Abstract: Apparatus for processing a substrate is disclosed herein. In some embodiments, a substrate support may include a substrate support having a support surface for supporting a substrate the substrate support having a central axis; a first electrode disposed within the substrate support to provide RF power to a substrate when disposed on the support surface; an inner conductor coupled to the first electrode about a center of a surface of the first electrode opposing the support surface, wherein the inner conductor is tubular and extends from the first electrode parallel to and about the central axis in a direction away from the support surface of the substrate support; an outer conductor disposed about the inner conductor; and an outer dielectric layer disposed between the inner and outer conductors, the outer dielectric layer electrically isolating the outer conductor from the inner conductor. The outer conductor may be coupled to electrical ground.

Abstract: We disclose a drug tracking system and method of use which may be used to screen a subject's bodily waste in order to assess whether the subject has consumed a drug. The system includes a drug composition which is tagged with at least one artificial sweetener that may be detected in the subject's bodily waste. The subject may consume the tagged drug and a user may obtain a sample of the subject's bodily waste. The bodily waste sample may be analyzed to detect the artificial sweetener or its metabolite. In some embodiments, the result of the analysis of bodily waste may be entered into a database, compared to standards that comprises analyses of a plurality of drug tags, and the identity of the drug tag, and consequently the drug composition, determined.

Abstract: An electronic device manufacturing system may include a loadlock. The loadlock may include a plurality of gas line heaters for providing a heated gas to the loadlock to heat a processed substrate therein. Heating a processed substrate may reduce corrosion in the loadlock and subsequent contamination of substrates therein. The loadlock may also include a plurality of embedded heaters in the loadlock housing to reduce moisture therein, further reducing corrosion and contamination. Methods of heating a substrate in a loadlock are also provided, as are other aspects.

Abstract: We disclose a drug tracking system and method of use which may be used to screen a user's bodily waste and to collect information about the drugs the user has consumed. The system includes mixing or adhering a drug tag with a drug compound. The drug tag includes at least one nucleic acid or nucleic acid analog, the unique nucleotide sequence of which correlates to information about the drug. The unique sequence may correlate with a drug molecule, a drug class, a manufacturer, and/or a distributer. Each of these categories of information may be incorporated into the nucleotide sequence of a separate nucleic acid or nucleic acid analog molecules or combined in a single molecule. The sequence of the drug tag may be entered into a database which stores the drug information associated with each discrete nucleotide sequence.

Abstract: Systems and methods are provided for determination of primers for differentiation of at least two unspecified pathogens that belong to distinct pathogen (e.g., virus) families that comprise multiple distinct pathogen species and/or varieties.

Abstract: A method and apparatus for processing substrates in tandem processing regions of a plasma chamber is provided. In one example, the apparatus is embodied as a plasma chamber that includes a chamber body having a first chamber side with a first processing region and a second chamber side with a second processing region. The chamber body has a front wall and a bottom wall. A first chamber side port, a second chamber side port, and a vacuum port are disposed through the bottom wall. The vacuum port is at least part of an exhaust path for each of the processing regions. A vacuum house extends from the front wall and defines a second portion of the vacuum port. A substrate support is disposed in each of the processing regions, and a stem is coupled to each substrate support. Each stem extends through a chamber side port.

Abstract: Apparatuses and methods for in-situ temperature measurement of a process chamber are described herein. A process chamber includes an infrared (IR) sensor mounted to the chamber wall. The IR sensor is mounted such that it can be oriented to receive an IR wave from targets within the process chamber through a view port in the chamber wall to detect a temperature of a surface inside the chamber, or to receive an IR wave from a target outside of the process chamber to detect an atmospheric temperature or a temperature of an exterior surface of the process chamber. As the orientation of the IR sensor is controllable to receive the IR wave from selected directions, it may be used to detect the temperature of various targets inside and outside the process chamber. The obtained temperature information is useful to improve overall chamber matching, processing throughput, and uniformity.

Abstract: We disclose a toilet system which analyzes solid waste to detect tags which were associated with pharmaceutical or nutritional products and excreted in the solid waste of a user. The toilet system may include a receptacle for receiving solid waste, a liquid dispenser for providing a liquid to assist in dispersing the solid waste, a solid waste dispersing system which may mix the solid waste with the liquid thereby homogenizing the solid waste, and an electromagnetic signature detector which may analyze the tags in the solid waste. The electromagnetic signature detector may include a selective binding surface which may bind tags present in the solid waste and which may be connected to a transducer which senses the presence of bound tags.

Abstract: Methods and apparatus for processing a substrate are provided herein. In some embodiments, an apparatus for processing a substrate includes a process chamber having an internal processing volume disposed beneath a dielectric lid of the process chamber; a substrate support disposed in the process chamber and having a support surface to support a substrate; an inductive coil disposed above the dielectric lid to inductively couple RF energy into the internal processing volume to form a plasma above the substrate support; and a first inductive applicator ring coupled to a lift mechanism to position the first inductive applicator ring within the internal processing volume.

