Abstract: A method for manufacturing a circuit board includes the steps of: forming a first wiring layer on a substrate; forming an insulating layer on the surface of the first wiring layer by means of electrophoretic deposition; forming a second wiring layer on the insulating layer and the surface of the substrate; and performing the follow-up procedures, such as forming a solder mask; thereby reducing the thickness of the circuit board and increasing the density of the circuit layout.

Abstract: A manufacturing process of a carrier is disclosed. First, a first substrate is provided. A circuit layer having a number of contacts is formed on a surface of the first substrate. Then, a solder mask is formed on the circuit layer and exposes the contacts. Next, a second substrate having an opening is bonded to the surface of the first substrate to form a carrier, and the opening exposes the solder mask and the contacts of the first substrate. Since the contacts are located within the opening, a circuit layout space can be increased, and a chip disposed in the opening can be electrically connected to the contacts directly, so as to reduce the thickness of a chip package structure. Besides, the carrier is formed by laminating the first and the second substrates. Hence, the manufacturing process of the carrier is simplified and yield of the carrier is promoted.

Abstract: A coreless thin substrate with embedded circuits in dielectric layers is provided. The substrate includes a plurality of first patterned dielectric layers with embedded circuits, and at least a second patterned dielectric layer with embedded conducting elements. The second patterned dielectric layer is disposed between the first patterned dielectric layers, such that the embedded conducting elements electrically conduct the circuits of the first patterned dielectric layers through thermal lamination. Thus, a conventional through-hole formation process after the thermal lamination is skipped, and the substrate has a thinner and flatter profile. In one embodiment, the first patterned dielectric layers are inkjet printed layers with negative images. Moreover, the embedded circuits are flush with and exposed from an upper surface and a lower surface of the corresponding first dielectric layers.

Abstract: A structure with a multilayer plated through hole is disclosed. At least one dielectric layer formed by deposition and a conductive layer are formed in an original plated through hole (PTH). The dielectric layer partially covers wiring layers of the substrate to electrically isolate the PTH and the conductive layer to form a multilayer PTH so as to save PTH occupation space of the substrate. Preferably, the formation of the dielectric layer is electrophoretic deposition to control the deposition thickness in the PTH very even and thin, no drilling is necessary. Accordingly, it can increase electrical performance and decrease cross-talk effect.

Abstract: A method of fabricating a substrate with an embedded component therein including the following steps is provided. First, a core layer having a first dielectric layer, a first patterned circuit layer, and a second patterned circuit layer is provided. The first patterned circuit layer and the second patterned circuit layer are disposed on an upper surface and a lower surface of the first dielectric layer, respectively. Then, a through hole is formed in the core layer. Next, the core layer is arranged on a supporting board and an embedded component having at least one electrode is disposed in the through hole. Afterward, a process of filling glue is carried out, such that the embedded component is fixed in the through hole. Thereafter, the supporting board is removed. Finally, the electrode of the embedded component is electrically connected to the second patterned circuit layer.

Abstract: A build-up package of an optoelectronic chip mainly includes a transparent circuit carrier board, at least one optoelectronic chip, at least one dielectric layer and at least one wiring layer of a build-up package. The optoelectronic chip is flip-chip bonded to the transparent circuit carrier board. The build-up package is formed on the transparent circuit carrier board, wherein the dielectric layer covers the optoelectronic chip and has a plurality of through holes, the wiring layer is formed on the dielectric layer and is electrically connected to a substrate wiring layer of the transparent circuit carrier board via the through holes. Accordingly, the build-up package of the optoelectronic chip is a thin optoelectronic product and improves the thermal dissipation, the encapsulation, and the compact of the electrical connection of the embedded optoelectronic chip.

Abstract: A multi-chip build-up package of an optoelectronic chip mainly includes a metal carrier, an IC chip, an optoelectronic chip, a build-up packaging structure including a plurality of dielectric layers and a plurality of wiring layers, and a transparent conductive substrate. The IC chip is disposed on the metal carrier and is covered by one of the dielectric layers, and a plurality of electrodes of the IC chip is electrically connected to the wiring layers. The optoelectronic chip is partially embedded in one of the dielectric layers such that an optoelectronic working region and a plurality of electrodes of the optoelectronic chip are exposed. The transparent conductive substrate is disposed on the dielectric layers and the optoelectronic chip, and the wiring layers electrically connect the optoelectronic chip and the IC chip. Accordingly, the embedded IC chip and optoelectronic chip can be electrically interconnected together in build-up process.

Abstract: A thermally enhanced coreless thin substrate with embedded chips, which mainly includes a patterned carrier metal layer, at least one chip, at least one dielectric layer and at least one wiring layer, is disclosed. The chip is attached to a heat sink portion of the patterned carrier metal layer. The dielectric layer is formed over the patterned carrier metal layer and covers the chip. The wiring layer is formed on the dielectric layer for electrically connecting the patterned carrier metal layer and the chip. In the process of manufacturing the thermally enhanced coreless thin substrate with embedded chips, the heat sink portion is formed by patterning the patterned carrier metal layer after finishing the formation of the wiring layer. Thus, a thin board type electronic device that combines a heat sink, a carrier substrate and embedded chips together to form an integral unit is fabricated.