Abstract: A semiconductor device fabrication method includes irradiating a first surface of a substrate with a radiation beam. While irradiating the first surface of the substrate, a precursor gas is introduced near the first surface to deposit a layer including a first material. The precursor gas is removed from near the first surface after the depositing the layer. After the removing the precursor gas and prior to forming another layer over the layer, while irradiating a second surface of the layer, a cleaning gas is introduced near the second surface of the layer to transform the first material into a second material.

Abstract: The present disclosure provides a method of repairing a mask. The method includes receiving a mask that includes a patterned feature, the patterned feature producing a phase-shift and having a transmittance; identifying a defect region on the mask; and forming a repair feature over the defect region on the mask, wherein forming the repair feature includes forming a first patterned material layer over the defect region and forming a second patterned material layer over the first patterned material layer to form the repair feature, the repair feature producing the phase-shift and having the transmittance.

Abstract: A thermoelectric converter includes a battery box, an outer box and a connecting ring. The battery box has a bottom case, a battery disposed in the bottom case, a battery circuit board electrically connected to the battery, and an application circuit board disposed at one end of the bottom case. The outer box has a heat sink surrounding and covering the battery box, a thermoelectric module electrically connected to the battery circuit board with the thermoelectric module electrically connected to the battery through the battery circuit board, a heat conducting plate overlying the thermoelectric module and configured to conduct thermal energy from ambient environment to the thermoelectric module for the thermoelectric module to absorb the thermal energy and convert the thermal energy to electricity, and a non-metal adiabatic frame surrounding the thermoelectric module and configured to prevent the thermal energy from being dissipated to the ambient environment.

Abstract: Example implementations relate to fingerprint scans with power buttons. For example, a computing device may include a power button and a processor. The power button receives a user input associated with an activation of the power button to turn on the computing device and scans a fingerprint associated with the user input while the computing device is initialized in response to the activation. The processor determines whether the fingerprint matches an authorized fingerprint from a database of stored fingerprints, identifies an account associated with the fingerprint when the fingerprint matches the authorized fingerprint, and provides a desktop environment associated with the account.

Abstract: A method for fabricating a pellicle assembly includes forming a release layer over a carrier. A membrane layer is fabricated over the release layer. A pellicle frame is attached to the membrane layer. After attaching the pellicle frame to the membrane layer, a release treatment process is performed to the release layer to separate the carrier from the membrane layer. A pellicle assembly including the pellicle frame and the membrane layer attached to the pellicle frame is formed.

Abstract: A EUV mask comprises a low thermal expansion material (LTEM) substrate, a reflective multi-layer (ML) over the LTEM substrate, and a patterned absorber layer over the reflective ML. The reflective ML includes a defect. The EUV mask further comprises a mark associated with the defect. The mark is one of: a deposit over the patterned absorber layer at a distance offset from the defect, and a cavity into the patterned absorber layer in an area over the defect.

Abstract: A displacement mechanism includes a base, three rails, three arm assemblies, a moving platform, and three parallel linkage assemblies. The rails stand on the base. Each of the arm assemblies has a first end and a second end. The first ends are slidably connected to the rails, respectively. Each of the arm assemblies is configured to swing in a space among the rails. The moving platform is parallel to the base. Two ends of each of the parallel linkage assemblies are connected to the second end of the corresponding arm assembly and the moving platform in a multidirectional rotating way, respectively. Each of the arm assemblies substantially extends away from the base from the corresponding rail, and each of the parallel linkage assemblies substantially extends toward the base from the second end of the corresponding arm assembly.

Abstract: The present disclosure relates to a method and apparatus for mitigating printable native defects in an extreme ultra violet (EUV) mask substrate. In some embodiments, the method is performed by identifying a printable native defect within an EUV mask substrate that violates one or more sizing thresholds. A first section of the EUV mask substrate including the printable native defect is removed to form a concavity within the EUV mask substrate. A multi-layer replacement section that is devoid of a printable native defect is inserted into the concavity.

Abstract: A displacement mechanism includes a base, three rails, three arm assemblies, a moving platform, and three parallel linkage assemblies. The rails stand on the base. Each of the arm assemblies has a first end and a second end. The first ends are slidably connected to the rails, respectively. Each of the arm assemblies is configured to swing in a space among the rails. The moving platform is parallel to the base. Two ends of each of the parallel linkage assemblies are connected to the second end of the corresponding arm assembly and the moving platform in a multidirectional rotating way, respectively. Each of the arm assemblies substantially extends away from the base from the corresponding rail, and each of the parallel linkage assemblies substantially extends toward the base from the second end of the corresponding arm assembly.

Abstract: Any defects in the reflective coating or absorber layer of an EUV mask are problematic in transferring a pattern of the EUV mask to a wafer since they produce errors in integrated circuit patterns on the wafer. In this regard, a method of manufacturing an EUV mask is provided according to various embodiments of the present disclosure. According to the method of the present disclosure, the defects in the EUV mask can be detected and repaired with an defect-free multilayer body. A substantially defect-free EUV mask can be made in a cost benefit way accordingly, so as to overcome disadvantages mentioned above.

