Abstract: A shaft bearing assembly having a shaft supported in a bearing housing is described. The shaft bearing assembly includes a pressure reduction device for generating an underpressure inside the bearing housing. The pressure reduction device is operated by employing an incompressible fluid. Further, a method of reducing a pressure inside a bearing housing supporting a shaft is described. The method includes using an incompressible fluid for operating a pressure reduction device for generating an underpressure inside the bearing housing.

Abstract: A method and apparatus for cooling a semiconductor chamber are described herein. A semiconductor chamber component, includes a powered region, a grounded region, and a fluid conduit disposed within the semiconductor chamber component and passing through the powered region and grounded region, the fluid conduit comprising a ceramic material.

Abstract: Disclosed is a work and recreation space module for a work environment, particularly for a production and/or presentation and/or outer environment, having an inner element which has at least one seat for a user, having a rolling device for rolling the inner element into different positions in the work environment; and an outer element which has two side walls and a roof wall connecting the side walls, wherein the inner element can be received in an inner space of the outer element delimited by side walls and roof wall; and a mechanical coupling device with which the inner element and the outer element can be coupled to one another, so that the outer element can also be rolled with the inner element into different positions in the work environment, in order to provide a work and/or recreation area that can be used flexibly in a work environment.

Abstract: System for order-receipt processing of an eyeglass lens, including: a receiver configured to receive order data of eyeglass lens, to store a catalog of eyeglass lens classes, which each are defined by a fixed number of predetermined and freely selectable order parameters and differ from each other in the number of freely selectable order parameters, and to classify the order data on the basis of the catalog of eyeglass lens classes, a processor configured to process the order data, to store only the highest eyeglass lens classes of the catalog of eyeglass lens classes, to select one of the highest eyeglass lens classes, to match the order data to the selected highest eyeglass lens class, to generate a respective digital reproduction of the eyeglass lens based on a calculation model and the adapted order data, and a communication device connecting the receiver and the processor.

Abstract: Aspects of the present disclosure generally relate to apparatuses and methods for edge ring replacement in processing chambers. In one aspect, a carrier for supporting an edge ring is disclosed. In other aspects, robot blades for supporting a carrier are disclosed. In another aspect, a support structure for supporting a carrier in a degassing chamber is disclosed. In another aspect, a method of transferring an edge ring on a carrier is disclosed.

Abstract: A carrier includes a carrier body configured to be supported on a robot to transport one or more process kit rings within a substrate processing system. The carrier further includes fingers extending from the carrier body. The fingers are configured to support the one or more process kit rings. A first finger of the plurality of fingers includes an upper surface that forms a recess to receive the one or more process kit rings.

Abstract: A calibration object is transferred from a processing chamber to an aligner station by one or more robot arms. The calibration object has a first processing chamber orientation in the processing chamber and a second orientation at the aligner station. A first characteristic error value associated with a transfer path between the processing chamber and the aligner is determined based on the first processing chamber orientation and the second orientation of the calibration object at the aligner station. In response to detecting an object at the aligner station to be transferred to the processing chamber along the transfer path, the object is aligned by the aligner station to be placed in the processing chamber according to a target processing chamber orientation based on a target aligner orientation as adjusted by the first characteristic error value determined for the transfer path between the processing chamber and the aligner station.

Abstract: A process kit ring adaptor includes one or more upper surfaces and one or more lower surfaces. The one or more upper surfaces are configured to support a process kit ring. The one or more lower surfaces are configured to interface with an end effector. The process kit ring adaptor supporting the process kit ring is configured to be transported on the end effector within a processing system.

Abstract: Proposed is a bipolar plate for a fuel cell device, wherein the bipolar plate is formed from a plurality of flat products, in particular arranged one above the other in a vertical direction, wherein one or each of at least some of the plurality of flat products has an alignment structure or a plurality of alignment structures, and at least one alignment structure of at least one flat product, at least in the state in which the plurality of flat products are arranged one above the other, is accessible and/or is exposed by the other one or more of the plurality of flat products.

Abstract: A calibration object is retrieved, by a first robot arm of a transfer chamber, from a processing chamber connected to the transfer chamber and placed in a load lock connected to the transfer chamber. The calibration object is retrieved from the load lock by a second robot arm of a factory interface connected to the load lock and placed at an aligner station housed in or connected to the factory interface. The calibration object has a first orientation at the aligner station. A difference is determined between the first orientation and an initial target orientation at the aligner station. A first characteristic error value associated with the processing chamber is determined based on the determined difference. The first characteristic error value is recorded in a storage medium. The aligner station is to use the first characteristic error value for alignment of objects to be placed in the processing chamber.

