Abstract: Exemplary methods, apparatuses, and systems a management server receiving, from a switch, an indication of network congestion at the switch. The indication includes one or more contributors to the network congestion. In response to the indication of network congestion, the management server identifies one or more hosts running the identified contributor(s) and transmits an instruction to the host(s) to restrict network traffic originated by the contributor(s). For example, the restriction may include a reduction in the contributor's I/O queue depth. If the reduction in traffic does not remedy the congestion, the management server may receive a further indication of congestion and further instruct the host(s) to restrict identified contributor network traffic. For example, the contributors may have their I/O queue depth reduced exponentially until congestion is relieved.

Abstract: A methodology for assays and diagnostics utilizes a nanoporous or corrugated metal-containing surface, fiber or particle which enhances or suppresses the optical detectability of a label. The resulting optical, electromagnetic, or imaging signal signals the presence of a pathogen or analyte of interest. Preferred embodiments pertain to label-free, in situ monitoring of individual DNA hybridization in microfluidics using molecular sentinel probes immobilized on nanoporous gold disks. By immobilizing molecular sentinel probes on nanoporous gold disks, single-molecule sensitivity is demonstrated via surface-enhanced Raman scattering which provides robust The described methodology is generally applicable to most amplification independent assays and molecular diagnostics.

Abstract: A semiconductor device fabrication method includes irradiating a first surface of a substrate with a radiation beam. While irradiating the first surface of the substrate, a precursor gas is introduced near the first surface to deposit a layer including a first material. The precursor gas is removed from near the first surface after the depositing the layer. After the removing the precursor gas and prior to forming another layer over the layer, while irradiating a second surface of the layer, a cleaning gas is introduced near the second surface of the layer to transform the first material into a second material.

Abstract: Embodiments provide data in-flight (DIF) services to software applications such as virtual machines (VMs) at an application level without requiring modification to established storage protocols. In exemplary embodiments, a software application is associated with a DIF services policy indicating one or more DIF services to apply to the software application. Data transmitted by the software application to a destination is tagged based on the DIF services policy associated with the software application and transmitted to the destination.

Abstract: This document describes techniques for efficient data deployment for a parallel data processing system. In one embodiment, a virtualization platform running a parallel processing application that includes one or more virtual data nodes receives a first command to write a data block to a storage device. The platform then determines whether the first command was sent by a first virtual data node. If the first command was sent by a first virtual data node, the platform then 1) writes, the data block to a first location in the storage device; 2) returns the first location to the first virtual data node and 3) determines whether the data should be replicated. If the data should be replicated, the platform instructs the storage device to make a copy of the data block to a second location in the storage device and storing the second location in a tracking structure.

Abstract: The present disclosure relates the use of a stamping surface enhanced Raman scattering (S-SERS) technique with nanoporous gold disk (NPGD) plasmonic substrates to produce a label-free, multiplexed molecular sensing and imaging technique. A NPGD SERS substrate is stamped onto a surface containing one or more target molecules, followed by SERS measurement of the target molecules located between the surface and SERS substrate. The target molecules may be deposited on the surface, which may be a carrier substrate such as polydimethylsiloxane (PDMS).

Abstract: Embodiments provide data in-flight (DIF) services to software applications such as virtual machines (VMs) at an application level without requiring modification to established storage protocols. In exemplary embodiments, a software application is associated with a DIF services policy indicating one or more DIF services to apply to the software application. Data transmitted by the software application to a destination is tagged based on the DIF services policy associated with the software application and transmitted to the destination.

Abstract: A memory system comprises a memory controller and a memory device having one or more memory ranks and multiple memory electrically connected to the one or more memory ranks. The memory controller includes at least one analysis module and at least one switching determination module. The analysis module analyzes states of multiple memory control commands corresponding to a particular memory rank to generate a control parameter. The switching determination module determines whether at least one switching command is sent according to the control parameter, a current operation mode of the particular memory rank, and an operation state of the particular memory rank. When the memory device receives a first switching command of the at least one command, the particular rank and at least one part of the memory internal circuits are switched from the normal voltage operation mode to the low voltage operation mode.

Abstract: This document describes techniques for efficient data deployment for a parallel data processing system. In one embodiment, a virtualization platform running a parallel processing application that includes one or more virtual data nodes receives a first command to write a data block to a storage device. The platform then determines whether the first command was sent by a first virtual data node. If the first command was sent by a first virtual data node, the platform then 1) writes, the data block to a first location in the storage device; 2) returns the first location to the first virtual data node and 3) determines whether the data should be replicated. If the data should be replicated, the platform instructs the storage device to make a copy of the data block to a second location in the storage device and storing the second location in a tracking structure.

