Patents by Inventor Chang Liu

Chang Liu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240096614
    Abstract: A method of adjusting a position of a tip of an electrode relative to an end of a nebulizer nozzle of a mass spectrometry device includes providing a conduit and the electrode connected to the conduit at a first end of the conduit. The electrode tip is disposed at a first position relative to the nebulizer nozzle end. The pressure gauge is connected to a second end of the conduit. A gas ejection is initiated from the nozzle with the electrode tip at the first position. During the gas ejection, the position of the electrode tip is adjusted from the first position towards a second position relative to the nozzle end. Adjusting the position from the first position towards the second position is terminated when the pressure gauge displays a pressure condition. Once adjusting is terminated, the electrode tip is at the second position.
    Type: Application
    Filed: January 20, 2022
    Publication date: March 21, 2024
    Applicant: DH Technologies Development Pte. Ltd.
    Inventors: Peter KOVARIK, Chang LIU
  • Publication number: 20240095360
    Abstract: Disclosed are a RISC-V and O-CFI mechanism-based defense method and apparatus for code reuse attacks, comprising: constructing a control flow graph according to program source codes randomized in a basic block order; on the basis of the control flow graph, obtaining a boundary range of a control flow transfer branch; executing the program source codes, obtaining a target node to which each control flow is to be transferred, and analyzing each target node in combination with the boundary range so as to defend against an abnormal control flow. The present invention can identify an illegal control flow transfer with the assistance of RISC-V security hardware according to the characteristics of a program control flow itself, and effectively handle code reuse attacks, thereby enhancing the security defense capabilities of an RISC-V system.
    Type: Application
    Filed: December 3, 2021
    Publication date: March 21, 2024
    Inventors: Yanjun WU, Chang LIU, Chen ZHAO, Jingzheng WU, Zhiqing RUI, Bin WU, Tianyue LUO
  • Publication number: 20240096781
    Abstract: A package structure including a semiconductor die, a redistribution circuit structure and an electronic device is provided. The semiconductor die is laterally encapsulated by an insulating encapsulation. The redistribution circuit structure is disposed on the semiconductor die and the insulating encapsulation. The redistribution circuit structure includes a colored dielectric layer, inter-dielectric layers and redistribution conductive layers embedded in the inter-dielectric layers. The electronic device is disposed over the colored dielectric layer and electrically connected to the redistribution circuit structure.
    Type: Application
    Filed: March 20, 2023
    Publication date: March 21, 2024
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chun-Ti Lu, Hao-Yi Tsai, Chia-Hung Liu, Yu-Hsiang Hu, Hsiu-Jen Lin, Tzuan-Horng Liu, Chih-Hao Chang, Bo-Jiun Lin, Shih-Wei Chen, Hung-Chun Cho, Pei-Rong Ni, Hsin-Wei Huang, Zheng-Gang Tsai, Tai-You Liu, Po-Chang Shih, Yu-Ting Huang
  • Publication number: 20240096611
    Abstract: A method of sampling an ejection of a sample from a liquid container includes disposing the liquid container adjacent an open port in-terface. The container includes a sampling port. The open port interface en-gages with the sampling port. The sample from the liquid container is eject-ed, through the sampling port, and into the open port interface. The sample is analyzed with a mass spectrometry device.
    Type: Application
    Filed: February 8, 2022
    Publication date: March 21, 2024
    Applicant: DH Technologies Development Pte. Ltd.
    Inventors: Thomas R. COVEY, Chang LIU, Hui ZHANG
  • Publication number: 20240097005
    Abstract: Disclosed is a semiconductor device and semiconductor fabrication method. A semiconductor device includes: a gate structure over a semiconductor substrate, having a high-k dielectric layer, a p-type work function layer, an n-type work function layer, a dielectric anti-reaction layer, and a glue layer; and a continuous metal cap over the gate structure formed by metal material being deposited over the gate structure, a portion of the anti-reaction layer being selectively removed, and additional metal material being deposited over the gate structure. A semiconductor fabrication method includes: receiving a gate structure; flattening the top layer of the gate structure; precleaning and pretreating the surface of the gate structure; depositing metal material over the gate structure to form a discontinuous metal cap; selectively removing a portion of the anti-reaction layer; depositing additional metal material over the gate structure to create a continuous metal cap; and containing growth of the metal cap.
    Type: Application
    Filed: January 12, 2023
    Publication date: March 21, 2024
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Shih-Hang Chiu, Jui-Yang Wu, Kuan-Ting Liu, Weng Chang
  • Patent number: 11935981
    Abstract: A photo-detecting device includes a first semiconductor layer with a first dopant, a light-absorbing layer, a second semiconductor layer, and a semiconductor contact layer. The second semiconductor layer is located on the first semiconductor layer and has a first region and a second region, the light absorbing layer is located between the first semiconductor layer and the second semiconductor layer and has a third region and a fourth region, the semiconductor contact layer contacts the first region. The first region includes a second dopant and a third dopant, the second region includes second dopant, and the third region includes third dopant. The semiconductor contact layer has a first thickness greater than 50 ? and smaller than 1000 ?.
