Abstract: Provided is a structure and method for forming CIS-based absorber layers for thin-film solar cells that include three-dimensional compositional profiles. The disclosure provides a patterned absorber layer with two or more different regions, each of the regions having a different concentration profile of one or more components. In some embodiments, the different regions have different respective GGI profiles. GGI represents an atomic ratio of Ga/(Ga+In) in CIS-based absorber materials and in some embodiments the two or more different regions have GGI gradients from top to bottom of the CIS-based absorber layer. The method includes using two evaporation sources in a co-evaporation system to produce the two or more different regions adjacent one another on a substrate.

Abstract: A method is disclosed for manufacturing an absorber layer, such as a CIS-based absorber layer, in a thin film solar cell, such as a CIS-based thin film solar cell. One method includes a selenization step, an annealing step, and a sulfuration step. Another method includes an annealing step and a sulfuration step. Additionally, a disclosed CIS-based absorber layer has a surface-to-bottom ratio of gallium which is greater than that for a conventional absorber layer and the ratio of sulfur to sulfur-plus-selenium is less than that for a conventional absorber layer. Also provided is a process for producing an absorber layer, such as a CIS-based absorber layer, over a large area where the layer is capable of achieving both a high open circuit voltage and a high fill factor by preferable depth composition profile through controllable gallium-diffusion/sulfur-incorporation and the enlarged grain size.

Abstract: A method and system provide for depositing a TCO, transparent conductive oxide, film in one chamber of a manufacturing tool then irradiating the TCO film with light energy in another chamber of the same tool. The TCO film is used in a solar cell and formed on a solar cell substrate in some embodiments. The method includes irradiating the TCO film for a time and energy to reduce resistance of the TCO film without reducing transmittance. One or multiple light sources are used in the light irradiation chamber. Light in the infrared range, visible light range and ultraviolet light range are used either individually or in combination.

Abstract: A cutting device for cutting a hard-brittle material along a cutting path is provided. The cutting device includes a cooling source having a first output terminal for providing a first cooling effect along the cutting path, and a heating source having a second output terminal disposed in the first output terminal for providing a heating effect following the first cooling effect along the cutting path.

Abstract: An image sensor, in which, a planarized layer is formed on a semiconductor substrate including a pixel array region, an optical black region, and a logic region to cover a photo sensing unit array in the pixel array region, a patterned metal layer is formed on the planarized layer corresponding to the pixel array region and the logic region, but not the optical black region. An optical black layer is formed in the optical black region after a passivation layer is formed and before a color filter array is formed at a temperature less than about 400° C., and preferably contains metal material.

Abstract: An image sensor and a method of manufacturing the same, in which, a planarized layer is formed on a semiconductor substrate including a pixel array region, an optical black region, and a logic region to cover a photo sensing unit array in the pixel array region, a patterned metal layer is formed on the planarized layer corresponding to the pixel array region and the logic region, but not the optical black region. An optical black layer is formed in the optical black region after a passivation layer is formed and before a color filter array is formed at a temperature less than about 400° C., and preferably contains metal material.

Abstract: A cutting device for cutting a hard-brittle material along a cutting path is provided. The cutting device includes a cooling source having a first output terminal for providing a first cooling effect along the cutting path, and a heating source having a second output terminal disposed in the first output terminal for providing a heating effect following the first cooling effect along the cutting path.

Abstract: An image sensor, in which, a planarized layer is formed on a semiconductor substrate including a pixel array region, an optical black region, and a logic region to cover a photo sensing unit array in the pixel array region, a patterned metal layer is formed on the planarized layer corresponding to the pixel array region and the logic region, but not the optical black region. An optical black layer is formed in the optical black region after a passivation layer is formed and before a color filter array is formed at a temperature less than about 400° C., and preferably contains metal material.

Abstract: A support platform includes a hollow frame, and a plurality of support plates mounted in the frame and each having a flat tread portion and a ramp portion. The flat tread portion of each of the support plates is located above and partially covers the ramp portion of an adjacent one of the support plates. Thus, when the heel portion of a high-heel shoe is inserted into one of the conduits of the support plates, the heel portion of the high-heel shoe is stopped and supported by the respective ramp portion to prevent the heel portion of the high-heel shoe from being jammed or upset as to protect a female passenger's safety.

Abstract: An image sensor and a method of manufacturing the same, in which, a planarized layer is formed on a semiconductor substrate including a pixel array region, an optical black region, and a logic region to cover a photo sensing unit array in the pixel array region, a patterned metal layer is formed on the planarized layer corresponding to the pixel array region and the logic region, but not the optical black region. An optical black layer is formed in the optical black region after a passivation layer is formed and before a color filter array is formed at a temperature less than about 400° C., and preferably contains metal material.

Abstract: A polishing device and method with a multi composite are provided. The polishing device has a first end and a second end, and includes a spinning axle having a magnetic end mounted on the first end, an inductance coil wound around the spinning axle, a magnetic pole connected to the spinning axle at the magnetic end, a holder mounted at the second end of the polishing device, and a separator device mounted around the magnetic pole.