Abstract: The present disclosure relates to a method for calibrating a projector. In one example, the method includes receiving by a processing element light field data corresponding to a calibration image projected by a projector and captured by a light field capturing device, and modeling by a processing element one or more intrinsic properties of the projector using the light field data and the calibration image. The calibration image may be projected by the projector directly into the light field capturing device.

Abstract: A system for augmenting the appearance of an object including a plurality of projectors. Each projector includes a light source and a lens in optical communication with the light source, where the lens focuses light emitted by the light source on the object. The system also includes a computer in communication with the plurality of projectors, the computer including a memory component and a processing element in communication with the memory component and the plurality of projectors. The processing element determines a plurality of images to create an augmented appearance of the object and provides the plurality of images to the plurality of projectors to project light corresponding to the plurality of images onto the object to create the augmented appearance of the object. After the images are projected onto the object, the augmented appearance of the objected is substantially the same regardless of a viewing angle for the object.

Abstract: An embodiment provides a memory system connectable to a host device. The memory system includes a host interface configured to receive a read command and a write command and a first non-volatile memory. In addition, the memory system includes a debug unit configured to collect debugging information when a processor executes firmware. The debug unit is capable of outputting the debugging information to a buffer area of the host device through the host interface.

Abstract: According to one embodiment, when shifting to a sleep mode, a processor of a memory device transmits a first command and saving data to a host and issues a power shut-off request. The first command is a command for writing data to a first memory of the host. The saving data includes register information. The register information includes register data stored in the control register and an address of the control register. A power supply circuit shuts off power supply to a second memory of the memory device, the control register, the processor, and a peripheral circuit in response to the issued power shut-off request.

Abstract: A photomask blank having a thin film on a transparent substrate is inspected for defects by irradiating inspection light to a surface region of the blank, collecting the reflected light from the irradiated region via an inspection optical system to form a magnified image of the region, extracting a feature parameter of light intensity distribution from the magnified image, and identifying the bump/pit shape of the defect based on the feature parameter combined with the structure of the thin film. The defect inspection method is effective for discriminating defects of bump or pit shape in a highly reliable manner. On application of the defect inspection method, photomask blanks having no pinhole defects are available at lower costs and higher yields.

Abstract: A multi-layer ceramic capacitor includes: a body including first and second end surfaces facing each other in a uniaxial direction, a first internal electrode drawn to the first end surface, a second internal electrode drawn to the second end surface, a capacitance forming unit including the first and second internal electrodes, and first and second end margins; a first external electrode; and a second external electrode, the multi-layer ceramic capacitor having a dimension of 0.4 mm or less in the uniaxial direction, the multi-layer ceramic capacitor satisfying the following condition: R??4.4*ln(S)+2.3, where R (%) represents a proportion of a total dimension of the first and second end margins in the uniaxial direction to a dimension of the body in the uniaxial direction, and S (mm2) represents an area of a cross section of the capacitance forming unit, the cross section being orthogonal to the uniaxial direction.

Abstract: According to one embodiment, a storage device includes a nonvolatile memory storing first data, and a device controller which is capable of storing all or a part of the first data stored in the nonvolatile memory as second data to a memory area in a host. The device controller which is configured to calculate a first hash value of the second data stored in the memory area in a first timing, calculate a second hash value of the second data stored in the memory area in a second timing, and detect whether the second data stored in the memory area is tampered between the first and second timings by comparing the second hash value with the first hash value.

Abstract: A method of inspecting a defect present at a surface portion of a photomask blank having at least one thin film formed on a substrate by use of the inspecting optical system. The method includes setting the distance between the defect and an objective lens of an inspecting optical system to a defocus distance, applying inspection light to the defect through the objective lens, collecting reflected light from the region irradiated with the inspection light, through the objective lens, as a magnified image, identifying a light intensity variation portion of the magnified image, and determining the rugged shape of the defect on the basis of a variation in light intensity of the light intensity variation portion of the magnified image.

Abstract: Disclosed is a method of inspecting a defect present at a surface portion of a photomask blank which includes an optical film, and a thin film. The method includes: selecting and designating an inspection treatment procedure and a criterion for determination of rugged shape of the defect which correspond to modes of the optical film and the thin film of the photomask blank; applying inspection light to a region including the defect while maintaining a distance between the defect and an objective lens of an inspecting optical system, based on the designated inspection treatment procedure, and collecting reflected light from the region irradiated with the inspection light, as a magnified image of the region, through the inspecting optical system; and determining the rugged shape of the defect, from light intensity distribution of the magnified image, based on the designated criterion for determination.

Abstract: The defect size of a photomask blank is evaluated. An inspection-target photomask blank is irradiated with inspection light and reflected light of the region of the inspection-target photomask blank irradiated with the inspection light is collected through an objective lens of an inspection optical system as a magnified image of the region. Then, an intensity change part in the light intensity distribution profile of the magnified image is identified. Next, a difference in the light intensity of the intensity change part is obtained and the width of the intensity change part is obtained as the apparent width of the defect. Then, the width of the defect is calculated on the basis of a predetermined conversion expression showing the relationship among the difference in the light intensity, the apparent width of the defect, and the actual width of the defect, and the width of the defect is estimated.

