Patents by Inventor Chin-Min An

Chin-Min An has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11069731
    Abstract: According to one example, a device includes a semiconductor substrate. The device further includes a plurality of color filters disposed above the semiconductor substrate. The device further includes a plurality of micro-lenses disposed above the set of color filters. The device further includes a structure that is configured to block light radiation that is traveling towards a region between adjacent micro-lenses. The structure and the color filters are level at respective top surfaces and bottom surfaces thereof.
    Type: Grant
    Filed: December 19, 2019
    Date of Patent: July 20, 2021
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Chin-Min Lin, Ching-Chun Wang, Dun-Nian Yaung, Chun-Ming Su, Tzu-Hsuan Hsu
  • Patent number: 10990744
    Abstract: Various integrated circuit (IC) design methods are disclosed herein. An exemplary method includes receiving an IC design layout having an IC feature to be formed on a wafer using a lithography process and inserting a spacing in the IC feature, thereby generating a modified IC design layout that divides the IC feature into a first main feature and a second main feature separated by the spacing. The spacing has a sub-resolution dimension, such that the IC feature does not include the spacing when formed on the wafer by the lithography process using the modified IC design layout. A mask can be fabricated based on the modified IC design layout, wherein the mask includes the first main feature and the second main feature separated by the spacing. A lithography process can be performed using the mask to form the IC feature (without the spacing) on a wafer.
    Type: Grant
    Filed: January 11, 2018
    Date of Patent: April 27, 2021
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Chin-Min Huang, Bo-Han Chen, Cherng-Shyan Tsay, Chien Wen Lai, Hua-Tai Lin, Chia-Cheng Chang, Lun-Wen Yeh, Shun-Shing Yang
  • Patent number: 10961118
    Abstract: The present disclosure relates to a micro-electro mechanical system (MEMS) package and a method of achieving differential pressure adjustment in multiple MEMS cavities at a wafer-to-wafer bonding level. In some embodiments, a ventilation trench and an isolation trench are concurrently within a capping substrate. The isolation trench isolates a silicon region and has a height substantially equal to a height of the ventilation trench. A sealing structure is formed within the ventilation trench and the isolation trench, the sealing structure filing the isolation trench and defining a vent within the ventilation trench. A device substrate is provided and bonded to the capping substrate at a first gas pressure and hermetically sealing a first cavity associated with a first MEMS device and a second cavity associated with a second MEMS device. The capping substrate is thinned to open the vent to adjust a gas pressure of the second cavity.
    Type: Grant
    Filed: September 26, 2019
    Date of Patent: March 30, 2021
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Yi-Chia Lee, Chin-Min Lin, Cheng San Chou, Hsiang-Fu Chen, Wen-Chuan Tai, Ching-Kai Shen, Hua-Shu Ivan Wu, Fan Hu
  • Publication number: 20210089701
    Abstract: A method for forming a photomask is provided. The method includes: receiving an initial layout, the initial layout comprising a first pattern and a second pattern; decomposing the initial layout into a first layout including the first pattern and a second layout including the second pattern; inserting a third pattern into the first layout; overlapping the first layout including the first pattern and the third pattern to the second layout including the second pattern; increasing a width of the third pattern in the first layout overlapping the second pattern in the second layout to form a fourth pattern in the first layout; and outputting the first layout comprising the first pattern, the third pattern and the fourth pattern into a first photomask.
    Type: Application
    Filed: December 8, 2020
    Publication date: March 25, 2021
    Inventors: CHIN-MIN HUANG, CHING-HUNG LAI, JIA-GUEI JOU, YIN-CHUAN CHEN, CHI-MING TSAI
  • Patent number: 10899608
    Abstract: The present disclosure relates to a micro-electro mechanical system (MEMS) package and a method of achieving differential pressure adjustment in multiple MEMS cavities at a wafer-to-wafer bonding level. A device substrate comprising first and second MEMS devices is bonded to a capping substrate comprising first and second recessed regions. A ventilation trench is laterally spaced apart from the recessed regions and within the second cavity. A sealing structure is arranged within the ventilation trench and defines a vent in fluid communication with the second cavity. A cap is arranged within the vent to seal the second cavity at a second gas pressure that is different than a first gas pressure of the first cavity.
