Patents by Inventor David M. Dobuzinsky

David M. Dobuzinsky has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Process for the vapor deposition of polysilanes photoresists
    Patent number: 5173452
    Abstract: Disclosed is a process for forming a film comprising a polysilane composition on a substrate. The film is formed by vapor deposition directly on a substrate, thus avoiding the cumbersome steps ordinarily encountered in preparing and applying polysilanes by conventional spin application techniques. The film is used in a lithographic process for forming an image on a substrate.
    Type: Grant
    Filed: January 2, 1991
    Date of Patent: December 22, 1992
    Inventors: David M. Dobuzinsky, Mark C. Hakey, Steven J. Holmes, David V. Horak