    Type: Grant
    Filed: June 30, 2021
    Date of Patent: March 19, 2024
    Assignee: EPISTAR CORPORATION
    Inventors: Chu-Jih Su, Chia-Hsiang Chou, Wei-Chih Peng, Wen-Luh Liao, Chao-Shun Huang, Hsuan-Le Lin, Shih-Chang Lee, Mei Chun Liu, Chen Ou
  • Publication number: 20240085404
    Abstract: The present disclosure relates to methods and compositions useful for measuring the transcytosis or recycling of a molecule. In particular, the present disclosure relates to in vitro receptor-dependent transcytosis or recycling assays for evaluating the clearance rates of therapeutic antibody molecules and Fc-fusion proteins in humans and animals.
    Type: Application
    Filed: October 13, 2023
    Publication date: March 14, 2024
    Applicant: Genentech, Inc.
    Inventors: Chang LIU, John Hok Nin LOWE, Shan CHUNG
  • Publication number: 20240081301
    Abstract: Provided are genetically modified animal expressing human or chimeric (e.g., humanized) FcRn, and methods of use thereof.
    Type: Application
    Filed: January 29, 2022
    Publication date: March 14, 2024
    Inventors: Chengzhang Shang, Chong Li, Chang Liu, Dirui Li
  • Publication number: 20240088225
    Abstract: A method includes forming a gate stack on a first portion of a semiconductor substrate, removing a second portion of the semiconductor substrate on a side of the gate stack to form a recess, growing a semiconductor region starting from the recess, implanting the semiconductor region with an impurity, and performing a melt anneal on the semiconductor region. At least a portion of the semiconductor region is molten during the melt anneal.
    Type: Application
    Filed: November 14, 2023
    Publication date: March 14, 2024
    Inventors: Su-Hao Liu, Wen-Yen Chen, Li-Heng Chen, Li-Ting Wang, Liang-Yin Chen, Huicheng Chang, Yee-Chia Yeo, Ying-Lang Wang
  • Patent number: 11923429
    Abstract: A semiconductor device and method for forming the semiconductor device are provided. In some embodiments, a semiconductor substrate comprises a device region. An isolation structure extends laterally in a closed path to demarcate the device region. A first source/drain region and a second source/drain region are in the device region and laterally spaced. A sidewall of the first source/drain region directly contacts the isolation structure at a first isolation structure sidewall, and remaining sidewalls of the first source/drain region are spaced from the isolation structure. A selectively-conductive channel is in the device region, and extends laterally from the first source/drain region to the second source/drain region. A plate comprises a central portion and a first peripheral portion. The central portion overlies the selectively-conductive channel, and the first peripheral portion protrudes from the central portion towards the first isolation structure sidewall.
    Type: Grant
    Filed: August 18, 2021
    Date of Patent: March 5, 2024
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chih-Chang Cheng, Fu-Yu Chu, Ming-Ta Lei, Ruey-Hsin Liu, Shih-Fen Huang
  • Patent number: 11924982
    Abstract: A curved display apparatus is provided, including one or more bending portions where the curved display apparatus is bent. At least the one or more bending portions of the curved display apparatus including a stacked structure, which includes a support layer; a display panel on the support layer; and N number of pressure sensitive adhesive layers and M number of flexible base layers between the support layer and the display panel, N is an integer equal to or greater than 3, M is an integer equal to or greater than 2. A first one of the N number of pressure sensitive adhesive layers adheres the support layer and a first one of the M number of flexible base layers together. A last one of the N number of pressure sensitive adhesive layers adheres the display panel and a last one of the M number of flexible base layers together.
    Type: Grant
    Filed: November 17, 2020
    Date of Patent: March 5, 2024
    Assignees: Chengdu BOE Optoelectronics Technology Co., Ltd., BOE Technology Group Co., Ltd.
    Inventors: Chang Liu, Chao Wang, Zhiliang Jiang, Pan Zhao, Qian Ma, Dianjie Hou
  • Patent number: 11922838
    Abstract: A display panel, comprising a first insulating structural layer, a first crack detection line, a second insulating structural layer and a second crack detection line which are sequentially arranged on a substrate, wherein the first crack detection line and the second crack detection line are both located in a peripheral area and are arranged around a display area, one end of the first crack detection line is configured to receive a detection signal, and the other end of the first crack detection line is configured to output a first output signal, and one end of the second crack detection line is configured to receive a detection signal and the other end of the second crack detection line is configured to output a second output signal.
    Type: Grant
    Filed: April 13, 2021
    Date of Patent: March 5, 2024
    Assignees: Chengdu BOE Optoelectronics Technology Co., Ltd., BOE Technology Group Co., Ltd.
    Inventors: Yu Wang, Yi Zhang, Tingliang Liu, Chang Luo, Hao Zhang, Huijuan Yang, Tinghua Shang, Yang Zhou, Pengfei Yu, Shun Zhang, Xiaofeng Jiang, Huijun Li, Linhong Han
  • Publication number: 20240068997
    Abstract: The disclosed signal quality assessment is particularly useful for mass spectrometry. In an embodiment of the disclosed system, a processor utilizes a wavelet-based feature extraction for the signal quality assessment of a chromatogram signal. The signal quality assessment may be used to control operational parameters, such as a flowrate of a pump that moves liquid droplets toward an ionization device of a mass spectrometer.
