Abstract: A self-contained ventilator includes a housing having a support member for supporting a pollution source. A filter is further disposed in the housing for filtering contaminants emitted from the pollution source. A conduit is adapted to connect to the housing to provide non-housing communication between portions of the housing. A fan is situated in the conduit to generate an airflow that follows a path through the housing, through the conduit, and back to the housing. The airflow entrains the contaminants such that the contaminants are captured by the filter upon passage of the airflow through the filter.

Abstract: In prior arts, additional pulse-width modulators and more costs are needed for increasing the current output. The invention provides a synchronized parallel running power converter. The power converter includes multiple power converters controlled by single-phase or double-phase pulse-width modulators. Each power converter includes a first pulse input port, a second pulse input port and a current output port. Each first pulse input ports are coupled, and each second pulse input ports are coupled also, so that each power converter is controlled by the same pulse signal and provide a same output current to be added as several times of current output.

Abstract: A method of forming very small silicon nitride spacers in split-gate flash EPROMs is disclosed which prevent the occurrence of “write disturb”, unwanted reverse tunneling, or erasing. This is accomplished by forming spacers with well-controlled dimensions and well-defined shapes through a judicious use of a fully wet etch technique, including main-etch and over-etch. The use of a phosphoric acid solution in combination with sulfuric acid+hydrogen peroxide widens the process window from a few seconds to several minutes so that the small-dimensioned silicon nitride spacers can be better controlled than it has been possible in the past. In the first embodiment phosphoric solution is used both for main-etch and for over-etch. In the second embodiment, phosphoric solution is used for main-etch only, while the sulfuric+hydrogen peroxide solution is used as an over-etch in forming the tiny silicon nitride spacers of the invention.

Abstract: A method and apparatus for mixing a fluid to form a homogeneous mixing volume providing at least two aspiration members at partially immersed in a solution, each of the two aspiration members include an aspiration surface having a plurality of aspiration openings for injecting a pressurized gas flow into the solution to produce a plurality of flow vortices. The aspiration surfaces disposed in opposing gas flow relationship and spaced apart to define an aspiration treatment volume to produce intersecting flow vortices within the aspiration treatment volume; providing a pressurized gas flow to a first aspiration member to produce a first plurality of flow vortices; and, adjusting the pressurized gas flow to a second aspiration member to produce a second plurality of flow vortices to form a homogeneous mixing volume within a portion of the solution.

Abstract: A wet etch system including a process tank having an inner etch bath chamber and an outer overflow chamber surrounding the etch bath chamber. A frame which is removably mounted on the process tank defines a diversion channel between the upper ends of the etch bath chamber and overflow chamber. The etch bath chamber receives a wafer-containing cassette, which displaces etchant from the etch bath chamber, through the diversion channel and into the overflow chamber, where the etchant is drained from the process tank. Particulate impurities leave the etch bath chamber, enter the overflow chamber and drain from the process tank with the overflow etchant. Fresh etchant is poured into the etch bath chamber prior to a subsequent etch cycle. A water spray loop may be provided in the overflow chamber for removing etch particles from the interior wall surfaces of the overflow chamber.

Abstract: A diaphragm holder for pressure regulator of air tank used in diving includes a diaphragm seat formed on the pressure regulator for holding a rubber diaphragm therein, a cover for closing onto a top of the diaphragm seat, and a soft push member integrally formed on the cover. The diaphragm seat is provided on an outer wall surface with spaced raised rails, and the cover is provided on an inner wall surface with L-shaped grooves corresponding to the raised rails on the diaphragm seat. Each of the L-shaped grooves includes communicable wide and narrow groove portions. By closing the cover to the diaphragm seat with the wide groove portions aligned with the raised rails and turning the cover, the rails are moved into the narrow groove portions to lock the cover to the diaphragm seat with the soft push member correctly located at an outer side of the rubber diaphragm.

