Patents by Inventor Deepak Shukla

Deepak Shukla has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7858970
    Abstract: A thin film transistor comprises a layer of organic semiconductor material comprising a tetracarboxylic diimide naphthalene-based compound having, attached to one or both of the imide nitrogen atoms, a substituted or unsubstituted heterocycloalkyl ring system. Such transistors can further comprise spaced apart first and second contacts or electrodes in contact with said material. Further disclosed is a process for fabricating an organic thin-film transistor device, preferably by sublimation deposition onto a substrate, wherein the substrate temperature is no more than 200° C.
    Type: Grant
    Filed: June 29, 2007
    Date of Patent: December 28, 2010
    Assignee: Eastman Kodak Company
    Inventors: Deepak Shukla, Thomas R. Welter, Wendy G. Ahearn
  • Patent number: 7829613
    Abstract: The present invention relates to a splayant, that is, an intercalant/exfoliant, comprising an azinium compound capable of splaying a layered material.
    Type: Grant
    Filed: March 11, 2009
    Date of Patent: November 9, 2010
    Assignee: Eastman Kodak Company
    Inventors: Debasis Majumdar, Deepak Shukla
  • Patent number: 7807994
    Abstract: A thin film transistor comprises a layer of organic semiconductor material comprising a tetracarboxylic diimide naphthalene-based compound having, attached to each of the imide nitrogen atoms, an aromatic moiety, at least one of which moieties is substituted with at least one electron donating group. Such transistors can further comprise spaced apart first and second contact means or electrodes in contact with said material. Further disclosed is a process for fabricating an organic thin-film transistor device, preferably by sublimation deposition onto a substrate, wherein the substrate temperature is no more than 100° C.
    Type: Grant
    Filed: August 21, 2009
    Date of Patent: October 5, 2010
    Assignee: Eastman Kodak Company
    Inventors: Deepak Shukla, Diane C. Freeman, Shelby F. Nelson, Jeffrey T. Carey, Wendy G. Ahearn
  • Patent number: 7804087
    Abstract: A thin film transistor comprises a layer of organic semiconductor material comprising a configurationally controlled N,N?-dicycloalkyl-substituted naphthalene-1,4,5,8-bis-carboximide compound having a substituted or unsubstituted alicyclic ring independently attached to each imide nitrogen atom with the proviso that at least one of the two alicyclic rings is necessarily a 4-substituted cyclohexyl ring in which a substituent at the 4-position is the sole substituent on the 4-substituted cyclohexyl ring other than the imide attachment; with such substituent being stereochemically disposed as only one of either an essentially trans or cis position, respectively, to the imide nitrogen substituent. Such transistors can further comprise spaced apart first and second contact means or electrodes in contact with said material.
    Type: Grant
    Filed: December 7, 2006
    Date of Patent: September 28, 2010
    Assignee: Eastman Kodak Company
    Inventors: Deepak Shukla, Thomas R. Welter, Jeffrey T. Carey, Manju Rajeswaran, Wendy G. Ahearn
  • Patent number: 7781076
    Abstract: A thin layer of organic semiconductor material comprising a comprising an organic semiconductor thin film material is disclosed in which the thin film material substantially comprises a heteropyrene compound or derivative. In one embodiment, a thin film transistor comprises a layer of the organic semiconductor material. Further disclosed is a process for fabricating an organic thin-film transistor device, preferably by relative low-temperature sublimation or solution-phase deposition onto a substrate.
