Patents by Inventor Brian A. Arthur

Brian A. Arthur has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10422030
    Abstract: In an apparatus and method for multi mask alignment, a carrier is provided that includes apertures therethrough. For each aperture, a combination frame and shadow mask that includes alignment features is positioned on spacers supported by the carrier with the shadow mask of the combination in coarse alignment with the aperture. Next, each combination frame and shadow mask is moved to a position spaced from the spacers whereupon the alignment system, under the control of a controller, individually aligns each combination frame and shadow mask to align the alignment features of the combination with reference alignment features associated with the combination. Each combination frame and shadow mask is then returned to a position on the spacers whereafter each combination frame and shadow mask is secured to the carrier. In an example, all of the combination frames and shadow masks can be aligned simultaneously.
    Type: Grant
    Filed: December 20, 2016
    Date of Patent: September 24, 2019
    Assignee: Advantech Global, LTD
    Inventors: Brian Arthur Bucci, David N. Monto, Shen-Chih Tung
  • Publication number: 20190226076
    Abstract: In a multi-mask alignment system and method, a carrier frame is provided having a number of apertures therethrough. A number of shadow mask-frame combinations are also provided. Each shadow mask-frame combination includes a first set of alignment features and each shadow mask-frame combination is positioned on a first side of the carrier with the frame supporting the shadow mask in alignment with one of the apertures. A single alignment stage is provided and a control system including a programmed controller is also provided. Under the control of the controller, the single alignment stage translates to each shadow mask-frame combination, one-at-a time, and adjusts the position of the shadow mask-frame combination based on positions of the first set of alignment features determined by the controller.
    Type: Application
    Filed: April 1, 2019
    Publication date: July 25, 2019
    Inventor: Brian Arthur Bucci
  • Publication number: 20190211115
    Abstract: The present invention provides methods for producing Fabs and bi-specific antibodies comprising designed residues in the interfaces of the heavy chain-light chain variable (VH/VL) domain and the heavy chain-light chain constant (CH/CL) domain, Fabs and bi-specific antibodies produced according to said processes and host cells encoding the same.
    Type: Application
    Filed: March 11, 2019
    Publication date: July 11, 2019
    Inventors: Stephen J. Demarest, Xiufeng Wu, Raheleh Toughiri, Brian Arthur Kuhlman, Steven Morgan Lewis
  • Patent number: 10323316
    Abstract: In a multi-mask alignment system and method, a carrier frame is provided having a number of apertures therethrough. A number of shadow mask-frame combinations are also provided. Each shadow mask-frame combination includes a first set of alignment features and each shadow mask-frame combination is positioned on a first side of the carrier with the frame supporting the shadow mask in alignment with one of the apertures. An alignment system is provided and a control system including a programmed controller is also provided. Under the control of the controller, the alignment system is caused to adjust the position of each shadow mask-frame combination with respect to the carrier based on positions of the first set of alignment features determined by the controller.
    Type: Grant
    Filed: October 14, 2015
    Date of Patent: June 18, 2019
    Assignee: Advantech Global, LTD
    Inventor: Brian Arthur Bucci
  • Patent number: 10294307
    Abstract: The present invention provides methods for producing Fabs and bi-specific antibodies comprising designed residues in the interfaces of the heavy chain-light chain variable (VH/VL) domain and the heavy chain-light chain constant (CH1/CL] domain, Fabs and bi-specific antibodies produced according to said processes and host cells encoding the same.
    Type: Grant
    Filed: July 6, 2018
    Date of Patent: May 21, 2019
    Assignees: Eli Lilly and Company, The University of North Carolina at Chapel Hill
    Inventors: Stephen J Demarest, Xiufeng Wu, Raheleh Toughiri, Brian Arthur Kuhlman, Steven Morgan Lewis
  • Publication number: 20180363127
    Abstract: In an apparatus and method for multi mask alignment, a carrier is provided that includes apertures therethrough. For each aperture, a combination frame and shadow mask that includes alignment features is positioned on spacers supported by the carrier with the shadow mask of the combination in coarse alignment with the aperture. Next, each combination frame and shadow mask is moved to a position spaced from the spacers whereupon the alignment system, under the control of a controller, individually aligns each combination frame and shadow mask to align the alignment features of the combination with reference alignment features associated with the combination. Each combination frame and shadow mask is then returned to a position on the spacers whereafter each combination frame and shadow mask is secured to the carrier. In an example, all of the combination frames and shadow masks can be aligned simultaneously.