Abstract: Methods and apparatus for particle reduction in throttle gate valves used in substrate process chambers are provided herein. In some embodiments, a gate valve for use in a process chamber includes a body having an opening disposed therethrough from a first surface to an opposing second surface of the body; a pocket extending into the body from a sidewall of the opening; a gate movably disposed within the pocket between a closed position that seals the opening and an open position that reveals the opening and disposes the gate completely within the pocket; and a plurality of gas ports disposed in the gate valve configured to direct a gas flow into a portion of the gate valve fluidly coupled to the opening.

Abstract: Contemplated compositions and methods are directed to cancer neoepitopes and uses of such neoepitopes, especially to generate synthetic antibodies against neoepitopes that may then be employed in the manufacture of a therapeutic agent. Preferred therapeutic agents will comprise a synthetic antibody against a neoepitope, and most preferably in combination with a cellular or non-cellular component for use as a diagnostic or therapeutic agent.

Abstract: We disclose a method of tagging pharmaceutical and nutritional products with nanoparticles which include noble metals. The disclosure describes a plurality of nanoparticles each with either a different size and/or shape. The nanoparticles of different sizes and shapes are distinguishable using spectroscopic techniques because each is associated with different optical properties and have a different spectral signature. The different optical properties are at least due to the unique size or shape of the nanoparticles. Each of the plurality of nanoparticles may be associated with a different characteristic of the tagged pharmaceutical or nutritional product. The method includes mixing the nanoparticles with or adhering the nanoparticles to the tagged pharmaceutical or nutritional product. Two or more of the plurality of nanoparticles may be mixed with or adhered to the tagged pharmaceutical or nutritional product in a ratio and the ratio may be associated with a characteristic of the product.

Abstract: Apparatus for processing semiconductors are provided herein. In some embodiments, an apparatus for processing a substrate may include: a first ring disposed concentrically about a substrate support, the first ring configured to position a substrate atop the substrate support during processing; and a second ring disposed between the substrate support and the first ring, the second ring configured to provide a heat transfer path from the first ring to the substrate support.

Abstract: We disclose a drug tracking system and method of use which may be used to screen a subject's bodily waste and to identify the drug the subject has consumed. The system includes a drug that is tagged with a food dye that may be detected in the subject's bodily waste using absorption spectroscopic analysis. The subject consumes the tagged drug and a user obtains a sample of the subject's bodily waste. The user may analyze the subject's urine using an absorption spectroscopic technique. The user may enter the emission spectrum obtained from the absorption spectroscopic analysis into a database that includes the signature emission spectra from multiple food dyes that are used as drug tags. The emission spectra may be compared and the identity of the food dye and its associated drug may be determined.

Abstract: A plasma reactor enclosure has a metallic portion and a dielectric portion of plural dielectric windows supported on the metallic portion, each of the dielectric windows extending around an axis of symmetry. Plural concentric coil antennas are disposed on an external side of the enclosure, respective ones of the coil antennas facing respective ones of the dielectric windows.

Abstract: Apparatus for plasma processing are provided herein. In some embodiments, a process chamber includes: a chamber body having a processing volume within; a dielectric adapter ring disposed atop the chamber body; a multi-zone showerhead disposed atop the dielectric adapter ring to provide process gas to the processing volume; and an inductively-coupled RF coil disposed about an upper portion of the chamber body to couple RF energy to the processing volume.

Abstract: Process chambers having a tunable showerhead and a tunable liner are disclosed herein. In some embodiments, a processing chamber includes a showerhead; a chamber liner; a first impedance circuit coupled to the showerhead to tune an impedance of the showerhead; a second impedance circuit coupled to the chamber liner to tune an impedance of the chamber liner; and a controller coupled to the first and second impedance circuits to control relative impedances of the showerhead and the chamber liner.

Abstract: Methods and apparatus for controlling gas flow to a process chamber are disclosed herein. In some embodiments, a processing system includes a first process chamber having a first gas input; a first gas break disposed upstream of the first gas input; a first adjustable valve disposed upstream of the first gas break; and a first isolation valve disposed upstream of the first adjustable valve. The processing system may further include a second process chamber having a second gas input; a second gas break disposed upstream of the second gas input; a second adjustable valve disposed upstream of the second gas break; and a second isolation valve disposed upstream of the second adjustable valve. A shared gas source may be disposed upstream of the first isolation valve and the second isolation valve to provide one or more gases to the first process chamber and to the second process chamber.

Abstract: A swimming aid device in the form of a monofi is contemplated. The swimming aid device may include first and second fins formed of a resilient material, each fin including an elongated internal space within a fin body, an opening leading to the elongated internal space, a fin blade coupled to and extending away from the elongated internal space, a first and second side heel connectors on opposing sides of the opening leading to the elongated internal space and sized and shaped to mate with each other, a fin blade connector and a fin blade connector receiver on the fin blade and sized and shaped to mate with each other, the combination of the first and second fins forming a monofin.

Abstract: A plasma reactor has an overhead multiple coil inductive plasma source with symmetric RF feeds and a symmetrical chamber exhaust with plural struts through the exhaust region providing access to a confined workpiece support. A grid may be included for masking spatial effects of the struts from the processing region.