    Type: Grant
    Filed: June 26, 2007
    Date of Patent: August 24, 2010
    Assignee: Eastman Kodak Company
    Inventors: Deepak Shukla, Thomas R. Welter, Ann L. Carroll-Lee, Wendy G. Ahearn, Douglas R. Robello
  • Publication number: 20100178728
    Abstract: A process for fabricating a thin film semiconductor device includes the following steps, but not necessarily in the noted order. Firstly, a thin film of organic semiconductor material is deposited onto a substrate. This thin film of organic semiconductor material comprises organic semiconductor material that comprises one or more aryl dicarboxylic diimidazole-based compounds of claim 1 such that the film exhibits a field effect electron mobility that is greater than 0.005 cm2/Vs. Then, the process includes forming a spaced apart source electrode and drain electrode, wherein the source electrode and the drain electrode are separated by and electrically connected with, the n-channel semiconductor film. A gate electrode is then formed, spaced apart from the semiconductor material. One or more of the thin film semiconductor devices (or transistors) can be incorporated into an electronic device.
    Type: Application
    Filed: March 25, 2010
    Publication date: July 15, 2010
    Inventors: Shiying Zheng, Deepak Shukla, Diane C. Freeman
  • Patent number: 7745821
    Abstract: A thin film transistor comprises a layer of organic semiconductor material comprising an organic semiconductor material that comprises an aryl dicarboxylic acid diimidazole-based compound. Such transistors can further comprise spaced apart first and second contact means or electrodes in contact with said material. Further disclosed is a process for fabricating ac thin film transistor device, preferably by sublimation or solution-phase deposition onto a substrate, wherein the substrate temperature is no more than 150° C.
    Type: Grant
    Filed: May 15, 2007
    Date of Patent: June 29, 2010
    Assignee: Eastman Kodak Company
    Inventors: Shiying Zheng, Deepak Shukla, Diane C. Freeman
  • Patent number: 7704568
    Abstract: The present invention relates to photo-tunable dopant compositions comprising a photo-reactive chiral compound capable of undergoing a photochemical reaction resulting in the loss of chirality, and a triplet sensitizer. The present invention also relates to a display comprising a substrate, a liquid crystalline layer thereon, wherein the liquid crystalline layer comprises a nematic host, at least one chiral dopant, a photo-reacted compound, and a triplet sensitizer, and at least one transparent conductive layer. The present invention also relates to a method of tuning a cholesteric liquid crystal material comprising providing at least one mesogenic compound, at least one triplet sensitizer, and at least one photo-reactive chiral compound; combining the at least one mesogenic compound, at least one triplet sensitizer, and at least one photo-reactive chiral compound to form a mixture; and irradiating the mixture for a period of time.
    Type: Grant
    Filed: December 10, 2008
    Date of Patent: April 27, 2010
    Assignee: Industrial Technology Research Institute
    Inventors: Deepak Shukla, Krishnan Chari
  • Publication number: 20100068418
    Abstract: The present invention relates to photo-tunable dopant compositions comprising a photo-reactive chiral compound capable of undergoing a photochemical reaction resulting in the loss of chirality, and a triplet sensitizer. The present invention also relates to a display comprising a substrate, a liquid crystalline layer thereon, wherein the liquid crystalline layer comprises a nematic host, at least one chiral dopant, a photo-reacted compound, and a triplet sensitizer, and at least one transparent conductive layer. The present invention also relates to a method of tuning a cholesteric liquid crystal material comprising providing at least one mesogenic compound, at least one triplet sensitizer, and at least one photo-reactive chiral compound; combining the at least one mesogenic compound, at least one triplet sensitizer, and at least one photo-reactive chiral compound to form a mixture; and irradiating the mixture for a period of time.
    Type: Application
    Filed: November 20, 2009
    Publication date: March 18, 2010
    Inventors: Deepak Shukla, Krishnan Chari
  • Patent number: 7649199
    Abstract: A thin film transistor comprises a layer of organic semiconductor that comprises an N,N?-1,4,5,8-naphthalenetetracarboxylic acid diimide having at least one cycloalkyl group having a fluorinated substituent at its 4-position that adopts an equatorial orientation in the trans configuration of the cycloalkyl group and an axial orientation in the cis configuration of the cycloalkyl group. Such transistors can be a field effect transistor having a dielectric layer, a gate electrode, a source electrode and a drain electrode. The gate electrode and the thin film of organic semiconductor material both contact the dielectric layer, and the source electrode and the drain electrode both contact the thin film of organic semiconductor material.
