Patents by Inventor Charles M. Watkins

Charles M. Watkins has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20160197255
    Abstract: Solid state lighting devices and associated methods of thermal sinking are described below. In one embodiment, a light emitting diode (LED) device includes a heat sink, an LED die thermally coupled to the heat sink, and a phosphor spaced apart from the LED die. The LED device also includes a heat conduction path in direct contact with both the phosphor and the heat sink. The heat conduction path is configured to conduct heat from the phosphor to the heat sink.
    Type: Application
    Filed: January 11, 2016
    Publication date: July 7, 2016
    Inventors: Kevin Tetz, Charles M. Watkins
  • Publication number: 20160027957
    Abstract: Various embodiments of light emitting devices with built-in chromaticity conversion and associated methods of manufacturing are described herein. In one embodiment, a method for manufacturing a light emitting device includes forming a first semiconductor material, an active region, and a second semiconductor material on a substrate material in sequence, the active region being configured to produce a first emission. A conversion material is then formed on the second semiconductor material. The conversion material has a crystalline structure and is configured to produce a second emission. The method further includes adjusting a characteristic of the conversion material such that a combination of the first and second emission has a chromaticity at least approximating a target chromaticity of the light emitting device.
    Type: Application
    Filed: October 2, 2015
    Publication date: January 28, 2016
    Inventors: Cem Basceri, Thomas Gehrke, Charles M. Watkins
  • Patent number: 9236550
    Abstract: Solid state lighting devices and associated methods of thermal sinking are described below. In one embodiment, a light emitting diode (LED) device includes a heat sink, an LED die thermally coupled to the heat sink, and a phosphor spaced apart from the LED die. The LED device also includes a heat conduction path in direct contact with both the phosphor and the heat sink. The heat conduction path is configured to conduct heat from the phosphor to the heat sink.
    Type: Grant
    Filed: February 22, 2013
    Date of Patent: January 12, 2016
    Assignee: Micron Technology, Inc.
    Inventors: Kevin Tetz, Charles M. Watkins
  • Patent number: 9184336
    Abstract: Various embodiments of light emitting devices with built-in chromaticity conversion and associated methods of manufacturing are described herein. In one embodiment, a method for manufacturing a light emitting device includes forming a first semiconductor material, an active region, and a second semiconductor material on a substrate material in sequence, the active region being configured to produce a first emission. A conversion material is then formed on the second semiconductor material. The conversion material has a crystalline structure and is configured to produce a second emission. The method further includes adjusting a characteristic of the conversion material such that a combination of the first and second emission has a chromaticity at least approximating a target chromaticity of the light emitting device.
    Type: Grant
    Filed: September 17, 2014
    Date of Patent: November 10, 2015
    Assignee: Micron Technology, Inc.
    Inventors: Cem Basceri, Thomas Gehrke, Charles M. Watkins
  • Patent number: 8969899
    Abstract: A method and system for manufacturing a light conversion structure for a light emitting diode (LED) is disclosed. The method includes forming a transparent, thermally insulating cover over an LED chip. The method also includes dispensing a conversion material onto the cover to form a conversion coating on the cover, and encapsulating the LED, the silicone cover, and the conversion coating within an encapsulant. Additional covers and conversion coatings can be added.
    Type: Grant
    Filed: February 28, 2013
    Date of Patent: March 3, 2015
    Assignee: Micron Technology, Inc.
    Inventors: Charles M. Watkins, Kevin Tetz, Thomas Gehrke
  • Publication number: 20150004729
    Abstract: Various embodiments of light emitting devices with built-in chromaticity conversion and associated methods of manufacturing are described herein. In one embodiment, a method for manufacturing a light emitting device includes forming a first semiconductor material, an active region, and a second semiconductor material on a substrate material in sequence, the active region being configured to produce a first emission. A conversion material is then formed on the second semiconductor material. The conversion material has a crystalline structure and is configured to produce a second emission. The method further includes adjusting a characteristic of the conversion material such that a combination of the first and second emission has a chromaticity at least approximating a target chromaticity of the light emitting device.
    Type: Application
    Filed: September 17, 2014
    Publication date: January 1, 2015
    Inventors: Cem Basceri, Thomas Gehrke, Charles M. Watkins
  • Patent number: 8847198
    Abstract: Various embodiments of light emitting devices with built-in chromaticity conversion and associated methods of manufacturing are described herein. In one embodiment, a method for manufacturing a light emitting device includes forming a first semiconductor material, an active region, and a second semiconductor material on a substrate material in sequence, the active region being configured to produce a first emission. A conversion material is then formed on the second semiconductor material. The conversion material has a crystalline structure and is configured to produce a second emission. The method further includes adjusting a characteristic of the conversion material such that a combination of the first and second emission has a chromaticity at least approximating a target chromaticity of the light emitting device.