    Type: Application
    Filed: December 20, 2016
    Publication date: December 20, 2018
    Inventors: Brian Arthur Bucci, David N. Monto, Shen-Chih Tung
  • Publication number: 20180305466
    Abstract: The present invention provides methods for producing Fabs and bi-specific antibodies comprising designed residues in the interfaces of the heavy chain light-chain variable (VH/VL) domain and the heavy chain-light chain constant (CH1/CL) domain, Fabs and bi-specific antibodies produced according to said processes and host cells encoding the same.
    Type: Application
    Filed: July 6, 2018
    Publication date: October 25, 2018
    Inventors: Stephen J Demarest, Xiufeng Wu, Raheleh Toughiri, Brian Arthur Kuhlman, Steven Morgan Lewis
  • Publication number: 20180232456
    Abstract: A system for building a software application may comprise a database and a hardware processor. The database may be configured to store a plurality of object definitions, each object definition being configured to cause an executing processor to perform specific processing when executed. The hardware processor may be configured to cause a user interface to be displayed; receive, from the user interface, a selection of a plurality of the object definitions and an input specifying at least one relationship between the plurality of the object definitions; create an application definition based on the selection and the input; and provide an application interpreter configured to enable the executing processor to process the application definition. The software application may include the application definition and the application interpreter.
    Type: Application
    Filed: February 13, 2018
    Publication date: August 16, 2018
    Inventor: BRIAN ARTHUR SHERMAN
  • Patent number: 10047167
    Abstract: The present invention provides methods for producing Fabs and bi-specific antibodies comprising designed residues in the interfaces of the heavy chain-light chain variable (VH/VL) domain and the heavy chain-light chain constant (CH1/CL] domain, Fabs and bi-specific antibodies produced according to said processes and host cells encoding the same.
    Type: Grant
    Filed: March 12, 2014
    Date of Patent: August 14, 2018
    Assignees: Eli Lilly and Company, University of North Carolina at Chapel Hill
    Inventors: Stephen J Demarest, Xiufeng Wu, Brian Arthur Kuhlman, Steven Morgan Lewis, Raheleh Toughiri
  • Publication number: 20180009908
    Abstract: The present invention provides fully IgG bi-specific antibodies comprising designed residues in the interface of the heavy chain-heavy chain (CH3/CH3) domains, processes for preparing said fully IgG bi-specific antibodies, and nucleic acids, vectors and host cells encoding the same.
    Type: Application
    Filed: January 21, 2016
    Publication date: January 11, 2018
    Applicants: Eli Lilly and Company, The University of North Carolina at Chapel Hill
    Inventors: Hector Aldaz, Shane Krummen Atwell, Stephen John Demarest, Karen Jean Froning, Brian Arthur Kuhlman, Andrew Philip Leaver-Fay
  • Publication number: 20170233861
    Abstract: In a multi-mask alignment system and method, a carrier frame is provided having a number of apertures therethrough. A number of shadow mask-frame combinations are also provided. Each shadow mask-frame combination includes a first set of alignment features and each shadow mask-frame combination is positioned on a first side of the carrier with the frame supporting the shadow mask in alignment with one of the apertures. An alignment system is provided and a control system including a programmed controller is also provided. Under the control of the controller, the alignment system is caused to adjust the position of each shadow mask-frame combination with respect to the carrier based on positions of the first set of alignment features determined by the controller.
    Type: Application
    Filed: October 14, 2015
    Publication date: August 17, 2017
    Inventor: Brian Arthur Bucci
  • Publication number: 20170165261
    Abstract: The invention relates to a pharmaceutical combination which comprises (a) a compound inhibiting BRAFV600E and (b) a compound which inhibits MerTK activation; for simultaneous, separate or sequential use; a commercial package or product comprising such a combination as a combined preparation for simultaneous, separate or sequential use; and to a method of treatment of a warm-blooded animal, especially a human.
    Type: Application
    Filed: June 30, 2015
    Publication date: June 15, 2017
    Inventors: Brian Arthur HEMMINGS, Gongda XUE
  • Publication number: 20170095827
    Abstract: In a shadow mask tensioning method and apparatus, a shadow mask supported by a support frame is positioned between a shadow mask frame and a set of actuators with a portion of the shadow mask extending across a gap between the support frame and the shadow mask frame. Under the control of a programmed controller, the set of actuators is caused to simultaneously displace numerous, spaced locations of the portion of the shadow mask into the gap to align alignment apertures of the shadow mask to predetermined positons in fields of view of cameras positioned to observe the alignment apertures. The shadow mask is then affixed to the shadow mask frame.
    Type: Application
    Filed: October 25, 2016
    Publication date: April 6, 2017
    Inventors: David N. Monto, Brian Arthur Bucci, Shen-Chih Tung, Nobuhiko Tamura, Whitten E. Little, JR.
