Patents by Inventor Deepak Shukla

Deepak Shukla has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20090092907
    Abstract: The present invention relates to photo-tunable dopant compositions comprising a photo-reactive chiral compound capable of undergoing a photochemical reaction resulting in the loss of chirality, and a triplet sensitizer. The present invention also relates to a display comprising a substrate, a liquid crystalline layer thereon, wherein the liquid crystalline layer comprises a nematic host, at least one chiral dopant, a photo-reacted compound, and a triplet sensitizer, and at least one transparent conductive layer. The present invention also relates to a method of tuning a cholesteric liquid crystal material comprising providing at least one mesogenic compound, at least one triplet sensitizer, and at least one photo-reactive chiral compound; combining the at least one mesogenic compound, at least one triplet sensitizer, and at least one photo-reactive chiral compound to form a mixture; and irradiating the mixture for a period of time.
    Type: Application
    Filed: December 10, 2008
    Publication date: April 9, 2009
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Deepak SHUKLA, Krishnan CHARI
  • Publication number: 20090092770
    Abstract: The present invention relates to photo-tunable dopant compositions comprising a photo-reactive chiral compound capable of undergoing a photochemical reaction resulting in the loss of chirality, and a triplet sensitizer. The present invention also relates to a display comprising a substrate, a liquid crystalline layer thereon, wherein the liquid crystalline layer comprises a nematic host, at least one chiral dopant, a photo-reacted compound, and a triplet sensitizer, and at least one transparent conductive layer. The present invention also relates to a method of tuning a cholesteric liquid crystal material comprising providing at least one mesogenic compound, at least one triplet sensitizer, and at least one photo-reactive chiral compound; combining the at least one mesogenic compound, at least one triplet sensitizer, and at least one photo-reactive chiral compound to form a mixture; and irradiating the mixture for a period of time.
    Type: Application
    Filed: December 10, 2008
    Publication date: April 9, 2009
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Deepak SHUKLA, Krishnan CHARI
  • Patent number: 7473448
    Abstract: The present invention relates to a photoalignable material comprising a photoactive stilbazolium-containing polymer of formula I: wherein, Ma, Mb, Mc are monomer units making up the polymer; x, y, z, are mole fractions of the monomer units Ma, Mb, Mc, wherein in each case 0<x?1; 0?y<1, 0?z<1; Sa and Sb are spacer units; Za is a stilbazolium unit which can undergo photochemical isomerization/dimerization reactions; Zb is a stilbazole unit, and n varies from 4 to 10,000. The present invention also relates to a display using a layer of the photoaligned material and methods for aligning the orientation layer as well as orienting a liquid crystal layer applied to the photoaligned orientation layer.
    Type: Grant
    Filed: December 23, 2005
    Date of Patent: January 6, 2009
    Assignee: Eastman Kodak Company
    Inventors: Deepak Shukla, David M. Teegarden, Thomas R. Welter
  • Publication number: 20090001354
    Abstract: A thin film transistor comprises a layer of organic semiconductor material comprising a tetracarboxylic diimide naphthalene-based compound having, attached to one or both of the imide nitrogen atoms, a substituted or unsubstituted heterocycloalkyl ring system. Such transistors can further comprise spaced apart first and second contacts or electrodes in contact with said material. Further disclosed is a process for fabricating an organic thin-film transistor device, preferably by sublimation deposition onto a substrate, wherein the substrate temperature is no more than 200° C.
    Type: Application
    Filed: June 29, 2007
    Publication date: January 1, 2009
    Inventors: Deepak Shukla, Thomas R. Welter, Wendy G. Ahearn
  • Publication number: 20090001353
    Abstract: A thin layer of organic semiconductor material comprising a comprising an organic semiconductor thin film material is disclosed in which the thin film material substantially comprises a heteropyrene compound or derivative. In one embodiment, a thin film transistor comprises a layer of the organic semiconductor material. Further disclosed is a process for fabricating an organic thin-film transistor device, preferably by relative low-temperature sublimation or solution-phase deposition onto a substrate.
