Patents by Inventor Clément Lansalot-Matras

Clément Lansalot-Matras has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Heteroleptic cyclopentadienyl transition metal precursors for deposition of transition metal-containing films
    Patent number: 8298616
    Abstract: Methods and compositions for depositing a film on one or more substrates include providing a reactor with at least one substrate disposed in the reactor. At least one metal precursor are provided and at least partially deposited onto the substrate to form a metal-containing film.
    Type: Grant
    Filed: July 24, 2009
    Date of Patent: October 30, 2012
    Assignee: American Air Liquide, Inc.
    Inventors: Christian Dussarrat, Clement Lansalot-Matras
  • Methods for synthesis of heteroleptic cyclopentadienyl transition metal precursors
    Patent number: 8236979
    Abstract: Methods for forming heteroleptic amidinate or guanidinate cyclopentadienyl containing transition metal precursors through synthesis reactions.
    Type: Grant
    Filed: July 24, 2009
    Date of Patent: August 7, 2012
    Assignee: American Air Liquide, Inc.
    Inventors: Christian Dussarrat, Clément Lansalot-Matras
  • METAL PRECURSORS FOR DEPOSITION OF METAL-CONTAINING FILMS
    Publication number: 20120122313
    Abstract: Compositions and methods for forming a metal-containing thin film on a substrate. A reactor and at least one substrate in the reactor are provided. A metal-containing bis-?-diketiminate precursor is introduced into the reactor. The reactor is maintained at a set temperature and pressure, and the precursor is contacted with the substrate to form a metal-containing film on the substrate.
    Type: Application
    Filed: November 10, 2011
    Publication date: May 17, 2012
    Applicants: American Air Liquide, Inc., L'Air Liquide Societe Anonyme pour I'Etude et I'Exploitation des Procedes Georges Claude
    Inventors: Christian Dussarrat, Clement Lansalot-Matras, Vincent M. Omarjee, Cheng-Fang Hsiao
  • Metal precursors for deposition of metal-containing films
    Patent number: 8076243
    Abstract: Compositions and methods for forming a metal-containing thin film on a substrate. A reactor and at least one substrate in the reactor are provided. A metal-containing bis-?-diketiminate precursor is introduced into the reactor. The reactor is maintained at a set temperature and pressure, and the precursor is contacted with the substrate to form a metal-containing film on the substrate.
    Type: Grant
    Filed: January 26, 2010
    Date of Patent: December 13, 2011
    Assignees: L'Air Liquide Societe Anonyme pour l'Etude et l'Exploitation des Procedes Georges Claude, American Air Liquide, Inc.
    Inventors: Christian Dussarrat, Clement Lansalot-Matras, Vincent M. Omarjee, Cheng-Fang Hsiao
  • Catalyst Components Based on Fulvene Complexes
    Publication number: 20110034653
    Abstract: The present invention discloses metallic complexes based on hydroxyl-carbonyl fulvene ligands, their method of preparation and their use in the oligomerisation or polymerisation of ethylene and alpha-olefins.
    Type: Application
    Filed: July 16, 2008
    Publication date: February 10, 2011
    Applicants: TOTAL PETROCHEMICALS RESEARCH FELUY, Centre National De La Recherche Scientifique (CNRS
    Inventors: Clement Lansalot-MaTras, Olivier Lavastre, Sabine Sirol
  • SYNTHESIS OF ALLYL-CONTAINING PRECURSORS FOR THE DEPOSITION OF METAL-CONTAINING FILMS
    Publication number: 20100256405
    Abstract: Methods and compositions for depositing a film on one or more substrates include providing a reactor with at least one substrate disposed in the reactor. At least one metal precursor is provided and at least partially deposited on the substrate to form a metal containing film.
    Type: Application
    Filed: November 6, 2009
    Publication date: October 7, 2010
    Inventors: Christian DUSSARRAT, Clement LANSALOT-MATRAS
  • METAL PRECURSORS FOR DEPOSITION OF METAL-CONTAINING FILMS
    Publication number: 20100193951
    Abstract: Compositions and methods for forming a metal-containing thin film on a substrate. A reactor and at least one substrate in the reactor are provided. A metal-containing bis-?-diketiminate precursor is introduced into the reactor. The reactor is maintained at a set temperature and pressure, and the precursor is contacted with the substrate to form a metal-containing film on the substrate.
    Type: Application
    Filed: January 26, 2010
    Publication date: August 5, 2010
    Inventors: Christian Dussarrat, Clement LANSALOT-MATRAS, Vincent M. Omarjee, Cheng-Fang Hsiao
  • ALLYL-CONTAINING PRECURSORS FOR THE DEPOSITION OF METAL-CONTAINING FILMS
    Publication number: 20100119406
    Abstract: Methods and compositions for depositing a film on one or more substrates include providing a reactor with at least one substrate disposed in the reactor. At least one metal precursor is provided and at least partially deposited on the substrate to form a metal containing film.
    Type: Application
    Filed: November 6, 2009
    Publication date: May 13, 2010
    Inventors: Christian DUSSARRAT, Clement LANSALOT-MATRAS
  • METHODS FOR SYNTHESIS OF HETEROLEPTIC CYCLOPENTADIENYL TRANSITION METAL PRECURSORS
    Publication number: 20100022790
    Abstract: Methods for forming heteroleptic amidinate or guanidinate cyclopentadienyl containing transition metal precursors through synthesis reactions.
    Type: Application
    Filed: July 24, 2009
    Publication date: January 28, 2010
    Inventors: Christian Dussarrat, Clement Lansalot-Matras
  • HETEROLEPTIC CYCLOPENTADIENYL TRANSITION METAL PRECURSORS FOR DEPOSITION OF TRANSITION METAL-CONTAINING FILMS
    Publication number: 20100021747
    Abstract: Methods and compositions for depositing a film on one or more substrates include providing a reactor with at least one substrate disposed in the reactor. At least one metal precursor are provided and at least partially deposited onto the substrate to form a metal-containing film.
    Type: Application
    Filed: July 24, 2009
    Publication date: January 28, 2010
    Inventors: Christian DUSSARRAT, Clement LANSALOT-MATRAS
  • BETA-DIKETIMINATE PRECURSORS FOR METAL CONTAINING FILM DEPOSITION
    Publication number: 20100003532
    Abstract: Methods and compositions for depositing a metal containing film on a substrate are disclosed. A reactor, and at least one substrate disposed in the reactor, are provided. A metal containing precursor with at least one ?-diketiminate ligand is provided and introduced into the reactor, which is maintained at a temperature of at least 100° C. Metal is deposited onto the substrate through a deposition process to form a thin film on the substrate.
    Type: Application
    Filed: June 8, 2009
    Publication date: January 7, 2010
    Inventors: Benjamin J. FEIST, Christian Dussarrat, Vincent M. Omarjee, Clement Lansalot-Matras