    Type: Grant
    Filed: April 11, 2008
    Date of Patent: January 19, 2010
    Assignee: Eastman Kodak Company
    Inventors: Deepak Shukla, Thomas R. Welter
  • Patent number: 7642035
    Abstract: The present invention relates to photo-tunable dopant compositions comprising a photo-reactive chiral compound capable of undergoing a photochemical reaction resulting in the loss of chirality, and a triplet sensitizer. The present invention also relates to a display comprising a substrate, a liquid crystalline layer thereon, wherein the liquid crystalline layer comprises a nematic host, at least one chiral dopant, a photo-reacted compound, and a triplet sensitizer, and at least one transparent conductive layer. The present invention also relates to a method of tuning a cholesteric liquid crystal material comprising providing at least one mesogenic compound, at least one triplet sensitizer, and at least one photo-reactive chiral compound; combining the at least one mesogenic compound, at least one triplet sensitizer, and at least one photo-reactive chiral compound to form a mixture; and irradiating the mixture for a period of time.
    Type: Grant
    Filed: April 13, 2006
    Date of Patent: January 5, 2010
    Assignee: Industrial Technology Research Institute
    Inventors: Deepak Shukla, Krishnan Chari
  • Publication number: 20090312553
    Abstract: A thin film transistor comprises a layer of organic semiconductor material comprising a tetracarboxylic diimide naphthalene-based compound having, attached to each of the imide nitrogen atoms, an aromatic moiety, at least one of which moieties is substituted with at least one electron donating group. Such transistors can further comprise spaced apart first and second contact means or electrodes in contact with said material. Further disclosed is a process for fabricating an organic thin-film transistor device, preferably by sublimation deposition onto a substrate, wherein the substrate temperature is no more than 100° C.
    Type: Application
    Filed: August 21, 2009
    Publication date: December 17, 2009
    Inventors: Deepak Shukla, Diane C. Freeman, Shelby F. Nelson, Jeffrey T. Carey, Wendy G. Ahearn
  • Patent number: 7632879
    Abstract: The present invention relates to a splayant, that is, an intercalant/exfoliant, comprising an azinium compound capable of splaying a layered material.
    Type: Grant
    Filed: March 31, 2005
    Date of Patent: December 15, 2009
    Assignee: Eastman Kodak Company
    Inventors: Debasis Majumdar, Deepak Shukla
  • Patent number: 7629605
    Abstract: A thin film transistor comprises a layer of organic semiconductor material comprising a tetracarboxylic diimide naphthalene-based compound having, attached to each of the imide nitrogen atoms, an aromatic moiety, at least one of which moieties is substituted with at least one electron donating group. Such transistors can further comprise spaced apart first and second contact means or electrodes in contact with said material. Further disclosed is a process for fabricating an organic thin-film transistor device, preferably by sublimation deposition onto a substrate, wherein the substrate temperature is no more than 100° C.
    Type: Grant
    Filed: October 31, 2005
    Date of Patent: December 8, 2009
    Assignee: Eastman Kodak Company
    Inventors: Deepak Shukla, Diane C. Freeman, Shelby F. Nelson, Jeffrey T. Carey, Wendy G. Ahearn
  • Publication number: 20090261323
    Abstract: A thin film transistor comprises a layer of organic semiconductor material comprising a tetracarboxylic diimide naphthalene-based compound having, attached to each of the imide nitrogen atoms, a substituted or unsubstituted arylalkyl moiety. Such transistors can further comprise spaced apart first and second contact means or electrodes in contact with said material. Further disclosed is a process for fabricating an organic thin-film transistor device, preferably by sublimation deposition onto a substrate, wherein the substrate temperature is no more than 100° C.