Abstract: A wet etch system including a process tank having an inner etch bath chamber and an outer overflow chamber surrounding the etch bath chamber. A frame which is removably mounted on the process tank defines a diversion channel between the upper ends of the etch bath chamber and overflow chamber. The etch bath chamber receives a wafer-containing cassette, which displaces etchant from the etch bath chamber, through the diversion channel and into the overflow chamber, where the etchant is drained from the process tank. Particulate impurities leave the etch bath chamber, enter the overflow chamber and drain from the process tank with the overflow etchant. Fresh etchant is poured into the etch bath chamber prior to a subsequent etch cycle. A water spray loop may be provided in the overflow chamber for removing etch particles from the interior wall surfaces of the overflow chamber.

Abstract: A computer assembly comprising a computer housing and a plurality of separate outer casing members mountable in enveloping relationship with the housing; the plurality of outer casing members having an attached state in fixedly mounted relationship with the housing and a disengaged state in nontouching relationship with the housing; the plurality of outer casing members being toolessly switchable between the attached state and the disengaged state.

Abstract: A valve-leaf protective structure for pressure regulator of air tank used in diving mainly includes a valve-leaf seat being provided at a lower center with a retaining hole and at two sides with two raised supports, each of which is provided at an upper inner surface with a rotary shaft hole; and a valve-leaf protective cover located between the two raised supports of the valve-leaf seat, and provided at two upper outer ends with two sideward projected rotary shafts for rotatably mounted in the two rotary holes on the raised supports. A lower side of the protective cover is formed into a tongue having a hook provided at a lowermost end thereof to detachably engage with the retaining hole at the lower center of the valve-leaf seat. Therefore, the protective cover may be pivotally turned about the rotary shafts between the raised supports to close or open the valve-leaf seat.

Abstract: In an improved brake handle structure for a mobility aid, a control handle is connected to a handlebar of a vehicle body. The control handle has a main body. An upper section of the main body has a transverse through bar hole. The handlebar extends through the bar hole and is then secured. A lateral side of the main body is provided with a brake pull wire hole for extension of a brake wire therethrough, with a plug inserted into a securing groove in a rotary pull lever. The main body is provided with upper and lower cavities for insertion of upper and lower corners of an inner end of the pull lever. A press rod cavity is disposed above the pull wire hole of the main body for insertion of an outer end of a press rod. The inner end of the press rod is connected pivotally in a rod sleeve of the pull lever. A projecting portion is provided near one side of the outer end of the press rod. A notch portion is provided between the projecting portion and the outer end of the press rod.

Abstract: A controlled pressure regulation system generates the wafer-pressing pressures during a polishing operation. A wafer carrier head holds a wafer to be polished against a platen. A first and second pressure regulators respectively generate a first and second pressure onto the platen and the wafer carrier head to press the wafer to be polished. A first and second controllers are respectively connected to the first and second pressure regulators in control feedback loops to control the generation of the first and second pressures. The first and second pressures are controlled to obtain a desired difference of pressure between the first and second pressure.

Abstract: A static mixer comprises a mixing chamber with an inlet mixing module, fluids to be mixed being fed into the module to undergo swirling and jet collision, at least one intermediate mixing module connected to the inlet mixing module and provided with means for splitting liquid flow into a plurality of jet flows with subsequent recombination of said jets and mixing action of vortices formed around the jet flows, and an outlet mixing module connected to the intermediate mixing module and provided with means for further swirling premixed fluids.

Abstract: A draining structure for diving mask includes a soft head cover fixedly connected to a rigid skirt framing a lens. The soft head cover includes a forward projected nose portion having a draining valve provided at a bottom thereof to be openable only in an outward direction. A draining guide is provided below the nose portion and has a hole formed directly below the draining valve to prevent water from sideward flushing open the draining valve when a diver jumps into water in a vertical position. An upward projected flange is provided at a rear end of the draining guide to guide air bubbles produced by the diver's expiration to two side outlets of the draining guide. The flange also reinforces the two side outlets and prevents them from deformation when the head cover is put on the diver's head and presses against the side outlets.

