Patents by Inventor Deepak Shukla

Deepak Shukla has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • PHOTOPOLYMERIZABLE COMPOSITIONS FOR ELECTROLESS PLATING METHODS
    Publication number: 20150227041
    Abstract: A photopolymerizable composition has seven essential components: (a) a photopolymerizable epoxy material, (b) a photoacid generator such as an onium salt, (c) electron acceptor photosensitizer, (d) an electron donor co-initiator having an oxidation potential of 0.1 V to 3 V vs. SCE, (e) metal particles, and in some embodiments, (f) one or more free radically polymerizable compounds, and (g) one or more free radical photoinitiators. This photopolymerizable composition can be applied or printed onto one or both sides of various substrates to form articles that can be used to form electrically conductive materials. Methods for using the photopolymerizable compositions include electroless plating methods that can be carried out in roll-to-roll printing and plating systems once various photocured patterns are formed from the photopolymerizable compositions.
    Type: Application
    Filed: February 7, 2014
    Publication date: August 13, 2015
    Inventors: Deepak Shukla, Mark R. Mis
  • PHOTOINITIATOR AND PHOTOCURABLE COMPOSITIONS AND USES
    Publication number: 20150126637
    Abstract: The photocuring efficiency of an N-oxyazinium salt photo initiator is increased by mixing it with an organic phosphine as a photoinitiator efficiency amplifier, and with an aryl aldehyde or alkyl aldehyde having a molecular weight of less than 1000. This mixture or photoinitiator composition can be used to cure acrylates or other photocurable compounds, particularly in an oxygen-containing environment.
    Type: Application
    Filed: January 7, 2015
    Publication date: May 7, 2015
    Inventor: Deepak Shukla
  • Forming patterns using thiosulfate polymer compositions
    Patent number: 9005878
    Abstract: A thiosulfate polymer composition includes an electron-accepting photosensitizer component, either as a separate compound or as an attachment to the thiosulfate polymer. The thiosulfate polymer composition can be applied to various articles and used to form a predetermined polymeric pattern after photothermal reaction to form crosslinked disulfide bonds, removing non-crosslinked polymer, and reaction with a disulfide-reactive material.
    Type: Grant
    Filed: January 20, 2014
    Date of Patent: April 14, 2015
    Assignee: Eastman Kodak Company
    Inventors: Deepak Shukla, Kevin M. Donovan, Mark R. Mis
  • ANTI-HEPARAN SULFATE PEPTIDES THAT BLOCK HERPES SIMPLEX VIRUS INFECTION IN VIVO
    Publication number: 20150093825
    Abstract: Provided are anti-heparan sulfate peptides and methods that employ those peptides for the prevention or treatment of viral infections, including herpesviral infections such as ?-herpesviral, ?-herpesviral, and ?-herpesviral infections, which are exemplified by HSV-1. CMV, and HHV-8 viral infections, respectively. Peptides may comprise at least 10 amino acids of the amino acid sequences (SEQ?ID?NO:?2) XRXRXKXXRXRX, (SEQ?ID?NO:?8) XRXRXXKXRXRX, (SEQ?ID?NO:?4) XXRRRRXRRRXK, and/or (SEQ?ID?NO:?10) KXRRRXRRRRXX, wherein X represents any amino acid. In some embodiments, peptides comprise at least 10 amino acids of the sequence LRSRTKIIRIRH (SEQ ID NO: 1), HRIRIIKTRSRL (SEQ ID NO: 7), MPRRRRIRRRQK (SEQ ID NO: 3), and/or KQRRRIRRRRM (SEQ ID NO: 9).
    Type: Application
    Filed: November 26, 2014
    Publication date: April 2, 2015
    Inventors: Deepak Shukla, Vaibhav Tiwari
  • Method of sequestering metals using thiosulfate polymers
    Patent number: 8986924
    Abstract: A thiosulfate polymer composition includes an electron-accepting photosensitizer component, either as a separate compound or as an attachment to the thiosulfate polymer. The thiosulfate polymer composition can be applied to various articles, or used to form a predetermined polymeric pattern after photothermal reaction to form crosslinked disulfide bonds, removing non-crosslinked polymer, and reaction with a disulfide-reactive material. Such thiosulfate polymer compositions can also be used to sequestering metals.
    Type: Grant
    Filed: January 20, 2014
    Date of Patent: March 24, 2015
    Assignee: Eastman Kodak Company
    Inventors: Deepak Shukla, Kevin M. Donovan
  • METHOD OF PHOTOCURING ACRYLATE COMPOSITIONS
    Publication number: 20150024141
    Abstract: Acrylate-containing compositions are photocured by mixing at least one N-oxyazinium salt photoinitiator, a photosensitizer for the N-oxyazinium salt, an N-oxyazinium salt efficiency amplifier, an aromatic heterocyclic, nitrogen-containing base, and one or more photocurable acrylates to form a photocurable composition. This photocurable composition is then irradiated to effect polymerization of the one or more acrylates. This method can be carried out in oxygen-containing environments.