    Type: Grant
    Filed: September 26, 2019
    Date of Patent: January 26, 2021
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Yi-Chia Lee, Chin-Min Lin, Cheng San Chou, Hsiang-Fu Chen, Wen-Chuan Tai, Ching-Kai Shen, Hua-Shu Ivan Wu, Fan Hu
  • Publication number: 20200403024
    Abstract: A method of fabricating a sensing apparatus is disclosed. The method includes providing a substrate that includes a plurality of image sensors, forming an optical filtering film on the substrate, and forming a collimator on the optical filtering film. The method further includes forming a blocking layer on the collimator and forming an illumination layer on the blocking layer. The illumination layer is configured to illuminate an object placed above the illumination layer. The image sensors are configured to detect a portion of light reflected from the object.
    Type: Application
    Filed: August 31, 2020
    Publication date: December 24, 2020
    Inventors: Chin-Min Lin, Cheng San Chou
  • Patent number: 10867107
    Abstract: A method for forming a photomask is provided. The method includes: receiving an initial layout including a plurality of first patterns and a plurality of second patterns; decomposing the initial layout into a first layout including the plurality of first patterns and a second layout including the plurality of second patterns; inserting a plurality of third patterns into the first layout, wherein each of the plurality of third patterns is adjacent to at least one of the plurality of first patterns; comparing the first layout and the second layout; identifying a fourth pattern as an overlapping portion of the plurality of third patterns overlapping one of the plurality of second patterns; increasing a width of the fourth pattern; and outputting the first layout including the first patterns, the third patterns and the fourth patterns into a first photomask.
    Type: Grant
    Filed: September 25, 2018
    Date of Patent: December 15, 2020
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
    Inventors: Chin-Min Huang, Ching-Hung Lai, Jia-Guei Jou, Yin-Chuan Chen, Chi-Ming Tsai
  • Publication number: 20200387686
    Abstract: Optical sensors and their making methods are described herein. In some embodiments, a described sensing apparatus includes: an image sensor; a collimator above the image sensor, wherein the collimator includes an array of apertures; and an optical filtering layer above the collimator, wherein the optical filtering layer is configured to filter a portion of light to be transmitted into the array of apertures.
    Type: Application
    Filed: May 7, 2020
    Publication date: December 10, 2020
    Inventors: You-Cheng JHANG, Han-Zong PAN, Wei-Ding WU, Jiu-Chun WENG, Hsin-Yu CHEN, Chen-San CHOU, Chin-Min LIN
  • Publication number: 20200343762
    Abstract: A power supply method includes the following steps: detecting whether a battery is installed in a system; delivering a control signal to a power conversion circuit by a controller when it is determined that the battery is not installed in the system; turning on part of a plurality of transistors and turning off the other part of the plurality of transistors by the power conversion circuit according to the control signal and a reference signal, so that an input voltage is delivered to a receiving terminal of the system from a sending terminal of the system through a current path.
    Type: Application
    Filed: July 13, 2020
    Publication date: October 29, 2020
    Inventors: Chin-Min LIU, Shan-Hsien YANG
  • Publication number: 20200297940
    Abstract: A safety needle has a needle base, a puncture needle, and a safety cap. The puncture needle is inserted into a front end of a needle connection segment of the needle base. The safety cap is combined with a front end of the needle base. The safety cap has a needle cap and a resilient member mounted in the needle base. The needle cap is mounted around the puncture needle. Guiding blocks formed on the rear end of the needle cap are mounted respectively in positioning recesses in a housing of the needle base. The needle cap and an outer cap are mounted around the puncture needle, and the puncture needle can be kept from exposure. The needle cap can be locked with the positioning recesses, and the safety needle cannot be reused and can be distinguished as a used needle.
