Patents by Inventor Chun-Chi Yu

Chun-Chi Yu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for designing photomask
    Patent number: 7476472
    Abstract: The present invention provides a method for designing a mask. First, a main pattern including at least a strip pattern is formed on the mask substrate. A shift feature is added to one end of the strip pattern of the main pattern. Either the phase shift or the optical transmission or both of the shift feature can be adjusted to optimize the resultant critical dimension between line-ends of the main pattern, thus improving pullback of the line-ends of the strip pattern in the main pattern.
    Type: Grant
    Filed: July 22, 2005
    Date of Patent: January 13, 2009
    Assignee: United Microelectronics Corp.
    Inventors: Ming-Feng Shieh, Benjamin Szu-Min Lin, Chun-Chi Yu, Jian-Shin Liou
  • METHOD OF MOVING BUBBLES
    Publication number: 20080067335
    Abstract: A method of moving bubbles includes utilizing optical tweezers to form a bright photoresist area and a dark photoresist area in the photoresist layer. The bubbles in the photoresist layer move from the bright photoresist area to the dark photoresist area.
    Type: Application
    Filed: July 17, 2006
    Publication date: March 20, 2008
    Inventors: Ya-Ching Hou, Huan-Ting Tseng, Benjamin Szu-Min Lin, Bo-Jou Lu, Yong-Fa Huang, Chun-Chi Yu
  • METHOD AND RELATED OPERATION SYSTEM FOR IMMERSION LITHOGRAPHY
    Publication number: 20070215040
    Abstract: To avoid the yield of wafers that undergo immersion lithography influencing by delay of post exposure baking (PEB), an operation system adjusts a speed of inputting the wafers to undergo immersion lithography according to a status of wafers that have finished exposure and are waiting for baking. Therefore, the wafers that have finished exposure are transmitted to be baked efficiently and on time.
    Type: Application
    Filed: March 14, 2006
    Publication date: September 20, 2007
    Inventors: Yong-Fa Huang, Benjamin Szu-Min Lin, Chun-Chi Yu, Huan-Ting Tseng, Bo-Jou Lu
  • METHOD FOR DESIGNING PHOTOMASK
    Publication number: 20070020532
    Abstract: The present invention provides a method for designing a mask. First, a main pattern including at least a strip pattern is formed on the mask substrate. A shift feature is added to one end of the strip pattern of the main pattern. Either the phase shift or the optical transmission or both of the shift feature can be adjusted to optimize the resultant critical dimension between line-ends of the main pattern, thus improving pullback of the line-ends of the strip pattern in the main pattern.
    Type: Application
    Filed: July 22, 2005
    Publication date: January 25, 2007
    Inventors: Ming-Feng Shieh, Benjamin Szu-Min Lin, Chun-Chi Yu, Jian-Shin Liou