    Type: Application
    Filed: October 6, 2014
    Publication date: January 22, 2015
    Inventor: Deepak Shukla
  • ORGANIC POLYMERIC BI-METALLIC COMPOSITES
    Publication number: 20150011699
    Abstract: Organic polymeric bi-metallic alkoxide or aryloxide composites are used as dielectric materials in various devices with improved properties such as improved mobility. These composites comprise a poly(meth)acrylate or polyester having metal coordination sites, and the same or different bi-metallic alkoxide or aryloxide molecules that are coordinated with the organic polymer. The bi-metallic alkoxide or aryloxide molecules can be represented by Structure (I) shown herein. Such composites are generally soluble at room temperature in various organic solvents and be provided in homogeneous organic solvent solutions that can be suitably applied to a substrate to form dielectric materials.
    Type: Application
    Filed: September 24, 2014
    Publication date: January 8, 2015
    Inventors: Deepak Shukla, Dianne Marie Meyer, Mark R. Mis, Matthew Dirmyer
  • Patterning method using thiosulfate polymer and metal nanoparticles
    Patent number: 8916336
    Abstract: A thiosulfate polymer composition includes an electron-accepting photosensitizer component, either as a separate compound or as an attachment to the thiosulfate polymer. The thiosulfate polymer composition can be used in methods to form predetermined patterns of metal nanoparticles.
    Type: Grant
    Filed: January 20, 2014
    Date of Patent: December 23, 2014
    Assignee: Eastman Kodak Company
    Inventors: Deepak Shukla, Kevin M. Donovan, Matthew Dirmyer
  • THIOSULFATE POLYMERS
    Publication number: 20140288253
    Abstract: A thiosulfate polymer includes both an electron-accepting photosensitizer component and thiosulfate groups in the same molecule, arranged in random order along the backbone. The thiosulfate polymer composition can be formulated into compositions and applied to various articles, or used to form a predetermined polymeric pattern after photothermal reaction to form crosslinked disulfide bonds, removing non-crosslinked polymer, and reaction with a disulfide-reactive material. Such thiosulfate polymer compositions can also be used to sequester metals in nanoparticulate form, and as a way for shaping human hair in hairdressing operations.
    Type: Application
    Filed: January 20, 2014
    Publication date: September 25, 2014
    Inventors: Mark R. Mis, Deepak Shukla
  • FORMING PATTERNS USING THIOSULFATE POLYMER COMPOSITIONS
    Publication number: 20140287365
    Abstract: A thiosulfate polymer composition includes an electron-accepting photosensitizer component, either as a separate compound or as an attachment to the thiosulfate polymer. The thiosulfate polymer composition can be applied to various articles and used to form a predetermined polymeric pattern after photothermal reaction to form crosslinked disulfide bonds, removing non-crosslinked polymer, and reaction with a disulfide-reactive material.
    Type: Application
    Filed: January 20, 2014
    Publication date: September 25, 2014
    Inventors: Deepak Shukla, Kevin M. Donovan, Mark R. Mis
  • METHOD OF SEQUESTERING METALS USING THIOSULFATE POLYMERS
    Publication number: 20140287366
    Abstract: A thiosulfate polymer composition includes an electron-accepting photosensitizer component, either as a separate compound or as an attachment to the thiosulfate polymer. The thiosulfate polymer composition can be applied to various articles, or used to form a predetermined polymeric pattern after photothermal reaction to form crosslinked disulfide bonds, removing non-crosslinked polymer, and reaction with a disulfide-reactive material. Such thiosulfate polymer compositions can also be used to sequestering metals.
    Type: Application
    Filed: January 20, 2014
    Publication date: September 25, 2014
    Inventors: Deepak Shukla, Kevin M. Donovan
  • PATTERNING METHOD USING THIOSULFATE POLYMER AND METAL NANOPARTICLES
    Publication number: 20140287364
    Abstract: A thiosulfate polymer composition includes an electron-accepting photosensitizer component, either as a separate compound or as an attachment to the thiosulfate polymer. The thiosulfate polymer composition can be used in methods to form predetermined patterns of metal nanoparticles.
    Type: Application
    Filed: January 20, 2014
    Publication date: September 25, 2014
    Inventors: Deepak Shukla, Kevin M. Donovan, Matthew Dirmyer
  • THIOSULFATE POLYMER COMPOSITIONS AND ARTICLES
    Publication number: 20140287349
    Abstract: A thiosulfate polymer composition includes an electron-accepting photosensitizer component, either as a separate compound or as an attachment to the thiosulfate polymer. The thiosulfate polymer composition can be applied to various articles, or used to form a predetermined polymeric pattern after photothermal reaction to form crosslinked disulfide bonds, removing non-crosslinked polymer, and reaction with a disulfide-reactive material. Such thiosulfate polymer compositions can also be used to sequester metals in nanoparticulate form, and as a way for shaping human hair in hairdressing operations.