    Type: Application
    Filed: June 26, 2007
    Publication date: January 1, 2009
    Inventors: Deepak Shukla, Thomas R. Welter, Ann L. Carroll-Lee, Wendy G. Ahearn, Douglas R. Robello
  • Patent number: 7471437
    Abstract: The present invention relates to an electrochromic material, and a device utilizing the electrochromic material, comprising a substituted-1,1-dioxo-thiopyran of the general structure I: wherein: X is carbon, nitrogen, oxygen, or sulfur; n is 0, 1 or 2; R3 is independently an electron withdrawing group or a substituted or unsubstituted alky or aryl group; R1 and R5 each independently represent a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group, or a substituted or unsubstituted heterocyclic group; and R2 and R4 each independently represent hydrogen, or an electron withdrawing group, or a substituted or unsubstituted alkyl group.
    Type: Grant
    Filed: March 31, 2004
    Date of Patent: December 30, 2008
    Assignee: Eastman Kodak Company
    Inventors: Jerome R. Lenhard, Deepak Shukla
  • Publication number: 20080283826
    Abstract: A thin film transistor comprises a layer of organic semiconductor material comprising an organic semiconductor material that comprises an aryl dicarboxylic acid diimidazole-based compound. Such transistors can further comprise spaced apart first and second contact means or electrodes in contact with said material. Further disclosed is a process for fabricating ac thin film transistor device, preferably by sublimation or solution-phase deposition onto a substrate, wherein the substrate temperature is no more than 150° C.
    Type: Application
    Filed: May 15, 2007
    Publication date: November 20, 2008
    Inventors: Shiying Zheng, Deepak Shukla, Diane C. Freeman
  • Patent number: 7422777
    Abstract: A thin film transistor comprises a layer of organic semiconductor material comprising a tetracarboxylic diimide naphthalene-based compound having, attached to each of the imide nitrogen atoms, a substituted or unsubstituted alicyclic ring system, optionally substituted with electron donating groups. Such transistors can further comprise spaced apart first and second contact means or electrodes in contact with said material. Further disclosed is a process for fabricating an organic thin-film transistor device, preferably by sublimation deposition onto a substrate, wherein the substrate temperature is no more than 100° C.
    Type: Grant
    Filed: November 22, 2005
    Date of Patent: September 9, 2008
    Assignee: Eastman Kodak Company
    Inventors: Deepak Shukla, Diane C. Freeman, Shelby F. Nelson, Jeffrey T. Carey, Wendy G. Ahearn
  • Publication number: 20080135833
    Abstract: A thin film transistor comprises a layer of organic semiconductor material comprising a configurationally controlled N,N?-dicycloalkyl-substituted naphthalene-1,4,5,8-bis-carboximide compound having a substituted or unsubstituted alicyclic ring independently attached to each imide nitrogen atom with the proviso that at least one of the two alicyclic rings is necessarily a 4-substituted cyclohexyl ring in which a substituent at the 4-position is the sole substituent on the 4-substituted cyclohexyl ring other than the imide attachment; with such substituent being stereochemically disposed as only one of either an essentially trans or cis position, respectively, to the imide nitrogen substituent. Such transistors can further comprise spaced apart first and second contact means or electrodes in contact with said material.
    Type: Application
    Filed: December 7, 2006
    Publication date: June 12, 2008
    Inventors: Deepak Shukla, Thomas R. Welter, Jeffrey T. Carey, Manju Rajeswaran, Wendy G. Ahearn
  • Patent number: 7368624
    Abstract: A process for forming an aryl-aryl bond comprises the step of reacting an arene hydrocarbon compound with either (1) an organic oxidant selected from the group consisting of a quinone, a quinone imine, a quinone diimine, and a nitroarene, or (2) an oxidizing salt selected from the group consisting of a triarylaminium salt, an oxonium salt, and a nitrosium salt, or (3) a hypervalent iodine compound, each in the presence of a Brönsted or Lewis acid.
