Abstract: A sound and illumination device including a sound-making portion, an illumination portion, and an attachment portion for mounting on a bicycle. The sound-making portion including a lever, a spring, a striking portion, and a metal portion, wherein the metal portion covers the lever, the spring, and the striking portion. The lever may include a magnet. The illumination portion including a cover portion, an electrical circuit, a switch, a light emitting source and a power source. Actuation of the lever of the sound-making portion results in the activation of the light emitting source of the illumination portion resulting in the concurrent emission of light and sound.

Abstract: A vertical transport field effect transistor (VTFET) apparatus includes a fin-shaped channel structure; a gate stack that surrounds the channel structure; a top source/drain structure at a top end of the channel structure; a top interconnect layer above the top source/drain structure; a top contact that electrically connects the top source/drain structure to the top interconnect layer; a bottom source/drain structure at a bottom end of the channel structure; a backside interconnect layer below the bottom source/drain structure; and a backside contact that touches a bottom surface of the bottom source/drain structure and also touches a side surface of the bottom source/drain structure and electrically connects the bottom source/drain structure to the backside interconnect layer.

Abstract: Embodiments of present invention provide a semiconductor structure. The semiconductor structure includes a semiconductor wafer having a first transistor and a second transistor; a first source/drain (S/D) contact of the first transistor; a second S/D contact of the second transistor; and a cut region between the first S/D contact and the second S/D contact, wherein the cut region includes a liner of a first dielectric material and a filler of a second dielectric material that is different from the first dielectric material, the liner lining at least a part of the first S/D contact and a part of the second S/D contact, and the filler being directly adjacent to the liner and between the first S/D contact and the second S/D contact. A method of manufacturing the semiconductor structure is also provided.

Abstract: An interconnect structure for an integrated circuit includes a plurality of first-type interconnect elements and a second-type of interconnect element which directly contact an underlying first-type interconnect element. The second-type interconnect element extends along a first axis to define a horizontal length and along a second axis to define a vertical height. The second-type interconnect element and the first-type interconnect element define a conductive via comprising a metal material extending continuously along the second axis from a base of the underlying first-type interconnect element and stopping at the upper surface of the second-type interconnect element. The vertical height of the second-type interconnect element is greater than the vertical height of the first-type interconnect elements.

Abstract: An immersive display for use in a robotic surgical system includes a support arm, a housing mounted to the support arm and configured to engage with a face of the user, at least two eyepiece assemblies disposed in the housing and configured to provide a three-dimensional display, and at least one sensor, wherein the sensor enables operation of the robotic surgical system, and wherein the support arm is actuatable to move the housing for ergonomic positioning.

Abstract: A semiconductor device includes a nanostructure field effect transistor (FET). The FET includes a gate and a first source or drain (S/D) region. A frontside S/D contact may be connected to and extends vertically upward from a top surface of the first S/D region. The FET further includes a second S/D region. The second S/D region extends below a bottom surface of the gate. A backside S/D contact may be connected to and extend vertically downward from a bottom surface of the second S/D region.

Abstract: A semiconductor device includes a field effect transistor (FET). The FET includes a gate and a first source or drain (S/D) region. A frontside S/D contact may be connected to and extend vertically upward from a top surface of the first S/D region. The FET further includes a second S/D region. The second S/D region includes a conduit liner and an inner column internal to the conduit liner that extends below a bottom surface of the wraparound gate. A backside S/D contact may be connected to and extend vertically downward from a bottom surface of the second S/D region.

Abstract: A VTFET is provided on a wafer. A backside power delivery network is on a backside of the wafer. A first backside contact is connected to a bottom source/drain region of the VTFET and a first portion of the backside power delivery network. A second backside contact is connected to top source/drain region of the VTFET and a second portion of the backside power delivery network.

Abstract: Semiconductor device and methods of forming the same include a semiconductor channel. A top source/drain structure is on the semiconductor channel. A bottom source/drain structure is under the semiconductor channel. The bottom source/drain structure includes a doped semiconductor part and a conductor part, with the conductor part covering a bottom surface of the doped semiconductor part.