    Type: Application
    Filed: January 20, 2014
    Publication date: September 25, 2014
    Inventors: Deepak Shukla, Mark R. Mis, Dianne Marie Meyer
  • METHOD FOR REDUCING GRAPHITE OXIDE
    Publication number: 20140239236
    Abstract: Graphite oxide can be converted to its reduced form (r-GO) using exposing UV radiation having a peak wavelength (?max) of less than 400 nm while being maintained at a temperature that is greater than room temperature. This conversion method is efficient and can be carried out with various forms of graphite oxide samples, below atmospheric pressure, or in a reducing environment.
    Type: Application
    Filed: May 5, 2014
    Publication date: August 28, 2014
    Inventors: Deepak Shukla, Debasis Majumdar
  • Articles with photocurable and photocured compositions
    Patent number: 8816211
    Abstract: The photocuring efficiency of a photoinitiator is increased by mixing it with an organic phosphite and an aldehyde. This mixture or photoinitiator composition can be used to cure acrylates or other photocurable compounds, particularly in an oxygen-containing environment, and the photocurable compositions can be used to form various articles.
    Type: Grant
    Filed: February 14, 2011
    Date of Patent: August 26, 2014
    Assignee: Eastman Kodak Company
    Inventor: Deepak Shukla
  • METHOD OF FLEXOGRAPHIC PATTERNING USING PHOTOCURABLE COMPOSITION
    Publication number: 20140216283
    Abstract: Photocured patterns can be provided using relief printing members such as flexographic printing plates. A photocurable composition has at least one N-oxyazinium salt photoinitiator, a photosensitizer for the N-oxyazinium salt, an N-oxyazinium salt efficiency amplifier, and one or more photocurable acrylates. After the photocurable composition is applied using the relief printing member, it is then exposed to suitable radiation to form a photocured pattern on the substrate.
    Type: Application
    Filed: April 4, 2014
    Publication date: August 7, 2014
    Inventor: Deepak Shukla
  • ORGANIC POLYMERIC MULTI-METALLIC COMPOSITES
    Publication number: 20140128551
    Abstract: Organic polymeric multi-metallic alkoxide or aryloxide composites are used as dielectric materials in various devices with improved properties such as improved mobility. These composites comprise an organic polymer comprising metal coordination sites, and multi-metallic alkoxide or aryloxide molecules that are coordinated with the organic polymer, the multi-metallic alkoxide or aryloxide molecules being represented by: (M)n(OR)x wherein at least one M is a metal selected from Group 2 of the Periodic Table and at least one other M is a metal selected from any of Groups 3 to 12 and Rows 4 and 5 of the Periodic Table, n is an integer of at least 2, R represents the same or different alkyl or aryl groups, and x is an integer of at least 2.
    Type: Application
    Filed: November 8, 2012
    Publication date: May 8, 2014
    Inventors: Deepak Shukla, Dianne M. Meyer, Mark R. Mis, Matthew Dirmyer
  • DEVICES CONTAINING ORGANIC POLYMERIC MULTI-METALLIC COMPOSITES
    Publication number: 20140124741
    Abstract: Organic polymeric multi-metallic alkoxide or aryloxide composites are used as dielectric materials in various devices with improved properties such as improved mobility. These composites comprise an organic polymer comprising metal coordination sites, and multi-metallic alkoxide or aryloxide molecules that are coordinated with the organic polymer, the multi-metallic alkoxide or aryloxide molecules being represented by: (M)n(OR)x wherein at least one M is a metal selected from Group 2 of the Periodic Table and at least one other M is a metal selected from any of Groups 3 to 12 and Rows 4 and 5 of the Periodic Table, n is an integer of at least 2, R represents the same or different alkyl or aryl groups, and x is an integer of at least 2.
    Type: Application
    Filed: November 8, 2012
    Publication date: May 8, 2014
    Inventors: Deepak Shukla, Dianne M. Meyer
  • Semiconductor devices and methods of preparation
    Patent number: 8692238
    Abstract: An organic film-forming polymer has a Tg of at least 70° C. and comprises a backbone comprising recurring units of Structure (A) shown in this application. These organic film-forming polymers can be used as dielectric materials in various devices with improved properties such as improved mobility.
    Type: Grant
    Filed: April 25, 2012
    Date of Patent: April 8, 2014
    Assignee: Eastman Kodak Company
    Inventors: Deepak Shukla, Douglas R. Robello, Mark R. Mis, Wendy G. Ahearn, Dianne M. Meyer
  • Fuel Cell Fleet Optimization
    Publication number: 20140089055
    Abstract: A fuel cell fleet has a plurality of fuel cell systems each connected to a data server. The data server may be configured to obtain operational data from of the plurality of fuel cell systems. An efficiency controller operably connected to the data server and is configured to predict an efficiency and a power output of the fleet from the operational data and optimize the efficiency of the fleet to minimize the fleet fuel consumption while maintaining a desired fleet output power. The efficiency may be determined by a ratio of the fleet output current or output power to the fleet fuel consumption.
    Type: Application
    Filed: September 25, 2012
    Publication date: March 27, 2014
    Applicant: BLOOM ENERGY CORPORATION
    Inventors: James SMITH, David WEINGAERTNER, Pramod VACHHANI, Brent MILLER, Ram RAMANAN, Arne BALLANTINE, Swaminathan VENKATARAMAN, Deepak SHUKLA