    Type: Application
    Filed: May 29, 2009
    Publication date: October 22, 2009
    Inventors: Deepak Shukla, Shelby F. Nelson, Diane C. Freeman
  • Publication number: 20090256137
    Abstract: A thin film transistor comprises a layer of organic semiconductor that comprises an N,N?-1,4,5,8-naphthalenetetracarboxylic acid diimide having at least one cycloalkyl group having a fluorinated substituent at its 4-position that adopts an equatorial orientation in the trans configuration of the cycloalkyl group and an axial orientation in the cis configuration of the cycloalkyl group. Such transistors can be a field effect transistor having a dielectric layer, a gate electrode, a source electrode and a drain electrode. The gate electrode and the thin film of organic semiconductor material both contact the dielectric layer, and the source electrode and the drain electrode both contact the thin film of organic semiconductor material.
    Type: Application
    Filed: April 11, 2008
    Publication date: October 15, 2009
    Inventors: Deepak Shukla, Thomas R. Welter
  • Patent number: 7579619
    Abstract: A thin film transistor comprises a layer of organic semiconductor material comprising a tetracarboxylic diimide naphthalene-based compound having, attached to each of the imide nitrogen atoms, a substituted or unsubstituted arylalkyl moiety. Such transistors can further comprise spaced apart first and second contact means or electrodes in contact with said material. Further disclosed is a process for fabricating an organic thin-film transistor device, preferably by sublimation deposition onto a substrate, wherein the substrate temperature is no more than 100° C.
    Type: Grant
    Filed: April 20, 2005
    Date of Patent: August 25, 2009
    Assignee: Eastman Kodak Company
    Inventors: Deepak Shukla, Shelby F. Nelson, Diane C. Freeman
  • Patent number: 7563389
    Abstract: The present invention relates to photo-tunable dopant compositions comprising a photo-reactive chiral compound capable of undergoing a photochemical reaction resulting in the loss of chirality, and a triplet sensitizer. The present invention also relates to a display comprising a substrate, a liquid crystalline layer thereon, wherein the liquid crystalline layer comprises a nematic host, at least one chiral dopant, a photo-reacted compound, and a triplet sensitizer, and at least one transparent conductive layer. The present invention also relates to a method of tuning a cholesteric liquid crystal material comprising providing at least one mesogenic compound, at least one triplet sensitizer, and at least one photo-reactive chiral compound; combining the at least one mesogenic compound, at least one triplet sensitizer, and at least one photo-reactive chiral compound to form a mixture; and irradiating the mixture for a period of time.
    Type: Grant
    Filed: December 10, 2008
    Date of Patent: July 21, 2009
    Assignee: Industrial Technology Research Institute
    Inventors: Deepak Shukla, Krishnan Chari
  • Publication number: 20090176111
    Abstract: The present invention relates to a splayant, that is, an intercalant/exfoliant, comprising an azinium compound capable of splaying a layered material.
    Type: Application
    Filed: March 11, 2009
    Publication date: July 9, 2009
    Inventors: Debasis Majumdar, Deepak Shukla
  • Patent number: 7531338
    Abstract: 3-OST-5 proteins, and nucleic acid molecules encoding the same. Recombinant host cells, recombinant nucleic acids and recombinant proteins are also disclosed, along with methods of producing each. Isolated and purified antibodies to 3-OST-5 homologs, and methods of producing the same, are also disclosed. 3OST-5 gene products have biological activity in specific heparan sulfate 3-O-sulfotransferase reactions. These reactions provide unique modified heparan sulfate. Thus, therapeutic methods involving this activity are also disclosed.
    Type: Grant
    Filed: July 7, 2003
    Date of Patent: May 12, 2009
    Assignees: The University of North Carolina at Chapel Hill, The Board of Trustees of the University of Illinois
    Inventors: Jian Liu, Guoqing Xia, Jinghua Chen, Michael B. Duncan, Deepak Shukla, Vaibhav Tiwari, Anders Malmstrom