    Type: Grant
    Filed: May 26, 2011
    Date of Patent: September 30, 2014
    Assignee: Micron Technology, Inc.
    Inventors: Cem Basceri, Thomas Gehrke, Charles M. Watkins
  • Publication number: 20140238298
    Abstract: Several embodiments of semiconductor systems and associated methods of color corrections are disclosed herein. In one embodiment, a method for producing a light emitting diode (LED) includes forming an (LED) on a substrate, measuring a base emission characteristic of the formed LED, and selecting a phosphor based on the measured base emission characteristic of the formed LED such that a combined emission from the LED and the phosphor at least approximates white light. The method further includes introducing the selected phosphor onto the LED via, for example, inkjet printing.
    Type: Application
    Filed: May 5, 2014
    Publication date: August 28, 2014
    Applicant: MICRON TECHNOLOGY, INC.
    Inventors: Kevin Tetz, Charles M. Watkins
  • Patent number: 8816371
    Abstract: Coated color-converting particles and associated devices, systems, and methods are disclosed herein. A coating of the coated color-converting particles can include, for example, a parylene, such as a fluorinated parylene. In particular embodiments, the coating can be configured to protect a color-converting material of a particle core of the coated color-converting particles from detrimental reactions. For example, the coating can prevent, slow, or otherwise inhibit detrimental reactions between the color-converting material and a matrix material or between the color-converting material and an environmental constituent that can diffuse through a matrix. In particular embodiments, the coated color-converting particles can be incorporated into a matrix to form a composite. The composite can be used, for example, with a radiation transducer.
    Type: Grant
    Filed: November 30, 2011
    Date of Patent: August 26, 2014
    Assignee: Micron Technology, Inc.
    Inventor: Charles M. Watkins
  • Publication number: 20140209582
    Abstract: Systems and methods for forming apertures in microfeature workpieces are disclosed herein. In one embodiment, a method includes directing a laser beam toward a microfeature workpiece to form an aperture and sensing the laser beam pass through the microfeature workpiece in real time. The method can further include determining a number of pulses of the laser beam and/or an elapsed time to form the aperture and controlling the laser beam based on the determined number of pulses and/or the determined elapsed time to form a second aperture in the microfeature workpiece.
    Type: Application
    Filed: April 1, 2014
    Publication date: July 31, 2014
    Applicant: MICRON TECHNOLOGY, INC.
    Inventors: Charles M. Watkins, William M. Hiatt
  • Patent number: 8786097
    Abstract: Methods for forming through vias in a semiconductor substrate and resulting structures are disclosed. In one embodiment, a through via may be formed by forming a partial via from an active surface through a conductive element thereon and a portion of the substrate underlying the conductive element. The through via may then be completed by laser ablation or drilling from a back surface. In another embodiment, a partial via may be formed by laser ablation or drilling from the back surface of a substrate to a predetermined distance therein. The through via may be completed from the active surface by forming a partial via extending through the conductive element and the underlying substrate to intersect the laser-drilled partial via. In another embodiment, a partial via may first be formed by laser ablation or drilling from the back surface of the substrate followed by dry etching to complete the through via.
    Type: Grant
    Filed: November 29, 2010
    Date of Patent: July 22, 2014
    Assignee: Micron Technology, Inc.
    Inventors: Charles M. Watkins, Kyle K. Kirby, Alan G. Wood, Salman Akram, Warren M. Farnworth
  • Patent number: 8716038
    Abstract: Several embodiments of semiconductor systems and associated methods of color corrections are disclosed herein. In one embodiment, a method for producing a light emitting diode (LED) includes forming an (LED) on a substrate, measuring a base emission characteristic of the formed LED, and selecting a phosphor based on the measured base emission characteristic of the formed LED such that a combined emission from the LED and the phosphor at least approximates white light. The method further includes introducing the selected phosphor onto the LED via, for example, inkjet printing.
    Type: Grant
    Filed: March 2, 2010
    Date of Patent: May 6, 2014
    Assignee: Micron Technology, Inc.
    Inventors: Kevin Tetz, Charles M. Watkins
  • Patent number: 8686313
    Abstract: Systems and methods for forming apertures in microfeature workpieces are disclosed herein. In one embodiment, a method includes directing a laser beam toward a microfeature workpiece to form an aperture and sensing the laser beam pass through the microfeature workpiece in real time. The method can further include determining a number of pulses of the laser beam and/or an elapsed time to form the aperture and controlling the laser beam based on the determined number of pulses and/or the determined elapsed time to form a second aperture in the microfeature workpiece.
    Type: Grant
    Filed: September 17, 2013
    Date of Patent: April 1, 2014
    Assignee: Micron Technology, Inc.