Abstract: Example implementations relate to fingerprint scans with power buttons. For example, a computing device may include a power button and a processor. The power button receives a user input associated with an activation of the power button to turn on the computing device and scans a fingerprint associated with the user input while the computing device is initialized in response to the activation. The processor determines whether the fingerprint matches an authorized fingerprint from a database of stored fingerprints, identifies an account associated with the fingerprint when the fingerprint matches the authorized fingerprint, and provides a desktop environment associated with the account.

Abstract: A method of depositing a material on a surface is disclosed. The method includes focusing a radiation beam on the surface and introducing a precursor gas near the surface wherein the precursor gas forms the material on the surface upon radiation by the radiation beam. The method further includes introducing an assistant gas near the surface wherein the assistant gas produces nitric oxide radicals upon radiation by the radiation beam. The nitric oxide radicals facilitate the dissociation process of the precursor gas and reduce contaminants in the deposited material.

Abstract: The present disclosure provides a method of repairing a mask. The method includes receiving a mask that includes a patterned feature, the patterned feature producing a phase-shift and having a transmittance; identifying a defect region on the mask; and forming a repair feature over the defect region on the mask, wherein forming the repair feature includes forming a first patterned material layer over the defect region and forming a second patterned material layer over the first patterned material layer to form the repair feature, the repair feature producing the phase-shift and having the transmittance.

Abstract: A semiconductor device fabrication method includes irradiating a first surface of a substrate with a radiation beam. While irradiating the first surface of the substrate, a precursor gas is introduced near the first surface to deposit a layer including a first material. The precursor gas is removed from near the first surface after the depositing the layer. After the removing the precursor gas and prior to forming another layer over the layer, while irradiating a second surface of the layer, a cleaning gas is introduced near the second surface of the layer to transform the first material into a second material.

Abstract: A shading device for the light module of the surveillance camera, wherein the light module rotates, with the filming module of the camera, back and forth between the vertical axis and horizontal axis of the camera. The shading device includes a shading shield that can moves back and forth between the first position and the second position. When the light module and the filming module rotate to a preset angle zone that is near the horizontal axis, the shading shield will move with the light module and the filming module, and the shading shield shades part of the light emitted by the light module that the part of light will not project onto the reflective object of the camera.

Abstract: Methods and tools for repairing a semiconductor mask are provided. The method includes steps of positioning the semiconductor mask within a repair chamber including a repair tool, supplying a first gas and a second gas into the repair chamber. The first gas includes a repair material for repairing a defect on the mask, and the second gas includes a polar gas and assists deposition of the repair material on the semiconductor mask. The method further includes steps of activating the repair tool such that the repair tool interacts with the first and second gases to deposit the repair material at the site of the defect to repair the semiconductor mask and removing the repaired semiconductor mask from the repair chamber. A dimension of the deposited repair material is less than about 32 nanometers.

Abstract: A method for fabricating a pellicle assembly includes forming a release layer over a carrier. A membrane layer is fabricated over the release layer. A pellicle frame is attached to the membrane layer. After attaching the pellicle frame to the membrane layer, a release treatment process is performed to the release layer to separate the carrier from the membrane layer. A pellicle assembly including the pellicle frame and the membrane layer attached to the pellicle frame is formed.

Abstract: A method for inter-radio access technology (inter-RAT) performance enhancement in a mobile communications device is provided. First, a first RAT is camped on to perform a first service. Thereafter, it is moved/fallen back to a second RAT from the first RAT to perform a second service. Cell information of the first RAT is then measured and collected during the performance of the second service in the second RAT. A first cell to return to the first RAT is determined according to the collected cell information of the first RAT after a call connection of the second RAT is released.

Abstract: The present invention provides a recombinant DNA molecule encoding a fusion protein, comprising a first DNA sequence encoding a high-efficiency transit peptide operably linked to a second DNA sequence encoding a passenger protein, wherein the high-efficiency transit peptide is selected from the group consisting of transit peptides of the precursors of translocon at the inner envelope membrane of chloroplasts 40 kD (prTic40), chaperonin 10-2 (prCpn10-2), Fibrillin 1B (prFibrillin), ATP sulfurylase 1 (prAPS1), ATP sulfurylase 3 (prAPS3), 5?-adenylylsulfate reductase 3 (prAPR3), stromal ascorbate peroxidase (prsAPX), prTic40-E2A (a prTic40 variant), prCpn10-1-?C7C37S (a chaperonin 10-1 variant), a functional fragment of any of the transit peptides and an equivalent thereof. And the present invention also provides a method of high efficiency delivery of a protein into plastids using the high-efficiency transit peptides.

Abstract: Some embodiments of the present disclosure relate to a method for repairing a photomask pattern, comprising receiving a photomask with a first translucent material formed on a transparent substrate, which forms an incomplete version of the photomask pattern. Missing portions of the photomask pattern are detected by comparing the incomplete version of the photomask pattern to a complete version of the photomask pattern. After detecting the missing portions, the photomask pattern is completed by using a second translucent material, which is different than the first translucent material, to form the missing portions. The second translucent exhibits the same transmissive property as the first translucent material. Consequently, both the repaired and unrepaired portions of the pattern have the same transmissive properties with respect to attenuation and phase shifting of incident radiation to enhance pattern resolution in the repaired portion of the photomask pattern.