Abstract: A method of replacing a side panel member of a computer casing comprising positioning the computer with a bottom portion thereof exposed and pushing a push button on the bottom portion.

Abstract: A backside cannelure of an electrode to provide for detecting semiconductor wafer shift after the wafer has been positioned over the cannelure of the electrode is disclosed. The wafer has a backside and a proper position over the cannelure. The cannelure exposes the backside of the wafer to a gas piped in through one or more holes of the electrode. The cannelure has a size such that deviation of the wafer from its proper position by more than a threshold partially exposes the cannelure, such that the gas leaks from the cannelure as now partially exposed. A gas flow detector may detect the gas leaking from the cannelure, and provide corresponding detection of the wafer deviating from its proper position.

Abstract: A static mixer comprises a mixing chamber with an inlet mixing module, fluids to be mixed being fed into the module to undergo swirling and jet collision, at least one intermediate mixing module connected to the inlet mixing module and provided with means for splitting liquid flow into a plurality of jet flows with subsequent recombination of said jets and mixing action of vortices formed around the jet flows, and an outlet mixing module connected to the intermediate mixing module and provided with means for further swirling premixed fluids.

Abstract: A liquid supply/drain conduit system that is equipped with an inner leakage detector and a liquid process tank that is equipped with such liquid supply/drain conduit system are disclosed. The liquid supply/drain conduit system includes a first conduit for feeding a liquid into an inlet of a first valve of the normal-closed type, a second conduit of T-shape that has a horizontal portion and a vertical portion, the horizontal portion of the second conduit flows a liquid from an outlet of the first valve into a reservoir tank. The second valve of the normal-open type has an inlet and an outlet, the inlet is situated in relation to the first valve in such a way that it receives through a vertical portion of the second conduit a leaked flow of liquid by gravity when the normal-closed first valve failed to close. A liquid detector is further provided for detecting a leaked flow of liquid through the second valve.

Abstract: A controlled pressure regulation system generates the wafer-pressing pressures during a polishing operation. A wafer carrier head holds a wafer to be polished against a platen. A first and second pressure regulators respectively generate a first and second pressure onto the platen and the wafer carrier head to press the wafer to be polished. A first and second controllers are respectively connected to the first and second pressure regulators in control feedback loops to control the generation of the first and second pressures. The first and second pressures are controlled to obtain a desired difference of pressure between the first and second pressure.

Abstract: A process for creating a fuse structure opening in a stack of materials comprised with overlying dielectric layers, and comprised with an underlying polysilicon layer, to expose a conductive fuse structure, has been developed. The process initiates with a dry etching procedure used to create an initial fuse structure opening in the dielectric layers, using a photoresist shape as an etch mask. Subsequent removal of the photoresist shape results in the completion of the fuse structure opening via in situ etching of the polysilicon layer exposed in the initial fuse structure opening. The isotropic wet etch procedure used for photoresist removal and in situ patterning of polysilicon, avoids polysilicon spacer formation on the sides of the conductive fuse structure, which would have been present with the use of an all dry etch procedure. In addition the wet etch procedure selectively terminates on a thin silicon oxide layer, located on the underlying conductive fuse structure.

Abstract: This is a fancy yarn spinning device with the number of counts and twisting varying according to the variation of waveforms, designed with pre-defined waveforms, working with fixed cycles, fixed amplitudes, or random cycles, and random amplitudes, which serve as drafting and twisting parameters for the ring spinning machine. This device involves a servomotor and a inverter, for respective control of the revolutions of front, middle, and rear rollers of the ring spinning machine and the spindle, so the drafting rate and twisting of all areas of the ring spinning machine can change continuously with pre-defined settings, to produce yarns with variable number of counts and twisted conditions. The design of variable waveforms can also achieve different touch and visual feelings.