    Inventors: Charles M. Watkins, William M. Hiatt
  • Patent number: 8669179
    Abstract: A through-wafer interconnect for imager, memory and other integrated circuit applications is disclosed, thereby eliminating the need for wire bonding, making devices incorporating such interconnects stackable and enabling wafer level packaging for imager devices. Further, a smaller and more reliable die package is achieved and circuit parasitics (e.g., L and R) are reduced due to the reduced signal path lengths.
    Type: Grant
    Filed: July 11, 2013
    Date of Patent: March 11, 2014
    Assignee: Micron Technology, Inc.
    Inventors: Salman Akram, Charles M. Watkins, William M. Hiatt, David R. Hembree, James M. Wark, Warren M. Farnworth, Mark E. Tuttle, Sidney B. Rigg, Steven D. Oliver, Kyle K. Kirby, Alan G. Wood, Lu Velicky
  • Patent number: 8664562
    Abstract: Systems and methods for forming apertures in microfeature workpieces are disclosed herein. In one embodiment, a method includes directing a laser beam toward a microfeature workpiece to form an aperture and sensing the laser beam pass through the microfeature workpiece in real time. The method can further include determining a number of pulses of the laser beam and/or an elapsed time to form the aperture and controlling the laser beam based on the determined number of pulses and/or the determined elapsed time to form a second aperture in the microfeature workpiece.
    Type: Grant
    Filed: May 1, 2006
    Date of Patent: March 4, 2014
    Assignee: Micron Technology, Inc.
    Inventors: Charles M. Watkins, William M. Hiatt
  • Patent number: 8633500
    Abstract: Light emitting diodes and methods for manufacturing light emitting diodes are disclosed herein. In one embodiment, a method for manufacturing a light emitting diode (LED) comprises applying a first light conversion material to a first region on the LED and applying a second light conversion material to a second, different region on the LED. A portion of the LED is exposed after applying the first and second light conversion materials.
    Type: Grant
    Filed: September 7, 2012
    Date of Patent: January 21, 2014
    Assignee: Micron Technology, Inc.
    Inventor: Charles M. Watkins
  • Publication number: 20140014635
    Abstract: Systems and methods for forming apertures in microfeature workpieces are disclosed herein. In one embodiment, a method includes directing a laser beam toward a microfeature workpiece to form an aperture and sensing the laser beam pass through the microfeature workpiece in real time. The method can further include determining a number of pulses of the laser beam and/or an elapsed time to form the aperture and controlling the laser beam based on the determined number of pulses and/or the determined elapsed time to form a second aperture in the microfeature workpiece.
    Type: Application
    Filed: September 17, 2013
    Publication date: January 16, 2014
    Applicant: MICRON TECHNOLOGY, INC.
    Inventors: Charles M. Watkins, William M. Hiatt
  • Publication number: 20130295766
    Abstract: A through-wafer interconnect for imager, memory and other integrated circuit applications is disclosed, thereby eliminating the need for wire bonding, making devices incorporating such interconnects stackable and enabling wafer level packaging for imager devices. Further, a smaller and more reliable die package is achieved and circuit parasitics (e.g., L and R) are reduced due to the reduced signal path lengths.
    Type: Application
    Filed: July 11, 2013
    Publication date: November 7, 2013
    Inventors: Salman Akram, Charles M. Watkins, William M. Hiatt, David R. Hembree, James M. Wark, Warren M. Farnworth, Mark E. Tuttle, Sidney B. Rigg, Steven D. Oliver, Kyle K. Kirby, Alan G. Wood, Lu Velicky
  • Patent number: 8536485
    Abstract: Systems and methods for forming apertures in microfeature workpieces are disclosed herein. In one embodiment, a method includes directing a laser beam toward a microfeature workpiece to form an aperture and sensing the laser beam pass through the microfeature workpiece in real time. The method can further include determining a number of pulses of the laser beam and/or an elapsed time to form the aperture and controlling the laser beam based on the determined number of pulses and/or the determined elapsed time to form a second aperture in the microfeature workpiece.
    Type: Grant
    Filed: April 28, 2006
    Date of Patent: September 17, 2013
    Assignee: Micron Technology, Inc.
    Inventors: Charles M. Watkins, William M. Hiatt
  • Patent number: 8502353
    Abstract: A through-wafer interconnect for imager, memory and other integrated circuit applications is disclosed, thereby eliminating the need for wire bonding, making devices incorporating such interconnects stackable and enabling wafer level packaging for imager devices. Further, a smaller and more reliable die package is achieved and circuit parasitics (e.g., L and R) are reduced due to the reduced signal path lengths.
    Type: Grant
    Filed: June 7, 2011
    Date of Patent: August 6, 2013
    Assignee: Micron Technology, Inc.
    Inventors: Salman Akram, Charles M. Watkins, William M. Hiatt, David R. Hembree, James M. Wark, Warren M. Farnworth, Mark E. Tuttle, Sidney B. Rigg, Steven D. Oliver, Kyle K. Kirby, Alan G. Wood, Lu Velicky