Abstract: According to one embodiment, a memory system includes: a non-volatile memory; a memory interface that reads a received word from the non-volatile memory; a decoder that decodes the received word; a control unit that predicts the number of error bits in the received word read from the non-volatile memory, predicts decoding time on the basis of the number of error bits predicted, and determines an operating clock frequency of the decoder on the basis of the predicted decoding time and requested decoding time being the decoding time requested; and a frequency control unit that supplies the operating clock frequency determined by the control unit to the decoder and supplies voltage corresponding to the operating clock frequency being determined to the decoder.

Abstract: Disclosed is a method of inspecting a defect present at a surface portion of a photomask blank which includes an optical film, and a thin film. The method includes: selecting and designating an inspection treatment procedure and a criterion for determination of rugged shape of the defect which correspond to modes of the optical film and the thin film of the photomask blank; applying inspection light to a region including the defect while maintaining a distance between the defect and an objective lens of an inspecting optical system, based on the designated inspection treatment procedure, and collecting reflected light from the region irradiated with the inspection light, as a magnified image of the region, through the inspecting optical system; and determining the rugged shape of the defect, from light intensity distribution of the magnified image, based on the designated criterion for determination.

Abstract: According to one embodiment, a controller writes first data requested to be written from a host into a third block among a plurality of first blocks in a case where a temperature of a nonvolatile memory is within a certain range. In a case where the temperature of the nonvolatile memory is out of the certain range, the controller determines a degree of wear of the third block and writes the first data into a second block in a case where the degree of wear of the third block is more than a threshold.

Abstract: A memory device according to an embodiment includes a non-volatile storage device, a volatile storage device that stores saved data which is saved in the host-side storage device when a first operation mode changing process is executed by the memory device, and a control unit. The control unit transmits, to the host device, a write command that is an instruction to write the saved data to the host-side storage device and the saved data, when the first operation mode changing process is executed by the memory device.

Abstract: According to one embodiment, a memory system includes: a non-volatile memory; a memory interface that reads a received word from the non-volatile memory; a decoder that decodes the received word; a control unit that predicts the number of error bits in the received word read from the non-volatile memory, predicts decoding time on the basis of the number of error bits predicted, and determines an operating clock frequency of the decoder on the basis of the predicted decoding time and requested decoding time being the decoding time requested; and a frequency control unit that supplies the operating clock frequency determined by the control unit to the decoder and supplies voltage corresponding to the operating clock frequency being determined to the decoder.

Abstract: An embodiment provides a memory system connectable to a host device. The memory system includes a host interface configured to receive a read command and a write command and a first non-volatile memory. In addition, the memory system includes a debug unit configured to collect debugging information when a processor executes firmware. The debug unit is capable of outputting the debugging information to a buffer area of the host device through the host interface.

Abstract: A method of inspecting a defect present at a surface portion of a photomask blank having at least one thin film formed on a substrate by use of the inspecting optical system. The method includes setting the distance between the defect and an objective lens of an inspecting optical system to a defocus distance, applying inspection light to the defect through the objective lens, collecting reflected light from the region irradiated with the inspection light, through the objective lens, as a magnified image, identifying a light intensity variation portion of the magnified image, and determining the rugged shape of the defect on the basis of a variation in light intensity of the light intensity variation portion of the magnified image.

Abstract: According to one embodiment, when shifting to a sleep mode, a processor of a memory device transmits a first command and saving data to a host and issues a power shut-off request. The first command is a command for writing data to a first memory of the host. The saving data includes register information. The register information includes register data stored in the control register and an address of the control register. A power supply circuit shuts off power supply to a second memory of the memory device, the control register, the processor, and a peripheral circuit in response to the issued power shut-off request.

Abstract: A system for augmenting the appearance of an object including a plurality of projectors. Each projector includes a light source and a lens in optical communication with the light source, where the lens focuses light emitted by the light source on the object. The system also includes a computer in communication with the plurality of projectors, the computer including a memory component and a processing element in communication with the memory component and the plurality of projectors. The processing element determines a plurality of images to create an augmented appearance of the object and provides the plurality of images to the plurality of projectors to project light corresponding to the plurality of images onto the object to create the augmented appearance of the object. After the images are projected onto the object, the augmented appearance of the objected is substantially the same regardless of a viewing angle for the object.

Abstract: The defect size of a photomask blank is evaluated. An inspection-target photomask blank is irradiated with inspection light and reflected light of the region of the inspection-target photomask blank irradiated with the inspection light is collected through an objective lens of an inspection optical system as a magnified image of the region. Then, an intensity change part in the light intensity distribution profile of the magnified image is identified. Next, a difference in the light intensity of the intensity change part is obtained and the width of the intensity change part is obtained as the apparent width of the defect. Then, the width of the defect is calculated on the basis of a predetermined conversion expression showing the relationship among the difference in the light intensity, the apparent width of the defect, and the actual width of the defect, and the width of the defect is estimated.