  • Patent number: 9581917
    Abstract: In a system and method of shadow mask tensioning, an object having second set of alignment features is positioned on a side of shadow mask having a first set of alignment features such that the object and the shadow mask can move independently of each other and the first and second sets of alignment features are not in final alignment. Tension is then applied to the shadow mask to bring the first set of alignment features into final alignment with the second set of alignment features. The alignment features of the shadow mask can include at least one deposition aperture of the shadow mask.
    Type: Grant
    Filed: June 24, 2015
    Date of Patent: February 28, 2017
    Assignee: ADVANTECH GLOBAL, LTD
    Inventor: Brian Arthur Bucci
  • Patent number: 9507273
    Abstract: In a method and apparatus for shadow mask tensioning, a shadow mask frame and an anchor frame are positioned in spaced relation defining a gap therebetween and a shadow mask is positioned on the shadow mask frame and the anchor frame with an interior portion of the shadow mask extending across the gap. An edge of the shadow mask is affixed to the anchor frame and the shadow mask is tensioned by urging the interior portion of the shadow mask into the gap. Once the shadow mask has been tensioned to a desired extent, the shadow mask is affixed to the shadow mask frame. Thereafter, the combination of the shadow mask affixed to the shadow mask frame is separated from the anchor frame.
    Type: Grant
    Filed: April 30, 2014
    Date of Patent: November 29, 2016
    Assignee: ADVANTECH GLOBAL, LTD
    Inventor: Brian Arthur Bucci
  • Publication number: 20160170315
    Abstract: In a system and method of shadow mask tensioning, an object having second set of alignment features is positioned on a side of shadow mask having a first set of alignment features such that the object and the shadow mask can move independently of each other and the first and second sets of alignment features are not in final alignment. Tension is then applied to the shadow mask to bring the first set of alignment features into final alignment with the second set of alignment features. The alignment features of the shadow mask can include at least one deposition aperture of the shadow mask.
    Type: Application
    Filed: June 24, 2015
    Publication date: June 16, 2016
    Inventor: Brian Arthur Bucci
  • Patent number: 9277452
    Abstract: Adaptive modulation and priority-based flow control in wireless communications are disclosed. Ingress communication traffic is modulated for transmission over a wireless communication link. A modulation rate of modulation to be applied to the ingress communication traffic is controlled by adaptive modulation. A rate at which the ingress communication traffic is received is controlled through Priority-based Flow Control (PFC), but the PFC is based on the adaptive modulation. Adaptive modulation and PFC are thus linked together. PFC messaging could be sent when a change in modulation rate due to the adaptive modulation would not meet the rate at which the ingress communication traffic is received. If a change in modulation rate due to the adaptive modulation would still meet the rate at which the ingress communication traffic is received, then PFC messaging might not be sent.
    Type: Grant
    Filed: March 7, 2013
    Date of Patent: March 1, 2016
    Assignee: Dragonwave, Inc.
    Inventors: Prakasha Aithal, Brian Arthur Kay
  • Publication number: 20160039947
    Abstract: The present invention provides methods for producing Fabs and bi-specific antibodies comprising designed residues in the interfaces of the heavy chain-light chain variable (VH/VL) domain and the heavy chain-light chain constant (CH1/CL] domain, Fabs and bi-specific antibodies produced according to said processes and host cells encoding the same.
    Type: Application
    Filed: March 12, 2014
    Publication date: February 11, 2016
    Inventors: Stephen J Demarest, Xiufeng Wu, Brian Arthur Kuhlman, Steven Morgan Lewis, Raheleh Toughiri
  • Patent number: 9229456
    Abstract: The preferred embodiments described herein make possible to use lower cost, fixed flow components, such as critical orifices, which are fast to stabilize to a steady flow. These cannot be adjusted to achieve equal flows but are selected to be sensibly close to their desired flow values. This embodiment determines the true ratios of the flows of all of the flow controlling components. Actual flows are not measured but near equal flows are each fed to a common flow meter and the ratio of the indicated flow meter readings is taken to be the same as the ratio of the flows. Two, near equal flows are then combined and compared to a single flow of approximately the same value, and so on. The flow meter is used only to compare near equal flows so does not need to be calibrated nor linear over a wide range.
    Type: Grant
    Filed: April 18, 2011
    Date of Patent: January 5, 2016
    Assignee: LNI SCHMIDLIN SA (LNI SCHMIDLIN AG) (LNI SCHMIDLIN LTD)
    Inventor: Brian Arthur Goody
  • Patent number: D850748
    Type: Grant
    Filed: January 4, 2016
    Date of Patent: June 4, 2019
    Assignee: STEINHOBEL DESIGN (PTY) LTD
    Inventor: Brian Arthur Steinhobel