    Type: Application
    Filed: March 2, 2016
    Publication date: September 24, 2020
    Inventor: Chin-Min Yeh
  • Patent number: 10763296
    Abstract: A sensing apparatus is disclosed. The sensing apparatus includes an image sensor; a collimator above the image sensor, the collimator having an array of apertures; an optical filtering layer between the collimator and the image sensor, wherein the optical filtering layer is configured to filter a portion of light transmitted through the array of apertures; and an illumination layer above the collimator.
    Type: Grant
    Filed: February 26, 2018
    Date of Patent: September 1, 2020
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Chin-Min Lin, Cheng San Chou
  • Publication number: 20200221649
    Abstract: A method is proposed for remotely growing plants in a planting zone that is divided into multiple planting areas. Via an electronic device that communicates with a remote automated planting sub-system in the planting zone, a user may select desired planting area(s) and desired type(s) of plant precursors on the electronic device, and remotely cause the remote automated planting sub-system to plant the selected type(s) of plant precursors into the selected planting area(s).
    Type: Application
    Filed: February 15, 2019
    Publication date: July 16, 2020
    Inventor: Chin-Min HUNG
  • Publication number: 20200129705
    Abstract: An injection pen comprises a starting mechanism (1) and a driving mechanism (2). A needle pin (40) of the starting mechanism (1) fitted to a connecting rod (30) and a front spring (60) is disposed in a front housing (10) and an inner casing (20) therein. A front cover (50) is disposed at the front end of the front housing (10) and covers the needle pin (40). A rear housing (70) of the driving mechanism (2) and a driving casing (80) therein are connected to the front housing (10). A trigger tube (90) and a key panel (A0) are mounted in the driving casing (80). A push rod (A1) fitted to a rear spring (A2) is mounted in the trigger tube (90). An elastic baffle (83) of the driving casing (80) fastens the driving casing (80) and the push Rod (A1) and locks the rear spring (A2). An injection needle group (3) can be mounted between the starting mechanism (1) and the driving mechanism (2).
    Type: Application
    Filed: April 25, 2017
    Publication date: April 30, 2020
    Inventor: Chin-Min Yeh
  • Publication number: 20200133371
    Abstract: A system performance control device is provided. The system performance control device includes a battery and a controller. The controller is coupled to the battery to obtain battery information from the battery. When the controller detects that the battery capacity of the battery is at a first level according to the battery capacity information, the controller adjusts system performance of the system performance control device to a first setting value. When the controller detects that the battery capacity of the battery is at a second level according to the battery capacity information, the controller adjusts the system performance of the system performance control device to a second setting value, wherein the first level is greater than the second level, and the first setting value is higher than the second setting value.
    Type: Application
    Filed: February 14, 2019
    Publication date: April 30, 2020
    Inventors: Ying Tzu CHOU, Chin-Min LIU, Wen-Cheng HSU
  • Publication number: 20200127042
    Abstract: According to one example, a device includes a semiconductor substrate. The device further includes a plurality of color filters disposed above the semiconductor substrate. The device further includes a plurality of micro-lenses disposed above the set of color filters. The device further includes a structure that is configured to block light radiation that is traveling towards a region between adjacent micro-lenses. The structure and the color filters are level at respective top surfaces and bottom surfaces thereof.
    Type: Application
    Filed: December 19, 2019
    Publication date: April 23, 2020
    Inventors: Chin-Min Lin, Ching-Chun Wang, Dun-Nian Yaung, Chun-Ming Su, Tzu-Hsuan Hsu
  • Publication number: 20200097631
    Abstract: A method for forming a photomask is provided. The method includes: receiving an initial layout including a plurality of first patterns and a plurality of second patterns; decomposing the initial layout into a first layout including the plurality of first patterns and a second layout including the plurality of second patterns; inserting a plurality of third patterns into the first layout, wherein each of the plurality of third patterns is adjacent to at least one of the plurality of first patterns; comparing the first layout and the second layout; identifying a fourth pattern as an overlapping portion of the plurality of third patterns overlapping one of the plurality of second patterns; increasing a width of the fourth pattern; and outputting the first layout including the first patterns, the third patterns and the fourth patterns into a first photomask.