Abstract: This present invention disclosed a method for culturing Ophiocordyceps sinensis by inoculating a fungus inoculum onto a medium, culturing with a culturing condition in the dark room, and then culturing under the light for at least four weeks. According to the method for culturing O. sinensis disclosed in this present invention, the cultured O. sinensis has better growth rate and its composition and content of active ingredients are similar with wild O. sinensis.

Abstract: The present disclosure relates to a method and apparatus for mitigating printable native defects in an extreme ultra violet (EUV) mask substrate. In some embodiments, the method is performed by identifying a printable native defect within an EUV mask substrate that violates one or more sizing thresholds. A first section of the EUV mask substrate including the printable native defect is removed to form a concavity within the EUV mask substrate. A multi-layer replacement section that is devoid of a printable native defect is inserted into the concavity.

Abstract: The present disclosure relates to a method and apparatus for mitigating printable native defects in an extreme ultra violet (EUV) mask substrate. In some embodiments, the method is performed by providing an EUV mask substrate having a multi-layer coating disposed over a low thermal expansion material. The sizes of one or more native defects within the EUV mask substrate are measured and printable native defects having a measured size that violates one or more sizing thresholds are identified. A position at which a patterned absorber material is to be formed over the multi-layer coating is determined. The position minimizes a number printable native defects that interact with EUV radiation during an EUV lithography process. By mitigating a number of printable native defects violating the one or more sizing thresholds, the process window of an EUV reticle formed from the EUV mask substrate is improved.

Abstract: A EUV mask comprises a low thermal expansion material (LTEM) substrate, a reflective multi-layer (ML) over the LTEM substrate, and a patterned absorber layer over the reflective ML. The reflective ML includes a defect. The EUV mask further comprises a mark associated with the defect. The mark is one of: a deposit over the patterned absorber layer at a distance offset from the defect, and a cavity into the patterned absorber layer in an area over the defect.

Abstract: Provided are cyclopropanecarboxamido-substituted aromatic compounds that inhibit protein kinases and their use in anti-tumor area. In particular, tyrosine-kinase inhibitors and Raf-kinase inhibitors as anti-tumor agents, their preparation, pharmaceutical composition, and their use in the treatment of cancer are also provided.

Abstract: A method of making an intellectual sensing device with a warming function is used to manufacture an intellectual sensing device, wherein a method of making flexible sensing pad includes a screen stretching process and a screen printing process. Thereby, each sensing line set has a silver sensitive layer and a graphite-slurry sensing layer so as to increase flexibility and deformation and to lower oxidation rate, production cost and graphite impedance. In addition, the method of making an intellectual sensing device can enhance healthcare safety.

Abstract: The present invention relates to systems and methods for the measurement of analytes such as glucose. Raman and reflectance spectroscopy are used to measure a volume, of material such as a blood sample or tissue within a subject and determine a concentration of a blood analyte based thereon. The present invention further relates to a calibration method, constrained regularization (CR), and demonstrates its use for analyzing spectra including, for example, the measurement glucose concentrations using transcutaneous Raman spectroscopy.

Abstract: A method for repairing a mask is disclosed. A mask, having at least one defect need to be repaired, is received. The mask includes a transmissive mask or a reflective mask. A location and size of the defect is determined. A repair hard mask (RHM) is formed over the mask. Various configuration of the RHM are disclosed. A repairing process is performed, with the RHM over the mask, to repair the defect.

Abstract: A method for lithography patterning is disclosed. An exemplary method includes receiving an IC design layout, the IC design layout having an IC pattern and receiving a mask, the mask having a defect. The method further includes making at least one mark on the mask in relation to the defect; positioning the IC design layout over the mask thereby covering the defect by the IC pattern; and patterning the mask with the IC design layout.

Abstract: A lithography-free, mold-free, single-step method of fabricating high quality optical lenses by curing polydimethylsiloxane (PDMS) droplets on a pre-heated smooth surface allows lenses with different focal lengths to be made by varying the droplet volume and surface temperature.

Abstract: The present disclosure relates to a method and apparatus for mitigating printable native defects in an extreme ultra violet (EUV) mask substrate. In some embodiments, the method is performed by providing an EUV mask substrate having a multi-layer coating disposed over a low thermal expansion material. The sizes of one or more native defects within the EUV mask substrate are measured and printable native defects having a measured size that violates one or more sizing thresholds are identified. A position at which a patterned absorber material is to be formed over the multi-layer coating is determined. The position minimizes a number printable native defects that interact with EUV radiation during an EUV lithography process. By mitigating a number of printable native defects violating the one or more sizing thresholds, the process window of an EUV reticle formed from the EUV mask substrate is improved.