    Type: Grant
    Filed: March 30, 2004
    Date of Patent: May 6, 2008
    Assignee: Eastman Kodak Company
    Inventors: Christopher T. Brown, Deepak Shukla, Kevin P. Dockery, Jerome R. Lenhard, James R. Matz
  • Patent number: 7365104
    Abstract: The present invention relates to a light curable material comprising a splayed layered material, at least one aqueous dispersible polymerizer, and at least one aqueous soluble N-oxyazinium compound, wherein the polymerizer polymerizes upon exposure to light. The present invention also includes a method for curing a material comprising providing layered material, splaying the layered material, combining the splayed layered material with a polymerizer and an aqueous soluble N-oxyazinium compound, and subjecting the combination to light for a period of time sufficient to effect the polymerization of the polymerizer.
    Type: Grant
    Filed: March 31, 2005
    Date of Patent: April 29, 2008
    Assignee: Eastman Kodak Company
    Inventors: Debasis Majumdar, Deepak Shukla
  • Patent number: 7326956
    Abstract: A thin film transistor comprises a layer of organic semiconductor material comprising a tetracarboxylic diimide 3,4,9,10-perylene-based compound having, attached to each of the imide nitrogen atoms a carbocyclic or heterocyclic aromatic ring system substituted with one or more fluorine-containing groups. Such transistors can further comprise spaced apart first and second contact means or electrodes in contact with said material. Further disclosed is a process for fabricating ac thin film transistor device, preferably by sublimation or solution-phase deposition onto a substrate, wherein the substrate temperature is no more than 100° C.
    Type: Grant
    Filed: December 17, 2004
    Date of Patent: February 5, 2008
    Assignee: Eastman Kodak Company
    Inventors: Deepak Shukla, Diane C. Freeman, Shelby F. Nelson
  • Publication number: 20070243342
    Abstract: The present invention relates to photo-tunable dopant compositions comprising a photo-reactive chiral compound capable of undergoing a photochemical reaction resulting in the loss of chirality, and a triplet sensitizer. The present invention also relates to a display comprising a substrate, a liquid crystalline layer thereon, wherein the liquid crystalline layer comprises a nematic host, at least one chiral dopant, a photo-reacted compound, and a triplet sensitizer, and at least one transparent conductive layer. The present invention also relates to a method of tuning a cholesteric liquid crystal material comprising providing at least one mesogenic compound, at least one triplet sensitizer, and at least one photo-reactive chiral compound; combining the at least one mesogenic compound, at least one triplet sensitizer, and at least one photo-reactive chiral compound to form a mixture; and irradiating the mixture for a period of time.
    Type: Application
    Filed: April 13, 2006
    Publication date: October 18, 2007
    Inventors: Deepak Shukla, Krishnan Chari
  • Patent number: 7252865
    Abstract: Polymer films comprising plasticizer compounds represented by Structure 1 as described in the specification are useful as protective films in polarizing plates for display applications. Methods of manufacturing such polymer films and polarizing plates are also disclosed.
    Type: Grant
    Filed: September 20, 2004
    Date of Patent: August 7, 2007
    Assignee: Eastman Kodak Company
    Inventors: Timothy C. Schunk, Donald R. Diehl, Daniel T. Linehan, Zora T. Marlowe, Deepak Shukla
  • Publication number: 20070148328
    Abstract: The present invention relates to a photoalignable material comprising a photoactive stilbazolium-containing polymer of formula I: wherein, Ma, Mb, Mc are monomer units making up the polymer; x, y, z, are mole fractions of the monomer units Ma, Mb, Mc, wherein in each case 0<x?1; 0?y<1, 0?z<1; Sa and Sb are spacer units; Za is a stilbazolium unit which can undergo photochemical isomerization/dimerization reactions; Zb is a stilbazole unit, and n varies from 4 to 10,000. The present invention also relates to a display using a layer of the photoaligned material and methods for aligning the orientation layer as well as orienting a liquid crystal layer applied to the photoaligned orientation layer.