    Type: Application
    Filed: September 25, 2018
    Publication date: March 26, 2020
    Inventors: CHIN-MIN HUANG, CHING-HUNG LAI, JIA-GUEI JOU, YIN-CHUAN CHEN, CHI-MING TSAI
  • Publication number: 20200046906
    Abstract: An injection device has a dose controlling assembly, an operation assembly, an injection pushing assembly, and a clutch assembly. The dose controlling assembly has an outer tube, a dose controlling tube, a driving tube, a connection tube, and a dose controlling collar. The driving tube has a limiting portion. The dose controlling collar is mounted in the dose controlling tube and has a spiral limiting portion selectively engaged with the limiting portion of the driving tube. The operation assembly is mounted on a rear end of the dose controlling assembly. The injection pushing assembly is mounted on a front end of the dose controlling assembly. The clutch assembly is mounted in a front segment of the outer tube and is connected with the injection pushing assembly.
    Type: Application
    Filed: February 24, 2017
    Publication date: February 13, 2020
    Inventor: Chin-Min Yeh
  • Patent number: 10556792
    Abstract: The present disclosure relates to a micro-electro mechanical system (MEMS) package and a method of achieving differential pressure adjustment in multiple MEMS cavities at a wafer-to-wafer bonding level. A device substrate comprising first and second MEMS devices is bonded to a capping substrate comprising first and second recessed regions. A ventilation trench is laterally spaced apart from the recessed regions and within the second cavity. A sealing structure is arranged within the ventilation trench and defines a vent in fluid communication with the second cavity. A cap is arranged within the vent to seal the second cavity at a second gas pressure that is different than a first gas pressure of the first cavity.
    Type: Grant
    Filed: November 28, 2017
    Date of Patent: February 11, 2020
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Yi-Chia Lee, Chin-Min Lin, Cheng San Chou, Hsiang-Fu Chen, Wen-Chuan Tai, Ching-Kai Shen, Hua-Shu Ivan Wu, Fan Hu
  • Patent number: 10556065
    Abstract: An injection pen comprises a circularly pushing device (1) and a vial housing (2), and is used to combine a medication vial (3) with a needle (4). The circularly pushing device (1) comprises a jointing member (10), a spiral sleeve (20), a spiral duct (30), a spirally-pushing tube (40), a threaded-connection shrink-ring (50), a propelling lever (60), a one-way ratchet ring (70), and an injection operation member (80). During the injection, the one-way ratchet ring (70) on a push rod (81) is jointed with a one-way ratchet groove portion (46) of the spirally-pushing tube (40) so as to restrain the rotation directions of the push rod (81) and the spirally-pushing tube (40); the propelling lever (60) cannot be rotated due to the limit of the jointing member (10).
    Type: Grant
    Filed: February 4, 2016
    Date of Patent: February 11, 2020
    Assignee: CC Biotechnology Corporation
    Inventor: Chin-Min Yeh
  • Publication number: 20200024136
    Abstract: The present disclosure relates to a micro-electro mechanical system (MEMS) package and a method of achieving differential pressure adjustment in multiple MEMS cavities at a wafer-to-wafer bonding level. A device substrate comprising first and second MEMS devices is bonded to a capping substrate comprising first and second recessed regions. A ventilation trench is laterally spaced apart from the recessed regions and within the second cavity. A sealing structure is arranged within the ventilation trench and defines a vent in fluid communication with the second cavity. A cap is arranged within the vent to seal the second cavity at a second gas pressure that is different than a first gas pressure of the first cavity.
    Type: Application
    Filed: September 26, 2019
    Publication date: January 23, 2020
    Inventors: Yi-Chia Lee, Chin-Min Lin, Cheng San Chou, Hsiang-Fu Chen, Wen-Chuan Tai, Ching-Kai Shen, Hua-Shu Ivan Wu, Fan Hu