Abstract: A first VTFET is provided on a wafer. A second VTFET is adjacent to the first VTFET on the wafer. A backside power deliver network is on a backside of the wafer. A shared frontside contact is on a frontside of the wafer. The shared frontside contact is connected to a first top source/drain region of the first VTFET, a second top source/drain region of the second VTFET, and the backside power delivery network.

Abstract: Semiconductor devices and methods of forming the same include a front-end-of-line (FEOL) layer that includes a first transistor device. A first back-end-of-line (BEOL) layer is on a front side of the FEOL layer and includes a first electrical connection to the first transistor device. A second BEOL layer is on a back side of the FEOL layer and includes a first BEOL device with a second electrical connection to the first transistor device.

Abstract: A method for forming a semiconductor device includes forming a front side of the semiconductor device, the front side comprising a metal wire M2, and a plurality of power rails coupled to the M2. Further, the method includes forming a through silicon via (TSV) from a back side of the semiconductor device to the front side, the TSV connecting a first power rail of the front side with a metal wire M1 on the back side. Further, the method includes forming a power delivery network on the back side, the TSV providing power from the power delivery network to the front side.

Abstract: A semiconductor device includes an isolation region and at least one transistor including a gate region, wherein the gate region is disposed on the isolation region. A via is disposed through a portion of the isolation region and on a signal line. A gate contact is disposed on the gate region. The via is connected to the gate contact and the signal line is connected to the gate region through the via and the gate contact.

Abstract: A VTFET is on a wafer and a backside power delivery network is on a backside of the wafer. A first backside contact is connected to a gate of the VTFET and a first portion of the backside power delivery network. The VTFET has a first width and the first width is a contacted poly pitch (CPP). The first backside contact may be at least the first width from the VTFET. The first backside contact may be double the first width from the VTFET.

Abstract: A semiconductor structure is presented including a device layer having a plurality of active devices, back-end-of-line (BEOL) components disposed under the device layer, a power distribution network (PDN) disposed over the device layer, and backside transistors disposed on a single crystal silicon (Si) layer disposed over the PDN. A through silicon via (TSV) extends from the backside transistors disposed on the single crystal Si layer through the BEOL. An upper TSV (uTSV) extends from the PDN through the backside transistors disposed on the single crystal Si layer to additional interconnects.

Abstract: An interconnect structure includes a first metal layer comprising at least one metal wire with a first segment and a local extension having a width in a first direction that is larger than a width of the first segment. A second metal layer is on top or below the first metal layer comprising at least one metal wire. A via is connected between the at least one metal wire of the first metal layer and the at least one metal wire of the second metal layer.

Abstract: A vertical-transport field-effect transistor (VTFET) is on a wafer. The VTFET has a first width. The first width is a contacted poly pitch (CPP). A bottom source/drain region of the VTFET extends at least the first width from the VTFET. A contact from a frontside of the VTFET is connected to the bottom source/drain region.

Abstract: An interconnect structure for connecting an upper wiring line to a lower wiring line includes a via connecting a lower portion of the upper wiring line with an upper surface of the lower wiring line and a wrap-around via portion formed integrally with the via, the wrap-around portion extending along and electrically contacting a portion of the sides of the lower wiring line.

Abstract: A semiconductor device includes: a first via level forming a bottom jumper configured to provide an output; a first set of two or more first metallization tracks overlying the first via level; a second via level forming a first top jumper overlying the first set of two or more first metallization tracks; and a second metallization track overlying the second via level.

Abstract: A semiconductor device includes first source/drain (S/D) epitaxy and a second S/D epitaxy and a gate contact. The device also includes a back end of the line (BEOL) layer connected electrically connected to the first S/D epitaxy and the gate contact on a top side of the device and a wafer that carries the BEOL layer and is on the top side of the device. The device also includes a backside trench epitaxy formed through and contacting portions of the second S/D epitaxy and a backside power distribution network electrically coupled to the backside trench epitaxy and disposed on the bottom of the device.