Abstract: A shaft bearing assembly having a shaft supported in a bearing housing is described. The shaft bearing assembly includes a pressure reduction device for generating an underpressure inside the bearing housing. The pressure reduction device is operated by employing an incompressible fluid. Further, a method of reducing a pressure inside a bearing housing supporting a shaft is described. The method includes using an incompressible fluid for operating a pressure reduction device for generating an underpressure inside the bearing housing.

Abstract: Embodiments described herein relate to a substrate support assembly which enables adjustment of the thermal conductivity therein. The substrate support assembly has heater and cooling channel. An adjustable thermal break disposed between the heater and the cooling channel. The adjustable thermal break has one or more fluid conduits coupled thereto and configured to flow a fluid into and out of the adjustable thermal break for variant the thermal conductivity between the heater and the cooling channel.

Abstract: Disclosed herein is a method and apparatus for controlling surface characteristics by measuring capacitance of a process kit ring. The method includes interfacing a ring with a jig assembly for measuring capacitance in at least a first location of the ring. The ring has that includes a top surface, a bottom surface, and an inner surface opposite an outer surface. At least the bottom surface has an external coating placed thereon. The method further includes contacting a measuring device to the first location on the outer surface proximate the bottom surface. The measuring device contacts an opening in the external coating to the body. The measuring device contacts a first conductive member that is electrically coupled to the ring. A capacitance is measured on the measuring device. The capacitance across the top surface is measured.

Abstract: Examples disclosed herein are directed to a method and apparatus for determining a position of a ring within a process kit. In one example, a sensor assembly for a substrate processing chamber is provided. The sensor assembly includes a housing having a top surface, a bottom surface opposite the top surface, and a plurality of sidewalls connecting the top surface to the bottom surface. The housing also has a recess in the top surface, the recess forming an interior volume within the housing. The sensory assembly includes a bias member, and a contact member disposed on the bias member. The bias member and contact member are disposed within the recess. A sensor is configured to detect a displacement of the contact member. The displacement of the contact member corresponds to a relative position of an edge ring.

Abstract: The invention relates to a method for extracting oxygen form a reaction chamber, as well as a use of microorganisms in such a method and a photobioreactor for carrying out the method. According to the invention, the method comprises the steps—irradiating at least one phototropic microorganism with light under anaerobic conditions in a reaction chamber, and—in situ bonding of produced oxygen by means of the microorganism by oxidation of an oxygen-utilizing substrates.

Abstract: Disclosed herein is a method and apparatus for controlling surface characteristics by measuring capacitance of a process kit ring. The method includes interfacing a ring with a jig assembly for measuring capacitance in at least a first location of the ring. The ring has that includes a top surface, a bottom surface, and an inner surface opposite an outer surface. At least the bottom surface has an external coating placed thereon. The method further includes contacting a measuring device to the first location on the outer surface proximate the bottom surface. The measuring device contacts an opening in the external coating to the body. The measuring device contacts a first conductive member that is electrically coupled to the ring. A capacitance is measured on the measuring device. The capacitance across the top surface is measured.

Abstract: The present invention relates to a method for producing RNA. In particular, the present invention relates to a method for producing RNA, which is scalable and provides RNA at a high purity. The present invention provides a method for producing RNA under GMP and/or cGMP-compliant conditions. The invention further provides specific processes for use as a quality control in the manufacturing of a template DNA and/or in a method for producing RNA, in particular by in vitro transcription.

Abstract: A substrate support pedestal comprises an electrostatic chuck, a cooling base, a gas flow passage, a porous plug, and a sealing member. The electrostatic chuck comprises body having a cavity. The cooling base is coupled to the electrostatic chuck via a bond layer. The gas flow passage is formed between a top surface of the electrostatic chuck and a bottom surface of the cooling base. The gas flow passage further comprises the cavity. The porous plug is positioned within the cavity to control the flow of gas through the gas flow passage. The sealing member is positioned in a groove formed in the cooling base and configured to form a seal between the cooling base and one or both of the porous plug and the body of the electrostatic chuck.

Abstract: A method of putting into operation level measurement apparatus is provided. The method may include detecting, by means of a radar sensor unit of the level measuring device, an echo curve, wherein the echo curve comprises at least a first echo; selecting, from the echo curve, the first echo corresponding to a first distance and having a first amplitude, the first amplitude having the highest amplitude of the echo curve; determining a calculated first amplitude, wherein the calculated first amplitude is a function of the first distance; and if the first amplitude is higher than the calculated first amplitude, evaluating the echo curve as acceptable for putting into operation the measuring device.

Abstract: Semiconductor chamber components are described herein that includes one or more conduits for carrying a fluid between powered and grounded portions of the chamber component, the conduit configure to be less prone to arcing as compared to conventional components. In one example, a semiconductor chamber component is provided that includes a powered region, a grounded region, and a fluid conduit. The fluid conduit is disposed within the semiconductor chamber component and passes through the powered and grounded regions. The fluid conduit has an end to end electrical resistance of between 0.1 to 100 M?.