device are disclosed. An embodiment includes forming trenches in a first main surface of a substrate, forming conductive fingers by forming a conductive material in the trenches and forming an opening from a second main surface of the substrate thereby exposing the conductive fingers, the second main surface opposite the first main surface.
    Type: Application
    Filed: February 21, 2019
    Publication date: June 20, 2019
    Inventor: Alfons Dehe
  • Support structure and method of forming a support structure
    Patent number: 10322481
    Abstract: A structure for fixing a membrane to a carrier including a carrier; a suspended structure; and a holding structure with a rounded concave shape which is configured to fix the suspended structure to the carrier and where a tapered side of the holding structure physically connects to the suspended structure is disclosed. A method of forming the holding structure on a carrier to support a suspended structure is further disclosed. The method may include: forming a holding structure on a carrier; forming a suspended structure on the holding structure; shaping the holding structure such that it has a concave shape; and arranging the holding structure such that a tapered side of the holding structure physically connects to the suspended structure.
    Type: Grant
    Filed: March 6, 2014
    Date of Patent: June 18, 2019
    Assignee: INFINEON TECHNOLOGIES AG
    Inventors: Alfons Dehe, Reinhard Gabl, Ulrich Krumbein
  • System and Method for a MEMS Device
    Publication number: 20190181776
    Abstract: According to an embodiment, a microelectromechanical systems MEMS device includes a first membrane attached to a support structure that a first plurality of acoustic vents; a second membrane attached to the support structure that includes a second plurality of acoustic vents, where the first plurality of acoustic vents and the second plurality of acoustic vents do not overlap; and a closing mechanism coupled to the first membrane and the second membrane.
    Type: Application
    Filed: February 13, 2019
    Publication date: June 13, 2019
    Inventors: David Tumpold, Alfons Dehe, Christoph Glacer