    Type: Application
    Filed: September 21, 2021
    Publication date: February 29, 2024
    Inventors: Gordana Ivosev, Chang Liu
  • Publication number: 20240069606
    Abstract: A portable electronic device including a first body, a second body, and a hinge mechanism is provided. The second body is connected to the first body through the hinge mechanism, and the hinge mechanism has a basis axis located at the first body and a rotation axis located at a lower end of the second body. When the second body rotates with respect to the first body, the rotation axis slides along an arc shaped path with respect to the basis axis to increase or decrease a distance between the rotation axis and the basis axis and increase or decrease a distance between the lower end of the second body and a back end of the first body.
    Type: Application
    Filed: November 3, 2023
    Publication date: February 29, 2024
    Applicants: Acer Incorporated, Sinher Technology Inc.
    Inventors: Yi-Ta Huang, Cheng-Nan Ling, Chih-Chun Liu, Yung-Chang Chiang
  • Publication number: 20240069416
    Abstract: A light path folding element includes a first surface, a second surface, a first reflecting surface and a second reflecting surface. A light travels from the first surface into the light path folding element. The second surface is disposed relative to the first surface along a first direction and is parallel to the first surface, and the first direction is perpendicular to the first surface. The first reflecting surface connects the first surface and the second surface, an acute angle is formed between the first reflecting surface and the first surface, and the light forms an internal reflection via the first reflecting surface. The light forms another internal reflection via the second reflecting surface. The light path folding element further includes a light blocking structure, which extends from at least one of the first surface and the second surface into the light path folding element.
    Type: Application
    Filed: August 24, 2023
    Publication date: February 29, 2024
    Inventors: Ssu-Hsin LIU, Wei-Che TUNG, Lin-An CHANG, Ming-Ta CHOU
  • Publication number: 20240072128
    Abstract: A method of forming a semiconductor device includes forming a source/drain region and a gate electrode adjacent the source/drain region, forming a hard mask over the gate electrode, forming a bottom mask over the source/drain region, wherein the gate electrode is exposed, and performing a nitridation process on the hard mask over the gate electrode. The bottom mask remains over the source/drain region during the nitridation process and is removed after the nitridation. The method further includes forming a silicide over the source/drain region after removing the bottom mask.
    Type: Application
    Filed: November 6, 2023
    Publication date: February 29, 2024
    Inventors: Tsan-Chun Wang, Su-Hao Liu, Liang-Yin Chen, Huicheng Chang, Yee-Chia Yeo
  • Patent number: 11916561
    Abstract: An apparatus may include a first clock generator configured to receive an input clock signal, and generate two or more first-level clock signals of a track-and-hold circuit, a phase interpolator configured to generate an interpolated clock signals, wherein the interpolated clock signal is based on the two or more first-level clock signals, and a second clock generator configured to generate two or more second-level clock signals based on the interpolated clock signal, wherein the phase of the two or more second-level clock signals relative to the phase of a respective first-level clock signal is determined, at least in part, by the phase of the interpolated clock signal.
    Type: Grant
    Filed: January 24, 2022
    Date of Patent: February 27, 2024
    Assignee: AVAGO TECHNOLOGIES INTERNATIONAL SALES PTE. LIMITED
    Inventors: Boyu Hu, Chang Liu, Guansheng Li, Haitao Wang, Delong Cui, Jun Cao
  • Publication number: 20240059285
    Abstract: In various examples, techniques for using future trajectory predictions for adaptive cruise control (ACC) are described. For instance, a vehicle may determine a future path(s) of the vehicle and a future path(s) of an object(s). The vehicle may then use a speed profile(s) and the future path(s) to determine a trajectory(ies) for the vehicle. The vehicle may then select a trajectory, such as based on the future path(s) of the object(s). Based on the trajectory, ACC of the vehicle may cause the vehicle to navigate at a speed or a velocity. This way, the vehicle is able to continue using ACC even when the driver makes a maneuver(s) or the system determined to make a maneuver, such as switching lanes or choosing a lane when a road splits.
    Type: Application
    Filed: August 19, 2022
    Publication date: February 22, 2024
    Inventors: Julia Ng, Jian Wei Leong, Nikolai Smolyanskiy, Yizhou Wang, Fangkai Yang, Nianfeng Wan, Chang Liu
  • Patent number: D1018293
    Type: Grant
    Filed: June 28, 2022
    Date of Patent: March 19, 2024
    Inventor: Chang Liu
  • Patent number: D1020147
    Type: Grant
    Filed: April 28, 2021
    Date of Patent: March 26, 2024
    Assignees: JIANGSU MIDEA CLEANING APPLIANCES CO., LTD., MIDEA GROUP CO., LTD.
    Inventors: Jin Wang, Hyun Seon Shin, Lu Wang, Chang Liu, Pei Cao, Gang Liu, Jian Xu