    Type: Application
    Filed: December 23, 2005
    Publication date: June 28, 2007
    Inventors: Deepak Shukla, David Teegarden, Thomas Welter
  • Publication number: 20070116895
    Abstract: A thin film transistor comprises a layer of organic semiconductor material comprising a tetracarboxylic diimide naphthalene-based compound having, attached to each of the imide nitrogen atoms, a substituted or unsubstituted alicyclic ring system, optionally substituted with electron donating groups. Such transistors can further comprise spaced apart first and second contact means or electrodes in contact with said material. Further disclosed is a process for fabricating an organic thin-film transistor device, preferably by sublimation deposition onto a substrate, wherein the substrate temperature is no more than 100° C.
    Type: Application
    Filed: November 22, 2005
    Publication date: May 24, 2007
    Inventors: Deepak Shukla, Diane Freeman, Shelby Nelson, Jeffrey Carey, Wendy Aheam
  • Patent number: 7217445
    Abstract: Disclosed is a multilayer film comprising a substrate bearing an aligned liquid crystal layer wherein the liquid crystal layer contains a Lewis acid. Such a film is useful for aligning a liquid crystal material to an increased tilt angle.
    Type: Grant
    Filed: December 15, 2003
    Date of Patent: May 15, 2007
    Assignee: Nitto Denko Corporation
    Inventors: Deepak Shukla, Thomas R. Welter, James F. Elman, Samir Y. Farid
  • Publication number: 20070096084
    Abstract: A thin film transistor comprises a layer of organic semiconductor material comprising a tetracarboxylic diimide naphthalene-based compound having, attached to each of the imide nitrogen atoms, an aromatic moiety, at least one of which moieties is substituted with at least one electron donating group. Such transistors can further comprise spaced apart first and second contact means or electrodes in contact with said material. Further disclosed is a process for fabricating an organic thin-film transistor device, preferably by sublimation deposition onto a substrate, wherein the substrate temperature is no more than 100° C.
    Type: Application
    Filed: October 31, 2005
    Publication date: May 3, 2007
    Inventors: Deepak Shukla, Diane Freeman, Shelby Nelson, Jeffrey Carey, Wendy Ahearn
  • Patent number: 7198977
    Abstract: A thin film transistor comprises a layer of organic semiconductor material comprising a tetracarboxylic diimide 3,4,9,10-perylene-based compound having, attached to each of the imide nitrogen atoms a substituted or unsubsitituted phenylalkyl group. Such transistors can further comprise spaced apart first and second contact means or electrodes in contact with said material. Further disclosed is a process for fabricating an organic thin-film transistor device, preferably by sublimation or solution-phase deposition onto a substrate, wherein the substrate temperature is no more than 100° C.
    Type: Grant
    Filed: December 21, 2004
    Date of Patent: April 3, 2007
    Assignee: Eastman Kodak Company
    Inventors: Deepak Shukla, Diane C. Freeman, Shelby F. Nelson
  • Publication number: 20060237712
    Abstract: A thin film transistor comprises a layer of organic semiconductor material comprising a tetracarboxylic diimide naphthalene-based compound having, attached to each of the imide nitrogen atoms, a substituted or unsubstituted arylalkyl moiety. Such transistors can further comprise spaced apart first and second contact means or electrodes in contact with said material. Further disclosed is a process for fabricating an organic thin-film transistor device, preferably by sublimation deposition onto a substrate, wherein the substrate temperature is no more than 100° C.
    Type: Application
    Filed: April 20, 2005
    Publication date: October 26, 2006
    Inventors: Deepak Shukla, Shelby Nelson, Diane Freeman